NO870191L - Ionestraale implanteringssystem. - Google Patents

Ionestraale implanteringssystem.

Info

Publication number: NO870191L
Authority: NO; Norway
Prior art keywords: ionestral; implant system; ion source; ion; forming system
Prior art date: 1985-05-17

Application number

NO87870191A

Other languages

English (en)

Norwegian (no)

Other versions

NO870191D0 (no

Inventor

Andre Lagendijk

Shantia Riahi

Original Assignee

Air Prod & Chem

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-05-17

Filing date

1987-01-16

Publication date

1987-03-10

1987-01-16 Application filed by Air Prod & Chem filed Critical Air Prod & Chem

1987-01-16 Publication of NO870191D0 publication Critical patent/NO870191D0/no

1987-03-10 Publication of NO870191L publication Critical patent/NO870191L/no

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Engineering & Computer Science (AREA)
Combustion & Propulsion (AREA)
Physical Vapour Deposition (AREA)
Physical Or Chemical Processes And Apparatus (AREA)
Electron Sources, Ion Sources (AREA)

NO87870191A 1985-05-17 1987-01-16 Ionestraale implanteringssystem. NO870191L (no)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
PCT/US1985/000929 WO1986006874A1 (en)	1985-05-17	1985-05-17	Ion beam implant system

Publications (2)

Publication Number	Publication Date
NO870191D0 NO870191D0 (no)	1987-01-16
NO870191L true NO870191L (no)	1987-03-10

Family

ID=22188682

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO87870191A NO870191L (no)	1985-05-17	1987-01-16	Ionestraale implanteringssystem.

Country Status (7)

Country	Link
US (1)	US4855604A (da)
EP (1)	EP0221056A4 (da)
JP (1)	JPS62503059A (da)
DK (1)	DK24187D0 (da)
FI (1)	FI870178A7 (da)
NO (1)	NO870191L (da)
WO (1)	WO1986006874A1 (da)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO1987006389A1 (en) *	1986-04-09	1987-10-22	J.C. Schumacher Company	Semiconductor dopant vaporizer
JP3485104B2 (ja)	2001-04-24	2004-01-13	日新電機株式会社	イオン源用オーブン
US6864633B2 (en) *	2003-04-03	2005-03-08	Varian Medical Systems, Inc.	X-ray source employing a compact electron beam accelerator
KR100675891B1 (ko) *	2005-05-04	2007-02-02	주식회사 하이닉스반도체	불균일 이온주입장치 및 불균일 이온주입방법
US8785881B2 (en)	2008-05-06	2014-07-22	Massachusetts Institute Of Technology	Method and apparatus for a porous electrospray emitter
US10125052B2 (en)	2008-05-06	2018-11-13	Massachusetts Institute Of Technology	Method of fabricating electrically conductive aerogels
DE102010027278B4 (de) *	2010-07-15	2020-07-02	Metismotion Gmbh	Thermisch volumenneutraler Hubübertrager sowie Dosierventil mit einem solchen Hubübertrager und Verwendung des Dosierventils
US10308377B2 (en) *	2011-05-03	2019-06-04	Massachusetts Institute Of Technology	Propellant tank and loading for electrospray thruster
US9358556B2 (en)	2013-05-28	2016-06-07	Massachusetts Institute Of Technology	Electrically-driven fluid flow and related systems and methods, including electrospinning and electrospraying systems and methods
WO2016164004A1 (en) *	2015-04-08	2016-10-13	Massachusetts Institute Of Technology	Propellant tank and loading for electrospray thruster
US10141855B2 (en)	2017-04-12	2018-11-27	Accion Systems, Inc.	System and method for power conversion
EP3973182A4 (en)	2019-05-21	2023-06-28	Accion Systems, Inc.	Apparatus for electrospray emission
US12104583B2 (en)	2020-08-24	2024-10-01	Accion Systems, Inc.	Propellant apparatus

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US1826809A (en) *	1929-11-08	1931-10-13	H A Metz Lab Inc	Receptacle for packing ampules
US2882410A (en) *	1946-06-14	1959-04-14	William M Brobeck	Ion source
CH581992A5 (da) *	1975-08-15	1976-11-30	Laib Jakob C
US4298037A (en) *	1976-12-02	1981-11-03	J. C. Schumacher Co.	Method of shipping and using semiconductor liquid source materials
US4134514A (en) *	1976-12-02	1979-01-16	J C Schumacher Co.	Liquid source material container and method of use for semiconductor device manufacturing
JPS6054150A (ja) *	1983-09-01	1985-03-28	Hitachi Ltd	イオン源
JPH0654150A (ja) *	1992-07-31	1994-02-25	Ricoh Co Ltd	ジターレス画像形成装置

1985
- 1985-05-17 FI FI870178A patent/FI870178A7/fi not_active Application Discontinuation
- 1985-05-17 EP EP19850902838 patent/EP0221056A4/en not_active Withdrawn
- 1985-05-17 WO PCT/US1985/000929 patent/WO1986006874A1/en not_active Ceased
- 1985-05-17 US US06/947,914 patent/US4855604A/en not_active Expired - Fee Related
- 1985-05-17 JP JP60502506A patent/JPS62503059A/ja active Pending
1987
- 1987-01-16 DK DK024187A patent/DK24187D0/da not_active Application Discontinuation
- 1987-01-16 NO NO87870191A patent/NO870191L/no unknown

Also Published As

Publication number	Publication date
FI870178A0 (fi)	1987-01-16
FI870178A7 (fi)	1987-01-16
NO870191D0 (no)	1987-01-16
EP0221056A4 (en)	1987-09-08
WO1986006874A1 (en)	1986-11-20
DK24187A (da)	1987-01-16
US4855604A (en)	1989-08-08
EP0221056A1 (en)	1987-05-13
JPS62503059A (ja)	1987-12-03
DK24187D0 (da)	1987-01-16

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