NL2006014A - Stage system calibration method, stage system, and lithographic apparatus comprising such stage system. - Google Patents
Stage system calibration method, stage system, and lithographic apparatus comprising such stage system. Download PDFInfo
- Publication number
- NL2006014A NL2006014A NL2006014A NL2006014A NL2006014A NL 2006014 A NL2006014 A NL 2006014A NL 2006014 A NL2006014 A NL 2006014A NL 2006014 A NL2006014 A NL 2006014A NL 2006014 A NL2006014 A NL 2006014A
- Authority
- NL
- Netherlands
- Prior art keywords
- stage
- frequency range
- substrate
- patterning device
- encoder
- Prior art date
Links
- 238000000034 method Methods 0.000 title description 28
- 239000000758 substrate Substances 0.000 claims description 64
- 238000000059 patterning Methods 0.000 claims description 48
- 230000005855 radiation Effects 0.000 claims description 42
- 238000001459 lithography Methods 0.000 claims description 5
- 238000005259 measurement Methods 0.000 description 60
- 210000003128 head Anatomy 0.000 description 36
- 230000002123 temporal effect Effects 0.000 description 35
- 230000035945 sensitivity Effects 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 7
- 238000012546 transfer Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000007654 immersion Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000001934 delay Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 102100026144 Transferrin receptor protein 1 Human genes 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 239000013598 vector Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 101150050472 Tfr2 gene Proteins 0.000 description 1
- 102100026143 Transferrin receptor protein 2 Human genes 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Claims (1)
1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31104310P | 2010-03-05 | 2010-03-05 | |
| US31104310 | 2010-03-05 | ||
| US31714810P | 2010-03-24 | 2010-03-24 | |
| US31714810 | 2010-03-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2006014A true NL2006014A (en) | 2011-09-06 |
Family
ID=45220286
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2006014A NL2006014A (en) | 2010-03-05 | 2011-01-17 | Stage system calibration method, stage system, and lithographic apparatus comprising such stage system. |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2006014A (nl) |
-
2011
- 2011-01-17 NL NL2006014A patent/NL2006014A/en not_active Application Discontinuation
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WDAP | Patent application withdrawn |
Effective date: 20120604 |