NL2002998A1 - Lithographic apparatus. - Google Patents

Lithographic apparatus. Download PDF

Info

Publication number: NL2002998A1
Authority: NL; Netherlands
Prior art keywords: radiation beam; substrate; sensor; lithographic apparatus; front side
Prior art date: 2008-06-18

Application number

NL2002998A

Other languages

English (en)

Inventor

Vitaliy Prosyentsov

Sanjaysingh Lalbahadoersing

Sami Musa

Hyun-Woo Lee

Original Assignee

Asml Netherlands Bv

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2008-06-18

Filing date

2009-06-11

Publication date

2009-12-22

2009-06-11 Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv

2009-12-22 Publication of NL2002998A1 publication Critical patent/NL2002998A1/nl

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

NL2002998A 2008-06-18 2009-06-11 Lithographic apparatus. NL2002998A1 (nl)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US12931508P	2008-06-18	2008-06-18
US10246708P	2008-10-03	2008-10-03

Publications (1)

Publication Number	Publication Date
NL2002998A1 true NL2002998A1 (nl)	2009-12-22

Family

ID=41430884

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NL2002998A NL2002998A1 (nl)	2008-06-18	2009-06-11	Lithographic apparatus.

Country Status (6)

Country	Link
US (1)	US8243259B2 (nl)
JP (1)	JP5066140B2 (nl)
KR (1)	KR101149841B1 (nl)
CN (1)	CN101609267B (nl)
NL (1)	NL2002998A1 (nl)
TW (1)	TWI411896B (nl)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP5477862B2 (ja) *	2010-09-06	2014-04-23	株式会社ブイ・テクノロジー	フィルム露光装置及びフィルム露光方法
US9939742B2 (en)	2012-11-05	2018-04-10	Asml Netherlands B.V.	Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method
JP6207671B1 (ja) *	2016-06-01	2017-10-04	キヤノン株式会社	パターン形成装置、基板配置方法及び物品の製造方法
EP3642652B1 (en)	2017-06-19	2026-01-21	Magic Leap, Inc.	Eyepiece comprising a dynamically actuable diffractive optical element
US11774868B2 (en)	2019-04-16	2023-10-03	Asml Netherlands B.V.	Image sensor for immersion lithography
US11275312B1 (en)	2020-11-30	2022-03-15	Waymo Llc	Systems and methods for verifying photomask cleanliness

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4509852A (en)	1980-10-06	1985-04-09	Werner Tabarelli	Apparatus for the photolithographic manufacture of integrated circuit elements
JPS587823A (ja) *	1981-07-06	1983-01-17	Hitachi Ltd	アライメント方法およびその装置
JPH0437113A (ja) *	1990-06-01	1992-02-07	Mitsubishi Electric Corp	縮小投影露光装置
WO1998039689A1 (en)	1997-03-07	1998-09-11	Asm Lithography B.V.	Lithographic projection apparatus with off-axis alignment unit
US20020041377A1 (en) *	2000-04-25	2002-04-11	Nikon Corporation	Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
JP2002014005A (ja) *	2000-04-25	2002-01-18	Nikon Corp	空間像計測方法、結像特性計測方法、空間像計測装置及び露光装置
JP4579376B2 (ja) *	2000-06-19	2010-11-10	キヤノン株式会社	露光装置およびデバイス製造方法
JP2002140005A (ja)	2000-10-31	2002-05-17	Yoshino Kogyosho Co Ltd	ロール型タックラベルとその製造方法及びタックラベルを貼着したプラスチック製品
US7113258B2 (en) *	2001-01-15	2006-09-26	Asml Netherlands B.V.	Lithographic apparatus
TW201738932A (zh) *	2003-10-09	2017-11-01	尼康股份有限公司	曝光裝置及曝光方法、元件製造方法
JP4524601B2 (ja) *	2003-10-09	2010-08-18	株式会社ニコン	露光装置及び露光方法、デバイス製造方法
JP4018647B2 (ja) *	2004-02-09	2007-12-05	キヤノン株式会社	投影露光装置およびデバイス製造方法
US7463330B2 (en) *	2004-07-07	2008-12-09	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US7333175B2 (en) *	2004-09-13	2008-02-19	Asml Netherlands, B.V.	Method and system for aligning a first and second marker
WO2006040890A1 (ja) *	2004-10-08	2006-04-20	Nikon Corporation	露光装置及びデバイス製造方法
US7652746B2 (en) *	2005-06-21	2010-01-26	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
JP2007103658A (ja) *	2005-10-04	2007-04-19	Canon Inc	露光方法および装置ならびにデバイス製造方法
US20080062385A1 (en) *	2006-04-07	2008-03-13	Asml Netherlands B.V.	Method of monitoring polarization performance, polarization measurement assembly, lithographic apparatus and computer program product using the same
JP2007329289A (ja) *	2006-06-07	2007-12-20	Canon Inc	光学部品の製造方法
JP2008066572A (ja) *	2006-09-08	2008-03-21	Canon Inc	マーク基板、マーク基板の製造方法、液浸露光装置およびデバイス製造方法
CN100535761C (zh) *	2007-10-11	2009-09-02	上海微电子装备有限公司	光刻装置的传感器
EP2264528A1 (en) *	2009-06-19	2010-12-22	ASML Netherlands B.V.	Sensor and lithographic apparatus

2009
- 2009-06-11 NL NL2002998A patent/NL2002998A1/nl not_active Application Discontinuation
- 2009-06-12 JP JP2009140853A patent/JP5066140B2/ja not_active Expired - Fee Related
- 2009-06-17 US US12/486,458 patent/US8243259B2/en not_active Expired - Fee Related
- 2009-06-17 KR KR1020090053944A patent/KR101149841B1/ko not_active Expired - Fee Related
- 2009-06-18 TW TW098120485A patent/TWI411896B/zh not_active IP Right Cessation
- 2009-06-18 CN CN2009101475365A patent/CN101609267B/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
CN101609267A (zh)	2009-12-23
KR101149841B1 (ko)	2012-05-24
CN101609267B (zh)	2012-01-11
TWI411896B (zh)	2013-10-11
TW201007390A (en)	2010-02-16
US20090316122A1 (en)	2009-12-24
US8243259B2 (en)	2012-08-14
JP2010004040A (ja)	2010-01-07
KR20090131662A (ko)	2009-12-29
JP5066140B2 (ja)	2012-11-07

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DE602005008654D1 (de)	2008-09-18	Belichtungsapparat ausgestattet mit Messvorrichtung
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EP1977157A4 (en)	2010-02-17	NANOSTRUCTURE-BASED OPTOELECTRONIC DEVICE
KR101483193B9 (ko)	2025-02-14	박막 패터닝 방법 및 이를 이용한 전기 광학 소자
FR2894029B1 (fr)	2011-07-22	Dispositif de detection de rapport air-carburant.
FR2883154B1 (fr)	2008-02-08	Dispositif de mesure du teint
FR2907229B1 (fr)	2012-12-21	Dispositif de detection.
FR2937779B1 (fr)	2014-03-21	Dispositif de treuil.
DE602006006969D1 (de)	2009-07-09	Negativ arbeitender, hitzeempfindlicher Lithographiedruckformvorläufer

Legal Events

Date	Code	Title	Description
2010-03-01	AD1A	A request for search or an international type search has been filed
2015-08-05	WDAP	Patent application withdrawn	Effective date: 20101118