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AU1110400A - Improvements in drying and cleaning objects using controlled aerosols and gases - Google Patents

Improvements in drying and cleaning objects using controlled aerosols and gases

Info

Publication number
AU1110400A
AU1110400A AU11104/00A AU1110400A AU1110400A AU 1110400 A AU1110400 A AU 1110400A AU 11104/00 A AU11104/00 A AU 11104/00A AU 1110400 A AU1110400 A AU 1110400A AU 1110400 A AU1110400 A AU 1110400A
Authority
AU
Australia
Prior art keywords
gases
drying
cleaning objects
aerosols
controlled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU11104/00A
Inventor
Gary W. Ferrell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU1110400A publication Critical patent/AU1110400A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H10P70/15—
    • H10P52/00—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/002—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being a degassed liquid
    • H10P72/0414—
AU11104/00A 1999-10-12 1999-10-12 Improvements in drying and cleaning objects using controlled aerosols and gases Abandoned AU1110400A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1999/023749 WO2001026830A1 (en) 1999-10-12 1999-10-12 Improvements in drying and cleaning objects using controlled aerosols and gases

Publications (1)

Publication Number Publication Date
AU1110400A true AU1110400A (en) 2001-04-23

Family

ID=22273794

Family Applications (1)

Application Number Title Priority Date Filing Date
AU11104/00A Abandoned AU1110400A (en) 1999-10-12 1999-10-12 Improvements in drying and cleaning objects using controlled aerosols and gases

Country Status (6)

Country Link
EP (1) EP1235653A1 (en)
JP (1) JP2003517917A (en)
KR (1) KR100604458B1 (en)
CN (1) CN1276804C (en)
AU (1) AU1110400A (en)
WO (1) WO2001026830A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7051743B2 (en) * 2002-10-29 2006-05-30 Yong Bae Kim Apparatus and method for cleaning surfaces of semiconductor wafers using ozone
JP4007980B2 (en) * 2004-07-15 2007-11-14 エス・イー・エス株式会社 Substrate drying method and substrate drying apparatus
TWI286796B (en) * 2004-12-14 2007-09-11 Sez Ag Apparatus and method for drying disk-shaped substrates
JP4807045B2 (en) * 2005-11-21 2011-11-02 パナソニック電工株式会社 Range hood with mist cleaning device
DE102006037087A1 (en) * 2006-08-07 2008-02-14 Accel Instruments Gmbh Cleaning inner surfaces of high frequency resonators, employs surface tension-reducing drying fluid, in which cleaning fluid is soluble
JP5261077B2 (en) 2008-08-29 2013-08-14 大日本スクリーン製造株式会社 Substrate cleaning method and substrate cleaning apparatus
CN102233310A (en) * 2010-04-20 2011-11-09 鸿富锦精密工业（深圳）有限公司 Immersion type coating device
US9174249B2 (en) * 2012-12-12 2015-11-03 Lam Research Corporation Ultrasonic cleaning method and apparatus therefore
JP5680699B2 (en) * 2013-04-25 2015-03-04 株式会社Ｓｃｒｅｅｎホールディングス Substrate cleaning method and substrate cleaning apparatus
JP2020203269A (en) * 2019-06-18 2020-12-24 合同会社アイル・Ｍｔｔ Bubble scattering inhibitor and method for using the same
AT522169B1 (en) * 2019-10-16 2020-09-15 Ess Holding Gmbh Device for the surface treatment of a workpiece in a production line
CN117153713B (en) * 2023-10-25 2024-02-02 江苏惠达电子科技有限责任公司 Method, system and equipment control method for detecting residual pollutants of frequency components

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4982753A (en) * 1983-07-26 1991-01-08 National Semiconductor Corporation Wafer etching, cleaning and stripping apparatus
US4850534A (en) * 1987-05-30 1989-07-25 Tdk Corporation Ultrasonic wave nebulizer
US5186192A (en) * 1990-12-14 1993-02-16 Shin-Etsu Handotai Co., Ltd. Apparatus for cleaning silicon wafer
JP3347814B2 (en) * 1993-05-17 2002-11-20 大日本スクリーン製造株式会社 Substrate cleaning / drying processing method and processing apparatus
US5571337A (en) * 1994-11-14 1996-11-05 Yieldup International Method for cleaning and drying a semiconductor wafer
JP3464843B2 (en) * 1995-03-30 2003-11-10 大日本スクリーン製造株式会社 Substrate processing method and substrate processing apparatus in substrate processing apparatus
JP3504023B2 (en) * 1995-05-26 2004-03-08 株式会社ルネサステクノロジ Cleaning device and cleaning method
US5685086A (en) * 1995-06-07 1997-11-11 Ferrell; Gary W. Method and apparatus for drying objects using aerosols
JPH0969509A (en) * 1995-09-01 1997-03-11 Matsushita Electron Corp Semiconductor wafer cleaning / etching / drying apparatus and method of using the same
US5954911A (en) * 1995-10-12 1999-09-21 Semitool, Inc. Semiconductor processing using vapor mixtures
JP3369418B2 (en) * 1996-11-25 2003-01-20 大日本スクリーン製造株式会社 Ultrasonic vibrator, ultrasonic cleaning nozzle, ultrasonic cleaning device, substrate cleaning device, substrate cleaning processing system, and ultrasonic cleaning nozzle manufacturing method

Also Published As

Publication number Publication date
JP2003517917A (en) 2003-06-03
KR20020068034A (en) 2002-08-24
CN1398206A (en) 2003-02-19
KR100604458B1 (en) 2006-07-26
EP1235653A1 (en) 2002-09-04
CN1276804C (en) 2006-09-27
WO2001026830A1 (en) 2001-04-19

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase