AU2001262716A1 - Process for producing polyurethane foam, polyurethane foam, and abrasive sheet - Google Patents
Process for producing polyurethane foam, polyurethane foam, and abrasive sheetInfo
- Publication number
- AU2001262716A1 AU2001262716A1 AU2001262716A AU6271601A AU2001262716A1 AU 2001262716 A1 AU2001262716 A1 AU 2001262716A1 AU 2001262716 A AU2001262716 A AU 2001262716A AU 6271601 A AU6271601 A AU 6271601A AU 2001262716 A1 AU2001262716 A1 AU 2001262716A1
- Authority
- AU
- Australia
- Prior art keywords
- polyurethane foam
- abrasive sheet
- producing
- producing polyurethane
- abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229920005830 Polyurethane Foam Polymers 0.000 title 2
- 239000011496 polyurethane foam Substances 0.000 title 2
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/30—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by mixing gases into liquid compositions or plastisols, e.g. frothing with air
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/0061—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof characterized by the use of several polymeric components
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2375/00—Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
- C08J2375/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Polyurethanes Or Polyureas (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-176732 | 2000-06-13 | ||
| JP2000176732 | 2000-06-13 | ||
| PCT/JP2001/004831 WO2001096434A1 (en) | 2000-06-13 | 2001-06-07 | Process for producing polyurethane foam, polyurethane foam, and abrasive sheet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001262716A1 true AU2001262716A1 (en) | 2001-12-24 |
Family
ID=18678424
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001262716A Abandoned AU2001262716A1 (en) | 2000-06-13 | 2001-06-07 | Process for producing polyurethane foam, polyurethane foam, and abrasive sheet |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US6777455B2 (en) |
| JP (1) | JP3490431B2 (en) |
| KR (1) | KR100707407B1 (en) |
| CN (1) | CN1263781C (en) |
| AU (1) | AU2001262716A1 (en) |
| TW (1) | TWI245050B (en) |
| WO (1) | WO2001096434A1 (en) |
Families Citing this family (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6777455B2 (en) * | 2000-06-13 | 2004-08-17 | Toyo Tire & Rubber Co., Ltd. | Process for producing polyurethane foam |
| WO2002046283A1 (en) * | 2000-12-08 | 2002-06-13 | Kuraray. Co., Ltd. | Thermoplastic polyurethane foam, process for production thereof and polishing pads made of the foam |
| JP3455187B2 (en) | 2001-02-01 | 2003-10-14 | 東洋ゴム工業株式会社 | Manufacturing equipment for polyurethane foam for polishing pad |
| KR100790427B1 (en) * | 2001-04-09 | 2008-01-02 | 도요 고무 고교 가부시키가이샤 | Polyurethane Compositions and Polishing Pads |
| JP2003062748A (en) * | 2001-08-24 | 2003-03-05 | Inoac Corp | Abrasive pad |
| WO2003043071A1 (en) | 2001-11-13 | 2003-05-22 | Toyo Boseki Kabushiki Kaisha | Grinding pad and method of producing the same |
| US20040171339A1 (en) * | 2002-10-28 | 2004-09-02 | Cabot Microelectronics Corporation | Microporous polishing pads |
| US20040021243A1 (en) * | 2002-08-02 | 2004-02-05 | Wen-Chang Shih | Method for manufacturing auxiliary gas-adding polyurethae/polyurethane-urea polishing pad |
| JP4101584B2 (en) * | 2002-08-09 | 2008-06-18 | 東洋ゴム工業株式会社 | Polyurethane foam for polishing sheet and method for producing the same, polishing sheet for polishing pad, and polishing pad |
| JP4313761B2 (en) * | 2002-11-18 | 2009-08-12 | ドン ソン エイ アンド ティ カンパニー リミテッド | Method for producing polyurethane foam containing fine pores and polishing pad produced therefrom |
| TW592894B (en) * | 2002-11-19 | 2004-06-21 | Iv Technologies Co Ltd | Method of fabricating a polishing pad |
| JP3637568B2 (en) * | 2002-12-17 | 2005-04-13 | 大日本インキ化学工業株式会社 | Two-component curing type polyol composition for foaming whetstone, two-component curing type composition for foaming whetstone, foaming whetstone, and method for producing foaming whetstone |
| US20050171224A1 (en) * | 2004-02-03 | 2005-08-04 | Kulp Mary J. | Polyurethane polishing pad |
| TWI293266B (en) * | 2004-05-05 | 2008-02-11 | Iv Technologies Co Ltd | A single-layer polishing pad and a method of producing the same |
| US7988534B1 (en) * | 2004-05-19 | 2011-08-02 | Sutton Stephen P | Optical polishing pitch formulations |
| TWI254354B (en) * | 2004-06-29 | 2006-05-01 | Iv Technologies Co Ltd | An inlaid polishing pad and a method of producing the same |
| US7275928B2 (en) | 2004-11-23 | 2007-10-02 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Apparatus for forming a striation reduced chemical mechanical polishing pad |
| JP5037014B2 (en) * | 2005-03-08 | 2012-09-26 | 東洋ゴム工業株式会社 | Polishing pad manufacturing method and polishing pad |
| US8148441B2 (en) | 2005-03-08 | 2012-04-03 | Toyo Tire & Rubber Co., Ltd. | Polishing pad and manufacturing method thereof |
| JP2006299076A (en) * | 2005-04-20 | 2006-11-02 | Toray Ind Inc | Polyurethane foam |
| KR101134432B1 (en) | 2005-05-17 | 2012-04-10 | 도요 고무 고교 가부시키가이샤 | Polishing pad |
| SG162797A1 (en) | 2005-07-15 | 2010-07-29 | Toyo Tire & Rubber Co | Layered sheets and processes for producing the same |
| JP4681970B2 (en) * | 2005-07-27 | 2011-05-11 | ニッタ・ハース株式会社 | Polishing pad and polishing machine |
| JP4884726B2 (en) | 2005-08-30 | 2012-02-29 | 東洋ゴム工業株式会社 | Manufacturing method of laminated polishing pad |
| JP4884725B2 (en) * | 2005-08-30 | 2012-02-29 | 東洋ゴム工業株式会社 | Polishing pad |
| JP5031236B2 (en) | 2006-01-10 | 2012-09-19 | 東洋ゴム工業株式会社 | Polishing pad |
| DE102006016638A1 (en) * | 2006-04-08 | 2007-10-11 | Bayer Materialscience Ag | Microporous coating based on polyurethane-polyurea |
| TW200800489A (en) * | 2006-04-19 | 2008-01-01 | Toyo Tire & Amp Rubber Co Ltd | Method for manufacturing polishing pad |
| KR100804275B1 (en) * | 2006-07-24 | 2008-02-18 | 에스케이씨 주식회사 | CPM polishing pad comprising a liquid organic core surrounded by a polymer shell and a method of manufacturing the same |
| KR101107043B1 (en) | 2006-08-28 | 2012-01-25 | 도요 고무 고교 가부시키가이샤 | Polishing pad |
| JP5008927B2 (en) | 2006-08-31 | 2012-08-22 | 東洋ゴム工業株式会社 | Polishing pad |
| KR101177781B1 (en) * | 2006-09-08 | 2012-08-30 | 도요 고무 고교 가부시키가이샤 | Method for production of polishing pad |
| WO2008029538A1 (en) | 2006-09-08 | 2008-03-13 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
| US20100036008A1 (en) * | 2006-12-11 | 2010-02-11 | Basf Se | Highly elastic flexible polyurethane foams |
| JP4237800B2 (en) * | 2007-01-15 | 2009-03-11 | 東洋ゴム工業株式会社 | Polishing pad |
| JP4261586B2 (en) * | 2007-01-15 | 2009-04-30 | 東洋ゴム工業株式会社 | Polishing pad manufacturing method |
| KR101399516B1 (en) * | 2007-01-15 | 2014-05-27 | 도요 고무 고교 가부시키가이샤 | Polishing pad and method for producing the same |
| JP5078000B2 (en) | 2007-03-28 | 2012-11-21 | 東洋ゴム工業株式会社 | Polishing pad |
| KR100828949B1 (en) * | 2007-04-18 | 2008-05-13 | 아이케이 주식회사 | Flame retardant board and manufacturing method thereof |
| US20090062414A1 (en) * | 2007-08-28 | 2009-03-05 | David Picheng Huang | System and method for producing damping polyurethane CMP pads |
| EP2045279A1 (en) * | 2007-10-05 | 2009-04-08 | Bayer MaterialScience AG | Polyurethane foams for treating wounds |
| US8052507B2 (en) * | 2007-11-20 | 2011-11-08 | Praxair Technology, Inc. | Damping polyurethane CMP pads with microfillers |
| JP4593643B2 (en) | 2008-03-12 | 2010-12-08 | 東洋ゴム工業株式会社 | Polishing pad |
| US20100035529A1 (en) * | 2008-08-05 | 2010-02-11 | Mary Jo Kulp | Chemical mechanical polishing pad |
| CN101412798B (en) * | 2008-11-21 | 2011-08-10 | 优洁(亚洲)有限公司 | Soft polyurethane low resilience foam and preparation method thereof |
| US8303375B2 (en) | 2009-01-12 | 2012-11-06 | Novaplanar Technology, Inc. | Polishing pads for chemical mechanical planarization and/or other polishing methods |
| CN102448669B (en) * | 2009-05-27 | 2014-12-10 | 罗杰斯公司 | Polishing pad, polyurethane layer thereof, and method for polishing silicon wafers |
| WO2011001755A1 (en) * | 2009-06-29 | 2011-01-06 | Dic株式会社 | Two-pack urethane resin composite for use in an abrasive pad, polyurethane abrasive pad, and method for manufacturing a polyurethane abrasive pad |
| JP5426469B2 (en) * | 2010-05-10 | 2014-02-26 | 東洋ゴム工業株式会社 | Polishing pad and glass substrate manufacturing method |
| EP2678152B1 (en) * | 2011-02-24 | 2021-03-24 | 3M Innovative Properties Company | Coated abrasive article with foam backing and method of making the same |
| KR20130095430A (en) * | 2012-02-20 | 2013-08-28 | 케이피엑스케미칼 주식회사 | Polishing pad and manufacturing method thereof |
| KR101417274B1 (en) * | 2012-05-23 | 2014-07-09 | 삼성전자주식회사 | Polishing pad and manufacturing method thereof |
| SG10201703539YA (en) * | 2012-09-28 | 2017-06-29 | Univ Nanyang Tech | Methods of Producing Foams And Nanocomposites of Phthalonitrile Based Resins, And Foams And Nanocomposites Produced Thereof |
| US9133626B2 (en) | 2013-05-02 | 2015-09-15 | Tower Ipco Company Limited | Multi-purpose tile |
| US9643377B2 (en) | 2013-05-02 | 2017-05-09 | Tower Ipco Company Limited | Floor plank with foam core |
| US20150196809A1 (en) * | 2014-01-10 | 2015-07-16 | Acushent Company | Golf balls having particle-based foam center |
| SG11201608219WA (en) * | 2014-04-03 | 2016-10-28 | 3M Innovative Properties Co | Polishing pads and systems and methods of making and using the same |
| TWI751202B (en) * | 2016-09-30 | 2022-01-01 | 日商富士紡控股股份有限公司 | Manufacturing method of polishing pad and manufacturing device of polishing pad |
| JP6856340B2 (en) * | 2016-09-30 | 2021-04-07 | 富士紡ホールディングス株式会社 | Polishing pad manufacturing method and polishing pad manufacturing equipment |
| CN107501521A (en) * | 2017-09-15 | 2017-12-22 | 山东诺威聚氨酯股份有限公司 | Polyurethane foamed composite thing applied to inner-walls of duct cleaner and preparation method thereof |
| KR102389882B1 (en) * | 2018-10-31 | 2022-04-21 | 한양대학교 산학협력단 | Method for Preparing Porous Polymer Film with Controlled Pore Depth and Porous Polymer Film Prepared by Same |
| CN114750069B (en) * | 2022-03-17 | 2023-01-24 | 安徽禾臣新材料有限公司 | A meticulous polishing pad for new energy automobile cylinder inner wall |
| WO2025054442A1 (en) * | 2023-09-06 | 2025-03-13 | University Of Connecticut | Flame retardant foams, methods of manufacture thereof and articles comprising the same |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR8701098A (en) | 1987-03-11 | 1988-09-13 | Brastemp Sa | HARD POLYURETHANE PREPARATION PROCESS |
| JP2878282B2 (en) | 1988-03-01 | 1999-04-05 | 藤倉ゴム工業株式会社 | Polyurethane composition for abrasive and method for producing polyurethane foam |
| MX170184B (en) | 1988-07-15 | 1993-08-10 | Takeda Chemical Industries Ltd | POLYOL COMPOSITION TO PRODUCE RIGID POLYURETHANE FOAMS. |
| IT218189Z2 (en) * | 1988-11-23 | 1992-04-08 | Zanussi A Spa Industrie | DISHWASHER MACHINE WITH SELF-CLEANING REDIRCULATION FILTER. |
| GB9216631D0 (en) * | 1992-08-05 | 1992-09-16 | Ici Plc | Reaction system for preparing microcellular elastomers |
| JPH06220151A (en) | 1993-01-22 | 1994-08-09 | Sanyo Chem Ind Ltd | Polyurethane resin for polishing material |
| JP3660375B2 (en) * | 1994-06-30 | 2005-06-15 | 住化バイエルウレタン株式会社 | Method for producing polyurethane foam |
| JP3042593B2 (en) * | 1995-10-25 | 2000-05-15 | 日本電気株式会社 | Polishing pad |
| JPH11302355A (en) | 1998-04-23 | 1999-11-02 | Dainippon Ink & Chem Inc | Foamed polyurethane elastomer composition and vibration damping material |
| US6200901B1 (en) * | 1998-06-10 | 2001-03-13 | Micron Technology, Inc. | Polishing polymer surfaces on non-porous CMP pads |
| JP2000017252A (en) | 1998-06-29 | 2000-01-18 | Dainippon Ink & Chem Inc | Abrasive composition and its abrasive |
| US6022903A (en) * | 1998-07-09 | 2000-02-08 | Arco Chemical Technology L.P. | Permanent gas blown microcellular polyurethane elastomers |
| CN1148395C (en) * | 1998-07-31 | 2004-05-05 | 花王株式会社 | Method for producing polyurethane foam |
| JP3516874B2 (en) * | 1998-12-15 | 2004-04-05 | 東洋ゴム工業株式会社 | Method for producing polyurethane foam and polishing sheet |
| JP2000176374A (en) | 1998-12-18 | 2000-06-27 | Nippon Steel Corp | Method of forming water glass based coating with good appearance quality on metal plate |
| JP3880028B2 (en) | 1999-08-06 | 2007-02-14 | Jsr株式会社 | Polymer composition for polishing pad and polishing pad using the same |
| JP2001176829A (en) | 1999-12-20 | 2001-06-29 | Nitto Denko Corp | Semiconductor wafer polishing method and semiconductor wafer polishing pad |
| JP2001179608A (en) | 1999-12-22 | 2001-07-03 | Toray Ind Inc | Polishing pad, and polishing device and polishing method using the same |
| TWI225494B (en) * | 2000-02-17 | 2004-12-21 | Mitsui Chemicals Inc | Microcellular polyurethane elastomer, and method of producing the same |
| JP2001277101A (en) | 2000-03-28 | 2001-10-09 | Rodel Nitta Co | Abrasive cloth |
| US6777455B2 (en) * | 2000-06-13 | 2004-08-17 | Toyo Tire & Rubber Co., Ltd. | Process for producing polyurethane foam |
| JP2001358101A (en) | 2000-06-13 | 2001-12-26 | Toray Ind Inc | Polishing pad |
| WO2003043071A1 (en) | 2001-11-13 | 2003-05-22 | Toyo Boseki Kabushiki Kaisha | Grinding pad and method of producing the same |
-
2001
- 2001-06-07 US US10/111,738 patent/US6777455B2/en not_active Expired - Lifetime
- 2001-06-07 CN CNB018110789A patent/CN1263781C/en not_active Expired - Lifetime
- 2001-06-07 AU AU2001262716A patent/AU2001262716A1/en not_active Abandoned
- 2001-06-07 WO PCT/JP2001/004831 patent/WO2001096434A1/en not_active Ceased
- 2001-06-07 KR KR1020027016600A patent/KR100707407B1/en not_active Expired - Lifetime
- 2001-06-07 JP JP2002510566A patent/JP3490431B2/en not_active Expired - Lifetime
- 2001-06-12 TW TW090114178A patent/TWI245050B/en not_active IP Right Cessation
-
2004
- 2004-06-30 US US10/881,756 patent/US7098255B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US7098255B2 (en) | 2006-08-29 |
| JPWO2001096434A1 (en) | 2004-01-08 |
| US20040242719A1 (en) | 2004-12-02 |
| CN1602321A (en) | 2005-03-30 |
| US20020183409A1 (en) | 2002-12-05 |
| CN1263781C (en) | 2006-07-12 |
| TWI245050B (en) | 2005-12-11 |
| JP3490431B2 (en) | 2004-01-26 |
| KR20030007885A (en) | 2003-01-23 |
| WO2001096434A1 (en) | 2001-12-20 |
| US6777455B2 (en) | 2004-08-17 |
| KR100707407B1 (en) | 2007-04-13 |
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