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MY139074A - Polishing composition - Google Patents

Polishing composition

Info

Publication number
MY139074A
MY139074A MYPI20042576A MYPI20042576A MY139074A MY 139074 A MY139074 A MY 139074A MY PI20042576 A MYPI20042576 A MY PI20042576A MY PI20042576 A MYPI20042576 A MY PI20042576A MY 139074 A MY139074 A MY 139074A
Authority
MY
Malaysia
Prior art keywords
polishing composition
substrate
substrates
polishing
optical
Prior art date
Application number
MYPI20042576A
Inventor
Shigeo Fujii
Hiroaki Kitayama
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Publication of MY139074A publication Critical patent/MY139074A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

A POLISHING COMPOSITION CONTAINING AN -ALUMINA, AN INTERMEDIATE ALUMINA, AN OXIDIZING AGENT AND WATER; A METHOD FOR REDUCING WAVINESS OF A SUBSTRATE TO BE POLISHED, INCLUDING THE STEP OF APPLYING THE POLISHING COMPOSITION TO THE SUBSTRATE TO BE POLISHED; AND A METHOD FOR MANUFACTURING A SUBSTRATE, INCLUDING THE STEP OF POLISHING A SUBSTRATE TO BE POLISHED WITH THE POLISHING COMPOSITION. THE POLISHING COMPOSITION IS SUITABLE FOR POLISHING SUBSTRATES FOR PRECISION PARTS SUCH AS SUBSTRATES FOR MAGNETIC RECORDING MEDIA FOR MAGNETIC DISCS, OPTICAL DISCS, OPTO-MAGNETIC DISCS, AND THE LIKE; PHOTOMASK SUBSTRATES; GLASS FOR LIQUID CRYSTALS; OPTICAL LENSES; OPTICAL MIRRORS; OPTICAL PRISMS; AND SEMICONDUCTOR SUBSTRATES.
MYPI20042576A 2003-07-01 2004-06-29 Polishing composition MY139074A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003270150A JP4339034B2 (en) 2003-07-01 2003-07-01 Polishing liquid composition

Publications (1)

Publication Number Publication Date
MY139074A true MY139074A (en) 2009-08-28

Family

ID=32768031

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20042576A MY139074A (en) 2003-07-01 2004-06-29 Polishing composition

Country Status (6)

Country Link
US (2) US20050003746A1 (en)
JP (1) JP4339034B2 (en)
CN (1) CN1320078C (en)
GB (1) GB2403725B (en)
MY (1) MY139074A (en)
TW (1) TWI323279B (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4753710B2 (en) * 2005-12-22 2011-08-24 花王株式会社 Polishing liquid composition for hard disk substrate
TWI506621B (en) 2005-12-22 2015-11-01 Kao Corp Polishing liquid composition for hard disk substrate
JP2007257810A (en) 2006-03-24 2007-10-04 Hoya Corp Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk
JP5283249B2 (en) * 2006-12-27 2013-09-04 花王株式会社 Method for producing polishing composition
JP5461772B2 (en) * 2007-12-14 2014-04-02 花王株式会社 Polishing liquid composition
US7922926B2 (en) 2008-01-08 2011-04-12 Cabot Microelectronics Corporation Composition and method for polishing nickel-phosphorous-coated aluminum hard disks
JP5049249B2 (en) * 2008-10-31 2012-10-17 花王株式会社 Polishing liquid composition
US8226841B2 (en) 2009-02-03 2012-07-24 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous memory disks
JP5536433B2 (en) * 2009-12-11 2014-07-02 花王株式会社 Polishing liquid composition for hard disk substrate
KR101396232B1 (en) * 2010-02-05 2014-05-19 한양대학교 산학협력단 Slurry for polishing phase change material and method for patterning polishing phase change material using the same
WO2012090510A1 (en) * 2010-12-29 2012-07-05 Hoya株式会社 Manufacturing method for glass substrate for magnetic disk, and manufacturing method for magnetic disk
US9039914B2 (en) 2012-05-23 2015-05-26 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous-coated memory disks
JP6734018B2 (en) * 2014-09-17 2020-08-05 株式会社フジミインコーポレーテッド Abrasive material, polishing composition, and polishing method
WO2016042744A1 (en) * 2014-09-17 2016-03-24 株式会社フジミインコーポレーテッド Polishing material, composition for polishing, and polishing method
JP6622991B2 (en) * 2015-06-30 2019-12-18 株式会社フジミインコーポレーテッド Polishing composition
WO2017163942A1 (en) * 2016-03-25 2017-09-28 株式会社フジミインコーポレーテッド Polishing composition for objects to be polished having metal-containing layer
JP7209004B2 (en) * 2018-03-28 2023-01-19 フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド Ruthenium barrier chemical mechanical polishing slurry
CN109233644B (en) * 2018-09-19 2021-03-12 广州亦盛环保科技有限公司 Fine polishing solution and preparation method thereof
JP7457586B2 (en) * 2020-06-18 2024-03-28 株式会社フジミインコーポレーテッド Concentrated solution of polishing composition and polishing method using the same

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5693239A (en) * 1995-10-10 1997-12-02 Rodel, Inc. Polishing slurries comprising two abrasive components and methods for their use
JP3507628B2 (en) * 1996-08-06 2004-03-15 昭和電工株式会社 Polishing composition for chemical mechanical polishing
KR19980019046A (en) * 1996-08-29 1998-06-05 고사이 아키오 Abrasive composition and use of the same
US6569216B1 (en) * 1998-11-27 2003-05-27 Kao Corporation Abrasive fluid compositions
JP4053165B2 (en) * 1998-12-01 2008-02-27 株式会社フジミインコーポレーテッド Polishing composition and polishing method using the same
AU2225301A (en) * 1999-12-27 2001-07-09 Showa Denko Kabushiki Kaisha Alumina particles, method for producing the same, composition comprising the same, and alumina slurry for polishing
WO2001057150A1 (en) * 2000-02-02 2001-08-09 Rodel Holdings, Inc. Polishing composition
US6261476B1 (en) * 2000-03-21 2001-07-17 Praxair S. T. Technology, Inc. Hybrid polishing slurry
US6569215B2 (en) * 2000-04-17 2003-05-27 Showa Denko Kabushiki Kaisha Composition for polishing magnetic disk substrate
TWI268286B (en) * 2000-04-28 2006-12-11 Kao Corp Roll-off reducing agent
US6468913B1 (en) * 2000-07-08 2002-10-22 Arch Specialty Chemicals, Inc. Ready-to-use stable chemical-mechanical polishing slurries
US20040092103A1 (en) * 2000-07-19 2004-05-13 Shigeo Fujii Polishing fluid composition
JP4009986B2 (en) * 2000-11-29 2007-11-21 株式会社フジミインコーポレーテッド Polishing composition and polishing method for polishing memory hard disk using the same
CN1191530C (en) * 2001-01-18 2005-03-02 深圳市中兴集成电路设计有限责任公司 PCI bridge with improved structure
JP4231632B2 (en) * 2001-04-27 2009-03-04 花王株式会社 Polishing liquid composition
CN100378145C (en) * 2001-06-21 2008-04-02 花王株式会社 Slurry Composition
GB2393186B (en) * 2002-07-31 2006-02-22 Kao Corp Polishing composition
GB2393447B (en) * 2002-08-07 2006-04-19 Kao Corp Polishing composition

Also Published As

Publication number Publication date
GB2403725B (en) 2007-10-24
JP2005023266A (en) 2005-01-27
TW200513522A (en) 2005-04-16
JP4339034B2 (en) 2009-10-07
US20050003746A1 (en) 2005-01-06
GB2403725A (en) 2005-01-12
TWI323279B (en) 2010-04-11
GB0413699D0 (en) 2004-07-21
CN1320078C (en) 2007-06-06
US20050132660A1 (en) 2005-06-23
CN1576346A (en) 2005-02-09

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