NL2005694A - Euv radiation source and method of generating euv radiation. - Google Patents
Euv radiation source and method of generating euv radiation. Download PDFInfo
- Publication number
- NL2005694A NL2005694A NL2005694A NL2005694A NL2005694A NL 2005694 A NL2005694 A NL 2005694A NL 2005694 A NL2005694 A NL 2005694A NL 2005694 A NL2005694 A NL 2005694A NL 2005694 A NL2005694 A NL 2005694A
- Authority
- NL
- Netherlands
- Prior art keywords
- collector
- radiation
- aperture
- euv radiation
- ellipsoid shape
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims description 186
- 238000000034 method Methods 0.000 title description 17
- 239000000758 substrate Substances 0.000 claims description 44
- 238000000059 patterning Methods 0.000 claims description 36
- 238000001459 lithography Methods 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 description 43
- 239000000446 fuel Substances 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 16
- 230000006870 function Effects 0.000 description 13
- 238000005286 illumination Methods 0.000 description 11
- 239000010410 layer Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 7
- 210000001747 pupil Anatomy 0.000 description 6
- 238000004088 simulation Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 239000013598 vector Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Claims (1)
1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2005694A NL2005694A (en) | 2010-11-15 | 2010-11-15 | Euv radiation source and method of generating euv radiation. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2005694 | 2010-11-15 | ||
| NL2005694A NL2005694A (en) | 2010-11-15 | 2010-11-15 | Euv radiation source and method of generating euv radiation. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2005694A true NL2005694A (en) | 2011-01-06 |
Family
ID=43617048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2005694A NL2005694A (en) | 2010-11-15 | 2010-11-15 | Euv radiation source and method of generating euv radiation. |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2005694A (nl) |
-
2010
- 2010-11-15 NL NL2005694A patent/NL2005694A/en unknown
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