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NL2021358A - Method and Apparatus for determining optical aberrations - Google Patents

Method and Apparatus for determining optical aberrations Download PDF

Info

Publication number
NL2021358A
NL2021358A NL2021358A NL2021358A NL2021358A NL 2021358 A NL2021358 A NL 2021358A NL 2021358 A NL2021358 A NL 2021358A NL 2021358 A NL2021358 A NL 2021358A NL 2021358 A NL2021358 A NL 2021358A
Authority
NL
Netherlands
Prior art keywords
diffraction
projection system
beams
interference
radiation detector
Prior art date
Application number
NL2021358A
Other languages
English (en)
Inventor
Yun Chek Chong Derick
Cristiaan De Groot Pieter
Jacobus Matheus Baselmans Johannes
Jan Voogd Robbert
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2021358A publication Critical patent/NL2021358A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02097—Self-interferometers
    • G01B9/02098—Shearing interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Claims (2)

  1. CONCLUSIE
    1. Een lithografieinrichting omvattende:
    een belichtinginrichting ingericht voor het leveren van een stralingsbundel;
    5 een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel;
    een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een
    10 doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
    1/14
  2. 2/14
    15a 15b 15c
NL2021358A 2018-01-31 2018-07-20 Method and Apparatus for determining optical aberrations NL2021358A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP18154481 2018-01-31

Publications (1)

Publication Number Publication Date
NL2021358A true NL2021358A (en) 2018-08-16

Family

ID=61132200

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2021358A NL2021358A (en) 2018-01-31 2018-07-20 Method and Apparatus for determining optical aberrations

Country Status (4)

Country Link
KR (1) KR102760552B1 (nl)
CN (1) CN111670413B (nl)
NL (1) NL2021358A (nl)
WO (1) WO2019149468A1 (nl)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230417628A1 (en) * 2020-11-13 2023-12-28 Asml Netherlands B.V. Measurement system and method of use
EP4109178A1 (en) * 2021-06-22 2022-12-28 ASML Netherlands B.V. Imaging system
CN114663689B (zh) * 2022-05-18 2022-08-16 沈阳和研科技有限公司 一种多步进测量方法
EP4350440A1 (en) 2022-10-06 2024-04-10 ASML Netherlands B.V. Methods and system for determining aberrations of a projection system
DE102022212136A1 (de) * 2022-11-15 2023-01-12 Carl Zeiss Smt Gmbh Verfahren zur Ermittlung von Bildfehlern hochauflösender Abbildungssysteme per Wellenfrontmessung
WO2025195676A1 (en) 2024-03-18 2025-09-25 Asml Netherlands B.V. Lithographic apparatus, calibration reticle, calibration method and device manufacturing method
WO2025256840A1 (en) 2024-06-11 2025-12-18 Asml Netherlands B.V. Lithographic apparatus comprising a reflective mark and a transmissive mark and a method of measuring aberrations in a lithographic apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI220998B (en) * 2001-02-13 2004-09-11 Nikon Corp Exposure method, exposure apparatus and manufacture method of the same
JP4266673B2 (ja) * 2003-03-05 2009-05-20 キヤノン株式会社 収差測定装置
CN102081308B (zh) * 2009-11-27 2014-02-19 上海微电子装备有限公司 投影物镜波像差测量装置和方法
NL2010792A (en) * 2012-05-31 2013-12-04 Asml Netherlands Bv Gradient-based pattern and evaluation point selection.
NL2016625A (en) * 2015-04-20 2016-10-24 Asml Netherlands Bv Lithographic Method and Apparatus.
DE102016212477A1 (de) * 2016-07-08 2018-01-11 Carl Zeiss Smt Gmbh Messverfahren und Messsystem zur interferometrischen Vermessung der Abbildungsqualität eines optischen Abbildungssystems

Also Published As

Publication number Publication date
WO2019149468A1 (en) 2019-08-08
CN111670413A (zh) 2020-09-15
KR102760552B1 (ko) 2025-01-24
KR20200116966A (ko) 2020-10-13
CN111670413B (zh) 2023-04-25

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