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AU2001269436A1 - Polishing composition and magnetic recording disk substrate polished with the polishing composition - Google Patents

Polishing composition and magnetic recording disk substrate polished with the polishing composition

Info

Publication number
AU2001269436A1
AU2001269436A1 AU2001269436A AU6943601A AU2001269436A1 AU 2001269436 A1 AU2001269436 A1 AU 2001269436A1 AU 2001269436 A AU2001269436 A AU 2001269436A AU 6943601 A AU6943601 A AU 6943601A AU 2001269436 A1 AU2001269436 A1 AU 2001269436A1
Authority
AU
Australia
Prior art keywords
polishing composition
magnetic recording
disk substrate
recording disk
substrate polished
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001269436A
Inventor
Kimihiro Hon
Ken Ishitobi
Tetsuro Kumita
Yoshinori Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamaguchi Seiken Kogyo Co Ltd
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Yamaguchi Seiken Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000204163A external-priority patent/JP2002020732A/en
Application filed by Showa Denko KK, Yamaguchi Seiken Kogyo Co Ltd filed Critical Showa Denko KK
Publication of AU2001269436A1 publication Critical patent/AU2001269436A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
    • C01F7/34—Preparation of aluminium hydroxide by precipitation from solutions containing aluminium salts
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
AU2001269436A 2000-07-05 2001-07-04 Polishing composition and magnetic recording disk substrate polished with the polishing composition Abandoned AU2001269436A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000204163A JP2002020732A (en) 2000-07-05 2000-07-05 Polishing composition
JP2000-204163 2000-07-05
US26088301P 2001-01-12 2001-01-12
US60260883 2001-01-12
PCT/JP2001/005800 WO2002002712A1 (en) 2000-07-05 2001-07-04 Polishing composition and magnetic recording disk substrate polished with the polishing composition

Publications (1)

Publication Number Publication Date
AU2001269436A1 true AU2001269436A1 (en) 2002-01-14

Family

ID=26595451

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001269436A Abandoned AU2001269436A1 (en) 2000-07-05 2001-07-04 Polishing composition and magnetic recording disk substrate polished with the polishing composition

Country Status (3)

Country Link
US (1) US20020128327A1 (en)
AU (1) AU2001269436A1 (en)
WO (1) WO2002002712A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2393186B (en) * 2002-07-31 2006-02-22 Kao Corp Polishing composition
GB2393447B (en) * 2002-08-07 2006-04-19 Kao Corp Polishing composition
US7481949B2 (en) * 2002-11-08 2009-01-27 Wako Pure Chemical Industries, Ltd Polishing composition and rinsing composition
WO2009131556A1 (en) 2008-04-24 2009-10-29 Ppt Research, Inc. Stable aqueous slurry suspensions
JP6396740B2 (en) 2014-09-29 2018-09-26 株式会社フジミインコーポレーテッド Polishing composition and polishing method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6034496B2 (en) * 1978-08-03 1985-08-09 住友アルミニウム製錬株式会社 Manufacturing method of alumina sol
JPS5527824A (en) * 1978-08-11 1980-02-28 Sumitomo Alum Smelt Co Ltd Production of alumina sol
JPH0269316A (en) * 1988-09-02 1990-03-08 Idemitsu Kosan Co Ltd Functional composite materials
JP3582017B2 (en) * 1993-06-25 2004-10-27 株式会社フジミインコーポレーテッド Polishing composition and plastic polishing composition
US5593468A (en) * 1995-07-26 1997-01-14 Saint-Gobain/Norton Industrial Ceramics Corporation Sol-gel alumina abrasives
JPH09258277A (en) * 1996-03-25 1997-10-03 Nippon Telegr & Teleph Corp <Ntt> Non-linear optical material, method of forming colloid, non-linear optical element and permanent grating
US6080216A (en) * 1998-04-22 2000-06-27 3M Innovative Properties Company Layered alumina-based abrasive grit, abrasive products, and methods
JP2000063806A (en) * 1998-08-17 2000-02-29 Okamoto Machine Tool Works Ltd Abrasive slurry and preparation thereof
JP2000109816A (en) * 1998-10-05 2000-04-18 Okamoto Machine Tool Works Ltd Method for preparing abrasive slurry

Also Published As

Publication number Publication date
US20020128327A1 (en) 2002-09-12
WO2002002712A1 (en) 2002-01-10

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