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ATE294445T1 - Nanoporösen materialien hergestellt mittels auflösbarer reagenz - Google Patents

Nanoporösen materialien hergestellt mittels auflösbarer reagenz

Info

Publication number
ATE294445T1
ATE294445T1 AT00928821T AT00928821T ATE294445T1 AT E294445 T1 ATE294445 T1 AT E294445T1 AT 00928821 T AT00928821 T AT 00928821T AT 00928821 T AT00928821 T AT 00928821T AT E294445 T1 ATE294445 T1 AT E294445T1
Authority
AT
Austria
Prior art keywords
reagent
materials produced
nanoporous materials
dissolvable reagent
dissolvable
Prior art date
Application number
AT00928821T
Other languages
English (en)
Inventor
Roger Leung
Hui Jung Wu
John Sikonia
Wenya Fan
Original Assignee
Allied Signal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Signal Inc filed Critical Allied Signal Inc
Application granted granted Critical
Publication of ATE294445T1 publication Critical patent/ATE294445T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Formation Of Insulating Films (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT00928821T 1999-05-07 2000-05-05 Nanoporösen materialien hergestellt mittels auflösbarer reagenz ATE294445T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13321899P 1999-05-07 1999-05-07
US09/420,611 US6214746B1 (en) 1999-05-07 1999-10-18 Nanoporous material fabricated using a dissolvable reagent
PCT/US2000/012170 WO2000068956A1 (en) 1999-05-07 2000-05-05 Nanoporous material fabricated using a dissolvable reagent

Publications (1)

Publication Number Publication Date
ATE294445T1 true ATE294445T1 (de) 2005-05-15

Family

ID=26831180

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00928821T ATE294445T1 (de) 1999-05-07 2000-05-05 Nanoporösen materialien hergestellt mittels auflösbarer reagenz

Country Status (8)

Country Link
US (1) US6214746B1 (de)
EP (1) EP1190422B1 (de)
JP (1) JP2002544331A (de)
KR (1) KR20020020887A (de)
AT (1) ATE294445T1 (de)
AU (1) AU4700000A (de)
DE (1) DE60019751D1 (de)
WO (1) WO2000068956A1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001048806A1 (en) * 1999-12-28 2001-07-05 Catalysts & Chemicals Industries Co., Ltd. Method of forming low-dielectric-constant film, and semiconductor substrate with low-dielectric-constant film
EP1197998A3 (de) 2000-10-10 2005-12-21 Shipley Company LLC Antireflektiver Schaumstoff
US6562449B2 (en) * 2001-02-22 2003-05-13 Jim Drage Nanoporous low dielectric constant polymers with hollow polymer particles
US6740685B2 (en) * 2001-05-30 2004-05-25 Honeywell International Inc. Organic compositions
US7141188B2 (en) * 2001-05-30 2006-11-28 Honeywell International Inc. Organic compositions
US6620542B2 (en) 2001-05-30 2003-09-16 Hewlett-Packard Development Company, L.P. Flex based fuel cell
US6602801B2 (en) * 2001-11-13 2003-08-05 Chartered Semiconductor Manufacturing Ltd. Method for forming a region of low dielectric constant nanoporous material
US6899857B2 (en) * 2001-11-13 2005-05-31 Chartered Semiconductors Manufactured Limited Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique
US6465052B1 (en) 2001-11-30 2002-10-15 Nanotek Instruments, Inc. Method for production of nano-porous coatings
JP3957154B2 (ja) * 2002-03-19 2007-08-15 富士通株式会社 低誘電率膜形成用組成物、低誘電率膜及びその製造方法、並びに半導体装置
GB0216333D0 (en) * 2002-07-13 2002-08-21 Univ Cranfield Substance - selective polymer membranes
AU2003302222A1 (en) * 2002-07-22 2004-06-30 Massachusetts Institute Of Technolgoy Porous material formation by chemical vapor deposition onto colloidal crystal templates
US20040137243A1 (en) * 2002-10-21 2004-07-15 Massachusetts Institute Of Technology Chemical vapor deposition of organosilicate thin films
US20040124092A1 (en) * 2002-12-30 2004-07-01 Black Charles T. Inorganic nanoporous membranes and methods to form same
EP1595003A4 (de) 2003-01-22 2008-03-26 Honeywell Int Inc Vorrichtung und verfahren zur ionisierten abscheidung eines films oder einer dünnen schicht
US7045851B2 (en) 2003-06-20 2006-05-16 International Business Machines Corporation Nonvolatile memory device using semiconductor nanocrystals and method of forming same
DE10336747A1 (de) * 2003-08-11 2005-03-17 Infineon Technologies Ag Halbleiterbauelementanordnung mit einer Nanopartikel aufweisenden Isolationsschicht
US8070988B2 (en) * 2003-09-09 2011-12-06 International Technology Center Nano-carbon hybrid structures
US7531209B2 (en) * 2005-02-24 2009-05-12 Michael Raymond Ayers Porous films and bodies with enhanced mechanical strength
US7341788B2 (en) 2005-03-11 2008-03-11 International Business Machines Corporation Materials having predefined morphologies and methods of formation thereof
WO2007143026A2 (en) 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Linked periodic networks of alternating carbon and inorganic clusters for use as low dielectric constant materials
US7883742B2 (en) * 2006-05-31 2011-02-08 Roskilde Semiconductor Llc Porous materials derived from polymer composites
US7875315B2 (en) * 2006-05-31 2011-01-25 Roskilde Semiconductor Llc Porous inorganic solids for use as low dielectric constant materials
WO2007143028A2 (en) * 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Low dielectric constant materials prepared from soluble fullerene clusters
JP4437820B2 (ja) * 2007-01-04 2010-03-24 富士通マイクロエレクトロニクス株式会社 低誘電率膜の製造方法
US20080173541A1 (en) * 2007-01-22 2008-07-24 Eal Lee Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced cooling
US20090026924A1 (en) * 2007-07-23 2009-01-29 Leung Roger Y Methods of making low-refractive index and/or low-k organosilicate coatings
US8702919B2 (en) * 2007-08-13 2014-04-22 Honeywell International Inc. Target designs and related methods for coupled target assemblies, methods of production and uses thereof
JP5133830B2 (ja) * 2008-09-19 2013-01-30 イビデン株式会社 基材の被覆方法
CN103383996B (zh) * 2013-06-27 2015-07-22 江苏华东锂电技术研究院有限公司 聚酰亚胺微孔隔膜的制备方法
RU2681185C1 (ru) * 2014-08-15 2019-03-04 Дау Глоубл Текнолоджиз Ллк Пена на основе полиэтилена, привитого полидиметилсилоксаном

Family Cites Families (10)

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GB1412983A (en) * 1971-11-30 1975-11-05 Debell & Richardson Method of producing porous plastic materials
CH625966A5 (de) * 1977-07-15 1981-10-30 Kilcher Chemie Ag
US4859715A (en) * 1984-05-18 1989-08-22 Raychem Corporation Microporous poly (arylether ketone) article
JP2906282B2 (ja) * 1990-09-20 1999-06-14 富士通株式会社 ガラスセラミック・グリーンシートと多層基板、及び、その製造方法
JPH04314394A (ja) * 1991-04-12 1992-11-05 Fujitsu Ltd ガラスセラミック回路基板とその製造方法
JP2531906B2 (ja) * 1991-09-13 1996-09-04 インターナショナル・ビジネス・マシーンズ・コーポレイション 発泡重合体
US5744399A (en) * 1995-11-13 1998-04-28 Lsi Logic Corporation Process for forming low dielectric constant layers using fullerenes
JPH10168218A (ja) * 1996-12-10 1998-06-23 Asahi Chem Ind Co Ltd フッ化ビニリデン系樹脂多孔膜
JPH1121369A (ja) * 1997-07-04 1999-01-26 Nippon Telegr & Teleph Corp <Ntt> 多孔質高分子膜の製造方法
US6299773B1 (en) * 1998-06-22 2001-10-09 Asahi Kasei Kogyo Kabushiki Kaisha Porous polyvinylidene fluoride resin film and process for producing the same

Also Published As

Publication number Publication date
KR20020020887A (ko) 2002-03-16
JP2002544331A (ja) 2002-12-24
AU4700000A (en) 2000-11-21
EP1190422B1 (de) 2005-04-27
US6214746B1 (en) 2001-04-10
DE60019751D1 (de) 2005-06-02
WO2000068956A1 (en) 2000-11-16
EP1190422A1 (de) 2002-03-27

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Legal Events

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