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NL2001209A1 - Inrichting en werkwijze voor het opwekken van extreem ultraviolette straling door middel van een elektrisch bedreven gasontlading. - Google Patents

Inrichting en werkwijze voor het opwekken van extreem ultraviolette straling door middel van een elektrisch bedreven gasontlading.

Info

Publication number
NL2001209A1
NL2001209A1 NL2001209A NL2001209A NL2001209A1 NL 2001209 A1 NL2001209 A1 NL 2001209A1 NL 2001209 A NL2001209 A NL 2001209A NL 2001209 A NL2001209 A NL 2001209A NL 2001209 A1 NL2001209 A1 NL 2001209A1
Authority
NL
Netherlands
Prior art keywords
electrode
electrically operated
gas discharge
extreme ultraviolet
ultraviolet radiation
Prior art date
Application number
NL2001209A
Other languages
English (en)
Other versions
NL2001209C2 (nl
Inventor
Guido Hergenhan
Christian Ziener
Mike Moeritz
Original Assignee
Xtreme Tech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xtreme Tech Gmbh filed Critical Xtreme Tech Gmbh
Publication of NL2001209A1 publication Critical patent/NL2001209A1/nl
Application granted granted Critical
Publication of NL2001209C2 publication Critical patent/NL2001209C2/nl

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL2001209A 2007-01-25 2008-01-23 Inrichting en werkwijze voor het opwekken van extreem ultraviolette straling door middel van een elektrisch bedreven gasontlading. NL2001209C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007004440 2007-01-25
DE102007004440A DE102007004440B4 (de) 2007-01-25 2007-01-25 Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung

Publications (2)

Publication Number Publication Date
NL2001209A1 true NL2001209A1 (nl) 2008-07-28
NL2001209C2 NL2001209C2 (nl) 2011-04-05

Family

ID=39587114

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2001209A NL2001209C2 (nl) 2007-01-25 2008-01-23 Inrichting en werkwijze voor het opwekken van extreem ultraviolette straling door middel van een elektrisch bedreven gasontlading.

Country Status (4)

Country Link
US (1) US7812542B2 (nl)
JP (1) JP4876059B2 (nl)
DE (1) DE102007004440B4 (nl)
NL (1) NL2001209C2 (nl)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005030304B4 (de) * 2005-06-27 2008-06-26 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung
DE102006015641B4 (de) * 2006-03-31 2017-02-23 Ushio Denki Kabushiki Kaisha Vorrichtung zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation
JP5246916B2 (ja) * 2008-04-16 2013-07-24 ギガフォトン株式会社 Ｅｕｖ光発生装置におけるイオン回収装置および方法
US9074310B2 (en) * 2008-07-04 2015-07-07 Ident Technology Ag Capacitative sensor device
US9265136B2 (en) 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US9113540B2 (en) 2010-02-19 2015-08-18 Gigaphoton Inc. System and method for generating extreme ultraviolet light
TW201212726A (en) * 2010-07-15 2012-03-16 Fraunhofer Ges Forschung Method of improving the operation efficiency of a EUV plasma discharge lamp
JP5921879B2 (ja) * 2011-03-23 2016-05-24 ギガフォトン株式会社 ターゲット供給装置及び極端紫外光生成装置
JP2013140771A (ja) * 2011-12-09 2013-07-18 Gigaphoton Inc ターゲット供給装置
WO2015179819A1 (en) * 2014-05-22 2015-11-26 Ohio State Innovation Foundation Liquid thin-film laser target
JP7156331B2 (ja) * 2020-05-15 2022-10-19 ウシオ電機株式会社 極端紫外光光源装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04110800A (ja) * 1990-08-31 1992-04-13 Shimadzu Corp 標的物質の供給装置
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
RU2206186C2 (ru) * 2000-07-04 2003-06-10 Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации
JP2003288998A (ja) * 2002-03-27 2003-10-10 Ushio Inc 極端紫外光源
US7049614B2 (en) * 2003-03-10 2006-05-23 Intel Corporation Electrode in a discharge produced plasma extreme ultraviolet source
US7446329B2 (en) * 2003-08-07 2008-11-04 Intel Corporation Erosion resistance of EUV source electrodes
DE10342239B4 (de) 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung
RU2278483C2 (ru) * 2004-04-14 2006-06-20 Владимир Михайлович Борисов Эуф источник с вращающимися электродами и способ получения эуф излучения из газоразрядной плазмы
US7605385B2 (en) * 2004-07-28 2009-10-20 Board of Regents of the University and Community College System of Nevada, on behlaf of the University of Nevada Electro-less discharge extreme ultraviolet light source
DE102005023060B4 (de) * 2005-05-19 2011-01-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung
EP1897422A2 (en) * 2005-06-14 2008-03-12 Philips Intellectual Property & Standards GmbH Method of protecting a radiation source producing euv-radiation and/or soft x-rays against short circuits
DE102005030304B4 (de) * 2005-06-27 2008-06-26 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung
JP4904809B2 (ja) * 2005-12-28 2012-03-28 ウシオ電機株式会社 極端紫外光光源装置

Also Published As

Publication number Publication date
DE102007004440B4 (de) 2011-05-12
US20080180029A1 (en) 2008-07-31
NL2001209C2 (nl) 2011-04-05
JP2008204940A (ja) 2008-09-04
US7812542B2 (en) 2010-10-12
DE102007004440A1 (de) 2008-08-07
JP4876059B2 (ja) 2012-02-15

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Effective date: 20190201