NL7514325A - GUIDE SYSTEM FOR INTEGRATED CIRCUITS OF THE THIN FILM AND HYBRID TYPE. - Google Patents
GUIDE SYSTEM FOR INTEGRATED CIRCUITS OF THE THIN FILM AND HYBRID TYPE.Info
- Publication number
- NL7514325A NL7514325A NL7514325A NL7514325A NL7514325A NL 7514325 A NL7514325 A NL 7514325A NL 7514325 A NL7514325 A NL 7514325A NL 7514325 A NL7514325 A NL 7514325A NL 7514325 A NL7514325 A NL 7514325A
- Authority
- NL
- Netherlands
- Prior art keywords
- thin film
- integrated circuits
- guide system
- hybrid type
- hybrid
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/80—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors
- H10D86/85—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors characterised by only passive components
-
- H10W70/05—
-
- H10W70/66—
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0364—Conductor shape
- H05K2201/0367—Metallic bump or raised conductor not used as solder bump
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/531,430 US4068022A (en) | 1974-12-10 | 1974-12-10 | Methods of strengthening bonds |
| US05/576,711 US4016050A (en) | 1975-05-12 | 1975-05-12 | Conduction system for thin film and hybrid integrated circuits |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| NL7514325A true NL7514325A (en) | 1976-06-14 |
| NL185249B NL185249B (en) | 1989-09-18 |
| NL185249C NL185249C (en) | 1990-02-16 |
Family
ID=27063541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NLAANVRAGE7514325,A NL185249C (en) | 1974-12-10 | 1975-12-09 | METHOD FOR MANUFACTURING ELECTRICAL CONDUCTORS ON AN INSULATING SUBSTRATE |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS6032311B2 (en) |
| DE (1) | DE2554691C2 (en) |
| ES (1) | ES443346A1 (en) |
| FR (1) | FR2294610A1 (en) |
| GB (1) | GB1527108A (en) |
| IT (1) | IT1051461B (en) |
| NL (1) | NL185249C (en) |
| SE (1) | SE427400B (en) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4153518A (en) * | 1977-11-18 | 1979-05-08 | Tektronix, Inc. | Method of making a metalized substrate having a thin film barrier layer |
| JPS54127572A (en) * | 1978-03-28 | 1979-10-03 | Oki Electric Ind Co Ltd | Thin film circuit |
| DE2833919C2 (en) * | 1978-08-02 | 1982-06-09 | Siemens AG, 1000 Berlin und 8000 München | Process for the production of electrical layer circuits on plastic foils |
| JPS5559795A (en) * | 1978-10-30 | 1980-05-06 | Nippon Electric Co | Printed circuit board and method of manufacturing same |
| DE2965814D1 (en) * | 1979-03-21 | 1983-08-11 | Bbc Brown Boveri & Cie | Thin film resistor having a high temperature coefficient and method of manufacturing the same |
| FR2476913B1 (en) * | 1980-02-25 | 1985-09-13 | Nippon Electric Co | MULTI-LAYERED CIRCUIT FOR LARGE-SCALE INTEGRATION AND METHOD FOR MANUFACTURING THE SAME |
| DE3029382A1 (en) * | 1980-08-01 | 1982-03-04 | Siemens AG, 1000 Berlin und 8000 München | Conductor pattern for semiconductor device on insulating substrate - where multilayer pattern includes palladium covered by palladium oxide and then gold |
| DE3029277C2 (en) * | 1980-08-01 | 1983-10-20 | Siemens AG, 1000 Berlin und 8000 München | Build-up of metal layers |
| DE3107943A1 (en) * | 1981-03-02 | 1982-09-16 | Siemens AG, 1000 Berlin und 8000 München | METHOD FOR THE PRODUCTION OF SOLDERABLE AND TEMPERATURE-ENDED METAL-FREE THICK-LAYER CONDUCTORS |
| JPS57198696A (en) * | 1981-06-01 | 1982-12-06 | Shimada Rika Kogyo Kk | Method of producing thin film circuit |
| DE3207659A1 (en) * | 1982-03-03 | 1983-09-15 | Siemens AG, 1000 Berlin und 8000 München | Thin-film circuits with through-contact holes |
| US4463059A (en) * | 1982-06-30 | 1984-07-31 | International Business Machines Corporation | Layered metal film structures for LSI chip carriers adapted for solder bonding and wire bonding |
| JPS59167096A (en) * | 1983-03-11 | 1984-09-20 | 日本電気株式会社 | Circuit board |
| JPS60140897A (en) * | 1983-12-28 | 1985-07-25 | 日本電気株式会社 | Resin insulated multilayer board |
| DE3433251A1 (en) * | 1984-08-16 | 1986-02-27 | Robert Bosch Gmbh, 7000 Stuttgart | METHOD FOR PRODUCING GALVANIC SOLDER LAYERS ON INORGANIC SUBSTRATES |
| US4808274A (en) * | 1986-09-10 | 1989-02-28 | Engelhard Corporation | Metallized substrates and process for producing |
| DE3785720T2 (en) * | 1986-09-25 | 1993-08-12 | Toshiba Kawasaki Kk | METHOD FOR PRODUCING A FILM CARRIER. |
| JPH03108797A (en) * | 1989-09-22 | 1991-05-08 | Ngk Spark Plug Co Ltd | Multilayer wiring board and manufacture thereof |
| DE4017181C2 (en) * | 1990-05-29 | 1998-08-27 | Daimler Benz Aerospace Ag | Electrical component |
| WO1992015117A1 (en) * | 1991-02-25 | 1992-09-03 | Sumitomo Electric Industries, Ltd. | Wiring board |
| US5449955A (en) * | 1994-04-01 | 1995-09-12 | At&T Corp. | Film circuit metal system for use with bumped IC packages |
| DE10004453B4 (en) * | 2000-02-03 | 2009-08-13 | Ust Umweltsensortechnik Gmbh | Electric fuse and method for its manufacture |
| JP2003101222A (en) * | 2001-09-21 | 2003-04-04 | Sony Corp | Thin film circuit board device and method of manufacturing the same |
| CN116093573A (en) * | 2022-12-14 | 2023-05-09 | 北京航天微电科技有限公司 | Microstrip circuit preparation method and microstrip ring spacer |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE7106898U (en) * | 1970-03-06 | 1971-05-27 | Motorola Inc | Integrated hybrid circuit |
-
1975
- 1975-12-05 DE DE2554691A patent/DE2554691C2/en not_active Expired
- 1975-12-08 GB GB50291/75A patent/GB1527108A/en not_active Expired
- 1975-12-09 FR FR7537607A patent/FR2294610A1/en active Granted
- 1975-12-09 SE SE7513853A patent/SE427400B/en not_active IP Right Cessation
- 1975-12-09 IT IT70022/75A patent/IT1051461B/en active
- 1975-12-09 NL NLAANVRAGE7514325,A patent/NL185249C/en not_active IP Right Cessation
- 1975-12-10 ES ES443346A patent/ES443346A1/en not_active Expired
- 1975-12-10 JP JP50146449A patent/JPS6032311B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6032311B2 (en) | 1985-07-27 |
| JPS51101864A (en) | 1976-09-08 |
| NL185249B (en) | 1989-09-18 |
| SE427400B (en) | 1983-03-28 |
| DE2554691C2 (en) | 1982-11-18 |
| ES443346A1 (en) | 1977-08-16 |
| SE7513853L (en) | 1976-06-11 |
| FR2294610B1 (en) | 1980-03-21 |
| NL185249C (en) | 1990-02-16 |
| DE2554691A1 (en) | 1976-06-16 |
| GB1527108A (en) | 1978-10-04 |
| IT1051461B (en) | 1981-04-21 |
| FR2294610A1 (en) | 1976-07-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BA | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| BC | A request for examination has been filed | ||
| A85 | Still pending on 85-01-01 | ||
| V4 | Discontinued because of reaching the maximum lifetime of a patent |
Free format text: 951209 |