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MXPA05012854A - Novedosos fotoiniciadores de polisiloxano tensioactivos. - Google Patents

Novedosos fotoiniciadores de polisiloxano tensioactivos.

Info

Publication number
MXPA05012854A
MXPA05012854A MXPA05012854A MXPA05012854A MXPA05012854A MX PA05012854 A MXPA05012854 A MX PA05012854A MX PA05012854 A MXPA05012854 A MX PA05012854A MX PA05012854 A MXPA05012854 A MX PA05012854A MX PA05012854 A MXPA05012854 A MX PA05012854A
Authority
MX
Mexico
Prior art keywords
photoinitiators
novel surface
active polysiloxane
polysiloxane
active
Prior art date
Application number
MXPA05012854A
Other languages
English (en)
Inventor
Gabriele Baisch
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of MXPA05012854A publication Critical patent/MXPA05012854A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Fotoiniciadores polimericos de la formula I o II (ver formula I) o (ver formula II) en donde n y m independientemente entre si, son 3-5; o es 10-16; p es 4-8; R es fenil-CO-CO-O-; Y e Y' independientemente entre si son C1-C10alquileno o -[(CH2)a-O-(CH2)b]c- en donde a es 2-10, b es 0-10, c es 1-3; con la condicion de que sin embargo sean al menos 1, si el grupo metileno en cuestion esta entre dos atomos de oxigeno.
MXPA05012854A 2003-06-06 2004-05-28 Novedosos fotoiniciadores de polisiloxano tensioactivos. MXPA05012854A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03405409 2003-06-06
PCT/EP2004/050952 WO2004108799A1 (en) 2003-06-06 2004-05-28 Novel surface-active polysiloxane photoinitiators

Publications (1)

Publication Number Publication Date
MXPA05012854A true MXPA05012854A (es) 2006-02-22

Family

ID=33495664

Family Applications (1)

Application Number Title Priority Date Filing Date
MXPA05012854A MXPA05012854A (es) 2003-06-06 2004-05-28 Novedosos fotoiniciadores de polisiloxano tensioactivos.

Country Status (13)

Country Link
US (1) US20070026509A1 (es)
EP (1) EP1631616B1 (es)
JP (1) JP4767840B2 (es)
KR (1) KR101081758B1 (es)
CN (1) CN100432122C (es)
AT (1) ATE527304T1 (es)
AU (1) AU2004245242A1 (es)
BR (1) BRPI0410985B1 (es)
CA (1) CA2525412A1 (es)
MX (1) MXPA05012854A (es)
RU (1) RU2351615C2 (es)
TW (1) TWI340757B (es)
WO (1) WO2004108799A1 (es)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004058193A1 (de) * 2004-12-02 2006-06-08 Wacker Chemie Ag Vernetzbare Siloxan-Harnstoff-Copolymere
EP1923038B1 (de) * 2006-11-16 2011-05-18 Ernst Mühlbauer GmbH & Co.KG Silikonabformmasse mit zweistufigem Aushärtungsmechanismus
DE102007031689A1 (de) * 2007-07-06 2009-01-08 Evonik Goldschmidt Gmbh Enzympräparate
EP2235078B1 (en) 2008-01-17 2011-11-16 Basf Se Modified olefin polymers
JP5563589B2 (ja) 2008-12-05 2014-07-30 スリーエム イノベイティブ プロパティズ カンパニー 非線形熱重合を使用した三次元物品
WO2011160640A2 (en) * 2010-06-22 2011-12-29 Coloplast A/S Hydrophilic gels derived from grafted photoinitiators
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
WO2013153183A2 (de) * 2012-04-11 2013-10-17 Ivoclar Vivadent Ag Kompositharz-zusammensetzung und verfahren zur herstellung dentaler bauteile mittels stereolithographie
KR20150051478A (ko) 2013-11-04 2015-05-13 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 박막 트랜지스터 표시판의 제조 방법
RU2758381C2 (ru) * 2016-09-22 2021-10-28 БАСФ Коатингс ГмбХ Водные базовые покрытия с повышенной устойчивостью к воздействию циркуляционного трубопровода
CN110325913B (zh) * 2017-03-29 2022-11-01 旭化成株式会社 感光性树脂组合物
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
CN107537401B (zh) * 2017-08-20 2019-07-12 上海航森化工科技有限公司 一种磺酸盐型嵌段共聚物分散剂及其制备方法
KR20230148381A (ko) 2017-12-27 2023-10-24 헨켈 아게 운트 코. 카게아아 광학적으로 투명한 감압성 접착제 및 그의 용도
JP7146409B2 (ja) * 2018-02-20 2022-10-04 ヘンケルジャパン株式会社 Ｕｖ熱硬化型接着剤組成物
GB201807653D0 (en) * 2018-05-11 2018-06-27 Fujifilm Speciality Ink Systems Ltd A printing ink
CN112114502B (zh) * 2020-08-27 2024-08-16 江苏中德电子材料科技有限公司 一种cf返工液
JP7335217B2 (ja) * 2020-09-24 2023-08-29 信越化学工業株式会社 感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
JP3189275B2 (ja) * 1990-08-31 2001-07-16 大日本インキ化学工業株式会社 活性エネルギー線硬化型樹脂組成物
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
AU737212B2 (en) * 1997-08-21 2001-08-09 Loctite Corporation Dual curing silicone compositions
DE19850507C1 (de) * 1998-11-03 2000-05-04 Goldschmidt Ag Th Verfahren zur Herstellung von Acrylsäureestern und/oder Methacrylsäureestern von hydroxyfunktionellen Siloxanen und/oder polyoxyalkylenmodifizierten Siloxanen und deren Verwendung
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
EP1392779B1 (en) * 2000-11-20 2009-04-22 Ciba Holding Inc. Fluorinated-photoinitiators in dual cure resins
CA2431619A1 (en) * 2000-12-13 2002-06-20 Ciba Specialty Chemicals Holding Inc. Surface-active photoinitiators
DE60136005D1 (en) * 2000-12-13 2008-11-13 Ciba Holding Inc Oberflächenaktive photoinitiatoren
AU2002231669A1 (en) * 2000-12-13 2002-06-24 Ciba Specialty Chemicals Holding Inc. Surface-active photoinitiators
ATE390446T1 (de) * 2002-02-04 2008-04-15 Ciba Sc Holding Ag Fluorierte photoinitiatoren in hochfluorierten monomeren
US20050119435A1 (en) * 2002-02-04 2005-06-02 Gisele Baudin Surface-active photoinitiators
WO2003066688A1 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Surface-active siloxane photoinitiators
JP4339694B2 (ja) * 2002-03-06 2009-10-07 チバ ホールディング インコーポレーテッド 有機ケイ素基を含有する光開始剤を調製するための酵素的方法

Also Published As

Publication number Publication date
KR20060021878A (ko) 2006-03-08
CN100432122C (zh) 2008-11-12
BRPI0410985A (pt) 2006-07-04
JP4767840B2 (ja) 2011-09-07
TW200502338A (en) 2005-01-16
EP1631616B1 (en) 2011-10-05
AU2004245242A1 (en) 2004-12-16
WO2004108799A1 (en) 2004-12-16
CA2525412A1 (en) 2004-12-16
RU2351615C2 (ru) 2009-04-10
CN1798793A (zh) 2006-07-05
EP1631616A1 (en) 2006-03-08
TWI340757B (en) 2011-04-21
KR101081758B1 (ko) 2011-11-10
US20070026509A1 (en) 2007-02-01
BRPI0410985B1 (pt) 2014-07-22
ATE527304T1 (de) 2011-10-15
JP2007526923A (ja) 2007-09-20
RU2005141515A (ru) 2006-07-27

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