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NL7001398A - - Google Patents

Info

Publication number
NL7001398A
NL7001398A NL7001398A NL7001398A NL7001398A NL 7001398 A NL7001398 A NL 7001398A NL 7001398 A NL7001398 A NL 7001398A NL 7001398 A NL7001398 A NL 7001398A NL 7001398 A NL7001398 A NL 7001398A
Authority
NL
Netherlands
Application number
NL7001398A
Other versions
NL172286C (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7001398A publication Critical patent/NL7001398A/xx
Application granted granted Critical
Publication of NL172286C publication Critical patent/NL172286C/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/44—Separation by mass spectrography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/12—Ion sources; Ion guns using an arc discharge, e.g. of the duoplasmatron type

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
  • Physical Vapour Deposition (AREA)
NLAANVRAGE7001398,A 1969-02-05 1970-01-30 ION BUNDLE SOURCE INTENDED FOR AN ELECTROMAGNETIC SEPARATOR. NL172286C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB6289/69A GB1280012A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam sources
GB6288/69A GB1280011A (en) 1969-02-05 1969-02-05 Improvements in or relating to ion beam separators

Publications (2)

Publication Number Publication Date
NL7001398A true NL7001398A (en) 1970-08-07
NL172286C NL172286C (en) 1983-08-01

Family

ID=26240578

Family Applications (2)

Application Number Title Priority Date Filing Date
NL7001397A NL7001397A (en) 1969-02-05 1970-01-30
NLAANVRAGE7001398,A NL172286C (en) 1969-02-05 1970-01-30 ION BUNDLE SOURCE INTENDED FOR AN ELECTROMAGNETIC SEPARATOR.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL7001397A NL7001397A (en) 1969-02-05 1970-01-30

Country Status (5)

Country Link
US (1) US3705320A (en)
DE (2) DE2003715B2 (en)
FR (2) FR2033958A5 (en)
GB (2) GB1280011A (en)
NL (2) NL7001397A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4017403A (en) * 1974-07-31 1977-04-12 United Kingdom Atomic Energy Authority Ion beam separators
DE2621824C2 (en) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Microwave Discharge Ion Source
DE3150156C2 (en) * 1981-12-18 1986-04-30 Gesellschaft für Schwerionenforschung mbH, 6100 Darmstadt High current ion source
US4847504A (en) * 1983-08-15 1989-07-11 Applied Materials, Inc. Apparatus and methods for ion implantation
US4578589A (en) * 1983-08-15 1986-03-25 Applied Materials, Inc. Apparatus and methods for ion implantation
EP0145119A1 (en) * 1983-08-15 1985-06-19 Applied Materials, Inc. Apparatus for ion implantation
US4761553A (en) * 1983-10-06 1988-08-02 The United States Of America As Represented By The United States Department Of Energy Gaseous leak detector
US4855602A (en) * 1986-06-20 1989-08-08 Sharma Devendra N Beam deflector
GB8820359D0 (en) * 1988-08-26 1988-09-28 Atomic Energy Authority Uk Charged particle grid
US5262652A (en) * 1991-05-14 1993-11-16 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime
US5723862A (en) * 1996-03-04 1998-03-03 Forman; Leon Mass spectrometer utilizing high energy product density permanent magnets
US6452338B1 (en) 1999-12-13 2002-09-17 Semequip, Inc. Electron beam ion source with integral low-temperature vaporizer
NL1021848C2 (en) 2002-11-06 2004-05-07 Nedap Nv Security system based on standard euro cylinder.
EP1830385A1 (en) * 2006-03-01 2007-09-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ion beam apparatus and method for aligning same
WO2010018639A1 (en) * 2008-08-15 2010-02-18 株式会社シンクロン Deposition apparatus and method for manufacturing thin-film device

Also Published As

Publication number Publication date
FR2033957A5 (en) 1970-12-04
GB1280012A (en) 1972-07-05
GB1280011A (en) 1972-07-05
NL7001397A (en) 1970-08-07
FR2033958A5 (en) 1970-12-04
DE2003715A1 (en) 1970-09-03
US3705320A (en) 1972-12-05
DE2003970A1 (en) 1970-08-20
NL172286C (en) 1983-08-01
DE2003715B2 (en) 1980-11-06

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee