MY179075A - Polishing composition and method for producing magnetic disk substrate - Google Patents
Polishing composition and method for producing magnetic disk substrateInfo
- Publication number
- MY179075A MY179075A MYPI2016702539A MYPI2016702539A MY179075A MY 179075 A MY179075 A MY 179075A MY PI2016702539 A MYPI2016702539 A MY PI2016702539A MY PI2016702539 A MYPI2016702539 A MY PI2016702539A MY 179075 A MY179075 A MY 179075A
- Authority
- MY
- Malaysia
- Prior art keywords
- magnetic disk
- disk substrate
- polishing composition
- polishing
- producing magnetic
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 8
- 239000000758 substrate Substances 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 6
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 239000003082 abrasive agent Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000011164 primary particle Substances 0.000 abstract 1
- -1 silicate ion Chemical class 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
This invention provides a polishing composition capable of suitably providing high polishing rates with the use of silica abrasives as well as a method for producing a magnetic disk substrate and a method for polishing a magnetic disk substrate, involving the use of the polishing composition. The polishing composition provided by this invention comprises a silica abrasive; the silica abrasive has an average primary particle diameter of 15 nm or larger and yields an average dissolved silicate ion quantity of 13.5 ppm/g or less in water at pH 9.5. The magnetic disk substrate production method provided by this invention comprises a step (1) of polishing a magnetic disk substrate using the polishing composition.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015141292 | 2015-07-15 | ||
| JP2016121571A JP6730859B2 (en) | 2015-07-15 | 2016-06-20 | Polishing composition and method for manufacturing magnetic disk substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY179075A true MY179075A (en) | 2020-10-27 |
Family
ID=57945438
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2016702539A MY179075A (en) | 2015-07-15 | 2016-07-13 | Polishing composition and method for producing magnetic disk substrate |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6730859B2 (en) |
| MY (1) | MY179075A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7096714B2 (en) * | 2017-06-26 | 2022-07-06 | 花王株式会社 | Silica slurry for polishing liquid composition |
| WO2019004161A1 (en) * | 2017-06-26 | 2019-01-03 | 花王株式会社 | Silica slurry for polishing-liquid composition |
| WO2020196542A1 (en) * | 2019-03-27 | 2020-10-01 | 株式会社フジミインコーポレーテッド | Polishing composition, polishing method, and method for producing substrate |
| JP7292923B2 (en) * | 2019-03-29 | 2023-06-19 | 株式会社フジミインコーポレーテッド | Method for manufacturing magnetic disk substrate, polishing composition and polishing method |
| TW202128943A (en) * | 2019-12-20 | 2021-08-01 | 日商Jsr 股份有限公司 | Composition for chemical mechanical polishing, chemical mechanical polishing method, and method for manufacturing particles for chemical mechanical polishing |
| US20230136485A1 (en) * | 2020-03-30 | 2023-05-04 | Fujimi Incorporated | Polishing composition |
| JP7692694B2 (en) * | 2020-12-23 | 2025-06-16 | ニッタ・デュポン株式会社 | Polishing composition and kit for producing polishing composition |
| WO2025197423A1 (en) * | 2024-03-21 | 2025-09-25 | 株式会社フジミインコーポレーテッド | Polishing composition |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6280490B1 (en) * | 1999-09-27 | 2001-08-28 | Fujimi America Inc. | Polishing composition and method for producing a memory hard disk |
| JP2004186350A (en) * | 2002-12-03 | 2004-07-02 | Sanyo Chem Ind Ltd | Polishing composition for cmp process |
| JP2005138197A (en) * | 2003-11-04 | 2005-06-02 | Fujimi Inc | Polishing composition and polishing method |
| US20080020680A1 (en) * | 2006-07-24 | 2008-01-24 | Cabot Microelectronics Corporation | Rate-enhanced CMP compositions for dielectric films |
| JP6259182B2 (en) * | 2012-12-12 | 2018-01-10 | 株式会社フジミインコーポレーテッド | Polishing liquid for primary polishing of magnetic disk substrate with nickel phosphorus plating |
| JP2014117754A (en) * | 2012-12-13 | 2014-06-30 | Osaka Univ | Polishing abrasive grain and polishing method |
-
2016
- 2016-06-20 JP JP2016121571A patent/JP6730859B2/en active Active
- 2016-07-13 MY MYPI2016702539A patent/MY179075A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP6730859B2 (en) | 2020-07-29 |
| JP2017025295A (en) | 2017-02-02 |
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