NL7808162A - Elektronenbundelinrichting. - Google Patents
Elektronenbundelinrichting.Info
- Publication number
- NL7808162A NL7808162A NL787808162A NL7808162A NL7808162A NL 7808162 A NL7808162 A NL 7808162A NL 787808162 A NL787808162 A NL 787808162A NL 7808162 A NL7808162 A NL 7808162A NL 7808162 A NL7808162 A NL 7808162A
- Authority
- NL
- Netherlands
- Prior art keywords
- electron beam
- beam device
- electron
- Prior art date
Links
- 238000010894 electron beam technology Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US82335277A | 1977-08-10 | 1977-08-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7808162A true NL7808162A (nl) | 1979-02-13 |
Family
ID=25238513
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL787808162A NL7808162A (nl) | 1977-08-10 | 1978-08-03 | Elektronenbundelinrichting. |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5429981A (it) |
| BR (1) | BR7804994A (it) |
| CH (1) | CH631574A5 (it) |
| DE (1) | DE2834391C2 (it) |
| FR (1) | FR2400256A1 (it) |
| GB (1) | GB1598219A (it) |
| IT (1) | IT1112285B (it) |
| NL (1) | NL7808162A (it) |
| SE (1) | SE425838B (it) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5435173U (it) * | 1977-08-12 | 1979-03-07 | ||
| JPS5463681A (en) * | 1977-10-29 | 1979-05-22 | Nippon Aviotronics Kk | Electron beam exposure device |
| FR2488043A1 (fr) * | 1980-07-30 | 1982-02-05 | Le N Proizv | Dispositif a optique electronique pour l'etude d'echantillons |
| JPS57206173A (en) * | 1981-06-15 | 1982-12-17 | Nippon Telegr & Teleph Corp <Ntt> | Focusing deflecting device for charged corpuscule beam |
| JPS61183926A (ja) * | 1985-02-08 | 1986-08-16 | Toshiba Corp | 荷電ビ−ム照射装置 |
| JPS62206828A (ja) * | 1986-03-06 | 1987-09-11 | Nec Corp | 荷電粒子線描画装置 |
| JPH02246318A (ja) * | 1989-03-20 | 1990-10-02 | Fujitsu Ltd | 荷電粒子ビーム露光装置 |
| JP2746098B2 (ja) * | 1994-01-19 | 1998-04-28 | 日本電気株式会社 | 電子ビーム描画用アパーチャおよび電子ビーム描画方法 |
| JP3206448B2 (ja) | 1996-08-30 | 2001-09-10 | 日本電気株式会社 | 電子ビーム描画装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| DE2460716C2 (de) * | 1974-12-19 | 1976-12-30 | Siemens Ag | Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats |
| US3956635A (en) * | 1975-06-13 | 1976-05-11 | International Business Machines Corporation | Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns |
| JPS5251871A (en) * | 1975-10-23 | 1977-04-26 | Rikagaku Kenkyusho | Projecting method for charge particle beams |
| JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
| GB1557924A (en) * | 1976-02-05 | 1979-12-19 | Western Electric Co | Irradiation apparatus and methods |
| FR2351497A1 (fr) * | 1976-05-14 | 1977-12-09 | Thomson Csf | Dispositif permettant le trace programme de figures de formes differentes |
| JPS5357764A (en) * | 1976-11-04 | 1978-05-25 | Fujitsu Ltd | Electron beam exposure apparatus |
| CA1166766A (en) * | 1977-02-23 | 1984-05-01 | Hans C. Pfeiffer | Method and apparatus for forming a variable size electron beam |
| US4182958A (en) * | 1977-05-31 | 1980-01-08 | Rikagaku Kenkyusho | Method and apparatus for projecting a beam of electrically charged particles |
-
1978
- 1978-05-10 GB GB18816/78A patent/GB1598219A/en not_active Expired
- 1978-06-29 FR FR7820120A patent/FR2400256A1/fr active Granted
- 1978-07-07 CH CH740878A patent/CH631574A5/de not_active IP Right Cessation
- 1978-07-12 JP JP8411578A patent/JPS5429981A/ja active Granted
- 1978-07-26 IT IT26097/78A patent/IT1112285B/it active
- 1978-08-02 SE SE7808326A patent/SE425838B/sv not_active IP Right Cessation
- 1978-08-03 BR BR7804994A patent/BR7804994A/pt unknown
- 1978-08-03 NL NL787808162A patent/NL7808162A/xx not_active Application Discontinuation
- 1978-08-05 DE DE2834391A patent/DE2834391C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| BR7804994A (pt) | 1979-04-17 |
| FR2400256B1 (it) | 1982-02-05 |
| SE425838B (sv) | 1982-11-15 |
| DE2834391C2 (de) | 1986-04-17 |
| GB1598219A (en) | 1981-09-16 |
| JPS5438035B2 (it) | 1979-11-19 |
| SE7808326L (sv) | 1979-02-11 |
| FR2400256A1 (fr) | 1979-03-09 |
| IT7826097A0 (it) | 1978-07-26 |
| DE2834391A1 (de) | 1979-02-22 |
| JPS5429981A (en) | 1979-03-06 |
| IT1112285B (it) | 1986-01-13 |
| CH631574A5 (en) | 1982-08-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BA | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |