NL2002693A1 - Solder plating method for copper pads or wafer. - Google Patents
Solder plating method for copper pads or wafer.Info
- Publication number
- NL2002693A1 NL2002693A1 NL2002693A NL2002693A NL2002693A1 NL 2002693 A1 NL2002693 A1 NL 2002693A1 NL 2002693 A NL2002693 A NL 2002693A NL 2002693 A NL2002693 A NL 2002693A NL 2002693 A1 NL2002693 A1 NL 2002693A1
- Authority
- NL
- Netherlands
- Prior art keywords
- wafer
- plating method
- solder plating
- copper pads
- pads
- Prior art date
Links
Classifications
-
- H10W72/012—
-
- H10W72/01231—
-
- H10W72/01235—
-
- H10W72/01251—
-
- H10W72/01255—
-
- H10W72/20—
-
- H10W72/251—
-
- H10W72/29—
-
- H10W72/923—
-
- H10W72/952—
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW097112408A TWI353645B (en) | 2008-04-03 | 2008-04-03 | Tin processing method for copper pads of wafer |
| TW97112408 | 2008-04-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL2002693A1 true NL2002693A1 (en) | 2009-10-06 |
| NL2002693C2 NL2002693C2 (en) | 2010-11-02 |
Family
ID=41397322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2002693A NL2002693C2 (en) | 2008-04-03 | 2009-03-31 | Solder plating method for copper pads of wafer. |
Country Status (2)
| Country | Link |
|---|---|
| NL (1) | NL2002693C2 (en) |
| TW (1) | TWI353645B (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6551931B1 (en) * | 2000-11-07 | 2003-04-22 | International Business Machines Corporation | Method to selectively cap interconnects with indium or tin bronzes and/or oxides thereof and the interconnect so capped |
| JP3679001B2 (en) * | 2000-12-22 | 2005-08-03 | シャープ株式会社 | Semiconductor device and manufacturing method thereof |
| US7078796B2 (en) * | 2003-07-01 | 2006-07-18 | Freescale Semiconductor, Inc. | Corrosion-resistant copper bond pad and integrated device |
-
2008
- 2008-04-03 TW TW097112408A patent/TWI353645B/en active
-
2009
- 2009-03-31 NL NL2002693A patent/NL2002693C2/en active Search and Examination
Also Published As
| Publication number | Publication date |
|---|---|
| TW200943444A (en) | 2009-10-16 |
| NL2002693C2 (en) | 2010-11-02 |
| TWI353645B (en) | 2011-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| PL2279537T3 (en) | The method of encapsulating the electronic circuit | |
| DK2371948T3 (en) | Lead free high temperature solder alloy | |
| EP2157841A4 (en) | Solder ball mounting method | |
| HUE050537T2 (en) | Method for testing indirect band gap semiconductor devices using luminescent imaging | |
| EP2028692A4 (en) | SEMICONDUCTOR COMPONENT | |
| EP2494594A4 (en) | SEMICONDUCTOR COMPONENT | |
| HUE051601T2 (en) | Through-hole bridge connection on a semiconductor chip | |
| DK2262356T3 (en) | ROBOT MILK ARM AND PROCEDURE FOR DETERMINING MILK COPPER | |
| EP2727898A4 (en) | SOLDERING METAL, SOLDERING METAL PULP, CERAMIC CIRCUIT SUBSTRATE, CERAMIC MASTER CIRCUIT SUBSTRATE, AND SEMICONDUCTOR FEEDING MODULE | |
| EP2442355A4 (en) | SEMICONDUCTOR COMPONENT | |
| IT1392071B1 (en) | METHOD FOR PERFORMING ELECTRICAL TESTING OF ELECTRONIC DEVICES | |
| DK2408787T3 (en) | COPPER COMPLEX FOR OPTOELECTRONIC APPLICATIONS | |
| IL214318A (en) | Select one or more parameter for chip testing | |
| GB2463180B (en) | Method for bonding two bonding partners | |
| FI20075920A7 (en) | Method for refining copper concentrate | |
| EP2396885A4 (en) | TERMINATION CIRCUIT FOR TERMINATION ON CHIP | |
| HRP20191441T1 (en) | PROCEDURE FOR OBTAINING THE CONTACT AREA OF THE ELECTRONIC COMPONENT | |
| DK2072483T3 (en) | Ceramics copper foil bonding process | |
| GB2458475B (en) | Processing of multilayer semiconductor wafers | |
| SG10201405439UA (en) | Method for bonding of chips on wafers | |
| EP2430016A4 (en) | INV (LEUKEMIA) INHIBITORS | |
| EP2315664A4 (en) | MATTE SUBSTRATE | |
| ZA200904920B (en) | Benzimidazole TRPV1 inhibitors | |
| IL193811A (en) | Coating method for increased resistance of copper to electromigration | |
| FI20070491L (en) | Method for processing cobalt-rich copper concentrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AD1A | A request for search or an international type search has been filed |