NL2006150A - Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. - Google Patents
Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. Download PDFInfo
- Publication number
- NL2006150A NL2006150A NL2006150A NL2006150A NL2006150A NL 2006150 A NL2006150 A NL 2006150A NL 2006150 A NL2006150 A NL 2006150A NL 2006150 A NL2006150 A NL 2006150A NL 2006150 A NL2006150 A NL 2006150A
- Authority
- NL
- Netherlands
- Prior art keywords
- substrate
- patterning device
- radiation beam
- lithographic apparatus
- intrafield
- Prior art date
Links
- 238000012545 processing Methods 0.000 title description 27
- 238000004519 manufacturing process Methods 0.000 title description 15
- 238000004590 computer program Methods 0.000 title description 11
- 239000000758 substrate Substances 0.000 claims description 154
- 238000000059 patterning Methods 0.000 claims description 82
- 230000005855 radiation Effects 0.000 claims description 77
- 238000001459 lithography Methods 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 description 38
- 238000000034 method Methods 0.000 description 36
- 238000012937 correction Methods 0.000 description 34
- 235000012431 wafers Nutrition 0.000 description 30
- 238000005259 measurement Methods 0.000 description 18
- 230000000694 effects Effects 0.000 description 16
- 239000010410 layer Substances 0.000 description 16
- 230000008569 process Effects 0.000 description 13
- 238000005286 illumination Methods 0.000 description 9
- 230000015654 memory Effects 0.000 description 8
- 238000007689 inspection Methods 0.000 description 7
- 238000004891 communication Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 230000006870 function Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000007654 immersion Methods 0.000 description 4
- 238000004886 process control Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 108010001267 Protein Subunits Proteins 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000013386 optimize process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Claims (1)
- Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2006150A NL2006150A (en) | 2011-02-07 | 2011-02-07 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2006150A NL2006150A (en) | 2011-02-07 | 2011-02-07 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. |
| NL2006150 | 2011-02-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2006150A true NL2006150A (en) | 2011-03-10 |
Family
ID=44065084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2006150A NL2006150A (en) | 2011-02-07 | 2011-02-07 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2006150A (nl) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013186307A1 (en) | 2012-06-15 | 2013-12-19 | Asml Netherlands B.V. | Positioning system, lithographic apparatus and device manufacturing method |
-
2011
- 2011-02-07 NL NL2006150A patent/NL2006150A/en not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013186307A1 (en) | 2012-06-15 | 2013-12-19 | Asml Netherlands B.V. | Positioning system, lithographic apparatus and device manufacturing method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WDAP | Patent application withdrawn |
Effective date: 20111006 |