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OA10026A - Method for removing residual additives from elastomeric articles - Google Patents

Method for removing residual additives from elastomeric articles Download PDF

Info

Publication number
OA10026A
OA10026A OA60523A OA60523A OA10026A OA 10026 A OA10026 A OA 10026A OA 60523 A OA60523 A OA 60523A OA 60523 A OA60523 A OA 60523A OA 10026 A OA10026 A OA 10026A
Authority
OA
OAPI
Prior art keywords
rubber
article
elastomeric
elastomeric article
supercritical fluid
Prior art date
Application number
OA60523A
Other languages
English (en)
Inventor
Crosta Michelle A De
Indradat Jagnandan
Original Assignee
Schering Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schering Corp filed Critical Schering Corp
Publication of OA10026A publication Critical patent/OA10026A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D11/00Solvent extraction
    • B01D11/02Solvent extraction of solids
    • B01D11/0203Solvent extraction of solids with a supercritical fluid
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/02Chemical treatment or coating of shaped articles made of macromolecular substances with solvents, e.g. swelling agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2321/00Characterised by the use of unspecified rubbers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/54Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Detergent Compositions (AREA)
  • Medical Preparation Storing Or Oral Administration Devices (AREA)
OA60523A 1991-12-18 1994-06-10 Method for removing residual additives from elastomeric articles OA10026A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81075491A 1991-12-18 1991-12-18

Publications (1)

Publication Number Publication Date
OA10026A true OA10026A (en) 1996-10-14

Family

ID=25204621

Family Applications (1)

Application Number Title Priority Date Filing Date
OA60523A OA10026A (en) 1991-12-18 1994-06-10 Method for removing residual additives from elastomeric articles

Country Status (14)

Country Link
US (2) US5550211A (fr)
EP (1) EP0617713A1 (fr)
JP (1) JP2634952B2 (fr)
KR (1) KR0156951B1 (fr)
AU (1) AU667337B2 (fr)
CA (1) CA2125965A1 (fr)
CZ (1) CZ148094A3 (fr)
FI (1) FI942866A0 (fr)
NO (1) NO942302D0 (fr)
NZ (1) NZ246440A (fr)
OA (1) OA10026A (fr)
RU (1) RU94030473A (fr)
SK (1) SK74094A3 (fr)
WO (1) WO1993012161A1 (fr)

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GB2311992A (en) * 1996-04-10 1997-10-15 Bespak Plc A method of cleaning or purifying elastomers and elastomeric articles which are intended for medical or pharmaceutical uses
GB2314336A (en) * 1996-06-18 1997-12-24 Bespak Plc Method of cleaning or purifying elastomers and elastomeric articles which are intended for medical or pharmaceutical use
US5868856A (en) * 1996-07-25 1999-02-09 Texas Instruments Incorporated Method for removing inorganic contamination by chemical derivitization and extraction
US5868862A (en) * 1996-08-01 1999-02-09 Texas Instruments Incorporated Method of removing inorganic contamination by chemical alteration and extraction in a supercritical fluid media
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US6500605B1 (en) 1997-05-27 2002-12-31 Tokyo Electron Limited Removal of photoresist and residue from substrate using supercritical carbon dioxide process
TW539918B (en) 1997-05-27 2003-07-01 Tokyo Electron Ltd Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US6426136B1 (en) 1998-02-10 2002-07-30 R & D Technology, Inc. Method of reducing material size
US7064070B2 (en) 1998-09-28 2006-06-20 Tokyo Electron Limited Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
US6277753B1 (en) 1998-09-28 2001-08-21 Supercritical Systems Inc. Removal of CMP residue from semiconductors using supercritical carbon dioxide process
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US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
US6416682B1 (en) 1999-11-04 2002-07-09 Ceramic Oxides International B.V. Method of producing minerals under near-critical, critical and supercritical conditions
US6663954B2 (en) 2000-01-03 2003-12-16 R & D Technology, Inc. Method of reducing material size
WO2001082368A2 (fr) 2000-04-25 2001-11-01 Tokyo Electron Limited Procede de depot de film metallique et outil combine de depot metallique comprenant un module de sechage/nettoyage supercritique
US6429284B2 (en) * 2000-05-18 2002-08-06 Matsushita Electric Industrial Co., Ltd. Method for treating flame retardant resin composition
US20030021825A1 (en) * 2000-06-28 2003-01-30 Pathak Chandrashekhar P. Cleaning of medical devices with supercritical fluids
US6457480B1 (en) * 2001-06-27 2002-10-01 International Business Machines Corporation Process and apparatus for cleaning filters
EP1474723A2 (fr) * 2002-02-15 2004-11-10 Supercritical Systems Inc. Sechage d'une photoresine au moyen d'un bain aux solvants et d'un co sb 2 /sb supercritique
US6924086B1 (en) 2002-02-15 2005-08-02 Tokyo Electron Limited Developing photoresist with supercritical fluid and developer
US7387868B2 (en) 2002-03-04 2008-06-17 Tokyo Electron Limited Treatment of a dielectric layer using supercritical CO2
EP1481284A4 (fr) 2002-03-04 2006-10-25 Tokyo Electron Ltd Procede de passivation de materiaux a faible constante dielectrique dans le traitement de plaquettes
WO2003082486A1 (fr) * 2002-03-22 2003-10-09 Supercritical Systems Inc. Elimination d'impuretes au moyen d'un traitement supercritique
US7169540B2 (en) 2002-04-12 2007-01-30 Tokyo Electron Limited Method of treatment of porous dielectric films to reduce damage during cleaning
US20040177867A1 (en) * 2002-12-16 2004-09-16 Supercritical Systems, Inc. Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removal
US20040166085A1 (en) * 2003-02-21 2004-08-26 Gurusamy Manivannan Shave gel compositions
US7163380B2 (en) 2003-07-29 2007-01-16 Tokyo Electron Limited Control of fluid flow in the processing of an object with a fluid
WO2005011783A1 (fr) * 2003-07-31 2005-02-10 Glaxo Group Limited Inhalateur pharmaceutique de dose mesuree et procedes associes
MXPA06001642A (es) * 2003-08-11 2006-04-28 Glaxo Group Ltd Inhalador farmaceutico de dosis medida y metodos relacionados con el mismo.
EP1925293A3 (fr) * 2003-10-20 2010-01-13 Schering Corporation Compositions d'aérosol pharmaceutique
JP2007509147A (ja) * 2003-10-20 2007-04-12 シェーリング コーポレイション 薬学的エアロゾル組成物
US20050092679A1 (en) * 2003-10-29 2005-05-05 Bespak Plc Method of cleaning or purifying a polymer
FR2864095B1 (fr) * 2003-12-23 2007-04-06 Valois Sas Procede d'elimination des polluants contenus dans une piece elastomere
US20050288485A1 (en) * 2004-06-24 2005-12-29 Mahl Jerry M Method and apparatus for pretreatment of polymeric materials utilized in carbon dioxide purification, delivery and storage systems
US7250374B2 (en) 2004-06-30 2007-07-31 Tokyo Electron Limited System and method for processing a substrate using supercritical carbon dioxide processing
US7307019B2 (en) 2004-09-29 2007-12-11 Tokyo Electron Limited Method for supercritical carbon dioxide processing of fluoro-carbon films
US7491036B2 (en) 2004-11-12 2009-02-17 Tokyo Electron Limited Method and system for cooling a pump
US7291565B2 (en) 2005-02-15 2007-11-06 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US7550075B2 (en) 2005-03-23 2009-06-23 Tokyo Electron Ltd. Removal of contaminants from a fluid
US7442636B2 (en) 2005-03-30 2008-10-28 Tokyo Electron Limited Method of inhibiting copper corrosion during supercritical CO2 cleaning
US7399708B2 (en) 2005-03-30 2008-07-15 Tokyo Electron Limited Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US7629397B2 (en) * 2006-06-23 2009-12-08 Exxonmobil Chemical Patents Inc. Phase separation process utilizing a hydrofluorocarbon
JP5569921B2 (ja) 2009-02-02 2014-08-13 ユニ・チャーム株式会社 生理用ナプキン
RU2484550C1 (ru) * 2011-11-09 2013-06-10 Открытое акционерное общество "ОКБ-Планета" (ОАО "ОКБ-Планета") Способ стабилизации электрических параметров полупроводниковых приборов, загерметизированных в пластмассу
KR101718127B1 (ko) 2016-02-24 2017-03-20 광운대학교 산학협력단 상황 인지 스트리밍 서비스를 위한 콘텐츠 패키징 시스템 및 스트리밍 방법
CN106117653A (zh) * 2016-06-28 2016-11-16 应城市恒天药业包装有限公司 一种药用合成聚异戊二烯垫片
TWI627975B (zh) * 2017-01-12 2018-07-01 國立中山大學 以超臨界流體處理生醫材料之方法

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FR2586938B1 (fr) * 1985-09-06 1989-10-20 Commissariat Energie Atomique Procede et dispositif pour l'extraction de constituants par un fluide supercritique
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FR2621037B1 (fr) * 1987-09-24 1989-12-08 Rhone Poulenc Chimie Procede de purification et d'isolement de condensats d'isocyanates par extraction au co2 liquide ou supercritique
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JPH03202102A (ja) * 1989-12-28 1991-09-03 Toray Dow Corning Silicone Co Ltd オルガノポリシロキサン成形物中のシロキサンオリゴマー量の減少方法
KR0156951B1 (ko) * 1991-12-18 1998-12-01 에릭 에스. 딕커 탄성중합체성 제품으로부터 잔류 첨가제를 제거하는 방법
US5233021A (en) * 1992-05-13 1993-08-03 Georgia Tech Research Corporation Recycling of polymeric materials from carpets and other multi-component structures by means of supercritical fluid extraction
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Also Published As

Publication number Publication date
US5550211A (en) 1996-08-27
US5861473A (en) 1999-01-19
WO1993012161A1 (fr) 1993-06-24
CA2125965A1 (fr) 1993-06-24
NO942302L (no) 1994-06-17
SK74094A3 (en) 1996-01-10
EP0617713A1 (fr) 1994-10-05
NZ246440A (en) 1996-01-26
KR940703883A (ko) 1994-12-12
FI942866L (fi) 1994-06-16
JP2634952B2 (ja) 1997-07-30
CZ148094A3 (en) 1994-12-15
AU3277293A (en) 1993-07-19
RU94030473A (ru) 1996-05-27
AU667337B2 (en) 1996-03-21
FI942866A7 (fi) 1994-06-16
KR0156951B1 (ko) 1998-12-01
NO942302D0 (no) 1994-06-17
FI942866A0 (fi) 1994-06-16
JPH06511278A (ja) 1994-12-15

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