MXPA01005358A - Read head with read track width defining layer that planarizes the write gap layer of a write head - Google Patents

Abstract

A read track width defining layer (306, 310) is employed for defining first (322) and second side edges of a read sensor. The read track width defining layer (310) preferably remains in the head to planarize the read head at first (330) and second (332) hard bias and lead layers so as to overcome a problem of write gap curvature in an accompanying write head. The read track width defining layer is defined by a subtractive process about a bilayer photoresist layer (308). The subtractive process is selective to the read track width defining layer over a read sensor material layer (304) therebelow. Ion milling is then employed for defining first and second side edges of a read sensor layer employing the read track width defining layer as a mask. First and second hard bias and lead layers are then deposited which make contiguous junctions with the first and second side edges of each of the read sensor and read track width defining layers. The photoresist is then removed and the remainder of the read head is completed.

Description

READING HEAD WITH A LAYER THAT DEFINES THE TRACK WIDTH READER THAT APPLIES WRITING LAYER WITH SPACE INTERMEDIATE OF A WRITING HEAD.

BACKGROUND OF THE INVENTION The present invention relates to a reading head having a layer defining a track width that flattens the layer with intermediate writing space of a writing head.

BACKGROUND OF THE INVENTION The heart of a computer is a mount that is referred to as a magnetic disk drive. The disk unit includes a rotating magnetic disk, the read and write heads that are suspended by a suspension arm on the rotating disk and an actuator that rotates the suspension arm to locate the read and write heads on the selected channels on the disk. the rotating disc. The read and write heads are directly mounted on a cursor that has an air support surface (ABS). When the disc is not rotating, the suspension arm misses the cursor in contact with the surface of the disc but, when the disc is rotating, the air swirls by the rotation of the disc adjacent to the ABS to cause, that with the support of the disc. air, the cursor travels a short distance from the surface of the rotating disc. The writing heads and readers are used to write the magnetic impressions and read the magnetic impressions of the rotating disk. The read and write heads are connected to the processing circuit that operates according to a computer program to carry out the writing and reading functions. The writing head includes a rolled layer incorporated in the first, second and third insulation layers (isolation stack), the isolation stack is sandwiched between the first and second polar part layers. A writing layer with intermediate space between the first and second polar piece layers forms a magnetic interspace on an air support surface (ABS) of the writing head. The polar piece layers are connected in an opposite intermediate space. The current directed to the wound layer induces a magnetic field through the magnetic interspace between the pole pieces. This field expands through the magnetic intermediate space for the purpose of writing the information in half-moving channels, such as the circular channels in the aforementioned rotating disc, or a magnetic tape moving linearly in a tape unit. The reading head includes the first and second protective layers, the first and second layers with intermediate space, a reading detector and the first and second guide layers that are connected to the reading detector to conduct a sensitive current through the reading detector. The first and second layers with intermediate space are located between the first and second protective layers and the reading detector and the first and second guide layers are located between the first and second layers with intermediate space. The distance between the first and second protective layers determines the linear reading density of the reading head. The reading detector has first and second side edges defining a track width of the reading head. The product of the linear density and the channel density is equal to the area density of the reading head which is the reading capacity in bit of the reading head per square centimeter (square inch) of the magnetic medium. The rows and columns of the combined reading and writing heads are made of a disk substrate located in several chambers where the layers are deposited and therefore defined by the subtraction processes. A plurality of substrate discs can be located on a rotating platform that rotates within the chamber and can function as an anode. One or more targets, which comprise the materials that will be deposited on the disk substrates, can also be located in the chamber.

The functions designated as a cathode and a polarization of CD or RF can be applied to the cathode and / or the anode. The chamber contains a gas, usually argon (Ar) that is under a predetermined pressure. The material is emitted from a target point towards the disc substrate which forms a layer of the desired material. The layers can also be deposited by the deposition of an ion beam where an ion beam gun directs the ionized atoms (ions) towards an objective point causing the target point to emit the material on the disk substrate. A subtraction process can use a gas in the chamber, such as argon (Ar), under pressure, causing that the emission of the material from the portions of the disk substrate is not covered by a masking. Alternatively, the subtraction process can employ an ion beam gun that discharges the ions at high speed, such as argon ions (Ar), which impact on and eliminate portions of the disk substrate which are not covered by a masking. The first and second guide and high polarization layers are normally joined at the first and second side edges of the reading detector, which is known in the art as a contiguous bond. A first step in making this joint is to form a layer of reading sensing material on the entire disc. Then, for each magnetic head a photoresist bilayer is formed on the desired reading detector site with a top layer portion having the first and second side edges to define the first and second side edges of the read detector and a lower layer portion directly on the reading detector material layer having an intermediate space from the upper layer portion to provide undercuts for the purpose of subsequently lifting the undesired deposited layer portions. The disk is then rotated by the turntable and a subtraction process, such as ion grinding, is employed to completely remove the layer of reading detector material except the reading detector under the photoresist bilayer. Unfortunately, the reading detectors on the outside of the disk are subjected to a different angle of grinding of the ion to the discs inside the disk, which produces magnetic heads that have different characteristics. A first side edge of the reading detectors on the outside of the disk has slits while a second side edge has no slit. This is due to the fact that the turntable is rotated on an axis that is at an angle to the milling direction for the purpose of minimizing redeposition of the ground material. Even when the photoresist bilayer is in place, a layer of high polarization guide material is deposited on the entire disc substrate. Then the photoresist bilayer is eliminated by lifting the material of the guide layer and polarization deposited on it. The result is that a first guide and polarization layer performs a good adjoining coupling with the first side edge of the reading detector, however, the second the high polarization guide layer can only make a partial abutting with the second side edge cleft of the reading detector. This occurs because the deposition angle of the high polarization guide layer material is different from the milling angle of the ion of the second side of the reading detector. The result is that the hard polarization material adjacent to the split side edge can not make the contact abutting enough to magnetically stabilize the magnetic domains of the reading detector. This will degrade the execution of the playhead. Another problem is that the undercutting of the photoresist bilayer allows the grinding of the grinding ion, some extent, under the undercut. This produces a width of unpredictable track of the reading detector. A further problem seen with the above process is that in the deposition of the high polarization and guide layer material there is some overlap of the guide layer material and / or high polarization in a top surface portion of the reading detector adjacent to each of the first and second lateral edges. This can cause a coupling exchange between the hard biasing material and the reading detector that adversely affects the magnetism of the reading detector and can alter the expected track width of the reading detector. Yet another problem with the above process is that the first and second guide and high polarization layers have a higher profile than the reading detector. When the second opening is deposited, the first layer of polar part / second protective layer and the writing layer with intermediate space of the reading head there is a depression in the layer with intermediate space. This depression, known in the art as the curvature of the intermediate writing space, can significantly degrade the execution of the writing head. With a curved writing space, the writing head writes curved magnetic impressions on a rotating disc which are subsequently read by a linearly extending reading detector. The reading detector will read only the central portion of the curved print which reduces the reading of the signal made.

European Patent Application 690439, published on January 3, 1996, describes a magnetoresistive detector that includes a magnetoresistive material, formed on a substrate, and having a first edge and a second edge. A first multilayer conductive guide structure is electrically connected to the first edge, and a second multilayer conductive guide structure is electrically connected to the second edge. U.S. Patent No. 5, 256, 249 issued October 26, 1993 discloses a method of making a plane magnetoresistive detector. The detector includes an oxide layer of track width that remains on a magnetoresistive element. The layers that stop the chemical attack remain on opposite sides of the magnetoresistive element adjacent to a magnetoresistive element. Japanese Patent 07 121839 describes a thin film magnetic head and its production. A magnet-resistance effect element (MR element) has a three-layer structure and is formed in a layer with a lower intermediate space. An insulating layer in the MR element and an insulating layer in the layer with an intermediate space are formed simultaneously and the electrode layers of the same film thickness as the thickness of the insulating layers 21a, 21b, are formed from the upper surface at the ends of the MR 12 element to the front surface of the layer with a lower intermediate space.

BRIEF DESCRIPTION OF THE INVENTION According to the present invention, there is now provided a method of making a magnetic head having an air support surface (ABS) and a read head with a track width, comprising: depositing the first layer with non-magnetic electrically insulating intermediate space; depositing a layer of reading detector material in the first layer with intermediate space; depositing a layer of material defining a reading track width in the reading detector material layer; forming a photoresist bilayer masking in the material layer defining a reading track width that masks a layer portion defining the reading track width of the material layer defining a track width; first selectively removing the layer of material defining a reading track width relative to the photoresist and the reading detector material layer to form the layer of material defining a reading track width with the first and second side exposed edges being independently spaced at the same distance from the track width; second, selectively removing the reading detector material layer relative to the photoresist masking and the layer portion defining the reading track width to form the reading sensing layer portion with the first and second side exposed edges defining the width of the reading sensing layer. track; depositing the high polarization guide material layers in the photoresist masking in contact with the first and second side edges of each of the reading detector layer portions and the layer portion defining the reading track width; and eliminating photoresist masking, whereby a portion of the high polarization guide material layer is lifted leaving the first and second guide and high polarization layers connected to the first and second side edges of each of the layer portions reading detector and the layer portion defining the width of the reading track. Viewing the present invention from another aspect, a magnetic head made by the method described above is now provided. In a preferred embodiment of the present invention, there is provided a readhead and a processing method wherein a layer defining a reading track width is located between the readhead of the readhead and the readinghead intermediate reading layer. the reading head and has a thickness that substantially flattens the reading head at the level of the first and second guide layers and of high polarization and guide layers that, by the repetition of subsequent layers, flattens the layer with intermediate reading space. An example of the present invention provides a combination of the read and write head wherein the read head is flattened to overcome the curvature of the reader intermediate space. Another example of the present invention provides a processing method wherein a layer defining a reading track width is used to define a track width of the reading detector with the improved side edges. In a preferred embodiment, the layer defining a reading track width remains in the head to flatten the reading head and overcome the curvature problem of the reading gap. In a preferred embodiment of the invention, a layer of material defining a reading track width is formed in a layer of reading sensing material. The photoresist bilayer masking is then formed for masking the layer defining the aforementioned track width. A first selective removal process is therefore used to remove the layer of material defining a reading track width, except for the layer defining a reading track width that is masked by the photoresist masking. The first selective elimination forms the layer defining a reading track width with the first and second side exposed edges. Then a second selective removal process is employed to remove the reading detector material layer, except for a portion of the reading detector layer masked by the layer defining the track width. The second selective removal process forms a reading sensing layer with the first and second lateral exposed edges. Subsequently, the layers of guide material and high polarization are deposited in the photoresist mask adjacent to the first and second side edges of each of the reading detector layers and of the layer defining a reading track width. Finally, the photoresisting masking is eliminated whereby a portion of the layer of guide material and high polarization is lifted leaving the first and second guide and high polarization layers connected to the first and second side edges of each of the layers of reading detector and the layer that defines a reading track width. The layer defining the track width is preferably carbon. When the layer defining a reading track width is carbon, the first selective removal is preferably a reactive ion attack with an oxygen base (02). Other materials for the layer defining a track width can be silicon (Si) or silicon dioxide (Si02). When the layer defining a reading track width is silicon (Si) or silicon dioxide (Si02) the first selective removal process may be a reactive ion attack with a freon base (CF4). In the preferred embodiment, the layer defining a reading track width has a thickness that is the difference between the thickness of the guide layer and the thickness of the reading detector with high polarization. With this arrangement the layer defining a reading track width flattens the read head at the level of the high polarization guide layer so that the subsequently formed layers in the reading detector and the first and second guide layers and high polarization do not reproduce a curvature to the intermediate writing space of the writing head. If desired, however, the layer defining a reading track width can be removed by total combustion in the presence of oxygen (02) within a chamber. The present invention provides a combined writing and reading head wherein the read head is flattened to show the curvature of the writing head writing space. The present invention also provides a reading head in where the adjoining joints are respectively made between the first and second guide and high polarization layers and the first and second side edges of a reading detector wherein the first and second guide and high polarization layers do not overlap the first and second portions of surface adjacent to the first and second side edges of the reading detector. The present invention also provides a read and write head wherein each of the first and second guide and high polarization layers make a continuous abutting connection with the first and second precisely located side edges of the reading detector. The present invention also provides a method of making a magnetic reading and writing head wherein a two-layer photoresist masking is employed to define a layer defining a reading track width that, in turn, is used to define the reading track width of a reading detector. The present invention also provides a method of making a magnetic read and write head that substantially removes any portion of the first and second guide and high polarization layers that cover a top surface of the read detector, implements the complete adjoining coupling of the first ones. and second guide and high polarization layers with the first and second side edges of the reading detector and flattens the reading head so that no curvature is reproduced in the layer with intermediate writing space of the writing head. BRIEF DESCRIPTION OF THE FIGURES Now, the preferred embodiments of the present invention will be described, by way of example, with reference only to the accompanying drawings, wherein: Figure 1 is an example plan view of a magnetic disk unit; Figure 2 is an end view of a cursor with a magnetic head of the disk drive as seen in the plane 2-2; Figure 3 is an elevation view of the magnetic disk unit where the multiple disks and the magnetic heads are used; Figure 4 is an isometric illustration of an example of the suspension system for supporting the cursor and the magnetic head; Figure 5 is a view of the ABS of the magnetic head taken along the plane 5-5 of Fig. 2; Figure 6 is a partial view of the cursor and the magnetic head of the prior art as seen in the plane 6-6 of Fig. 2; Figure 7 is a partial ABS view of the cursor taken along the plane 7-7 of Fig. 6 to show the reading and writing elements of the magnetic head of the prior art; Figure 8 is a view taken along the plane 8-8 of Fig. 6 with the insulation stack removed; Figures 9A and 9B are block diagrams of various methods for depositing and grinding the layers within a chamber; Figure 10 is a side elevational view of a photoresist bilayer in a layer of reading sensing material; Figure 11 is the same as Fig. 10 except that ion grinding has been implemented to remove the reading detector material layer except a reading detector under the photoresist bilayer; "Fig. 12 is the same as Fig. 11 except that the first and second guide and high-polarization layers have been formed; Fig. 13 is the same as Fig. 12 except that a second layer with intermediate space has been formed, second protective layer / first layer of polar piece, a layer with intermediate reading space, a second pole tip layer and a coating layer in the reading detector and in the first and second guide layers and high polarization; Figure 14 is a side elevation view of a first step in the present method for making a readhead; Figure 15 is the same as Fig. 14 except that a layer of carbon material defining a reading track width has been formed in the layer of reading sensing material; Figure 16 is the same as Fig. 15 except that a photoresist bilayer has been formed in the layer defining the material track width; Figure 17 is the same as Fig. 16 except that reactive ion chemical attack (RIE) has been implemented to remove the entire material layer defining the track width except a portion of the material layer that defines the track width (layer defining the track width) under "the photoresist bilayer;" Figure 17 is the same as FIG. 16 except that grinding of the ion has been employed for the removal of the reading detector material layer except for one layer reading detector directly below the layer defining the track width, Figure 19 is the same as Fig. 18 except that the first and second guide and high polarization layers have been formed, Figure 20 is the same as Fig. 19 except that the photoresist bilayer has been removed; Figure 21 is the same as Fig. 20 except that the writing head and additional layers of the read head are shown; Figure 22 is a side view of the first and second high polarization guide layers connected to the first and second side edges of the reading sensing layer which is the same as that shown in Fig. 20; Figure 23 is the same as Fig. 22 except that the layer defining the track width has been removed; Figure 24 is the same as Fig. 23 except that the second layer with intermediate space has been formed, the second protective layer / first layer of pole piece, the layer with intermediate writing space, the second pole tip layer and a coating layer; -Figure 25 is the same as Fig. 17 except that silicon (Si) or silicon dioxide (Si02) is used for the layer defining the track width and RÍE is employed with a fluorine base as a removal process; and Figure 26 is the same as Figure 17 except that grinding of the ion is used to define the first and second side edges of the reading sensing layer.

DETAILED DESCRIPTION OF THE PREFERRED MODALITIES OF THE INVENTION Referring now to the drawings, wherein the reference numerals designate like or similar parts throughout the different views illustrated in Figures 1-3, there is a magnetic disk unit 30. The unit 30 includes a spindle 32 which supports and rotates a magnetic disk 34. The spindle 32 is rotated by means of an engine 36 which is controlled by a motor controller 38. A combined magnetic reading and writing head 40 is mounted on a slider 42 which is supported by a suspension arm 44 and an actuator 46. A plurality of discs, sliders and suspension arms can be employed in a larger capacity direct access storage device (DASD) as shown in Fig. 3. Suspension arm 44 and the actuator 46 positions the cursor 42 so that the magnetic head 40 is in a transduction relationship with a surface of the magnetic disk 34. When the disk 34 is rotated by the motor 36, the cursor is supported in a thin air pad (typically .05 μm) (air support) between the surface of the disk 34 and the air support surface (ABS) 48. The magnetic head 40 can then be used to write the information in the circular channels multiple on the surface of the disk 34, as well as to read the information therefrom. The processing circuit 50 which exchanges the signals, representing such information, with the head 40, provides the driving signals of the motor for rotating the magnetic disk 34, and provides the control signals for moving the cursor to several channels. In Figure 4 the slider 42 is shown mounted on the suspension arm 44. The components described above can be mounted on a frame 54 of a housing 55., as shown in Figure 3. Figure 5 is a view of the ABS of the cursor 42 and the magnetic head 40. The cursor has a central bar 56 _ which supports the magnetic head 40, and the side bars 58 and 60. The bars 56, 58 and 60 extend from a crossbar 62. With respect to the rotation of the magnetic disk 34, the crossbar 62 is on a guide edge 64 of the slider and the magnetic head 40 is on a coupling edge 66 of the slider .

United Magnetic Head Figure 6 is a side cross-sectional elevational view of the attached MR or pivot valve head 40 having a writing head portion 70 and a read head portion 72, the read head portion employing a MR or turn-valve detector 74. Figure 7 is a view of the ABS of Figure 6. The detector 74 is located between the first and second layers with intermediate space 76 and 78 and the layers with intermediate space are located between the first and second protective layers 80 and 82. In response to external magnetic fields, the resistance of detector 74 changes. A sensitive current is directed through the detector that causes these resistance changes to manifest as potential changes. Then, these potential changes are processed as the continuous reading signals by the process circuit 50 shown in Fig. 3. The writing head portion of the attached head includes a rolled layer 84 located between the first and second insulation layers. 86 and 88. A third layer of insulation 90 can be used to flatten the head to eliminate the folds in the second insulation layer caused by the rolled layer 84. The first, second and third layers of insulation are referred to in the art as a " insulation stack ". The rolled layer 84 and the first, second and third insulating layers 86, 88 and 90 are located between the first and second pole piece layers 92 and 94. The first and second pole piece layers 92 and 94 are magnetically coupled to one another. opposite opening 96 and have the first and second pole tips 98 and 100 that are separated by a layer with intermediate reading space 102 in the ABS. As shown in Figures 2 and 4, the first and second connections 104 and 106 connect the detector guides 74 to the guides 112 and 114 in the suspension arm 44 and the third and fourth connections 116 and 118 connect the guides 120 and 122 of the roll 84 (see Fig. 8) to the guides 124 and 126 on the suspension arm. It should be noted that the attached head 50 employs a single layer 82/92 to serve a dual function as a second protective layer for the reading head and as a first polar part for the writing head. The head in tow employs two separate layers for these functions. After placing a disc substrate in a chamber 150, as shown in Figure 9, various deposition processes 152 and various subtractive processes 154 can be employed carrying out the present invention. The deposition processes may include electronic deposition 156, electronic magnetron deposition 158 or electronic deposition of ion beam 160. Subtractive process 154 may include chemical etching 162, etching of reactive ion (RIE) 164, the grinding of the ion beam 166 or the grinding of the reactive ion beam 168. The electronic deposition 156 may include providing the argon gas (Ar) and a target material to be deposited in the chamber 170, providing the radio frequency (rf ) or direct current polarization (cd) between the target material and the disk substrate 172 and the electronic deposition of the target material to deposit the target material on the disk substrate 174. The electronic deposition of the magnetron 158"may include providing a target material to be deposited in the chamber between a magnetron and the disk substrate 176 allow the electronic deposition of the target material in the magnetron field for depositing the target material on the disk substrate 178. The electronic deposition of the ion beam 160 may include providing an inert gas, such as argon (Ar), krypton (Kr) or xenon '(Xe). ), and a target material to be deposited in the chamber 180 and allowing the electronic deposition of the ion beam of the target material to deposit the target material on the disk substrate 182. The etching 162 of the electronic deposition may include providing the gas argon (Ar) in chamber 184, applying the polarization of rf or cd to the disk substrate 186 and allowing chemical attack of the electronic deposition to the disk substrate 188. The chemical attack of the reactive ion 164 includes putting the argon gas (Ar) and reactive gases in the chamber 189, applying a polarization of cd or rf to disk substrate 190 and allowing chemical attack of reactive ion to disk substrate 192. Grinding of ion beam 166 includes grounding disk substrate 193 and allowing grinding of the beam of ion to disc substrate 194. Grinding of reactive ion beam 168 may include placing an inert gas, such as argon (Ar) or helium (He), and reactive gases in an ion beam gun 196, grounded with the disc substrate 197 and allowing the reactive ion beam to grind the disc substrate 198. The chambers are placed under various preselected pressures to carry out the aforementioned processes. The total film deposition is performed without a masking, however, when the features are formed, a masking is provided with openings where the features are formed. A masking is also employed to cover the areas to be retained when the subtractive processes 154. are employed. Figures 10-13 illustrate a prior art process for making the adjoining joints between the first and second guide and high-polarization layers and the first Y. second side edges of a reading detector, respectively. In Figure 10 a layer of reading detector material 220 can be formed in a first layer with electrically insulating, non-conductive intermediate space (Gl) 222 by means of stools 156, 158 or 160 in Figure 9A. A photoresist bilayer 224 is then formed in the layer of reading detector material 220 having the first and second layer portions 226 and 228. The first layer portion 226 has a width that is smaller than the second layer portion 228 to provide the photo-resistant bilayer with the first and second undercuts. This photoresist bilayer can be formed by forming the first and second layer portions 226 and 228, exposing the second layer portion to light and revealing the second layer 228 with a developer that also chemically attacks the first layer 226. The second layer portion 228 it has the first and second side edges 230 and 233 that define a desired track width of a subsequently formed reading detector. In Figure 11 the disc substrate is subjected to the grinding of the ion beam (166 in Fig. 9B) as the disc substrate rotates, which removes the entire layer of detector material except the read detector 232 between the first and second side edges 234 and 236. When a head is located near the outer perimeter of the disc substrate, the side edges 234 and 236 are significantly asymmetric. This is due to an angle of incidence?, With respect to a normal one, to the surface of the reading detector and to the divergence of the beam from a source on the center of the disk substrate. The result is that the second side edge 234 is ground with a large taper device while the first side edge 236 is defined only with a small taper device. The problem is not so bad for the heads near the center of the disk. In Figure 12 the first and second guide and high polarization layers 238 and 240 are formed by the depositions 156, 158 or 160 in Figure 9A where each high polarization guide layer has a side edge that is formed adjacent to a respective lateral edge of the reading detector. As shown, unfortunately, the full thickness of the second high polarization guide layer 238 does not make full contact adjacent the second side edge 234 of the reading detector due to a slit or depression of each of the guide and high layers. polarization (HB) 238. This is also due to the angle of incidence? and to the divergence of the beam, which is worse for the heads near the outer perimeter of the disc substrate. This reduced abutting contact can seriously degrade the agneostatic coupling between the high polarization layer and the read detector which can, in turn, affect the magnetic stabilization of the magnetic domains of the reading detector and render the read head inoperative. In Figure 13 the photoresist bilayer has been removed and a second layer with intermediate space 242, a second protective layer / first layer of pole piece 244, a layer with intermediate writing space 246, a second layer of pole tip have been formed. 248 and a coating layer 250 by any of the stools 156, 158 or 160 in Figure 9A. Due to the higher profile of the high polarization and guide layers 238 and 240 relative to the reading detector 232, the second intermediate layer 242, the second protective layer / first polar part layer 244 and the intermediate space writing 246 produces a depression which results in the curvature of the intermediate writing space of the intermediate writing layer 246. This is undesirable since the read head reads the curved magnetic impressions on a rotating magnetic disk which degrades the reading of the signal done. It should also be noted that the first and second guide and high polarization layers overlap the first and second surface portions of the reading detector adjacent to the first and second side edges 234 and 236. If the high polarization layer overlaps these portions', it will result in an exchange coupling that can degrade the magnetic performance of the reading detector layer. The overlap can also change the track width of the read detector. Still another problem is that the lateral edges 234 and 236 of the reading detector are directly under the side edges 230 and 233 of the second layer of the photoresist bilayer. This produces a read detector with an unstable track width.

The Invention Figures 14-21 illustrate various steps of the present method for making the reading head. In Figure 14 a first ferromagnetic protective layer (SI) 300 is formed on the disc substrate (not shown), a first non-magnetic electrically insulating protective layer (Gl) 302 is formed on the first protective layer and a layer of detector material 304 is formed in the first layer with intermediate space 302 by any of the stools 156, 158 or 160 in Figure 9A. The reading detector material layer 304 may comprise multiple layers such as a fixed antiferromagnetic layer, a fixed ferromagnetic layer, an electrically conductive spacer layer, a ferromagnetic free layer and a coating layer, wherein the layers constitute a rotary valve detector. The ferromagnetic fixed layer may be a fixed antiparallel (AP) layer as described in U.S. Patent 5,018,037, which is incorporated herein by reference, or a fixed layer consisting of a single thin film. The layers may differ depending on the different types used of rotary valve detectors or anisotropic magnetoresistive detectors (AMR). In Figure 15 a track width 306 is formed defining the layer of carbon material in the layer of reading sensing material 304. The layer defining the track width of material has a predetermined thickness which will be described in detail below. . In Figure 16 a photoresist bilayer 303 is formed in the layer defining the track width of material 306 which is equal to the photoresist bilayer 224 shown in Figure 10. In Figure 17 a chemical attack of the reactive ion (RIE) with an oxygen base (02), as shown in no. 164 of Figure 9B, is used in a chamber (not shown) to remove the entire layer defining the material track width except a layer defining the track width 310 below the photoresist bilayer 308. The camera may contain 20% of oxygen (02) and 80% of argon (Ar) with a pressure of 5 millitorr. A rf polarization of 150 watts can be applied to the disc substrate. It has been found that the first and second side edges 312 and 314 of the layer portion defining track width 310 substantially align with the first and second side edges 316 and 318 of the photoresist bilayer. This is because the RIE process is selective by a ratio of 4 to 1 for the layer defining the width of the material track with respect to the materials of the reading detector material layer 304 and the photoresist bilayer 308. Consequently, the layer of material defining the reading track width is quickly eliminated, except layer 310 that defines the reading track width, without any substantial elimination of the reading detector material layer 304 or the photoresist bilayer 308. In the Figure 18, the grinding of the ion beam, as shown in no. 166 of Figure 9B, is employed to remove the entire layer of reading sensing material except a reading sensing layer 320 directly below the layer defining a reading track width 310. This milling is selective at a ratio of 4 to the reading detector material layer 304 (Figure 17) with respect to the carbon of the layer defining a track width 310. It should be noted from Figure 17 that the first and second side edges 312 and 314 of the layer defining a Reading track widths are immediately adjacent to the reading detector material layer 304 so that the first and second side edges 322 and 324 of the reading detector in Figure 18 are precisely located and defined with less asymmetry between the two edges 322 and 324 for the heads located closer to the outer perimeter of the disk substrate. In Figure 19 the first and second guide and high polarization layers 326 and 328 are formed with side edges that make the complete coupling abutting the respective side edges 322 and 324 of the reading detector and with the first and second side edges 312 and 314 of the layer that defines a reading track width. In Figure 20 the photoresist bilayer 308 is removed leaving the top surfaces 326 and 328 of the first and second guide layers of high polarization, substantially flat with the upper surface 334 of the reading detector. To achieve this, the thickness of the layer portion defining the track width 310 should be substantially the difference between the thickness of the guide and high-polarization layers 330 and 332 and the thickness of the reading detector 320. This thickness is preferably of 100-500 ° and, more preferably, of about 200 ° of thickness. The thickness of the first and second guide and high-polarization layers 326 and 328 are usually thicker than the thickness of the read detector 320 so that when the thickness of the reading detector 320 is subtracted from the thickness of one of the guide layers and of high polarization, the result is the desired thickness of the layer defining a reading track width 310. It should be noted that each of the first and second guide and high polarization layers has a light lift or "bird's beak" 336 and 338. It has been found that this height is less than 100 °, and does not affect the uniformity of the reading head. In Figure 21 the complete read head is shown with a second layer with electrically insulating non-magnetic intermediate space (G2) 340 in the reading detector 310 and the first and second guide and high polarization layers 326 and 328 are formed, a second protective layer / first layer of polar part (S2 / P1) 342 in the second layer with intermediate space 340, a layer with intermediate writing space 344 in the second protective layer / first layer of pole piece 342, a second layer of tip pole 346 in the layer with intermediate writing space 344 and a coating layer 348 in the second pole tip layer 346 by any of the depositions 156, 158 or 160 in Figure 9A. It can be seen that with this method of construction there is substantially no curvature of the intermediate writing space of the intermediate writing space 344 since the read head is flattened at the level of the first and second guide layers and high polarization by the layer defining a reading track width 310. Additionally, it should be noted that the first and second guide and high polarization layers 326 and 328 do not overlap any portion of the upper surface 334 of the reading detector adjacent to its first and second side edges. 312 and 314. Accordingly, the magnetic properties of the read detector 310 are preserved as well as the desired track width. Figures 22-24 illustrate various stages of an alternative construction of the present reader head. Figure 22 is the same as Figure 20. If desired, the layer portion defining track width 310 in Figure 22 can be eliminated in Fig. 23 by any convenient process such as total combustion that is carried out by the presence of oxygen (02) in a chamber. This removal may be desired if carbon material is not desired in the ABS or if the carbon has a coefficient of expansion substantially different than that of the other layers in the head which may force the detector to read or make protuberances in other layers. in ABS under high heat conditions. After forming the second intermediate space layer (G2) 350, the second protective layer / first pole piece (S2 / P1) 352 and the layer with intermediate writing space 354, it can be seen that the layer with intermediate writing space 354 has the curvature under the second pole tip layer 356. Accordingly, the preferred embodiment is the method shown in Figures 14-20 and the embodiment shown in Figures 21 since the curvature of the intermediate writing space has been eliminated. However, the embodiment shown in Figures 22-24 has an advantage over the read head made by the process of Figures 10-13, since the read head in Figure 24 does not have an overlap of the first and second guide layers and high polarization in the upper surface portions of the detector read 320. Figures 25 and 26 illustrate the steps alternate to the stages shown in Figures 17 and 18. In Figure 25 a silicon (Si) or silicon dioxide (Si02) material is employed by the layer portion that defines the reading track width 360 instead of the carbon as shown in Figure 17. The chamber can contain 20% freon (CF4) and 80% helium (He) under a pressure of 5 millitorr. A rf polarization of 150 watts can be applied to the disc substrate. In this case, the entire layer of material defining a reading track width is eliminated by the chemical attack of reactive ion (RIE) with a fluorine base, such as freon (CF6), which is selective by a ratio of 5 to 1 for silicon (Si) or silicon dioxide (Si02) with respect to the reading detector material layer 304 and the photoresist bilayer 308. In Figure 26 the grinding of the ion beam is used to define the first and second side edges 322 and 324 of the read detector 320. The ratio of the grinding of the ion beam of the reading detector material layer with respect to the layer defining a reading track width 360 and the photoresist layer 308 is about 1/1. Clearly, other embodiments and modifications of this invention will rapidly occur to those skilled in the art in view of these teachings. Accordingly, this invention will be limited only by the following claims, which include all modalities and modifications when viewed in conjunction with the above specification and the accompanying drawings.

Claims (11)

1. CLAIMS 1. A method for producing a magnetic head having an air support surface (ABS) and a reading head with a track width, characterized in that it comprises: depositing a non-magnetic, electrically insulating intermediate space; depositing a layer of reading detector material in the first layer with intermediate space; depositing a layer of material defining a reading track width in the reading detector material layer; forming a photoresist bilayer masking in the material layer defining a reading track width that masks the layer portion defining the reading track width of the layer defining the material track width; first, selectively removing the layer of material defining a reading track width relative to the photoresist masking and the reading detector material layer to form the layer of material defining a reading track width with the first and second side exposed edges that they are independently spaced at a distance equal to the track width; second, selectively removing the reading detector material layer relative to the photoresist masking and the layer portion defining the reading track width to form the reading sensing layer portion with the first and second side exposed edges defining the width of the reading sensing layer. track; depositing the high polarization guide material layers in the photoresist masking in contact with the first and second side edges of each portion of the reading sensing layer and the layer portion defining the width of the reading track; and eliminating the photoresist masking, whereby a portion of the high polarization guide material layer is lifted leaving the first and second guide and high-bias layers connected to the first and second side edges of each portion of the reading sensing layer and of the layer portion defining the reading track width (310).
2. 2. A method according to claim 1, characterized in that: the layer portion defining the reading track width (310) is carbon; the first selective elimination is a reactive ion attack with an oxygen base (02); and the second selective elimination is the ion grinding.
3. 3. A method according to claim 1, characterized in that: the portion defining the reading track width is silicon (Si) or silicon dioxide (Si02); the first selective elimination is a chemical attack of reactive ion with a chlorine base; and the second selective elimination in the ionic rectification.
4. 4. A method according to claim 1, 2 or 3, characterized in that it comprises: first forming the first layer with intermediate space (302) forming a first ferromagnetic protective layer and this formation of the first layer with intermediate space forms the first layer with intermediate space in the first protective layer; forming a second layer with non-magnetic electrically insulating intermediate space in the layer portion defining the width of the reading track and the first and second guide layers and high polarization; and forming a second ferromagnetic protective layer in the second layer with intermediate space.
5. 5. A method according to any of the preceding claims, characterized in that it comprises: after elimination of the photoresist masking, remove the layer portion defining the reading track width.
6. A method according to any of the preceding claims, characterized in that the deposition of the layer portion defining the width of the reading track forms the layer of material defining a reading track width with a thickness that is the difference between a thickness of the guide and high polarization layers and the reading detector layer portion.
7. A method according to claim 6, characterized in that the magnetic head additionally includes a read head, the method is characterized in that it comprises: • using the second protective layer as a first layer of polar part for the reading head; forming a layer with non-magnetic, electrically conductive reading intermediate space in the first pole piece layer that forms a portion of the ABS; forming an insulation stack with at least one rolled layer included therein in the first pole piece layer; and forming a second layer of polar piece on the layer with intermediate writing space in the ABS, on the isolation stack in a yoke region and connected to the € 40 first layer of pole piece in an opposite region with intermediate space that is hollow from the insulation stack in a direction away from the ABS.
8. 8. A method in accordance with the claim 7, characterized in that the layer portion defining the width of the reading track is 100-500 ° thick.
9. 9. A method in accordance with the claim 8, characterized in that the layer defining a reading track width is 200 ° thick. 10
10. 10. A method in accordance with the claim 9, characterized in that the first layer with intermediate space is carbon.
11. 11. A method according to any of claims 1 to 10, characterized in that the layer of 15 • material that defines a reading track width is electrically insulating and non-magnetic.