NL2021680A - Radiation System - Google Patents
Radiation System Download PDFInfo
- Publication number
- NL2021680A NL2021680A NL2021680A NL2021680A NL2021680A NL 2021680 A NL2021680 A NL 2021680A NL 2021680 A NL2021680 A NL 2021680A NL 2021680 A NL2021680 A NL 2021680A NL 2021680 A NL2021680 A NL 2021680A
- Authority
- NL
- Netherlands
- Prior art keywords
- radiation
- substrate
- alignment
- wavelength
- wavelengths
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 517
- 239000000758 substrate Substances 0.000 claims description 114
- 238000000059 patterning Methods 0.000 claims description 18
- 238000005286 illumination Methods 0.000 claims description 11
- 238000001459 lithography Methods 0.000 claims description 2
- 230000003750 conditioning effect Effects 0.000 abstract description 51
- 238000005259 measurement Methods 0.000 description 132
- 238000012876 topography Methods 0.000 description 56
- 230000001143 conditioned effect Effects 0.000 description 43
- 230000010287 polarization Effects 0.000 description 42
- 239000013307 optical fiber Substances 0.000 description 19
- 230000003287 optical effect Effects 0.000 description 17
- 238000000034 method Methods 0.000 description 15
- 238000007689 inspection Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 13
- 238000000926 separation method Methods 0.000 description 12
- 239000000446 fuel Substances 0.000 description 11
- 239000000835 fiber Substances 0.000 description 9
- 239000003086 colorant Substances 0.000 description 8
- 239000011295 pitch Substances 0.000 description 7
- 238000001514 detection method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 210000001747 pupil Anatomy 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 229910052756 noble gas Inorganic materials 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 230000002123 temporal effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 230000009977 dual effect Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000002070 Raman circular dichroism spectroscopy Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 230000009022 nonlinear effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000671 immersion lithography Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Claims (3)
- CONCLUSIE1. Een lithografiemrichting omvattende:een belichtinginrichting ingericht voor het leveren van een stralingsbundel;
- 5 een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel;een substraattafel geconstrueerd om een substraat te dragen; en een piOjectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een
- 10 doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.1/6TMS >“ cc3/6Figure 3L4/6PRFigure 55/6RS RCASFigure 6Figure 7
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2021680A NL2021680A (en) | 2018-09-21 | 2018-09-21 | Radiation System |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2021680A NL2021680A (en) | 2018-09-21 | 2018-09-21 | Radiation System |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2021680A true NL2021680A (en) | 2019-08-16 |
Family
ID=67625070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2021680A NL2021680A (en) | 2018-09-21 | 2018-09-21 | Radiation System |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2021680A (nl) |
-
2018
- 2018-09-21 NL NL2021680A patent/NL2021680A/en unknown
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