NL2018274A - Radiation Source - Google Patents
Radiation Source Download PDFInfo
- Publication number
- NL2018274A NL2018274A NL2018274A NL2018274A NL2018274A NL 2018274 A NL2018274 A NL 2018274A NL 2018274 A NL2018274 A NL 2018274A NL 2018274 A NL2018274 A NL 2018274A NL 2018274 A NL2018274 A NL 2018274A
- Authority
- NL
- Netherlands
- Prior art keywords
- radiation
- radiation beam
- electron
- polarization
- amplified
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 633
- 239000000758 substrate Substances 0.000 claims description 24
- 238000000059 patterning Methods 0.000 claims description 10
- 238000005286 illumination Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 abstract description 228
- 230000001419 dependent effect Effects 0.000 abstract description 25
- 230000005540 biological transmission Effects 0.000 abstract description 24
- 238000011144 upstream manufacturing Methods 0.000 abstract description 9
- 230000010287 polarization Effects 0.000 description 132
- 239000003574 free electron Substances 0.000 description 53
- 230000008859 change Effects 0.000 description 48
- 238000010894 electron beam technology Methods 0.000 description 42
- 230000009021 linear effect Effects 0.000 description 21
- 239000000835 fiber Substances 0.000 description 11
- 230000000737 periodic effect Effects 0.000 description 9
- 230000001052 transient effect Effects 0.000 description 9
- 238000007689 inspection Methods 0.000 description 7
- 230000009022 nonlinear effect Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000003321 amplification Effects 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 230000005670 electromagnetic radiation Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229910052769 Ytterbium Inorganic materials 0.000 description 3
- 230000008033 biological extinction Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 239000002901 radioactive waste Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Claims (1)
1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16158184 | 2016-03-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2018274A true NL2018274A (en) | 2017-09-07 |
Family
ID=55451103
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2018274A NL2018274A (en) | 2016-03-02 | 2017-02-01 | Radiation Source |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2018274A (nl) |
-
2017
- 2017-02-01 NL NL2018274A patent/NL2018274A/en unknown
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