AR088700A1 - Procedimiento para la deposicion de sistemas de capas de pvd a partir de la fase de gas mediante pulverizacion sobre sustratos - Google Patents
Procedimiento para la deposicion de sistemas de capas de pvd a partir de la fase de gas mediante pulverizacion sobre sustratosInfo
- Publication number
- AR088700A1 AR088700A1 ARP120104202A ARP120104202A AR088700A1 AR 088700 A1 AR088700 A1 AR 088700A1 AR P120104202 A ARP120104202 A AR P120104202A AR P120104202 A ARP120104202 A AR P120104202A AR 088700 A1 AR088700 A1 AR 088700A1
- Authority
- AR
- Argentina
- Prior art keywords
- procedure
- spraying
- deposition
- gas phase
- substrates
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- 239000000758 substrate Substances 0.000 title abstract 4
- 230000008021 deposition Effects 0.000 title abstract 2
- 238000005507 spraying Methods 0.000 title abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 abstract 1
- 238000005240 physical vapour deposition Methods 0.000 abstract 1
- 230000010287 polarization Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
La presente se refiere a un procedimiento para la deposición de sistemas de capas de PVD a partir de la fase de gas mediante pulverización sobre por lo menos un sustrato, en donde el sistema de capas abarca por lo menos una primera capa, caracterizado porque por lo menos en un primer paso del procedimiento se emplea un procedimiento HIPIMS con una potencia que tiene una densidad de por lo menos 250 W/cm², empleándose pulsaciones con una longitud de por lo menos 5 ms de duración mientras sobre el sustrato se halla aplicada una polarización de sustrato.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011117994A DE102011117994A1 (de) | 2011-11-09 | 2011-11-09 | HIPIMS-Schichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AR088700A1 true AR088700A1 (es) | 2014-06-25 |
Family
ID=47263219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ARP120104202A AR088700A1 (es) | 2011-11-09 | 2012-11-08 | Procedimiento para la deposicion de sistemas de capas de pvd a partir de la fase de gas mediante pulverizacion sobre sustratos |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US9416441B2 (es) |
| EP (1) | EP2777061B1 (es) |
| JP (1) | JP6236613B2 (es) |
| KR (1) | KR101929085B1 (es) |
| CN (1) | CN103918054B (es) |
| AR (1) | AR088700A1 (es) |
| BR (1) | BR112014011141B1 (es) |
| CA (1) | CA2854976C (es) |
| DE (1) | DE102011117994A1 (es) |
| MX (1) | MX364356B (es) |
| MY (1) | MY168656A (es) |
| RU (1) | RU2633672C2 (es) |
| SG (1) | SG11201402191VA (es) |
| TR (1) | TR201902881T4 (es) |
| TW (1) | TWI582258B (es) |
| WO (1) | WO2013068080A1 (es) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2916640A1 (en) * | 2013-06-26 | 2014-12-31 | Siegfried Krassnitzer | Decorative hipims - hard-material layer |
| KR102422356B1 (ko) * | 2014-09-17 | 2022-07-18 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 | 내마모성이 향상된 이중층 코팅 절삭 공구의 제조 방법 |
| EP3018233A1 (de) * | 2014-11-05 | 2016-05-11 | Walter Ag | Schneidwerkzeug mit mehrlagiger PVD-Beschichtung |
| EP3056587B1 (de) | 2015-02-13 | 2020-11-18 | Walter AG | VHM-Schaftfräser mit TiAlN-ZrN-Beschichtung |
| JP7292695B2 (ja) * | 2016-08-17 | 2023-06-19 | 地方独立行政法人東京都立産業技術研究センター | 機能性薄膜、その製造方法、積層構造体及びその製造方法 |
| EP3650584B1 (en) * | 2018-11-08 | 2026-01-07 | Walter Ag | An industrial pvd method for producing a coated cutting tool |
| JP7509790B2 (ja) | 2019-02-11 | 2024-07-02 | アプライド マテリアルズ インコーポレイテッド | パルスｐｖｄにおけるプラズマ改質によるウエハからの粒子除去方法 |
| DE102020116157A1 (de) * | 2020-06-18 | 2021-12-23 | Cemecon Ag. | Verfahren und Vorrichtung zum Aufbringen einer Beschichtung sowie beschichteter Körper |
| DE102022003082A1 (de) * | 2022-08-23 | 2024-02-29 | Oerlikon Surface Solutions Ag, Pfäffikon | Beschichtungsverfahren zur Abscheidung eines Schichtsystems auf einem Substrat, sowie ein Substrat mit einem Schichtsystem |
| EP4624622A1 (en) | 2024-03-28 | 2025-10-01 | Walter Ag | Cutting tool with tialn-layer |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1580298A1 (fr) * | 2004-03-22 | 2005-09-28 | Materia Nova A.S.B.L | Dépôt par pulverisation cathodique magnétron en régime impulsionnel avec préionisation |
| DE102005033769B4 (de) * | 2005-07-15 | 2009-10-22 | Systec System- Und Anlagentechnik Gmbh & Co.Kg | Verfahren und Vorrichtung zur Mehrkathoden-PVD-Beschichtung und Substrat mit PVD-Beschichtung |
| US9605338B2 (en) * | 2006-10-11 | 2017-03-28 | Oerlikon Surface Solutions Ag, Pfaffikon | Method for depositing electrically insulating layers |
| RU2339735C1 (ru) * | 2007-02-12 | 2008-11-27 | Закрытое акционерное общество "Нано-Плазменные Технологии" (ЗАО "НАНПЛАТЕК") | Способ нанесения пленочного покрытия |
| US7966909B2 (en) * | 2007-07-25 | 2011-06-28 | The Gillette Company | Process of forming a razor blade |
| SE532505C2 (sv) * | 2007-12-12 | 2010-02-09 | Plasmatrix Materials Ab | Förfarande för plasmaaktiverad kemisk ångdeponering och plasmasönderdelningsenhet |
| EP2272080B1 (de) * | 2008-04-28 | 2012-08-01 | CemeCon AG | Vorrichtung und verfahren zum vorbehandeln und beschichten von körpern |
| DE102008028140B3 (de) * | 2008-06-13 | 2009-12-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer transparenten und leitfähigen Metalloxidschicht durch gepulstes, hochionisierendes Magnetronsputtern |
| US20100055826A1 (en) * | 2008-08-26 | 2010-03-04 | General Electric Company | Methods of Fabrication of Solar Cells Using High Power Pulsed Magnetron Sputtering |
| DE202010001497U1 (de) | 2010-01-29 | 2010-04-22 | Hauzer Techno-Coating B.V. | Beschichtungsvorrichtung mit einer HIPIMS-Leistungsquelle |
-
2011
- 2011-11-09 DE DE102011117994A patent/DE102011117994A1/de not_active Withdrawn
-
2012
- 2012-10-26 RU RU2014123354A patent/RU2633672C2/ru active
- 2012-10-26 WO PCT/EP2012/004498 patent/WO2013068080A1/de not_active Ceased
- 2012-10-26 BR BR112014011141-3A patent/BR112014011141B1/pt active IP Right Grant
- 2012-10-26 MX MX2014005722A patent/MX364356B/es active IP Right Grant
- 2012-10-26 CN CN201280054937.6A patent/CN103918054B/zh active Active
- 2012-10-26 CA CA2854976A patent/CA2854976C/en active Active
- 2012-10-26 SG SG11201402191VA patent/SG11201402191VA/en unknown
- 2012-10-26 JP JP2014540343A patent/JP6236613B2/ja active Active
- 2012-10-26 MY MYPI2014001366A patent/MY168656A/en unknown
- 2012-10-26 KR KR1020147015487A patent/KR101929085B1/ko active Active
- 2012-10-26 TR TR2019/02881T patent/TR201902881T4/tr unknown
- 2012-10-26 EP EP12794175.5A patent/EP2777061B1/de active Active
- 2012-10-26 US US14/357,003 patent/US9416441B2/en active Active
- 2012-11-06 TW TW101141112A patent/TWI582258B/zh active
- 2012-11-08 AR ARP120104202A patent/AR088700A1/es active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015501876A (ja) | 2015-01-19 |
| CN103918054B (zh) | 2017-02-15 |
| RU2633672C2 (ru) | 2017-10-16 |
| BR112014011141B1 (pt) | 2021-08-10 |
| JP6236613B2 (ja) | 2017-11-29 |
| KR20140099898A (ko) | 2014-08-13 |
| MY168656A (en) | 2018-11-28 |
| TR201902881T4 (tr) | 2019-03-21 |
| CA2854976A1 (en) | 2013-05-16 |
| WO2013068080A1 (de) | 2013-05-16 |
| CN103918054A (zh) | 2014-07-09 |
| MX2014005722A (es) | 2015-03-09 |
| TW201329271A (zh) | 2013-07-16 |
| RU2014123354A (ru) | 2015-12-20 |
| EP2777061A1 (de) | 2014-09-17 |
| MX364356B (es) | 2019-04-08 |
| DE102011117994A1 (de) | 2013-05-16 |
| TWI582258B (zh) | 2017-05-11 |
| BR112014011141A2 (pt) | 2017-05-16 |
| SG11201402191VA (en) | 2014-08-28 |
| US20140305792A1 (en) | 2014-10-16 |
| EP2777061B1 (de) | 2018-12-12 |
| CA2854976C (en) | 2019-07-30 |
| US9416441B2 (en) | 2016-08-16 |
| KR101929085B1 (ko) | 2018-12-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG | Grant, registration |