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AU1241401A - Method and radiation generating system using microtargets - Google Patents

Method and radiation generating system using microtargets

Info

Publication number
AU1241401A
AU1241401A AU12414/01A AU1241401A AU1241401A AU 1241401 A AU1241401 A AU 1241401A AU 12414/01 A AU12414/01 A AU 12414/01A AU 1241401 A AU1241401 A AU 1241401A AU 1241401 A AU1241401 A AU 1241401A
Authority
AU
Australia
Prior art keywords
microtargets
generating system
radiation generating
radiation
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU12414/01A
Inventor
John H. Carosella
Richard M. Foster
James H. Morris
Carey A. Pico
Michael F. Powers
I. C. Edmond Turcu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JMAR Research Inc
Original Assignee
JMAR Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JMAR Research Inc filed Critical JMAR Research Inc
Publication of AU1241401A publication Critical patent/AU1241401A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0025—Systems for collecting the plasma generating material after the plasma generation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H6/00—Targets for producing nuclear reactions

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU12414/01A 1999-10-27 2000-10-27 Method and radiation generating system using microtargets Abandoned AU1241401A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16189199P 1999-10-27 1999-10-27
US60161891 1999-10-27
PCT/US2000/029743 WO2001031678A1 (en) 1999-10-27 2000-10-27 Method and radiation generating system using microtargets

Publications (1)

Publication Number Publication Date
AU1241401A true AU1241401A (en) 2001-05-08

Family

ID=22583229

Family Applications (1)

Application Number Title Priority Date Filing Date
AU12414/01A Abandoned AU1241401A (en) 1999-10-27 2000-10-27 Method and radiation generating system using microtargets

Country Status (4)

Country Link
EP (1) EP1232516A4 (en)
JP (1) JP2003513418A (en)
AU (1) AU1241401A (en)
WO (1) WO2001031678A1 (en)

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US6714624B2 (en) * 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
US8653437B2 (en) * 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
JP2010182698A (en) * 2002-04-10 2010-08-19 Cymer Inc Extreme ultraviolet light source
DE602004028446D1 (en) 2003-03-18 2010-09-16 Koninkl Philips Electronics Nv DEVICE AND METHOD FOR GENERATING EXTREME ULTRAVIOLET AND / OR SOFT X-RAY USING A PLASMA
AU2003296155A1 (en) * 2003-03-26 2004-10-18 Kansai Technology Licensing Organization Co., Ltd. Extreme ultraviolet light source and target for extreme ultraviolet light source
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
JP4337648B2 (en) 2004-06-24 2009-09-30 株式会社ニコン EUV LIGHT SOURCE, EUV EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
CN100485864C (en) * 2004-06-24 2009-05-06 株式会社尼康 EUV light source, EUV exposure apparatus, and method for manufacturing semiconductor device
US7302043B2 (en) 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
FR2874785B1 (en) * 2004-08-27 2006-12-01 Commissariat Energie Atomique METHOD AND DEVICE FOR GENERATING RADIATION OR PARTICLES BY INTERACTING BETWEEN A LASER BEAM AND A TARGET
JP2006128157A (en) * 2004-10-26 2006-05-18 Komatsu Ltd Driver laser system for extreme ultraviolet light source
WO2006064592A1 (en) * 2004-12-17 2006-06-22 Osaka University Target for extreme ultraviolet light and x-ray source and process for producing the same
JP2006202671A (en) * 2005-01-24 2006-08-03 Ushio Inc Extreme ultraviolet light source device and method for removing debris generated in extreme ultraviolet light source device
JP4710463B2 (en) * 2005-07-21 2011-06-29 ウシオ電機株式会社 Extreme ultraviolet light generator
US7763871B2 (en) 2008-04-02 2010-07-27 Asml Netherlands B.V. Radiation source
US8901521B2 (en) 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
NL1035846A1 (en) * 2007-08-23 2009-02-24 Asml Netherlands Bv Radiation source.
DE102007056872A1 (en) * 2007-11-26 2009-05-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Berlin Radiation generation by laser irradiation of a free droplet target
EP2236016B1 (en) * 2007-12-28 2017-08-09 Phoenix Nuclear Labs LLC High energy proton or neutron source
CN105575445B (en) 2008-05-02 2018-07-24 阳光医疗技术公司 Device and method for generating medical-isotope
JP2010103499A (en) 2008-09-29 2010-05-06 Komatsu Ltd Extreme ultraviolet light source apparatus and method for generating extreme ultraviolet light
JP5576079B2 (en) * 2008-09-29 2014-08-20 ギガフォトン株式会社 Extreme ultraviolet light source device
DE102009020776B4 (en) * 2009-05-08 2011-07-28 XTREME technologies GmbH, 37077 Arrangement for the continuous production of liquid tin as emitter material in EUV radiation sources
JP5574470B2 (en) * 2009-06-12 2014-08-20 国立大学法人 宮崎大学 Extreme ultraviolet light source and method for generating extreme ultraviolet light
EP2513640B1 (en) 2009-12-15 2020-02-05 Phoenix, LLC Method and apparatus for performing active neutron interrogation of containers
WO2012003009A2 (en) 2010-01-28 2012-01-05 Shine Medical Technologies, Inc. Segmented reaction chamber for radioisotope production
JP5075951B2 (en) * 2010-07-16 2012-11-21 ギガフォトン株式会社 Extreme ultraviolet light source device and driver laser system
US10734126B2 (en) 2011-04-28 2020-08-04 SHINE Medical Technologies, LLC Methods of separating medical isotopes from uranium solutions
JP5881345B2 (en) * 2011-09-13 2016-03-09 ギガフォトン株式会社 Extreme ultraviolet light generator
CA2869559C (en) 2012-04-05 2022-03-29 Shine Medical Technologies, Inc. Aqueous assembly and control method
GB2525957B (en) * 2013-03-04 2020-02-26 Inst Of Modern Physics Target device for neutron generating device, accelerator-excited neutron generating device and beam coupling method thereof
US9699876B2 (en) * 2013-03-14 2017-07-04 Asml Netherlands, B.V. Method of and apparatus for supply and recovery of target material
DE102013209447A1 (en) * 2013-05-22 2014-11-27 Siemens Aktiengesellschaft X-ray source and method for generating X-ray radiation
US10237960B2 (en) 2013-12-02 2019-03-19 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
US9301382B2 (en) * 2013-12-02 2016-03-29 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
JP2017522697A (en) * 2014-07-17 2017-08-10 シーメンス アクチエンゲゼルシヤフトＳｉｅｍｅｎｓ Ａｋｔｉｅｎｇｅｓｅｌｌｓｃｈａｆｔ Fluid injector for x-ray tube and method for providing a liquid anode by liquid metal jet
JP5964400B2 (en) * 2014-12-04 2016-08-03 ギガフォトン株式会社 Extreme ultraviolet light source device and its target supply system
DE102014226814B4 (en) * 2014-12-22 2023-05-11 Siemens Healthcare Gmbh metal beam x-ray tube
GB201522590D0 (en) * 2015-12-22 2016-02-03 Sck Cen Target assembly for generation of radioactive isotopes
US10310380B2 (en) 2016-12-07 2019-06-04 Taiwan Semiconductor Manufacturing Co., Ltd. High-brightness light source
US10847340B2 (en) 2017-10-11 2020-11-24 HIL Applied Medical, Ltd. Systems and methods for directing an ion beam using electromagnets
US10395881B2 (en) 2017-10-11 2019-08-27 HIL Applied Medical, Ltd. Systems and methods for providing an ion beam
EP3648135A1 (en) * 2018-11-05 2020-05-06 Excillum AB Mechanical alignment of x-ray sources
KR102430082B1 (en) 2020-03-13 2022-08-04 경희대학교 산학협력단 Extreme ultraviolet light source using eletron beam
JP7641167B2 (en) * 2021-04-26 2025-03-06 レーザーテック株式会社 Supply device, supply method and light source
DE102021004714A1 (en) 2021-08-23 2023-02-23 Hochschule Mittweida (FH), Körperschaft des öffentlichen Rechts Device for influencing the X-ray emission during laser material processing of a workpiece using a laser
KR102895880B1 (en) * 2021-09-10 2025-12-03 경희대학교 산학협력단 Electron beam and droplet based extreme ultraviolet light source apparatus
EP4457850A1 (en) * 2021-12-29 2024-11-06 Innovicum Technology AB Particle based x-ray source
US11882642B2 (en) 2021-12-29 2024-01-23 Innovicum Technology Ab Particle based X-ray source
CN115696710B (en) * 2022-10-20 2025-12-05 中国工程物理研究院激光聚变研究中心 A plasma preparation device and method based on microchannel devices
JP2025074606A (en) * 2023-10-30 2025-05-14 ウシオ電機株式会社 Plasma generation mechanism and light source device

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US6285743B1 (en) * 1998-09-14 2001-09-04 Nikon Corporation Method and apparatus for soft X-ray generation
FR2799667B1 (en) * 1999-10-18 2002-03-08 Commissariat Energie Atomique METHOD AND DEVICE FOR GENERATING A DENSE FOG OF MICROMETRIC AND SUBMICROMETRIC DROPLETS, APPLICATION TO THE GENERATION OF LIGHT IN EXTREME ULTRAVIOLET IN PARTICULAR FOR LITHOGRAPHY

Also Published As

Publication number Publication date
WO2001031678A1 (en) 2001-05-03
EP1232516A1 (en) 2002-08-21
JP2003513418A (en) 2003-04-08
EP1232516A4 (en) 2003-03-12

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase