AU2080999A - A composition for chemical mechanical polishing - Google Patents

A composition for chemical mechanical polishing

Info

Publication number: AU2080999A
Authority: AU; Australia
Prior art keywords: composition; mechanical polishing; chemical mechanical; polishing; chemical
Prior art date: 1997-12-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU20809/99A

Inventor

Kenneth Olof Larsson

Bozena Tokarz

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Akzo Nobel NV

Original Assignee

Akzo Nobel NV

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-12-23

Filing date

1998-12-18

Publication date

1999-07-12

1998-12-18 Application filed by Akzo Nobel NV filed Critical Akzo Nobel NV

1999-07-12 Publication of AU2080999A publication Critical patent/AU2080999A/en

Status Abandoned legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
- H10P52/402—

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Treatment Of Semiconductor (AREA)

AU20809/99A 1997-12-23 1998-12-18 A composition for chemical mechanical polishing Abandoned AU2080999A (en)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
US7129197P	1997-12-23	1997-12-23
US60071291		1997-12-23
US991998A	1998-01-21	1998-01-21
US09009919		1998-01-21
PCT/SE1998/002370 WO1999032570A1 (en)	1997-12-23	1998-12-18	A composition for chemical mechanical polishing

Publications (1)

Publication Number	Publication Date
AU2080999A true AU2080999A (en)	1999-07-12

Family

ID=26680020

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU20809/99A Abandoned AU2080999A (en)	1997-12-23	1998-12-18	A composition for chemical mechanical polishing

Country Status (2)

Country	Link
AU (1)	AU2080999A (en)
WO (1)	WO1999032570A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3440419B2 (en) *	2001-02-02	2003-08-25	株式会社フジミインコーポレーテッド	Polishing composition and polishing method using the same
EP1456313A1 (en) *	2001-12-20	2004-09-15	AKZO Nobel N.V.	Cerium oxide coated silica particles and method for production thereof
DE10247201A1 (en) *	2002-10-10	2003-12-18	Wacker Siltronic Halbleitermat	Production of boron-doped silicon wafer, used as substrate for electronic element, e.g. processor or memory element, includes polishing with aqueous alkaline polish containing silica and alkali metal or ammonium polyaminocarboxylate
JP4912592B2 (en)	2002-11-08	2012-04-11	株式会社フジミインコーポレーテッド	Polishing composition and method of using the same
JP2006005246A (en)	2004-06-18	2006-01-05	Fujimi Inc	Rinsing composition and rinsing method using the same
JP2007214205A (en)	2006-02-07	2007-08-23	Fujimi Inc	Polishing composition
JP5204960B2 (en)	2006-08-24	2013-06-05	株式会社フジミインコーポレーテッド	Polishing composition and polishing method
JP5474400B2 (en)	2008-07-03	2014-04-16	株式会社フジミインコーポレーテッド	Semiconductor wetting agent, polishing composition and polishing method using the same
CN102441819B (en) *	2011-10-20	2014-03-19	天津理工大学	Chemical and mechanical polishing method for sulfur phase-change material
CN102952467A (en) *	2012-11-09	2013-03-06	中国电子科技集团公司第四十六研究所	Polishing solution and method for polishing cadmium sulfide (CdS) wafer by applying same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3715842A (en) *	1970-07-02	1973-02-13	Tizon Chem Corp	Silica polishing compositions having a reduced tendency to scratch silicon and germanium surfaces
US4462188A (en) *	1982-06-21	1984-07-31	Nalco Chemical Company	Silica sol compositions for polishing silicon wafers
JPS63272460A (en) *	1987-04-28	1988-11-09	Mitsubishi Monsanto Chem Co	Abrasive composition for wafers
US4954142A (en) *	1989-03-07	1990-09-04	International Business Machines Corporation	Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
JP2726488B2 (en) *	1989-04-10	1998-03-11	株式会社東芝	Method for manufacturing semiconductor device
EP0520109B1 (en) *	1991-05-28	1995-03-29	Rodel, Inc.	Low sodium, low metals silica polishing slurries
US5376222A (en) *	1991-09-04	1994-12-27	Fujitsu Limited	Polishing method for polycrystalline silicon
US5885899A (en) *	1995-11-14	1999-03-23	International Business Machines Corporation	Method of chemically mechanically polishing an electronic component using a non-selective ammonium hydroxide slurry

1998
- 1998-12-18 AU AU20809/99A patent/AU2080999A/en not_active Abandoned
- 1998-12-18 WO PCT/SE1998/002370 patent/WO1999032570A1/en not_active Ceased

Also Published As

Publication number	Publication date
WO1999032570A1 (en)	1999-07-01

Publication	Publication Date	Title
AU8677698A (en)	1999-03-08	Chemical mechanical polishing composition
AU6322098A (en)	1998-08-26	A cleaning composition
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AU8731598A (en)	1999-05-03	Actuating tool
AU5965198A (en)	1998-10-15	Hand tool
AU7210598A (en)	1998-10-20	Novel compounds
AU6804098A (en)	1998-11-26	Triazinylaminostilbene compounds
AU7476598A (en)	1999-02-10	18-substituted-19-nor-vitamin d compounds
AU688252B3 (en)	1998-03-05	A juice-extractor also serving as a grinder
AUPO941497A0 (en)	1997-10-16	Novel compounds
AU2080999A (en)	1999-07-12	A composition for chemical mechanical polishing
AUPP042397A0 (en)	1997-12-11	5-arylpyrazole compounds
AU4021697A (en)	1999-03-08	A cleaning composition
AU4905697A (en)	1999-05-03	A detergent composition
AU7124598A (en)	1998-11-13	Polymer-platinum compounds
AU699057B2 (en)	1998-11-19	Chemical composition
AU8863098A (en)	1999-02-16	Chemical composition
AU7582598A (en)	1998-12-30	Chuck
AU8019998A (en)	1998-12-21	Fluoromethoximino compounds
AU5080298A (en)	1999-05-03	A detergent composition
AU9753998A (en)	1999-05-24	Azaboroxine compounds
AU7041098A (en)	1998-10-30	Pi-complex compounds
AU7576798A (en)	1998-12-08	Sympathomimetic compounds
AU9464398A (en)	1999-05-10	Novel antifungal compounds
AU6560598A (en)	1998-09-29	Functionally-graded materials

Legal Events

Date	Code	Title	Description
2000-04-06	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase