MXPA99007895A - PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON&agr;-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES - Google Patents

Abstract

This invention relates to&agr;-ammonium ketones, iminium ketones or amidinium ketones in the form of their tetraaryl- or triarylalkylborate salts which can be photochemically converted into amines, imines or amidines as well as to a process for their preparation. This invention also relates to base-polymerisable or cross-linkable compositions comprising these&agr;-ammonium ketones, iminium ketones or amidinium ketones in the form of their tetra- or triarylalkylborate salts, to a process for carrying out photochemically induced, base-catalysed reactions as well as to their use as photoinitiators for base-catalysed reactions.

Description

BASES CONTAINING PHOTOACTIVE NITROGEN, BASED ON CETONAS-AMMONIUM, CETONAS IMINION OR AMIDINIO CETONAS AND ARIL BORATOS The present invention relates to a-ammonium ketones, iminium ketones or amidinium ketones in the form of their salts tetraaril- or triarilaquilboratos that can be photochemically converted in amines, imines or amidines, as well as a procedure for their preparation. This invention also relates to crosslinkable or polymerizable base compositions, which comprise these α-ammonium ketones, iminium ketones or amidinium ketones in the form of their tetra- or triarylalkyl borate salts, to a process for carrying out photochemically induced, base-catalyzed reactions , as well as its use as photoinitiators for base catalyzed reactions. The photolytic breakdown of specific a-amino ketones into radicals and their photopolymerization of olefinically unsaturated monomers or oligomers has been known for a long time, and is described, for example, in EP-A-284,561. In addition to radically polymerizable oligomers or monomers, base catalysable systems have been described in particular for photolithographic processes. These systems require a photoinitiator that releases a base upon exposure to light, D. R. MacKean et al., Polym. Mater. Sci. Eng. (1992), 66, 237-238, for example, reports the photo-structured polyimide using specific carbamates as photoinitiators. In J. of Polymer Science: Polym. Chem. Ed., Vol. 12, 2943-2951 (1974), Ko et al. Report BF4 ~ salts containing α-ammonium ketones which, upon exposure to light, decompose into radicals with a-rupture, but which do not form any free amine and are therefore inadequate as latent bases. J. Chem. Soc. (C), 1971, 1863-1869 discloses bromine salts of α-ammonium ketones which upon exposure to light result in protonated amines and which are therefore inadequate as latent bases. In Chem. Mater. 1996, 8, 1360-1362, Neckers et al., Recently reported novel systems for photostructures based on polymeric ammonium phenylborates containing mobile benzophenone groups in the polymer structure. Surprisingly, it has now been found that certain α-ammonium ketones, iminium ketones or amidinium ketones in the form of their tetraaryl- or triarylalkyl borate salts, release an amine, imine or amidine group upon exposure to visible light or UV light. These groups are sufficiently basic to initiate a large number of base catalysable reactions, in particular polymerization reactions. These compounds are highly sensitive and through the selection of the substitution pattern, the absorption spectrum can be varied over a wide range. These compounds make it possible to prepare so-called one-pot systems with base-catalysable oligomers or monomers having an extremely long shelf life. A polymerization reaction, for example, starts only after exposure to light. The systems can be formulated with little or no solvent, since the compounds can be dissolved in the monomers or oligomers, without being affected. The active catalyst is formed only after exposure to light. These systems can be used for numerous purposes such as for finishes, coatings, molding compounds or photolithographic reproductions. This invention provides compounds of the formula (I) where m is 1 or 2 and corresponds to the number of positive charges of the cation; x is phenyl, naphthyl, phenanthryl, anthracyl, pyrenyl, ,6,7,8-tetrahydro-2-naphthyl, 5,6,7,8-tetrahydro-1-naphthyl, thienyl, benzo [b] thienyl, naphtho [2,3-b] thienyl, thiarenyl, dibenzofuryl, chromenyl, xanthenyl, thioxanthyl, phenoxyntinyl, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolizinyl, isoindolyl, indolyl, indazolyl, purinyl, quinolizinyl, isoquinolyl, quinolyl, phthalazinyl, naftriridinyl, quinoxalinyl, quinazolinyl, cinolinyl, pteridinyl, carbazolyl, β-carbolinyl, phenanthridinyl, acridinyl, perimidinyl, phenanthrolinyl, phenazinyl, isothiazolyl, phenothiazinyl, isoxazolyl, furazanyl, terphenyl, stilbenyl, fluorenyl or phenoxazinyl, these radicals are unsubstituted or mono - or polysubstituted by alkyl with 1 to 18 carbon atoms, alkenyl with 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, NR6R7, N3, OH, CN, OR8, C (0) R9, C (O) OR10 or halogen, or Rx is a radical of formula A or B (B); R2 * R3 and R each independently are hydrogen, alkyl with 1 to 18 carbon atoms, alkenyl with 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, or phenyl, or R2 and R3 and / or R4 and R3 each forms independently of the other, an alkylene bridge with haloalkyl having 2 to 12 carbon atoms; or R2, R3, R4 together with the linking nitrogen atom are a phosphazene base of the P17 P2 < t / 4 > or a group of the structural formula (a), (b), (c), (d), (e), (f) or (g) where k e 1 each independently of the other is a number of 2 to 12; R5, R6, R7, R8, R9 and? O are hydrogen or alkyl having 1 to 18 carbon atoms; or Rs and R? together with the linking carbon atoms are a benzocyclopentanone radical; Rn is alkyl with 1 to 18 carbon atoms, alkenyl with 2 to 18 carbon atoms, alkynyl with 2 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, NR6R7, N3, OH, CN, OR8, C (0) R9, C (O) OR10 or halogen; and n is 0 or 1, 2 or 3; R12, Ri3 and Ri4 are phenyl or other aromatic hydrocarbon, these radicals are unsubstituted or mono- or polysubstituted by alkyl having 1 to 18 carbon atoms, alkenyl with 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, NR6R7, N3, OH, CN, OR8, C (0) R9, C (O) OR10 or halogen; R1S is alkyl having 1 to 18 carbon atoms, phenyl or other aromatic hydrocarbon, the phenyl and aromatic hydrocarbon radicals are unsubstituted or mono- or polysubstituted by alkyl having 1 to 18 carbon atoms, alkenyl having 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, NR6R7, N3, OH, CN, 0R8, C (0) R9; C (O) OR10 or halogen, or R ?? is a radical .R - X-B; 12 * 3; and X is alkylene with 1 to 20 carbon atoms, alkylene 2 to carbon atoms, which is interrupted by -O-, -S- or NR8 or X is The absorption maximum can be varied within a wide range through the selection of the aromatic or heteroaromatic Rx and the respective borate anion and in this way the photosensitivity of the compounds can be shifted from the UV region to that of daylight. Alkyl in the various radicals having up to 18 carbon atoms, is a branched or unbranched radical such as methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, 2-ethyl-butyl, n-pentyl, isopentyl, 1-methylpentyl, 1,3-dimethylbutyl, n-hexyl, 1-methylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1-methylheptyl, 3-methylheptyl, n- octyl, 2-ethylhexyl, 1, 1,3-trimethyl-ilhexyl, 1,1,3,3-tetramethylpentyl, nonyl, decyl, undecyl, 1-methylundecyl, dodecyl, 1, 3, 3, 5, 5-hexamethylhexyl , tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl. Preference is given to alkyl having 1 to 12, especially 1 to 6, carbon atoms. Alkenyl having 3 to 18 carbon atoms is a branched or unbranched radical such as propenyl, 2-butenyl, 3-butenyl, isobutenyl, n-2, 4-pentadienyl, 3-methyl-2-butenyl, n-2 octenyl, n-2-dodecinyl, iso-dodecenyl, oleyl, n-2-octadecenyl or n-4-octadecenyl. Preference is given to alkenyl having 3 to 12, especially 3 to 6, carbon atoms. Alkynyl having 3 to 18 carbon atoms is a branched or unbranched radical such as propynyl (-CH2-C = CH), 2-butynyl, 3-butynyl, n-2-octynyl, or n-2-octadecynyl. Preference is given to alkynyl having 3 to 12, especially 3 to 6, carbon atoms. The alkylene bridge with 2 to 12 carbon atoms is ethylene, propylene, butylene, pentylene, hexylene, heptylene, octylene, nonylene, decylene, undecylene or dodecylene. Halogen is fluorine, chlorine, bromine or iodine. Typical examples of alkyl halo with 1 to 18 carbon atoms comprise total or partially halogenated alkyl. An illustrative example is the positional isomers of mono- to deca-fluoropentyl, mono- to octafluorobutyl, mono- to hexafluoropropyl, mono- to tetrafluoroethyl and mono- a difluoromethyl and also the corresponding chlorine, bromine and iodine compounds. Preference is given to perfluorinated alkyl radicals. Examples of these are perfluoropentyl, perfluorobutyl, perfluoropropyl, perfluoroethyl and in particular trifluoromethyl. Example of the group NR8R9 amino are the respective monoalkyl or dialkylamino groups such as methylamino, ethylamino, propylamino, butylamino, pentylamino, hexylamino, octadecylamino, dimethylamino, diethylamino, dipropylamino, diisopropylamino, di-n-butylamino, di-isobutylamino, dipentylamino, dihexylamino or dioctadecylamine. Additional dialkylamino groups are those in which the two radicals independently are branched or unbranched, for example, methylethylamino, methyl-n-propylamino, methylisopropylamino, methyl-n-butylamino, methylisobutylamino, ethylisopropylamino, ethyl-n-butylamino, ethylisobutylamino , ethyl-tert-butylamino, isopropyl-n-butylamino or isopropylisobutylamino. The OR10 alkoxy group having up to 18 carbon atoms is a branched or unbranched radical such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, isobutoxy, pentoxy, isopentoxy, hexoxy, heptoxy, octoxy, decyloxy, tetradecyloxy, hexadecyloxy or octadecyloxy. Preference is given to alkoxy having 1 to 12, especially 1 to 8, for example 1 to 6 carbon atoms. Examples of the thioalkyl group SR10 are thiomethyl, thioethyl, thiopropyl, thiobutyl, thiopentyl, thiohexyl, thioheptyl, thiocotyl or thiooctadecyl, it being possible for the alkyl radicals to be linear or branched. Aromatic hydrocarbons such as may be present in the novel compounds (R13, Ri4 or R15) may contain, for example, one or more, preferably 1 or 2, hetero atoms. Suitable hetero atoms for example are N, O, P or S, preferably N or O. Typical examples of aromatic hydrocarbons are: phenyl, α- and β-naphthyl, stilbenyl, biphenyl, o-, m-, p-terphenyl, tri-phenylphenyl, binaphthyl, anthracyl, phenanthryl, pyrenyl, furan-2-yl or furan-3-thiophen-2-yl or thiophen-3-yl, pyridin-2-yl, pyridin-3-yl or pyridin-4- ilo, quinolyl or isoquinolyl. . Examples of R? they are phenyl, naphthyl, phenanthryl, anthracyl, pyrenyl, 5, 6, 7, 8-tetrahydro-2-naphthyl, 5,6,7,8-tetrahydro-1-naphthyl, thienyl, benzo [b] thienyl, naphtho [2 , 3-b] thienyl, thiarenyl, dibenzofuryl, chromenyl, xanthenyl, phenoxyntinyl, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolizinyl, isoindolyl, indolyl, indazolyl, purinyl, quinolizinyl, isoquinolyl, quinolyl, phthalazinyl, naphidinyl, quinoxalinyl, quinazolinyl, cimolinyl, pteridinyl, carbazolyl, β-carbolinyl, phenanedrinyl, acridinyl, perimidinyl, phenanthrolinyl, phenazinyl, isothiazolyl, phenotriazinyl, isoxazolyl, furazanyl, biphenyl, sty-benyl, terphenyl, fluorenyl, phenoxazinyl, methoxyphenyl, 2-4 dimethoxyphenyl, 2,4,6-trimethoxyphenyl, bromophenyl, tolyl, xylyl, mesityl, nitrophenyl, dimethylaminophenyl, diethylaminophenyl, aminophenyl, diaminophenyl, 1-naphthyl, 2-naphthyl, 1-phenylamino-4-naphthyl, 1-methylnaphthyl, 2- methylnaphthyl, l-methoxy-2-naphthyl, 2-methoxy-l-naf lime, 1-dimethylamino-2-naphthyl, 1,2-dimethyl-4-naphthyl, 1,2-dimethyl-6-naphthyl, 1,2-dimethyl-7-naphthyl, 1,3-dimethyl-6-naphthyl, 1, 4-dimethyl-6-naphthyl, 1,5-dimethyl-2-naphthyl, 1,6-dimethyl-2-naphthyl, 1-hydroxy-2-naphthyl, 1-hydroxy-1-naphthyl, 1,4- dihydroxy-2-naphthyl, 7-phenanthryl, 1-anthryl, 2-anthryl, 9-anthryl, 3-benzo [b] thienyl, 5-benzo [b] thienyl, 2-benzo [b] thienyl, 4-dibenzofuryl, 4,7-dibenzofuryl, 4-methyl-7-dibenzofuryl, 2-xanthenyl, 8-methyl-2-xanthenyl, 3-xanthenyl, 2-phenoxathiinyl, 2,7-phenoxathiinyl, 2-pyrrolyl, 3-pyrrolyl, 5- methyl-3-pyrrolyl, 2-imidazolyl, 4-imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2-ethyl-4-imidazolyl, 2-ethyl-5-imidazolyl, 3-pyrazolyl, 1-methyl- 3-pyrazolyl, l-propyl-4-pyrazolyl, 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-l-isoindolyl, l-methyl-2-indolyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indolyl, l-methyl-3-indazolyl, 2,7-dimethyl-8 nyl, 2-methoxy-7-methyl-8-nyl, 2-quinolizinyl, 3-isoquinolyl, 6-isoquinolyl, 7-isoquinolyl, isoquinolyl, 3-methoxy-6-isoquinolyl, 2-quinolyl, 6-quinolyl, -quinolyl, 2-methoxy-3-quinolyl, 2-methoxy-6-quinolyl, 6-phthalazinyl, 7-phthalazinyl, 1-methoxy-6-phthalazinyl, 1,4-dimethoxy-6-phthalazinyl, 1,8-naph riridin-2-yl, 2-quinoxalinyl, 6-quinoxalinyl, 2,3-dimethyl-6-quinoxalinyl, 2,3-dimethoxy-6-quinoxalinyl, 2-quinazolinyl, 7-quinazolinyl, 2-dimethylamino-6 -quinazolinyl, 3-cinolinyl, 6-cinolinyl, 7-cinolinyl, 3-methoxy-7-cinolinyl, 2-pteridinyl, 6-pteridinyl, 7-pteridinyl, 6,7-dimethoxy-2-pteridinyl, 2-carbazolyl, 3-carbazolyl, 9-methyl-2-carbazolyl, 9-methyl-3-carbazolyl, β-carbolin-3-yl, l-methyl-β-carbolin-3-yl, methyl-β-carbolin-6-yl, 3-phenanthridinyl, 2-acridinyl, 3-acridinyl, 2-perimidinyl, l-methyl-5-perimidinyl, -phenanthrolinyl, 6-phenanthroline, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5-isothiazolyl, 2-phenothiazinyl, 3-phenothiazinyl, 10-methyl-3-phenothiazinyl, 3-isoxazolyl, 4-isoxazolyl , 5-isoxazolyl, 4-methyl-3-furazanyl, 2-phenoxazinyl or 10-methyl-2-phenoxazinyl.

Where R1 and R5 together with the linking carbon atoms form a benzocyclopentanone radical, this means structures as follows Typical examples of phosphazene bases of the type Px, P2 or P < t / 4 > They are wherein the phosphazene bases can be linked by imine nitrogen, as well as by one of the tertiary nitrogen atoms to the CH2 group of the ketone. The phosphazene phases are preferably linked by one of the tertiary nitrogen atoms to the CH2 group of the ketone. Rx preferably is phenyl, naphthyl, phenanthryl, anthracyl, pyrenyl, 5, 6, 7, 8-tetrahydro-2-naphthyl, 5,6,7,8-tetrahydro-1-naphthyl, thienyl, benzo [b] thienyl, naphth [2., 3-b] thienyl, thiarenyl, dibenzofuryl, chromenyl, xanthenyl, thioxanthyl, phenoxyantiinyl, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolizinyl, isoindolyl, indolyl, indazolyl, purinyl, quinolizinyl, isoquinolyl, quinolyl , phthalazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, cinolinyl, pteridinyl, carbazolyl, β-carbolinyl, phenanthridinyl, acridinyl, perimidinyl, phenanthrolinyl, phenazinyl, isothiazolyl, phenothiazinyl, isoxazolyl, furazanyl, terphenyl, stilbenyl, fluorenyl or phenoxazinyl, these radicals are unsubstituted or mono- or polysubstituted by alkyl with 1 to 18 carbon atoms, alkenyl with 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, NRfaR- / 7 N3, OH, CN, 0R8, C (0) R9, C (O ) OR10 or halogen; or Rx is a radical of formula A or B or R1 and R5 together with the linking carbon atoms are a benzocyclopentanone radical. Preferably Rx is particularly phenyl, naphthyl, pyrenyl, thioxanthyl or phenothiazinyl, these radicals are unsubstituted or mono- or polysubstituted by alkyl with 1 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, NR6R7, CN, N02 , SR8 or OR8, R2, R3 and R preferably each independently are hydrogen, alkyl having 1 to 18 carbon atoms or R2 and R3 and / or R4 and R3 each independently of the other form an alkylene bridge with 2 to 12 carbon atoms, or R2, R3, R4 together with the bonding nitrogen atom are a group of the structural formulas (a), (b), (c), (d), (e), (f), (g), as indicated above, or a phosphazene base of the type Px, P2 or P < t / 4>. Each of k and 1 independently of the other, is a number of 2 to 12, preferably a number from 2 to 6. Particularly preferred compounds are those wherein R2, R3 and R4, each independently of the other, are alkyl with 1 to 18 carbon atoms. arbono or R2, R3, R4 together with the nitrogen atom form a group of the structural formula (a), (b), (c), (d) or (e) as indicated above. R12, Ri3, Ri4 are preferably phenyl, biphenyl, naphthyl, anthracyl or phenanthryl, these radicals are unsubstituted or mono- or polysubstituted by alkyl with 1 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, OH , CN, OR8 or halogen and R15 is alkyl with 1 to 18 carbon atoms or phenyl which is unsubstituted or mono- or polysubstituted with alkyl having 1 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, OH , CN, OR8 or halogen. Suitable borate anions for the nitrogenous base cation in the compounds of formula I are also to be found among others in US 4772530, GB 2307474, GB 2307473, GB2307472, EP775706. Illustrative examples are triphenylbutylborate, trifenylhexylborate, triphenylmethylborate, dimesitylphenylmethylborate or dimesitylphenylbutylborate, di (bromo-mesityl) phenyl-methylborate or di (bromomesityl) phenylbutylborate, tris (3-fluorophenyl) exilborate, tris (3-fluorophenyl) methylborate or tris (3 - fluorophenyl) butylborate, dichloro-dimethyl-phenylmethylborate or dichloromesit-ilphenylbutylborate, tris (dichlorosityl) methylborate, tris (3-chlorophenyl) exilborate, tris (3-chlorophenyl) methylborate or tris (3-chlorofenyl) butyl-borate, tris (3-bromo-phenyl)-exoborate, tris (3-bromfenyl) methylborate or tris (3-bromo-phenyl) butylborate, tris (3,5-dif luorofenyl) hexylborate, dimesitylbifenyl-butylborate, dimesitilnaf, tylmethylborate or dimesitilnafylbutyl-ilborate, di (o-tolyl) -9-anthracyl methylborate, or di (o-tolyl) -9-anthracylbutylborate, dimesityl-9-f enantrilf enylborate or dimesityl-9-f enantrilf enyl-butylborate or The preparation of these anions is described in the aforementioned publications. The preparation of the bromides or iodides of the novel compounds of the formula I is carried out, for example, by the methods described by A. Padwa, W.

Eisenhardt, R. Gruber and D. Pashayan in J. Am. Chem. Soc., 93, 6998 (1971) or by T. Laird and H. Williams, J. Chem. Soc.

(C), 3467 (1971). The borates are obtained from there in an analogous way. The reaction can be carried out in a manner known per se. It is also useful to use a solvent or mixture of solvents, for example hydrocarbons (benzene, toluene, xylene), halogenated hydrocarbons (methylene chloride, chloroform, carbon tetrachloride, chlorobenzene), alkanols (methanol, ethanol, 2-methoxy-ethanol) and ethers (diethyl ether, dibutyl ether, 1,2-dimethoxyethane) or mixtures thereof. The reaction is conveniently carried out in the temperature range from -10 ° C to + 100 ° C. It is preferably carried out in the range of 10 ° C to 50 ° C. This invention also provides a process for the preparation of the compounds of the formula I, which comprises reacting in a first step, a nitrogenous base of the formula II NR2R3R4 (II) with an a-halogen ketone of the formula III Halogen CH (II) O with a compound of the formula IV (IV) or and in a second step, reacting the compounds of the formula IV, with a compound of the formula V to the compound of formula I, wherein halogen is bromine or iodine, and M is Na, K or ammonium and R1 (R2, R4, R5, R? 2 / L13, R1 and R15 have the meanings and meanings previously established This invention also relates to a composition comprising A) at least one compound of the formula (I), and B) at least one organic compound that is capable of a base catalyzed addition reaction or substitution reaction. The substitution reaction or base catalyzed addition reaction can be carried out with low molecular weight compounds (monomers), with oligomers, with polymeric compounds or with a mixture of these compounds. Examples of reactions that can be carried out with both monomers and oligomers / polymers using the novel photoinitiators are the Knoevenagel reaction or the Michael addition reaction.

Particularly important compositions are those in which component B) is an anionically polymerizable or crosslinkable organic material. The organic material may be in the form of mono- or polyfunctional monomers, oligomers or polymers. Particularly preferred oligomeric / polymeric systems are binders or coating systems as is usual in the coating industry. Examples of these binders or base catalysable coating systems are: a) acrylate copolymers having alkoxysilane or alkoxysiloxane side groups, for example the polymers described in US-A 4,772,672 or US-A 4,444,974; b) two-component systems comprising polyacrylates containing hydroxyl groups, polyesters and / or polyethers and aliphatic or aromatic polyisocyanates; c) two-component systems comprising functional polyacrylates and a polyepoxide, wherein the polyacrylate contains carboxyl or anhydride groups; d) two-component systems comprising polyacrylates, polyesters and / or polyethers containing hydroxyl group modified with silicone or modified with fluorine and aliphatic or aromatic polyisocyanates; e) two component systems comprising (poly) ketimines and aliphatic or aromatic polyisocyanates; f) two-component systems comprising (poly) ketimines and unsaturated acrylate resins or acetoacetate or methyl a-acrylamidomethylglycolate resins; h) two-component systems comprising (poly) oxazolidines and polyacrylates containing anhydride groups or unsaturated acrylate resins or polyisocyanates; i) two-component systems comprising polyacrylates containing epoxy and polyacrylates containing carboxyl group; 1) polymers based on allyl glycidyl ether; m) two-component systems comprising a (poly) alcohol and a (poly) isocyanate; n) two-component systems comprising an α, β-ethylenically unsaturated carbonyl compound and a polymer containing activated CH 2 gr, it being possible for the activated CH 2 gr to be present either in the main chain or in the secondary chain or in both, as described for example in EP-B-0 161 697 for gr (poly) malonate. Other compounds having activated CH2 groups are (poly) acetoacetates and (poly) cyanoacetates. Among these base-catalysable binders, particular preference is given to the following: b) two-component systems comprising polyacrylates, polyesters and / or polyethers containing hydroxyl groups and aliphatic or aromatic polyisocyanates; c) two-component systems comprising functional polyacrylates and a polyepoxide, wherein the polyacrylate contains carboxyl or anhydride groups; i) two-component systems comprising polyacrylates containing epoxy and polyacrylates containing carboxyl group; m) two-component systems comprising a (poly) alcohol and a (poly) isocyanate; and n) two-component systems comprising an α, β-ethylenically unsaturated carbonyl compound and a polymer containing activated CH 2 groups, it being possible for the activated CH 2 groups to be present, either in the main chain or in the secondary chain or both as it is described, for example, in EP-B-0 161 697 for (poly) malonate groups. Other compounds having activated CH2 groups are (poly) acetoacetates and (poly) cyanoacetates. Two-component systems comprising a α, β-ethylenically unsaturated carbonyl compound and a (poly) malonate, and its preparation are described in EP-B-0 161 687. The malonate group can be connected here in a polyurethane, polyester, polyacrylate, epoxy resin, polyamide or polyvinyl polymer, either in the main chain or in a secondary chain. The O, β-ethylenically unsaturated carbonyl compound employed can be any double bond activated by a carbonyl group. Examples are esters or amides of acrylic acid or methacrylic acid. In the ester groups, it is also possible that additional hydroxyl groups are present. Diesters and triesters are also possible. Typical examples are hexandiol diacrylate or trimethylol propane triacrylate. Instead of acrylic acid, it is also possible to use other acids and their esters or amides such as crotonic acid or cinnamic acid. Under base catalysis, the components of the system react with each other at room temperature to form an interlocking coating system that is suitable for numerous applications. Due to their good resistance to inherent weathering, they are suitable for example for outdoor applications as well and can, if required, be additionally stabilized by UV absorbers and other light stabilizers. Other systems suitable as component B) in the novel compositions are epoxy systems. Epoxy resins which are suitable for preparing novel, curable mixtures comprising epoxy resins as component B) are those which are customary in epoxy resin technology, examples of these epoxy resins are: I) Polyglycidyl and poly (β-methylglycidyl) esters, which are obtained by reacting a compound having at least two carboxyl groups in the molecule with epichlorohydrin or β-methylepichlorohydrin. The reaction is carried out judiciously in the presence of bases. Since the compound has at least two carboxyl groups in the molecule, it is possible to use aliphatic polycarboxylic acids. Examples of these polycarboxylic acids are oxalic, succinic, glutaric, adipic, pimelic, suberic, azelaic or dimerized or trimerized linoleic acid. However, it is also possible to use cycloaliphatic polycarboxylic acids such as tetrahydrophthalic acid, 4-methyltetrahydrophthalic acid, hexahydrophthalic acid or 4-methylhexahydrophthalic acid. Further aromatic polycarboxylic acids may be used such as phthalic, isophthalic or terephthalic acid. II) Polyglycidyl or poly (β-methylglycidyl) ethers, which are obtained by reacting a compound having at least two free alcoholic hydroxyl groups and / or phenolic hydroxyl groups with epichlorohydrin or β-methylepichlorohydrin, under alkaline conditions or in the presence of a Acidic catalyst with subsequent alkaline treatment. Glycidyl ethers of this type are derived, for example, from acyclic alcohols such as ethylene glycol, diethylene glycol and poly (oxyethylene) higher glycols, propan-1,2-diol or poly (oxypropylene) glycols, propan-1,3-diol, bu t an-1,4-diol, poly (oxy-tetramethylene) glycols , pentan-1, 5-diol, hexan-1,6-diol, hexan-2,4,6,6-triol, glycerol, 1,1-trimethylolpropane, pentaerythritol, sorbitol and polyepichlorohydrins. They are also derived, for example, from cycloaliphatic alcohols such as 1, 4-c ichexandimet anol, bis (4-hydroxycyclohexyl) -methane or 2,2-bis (4-hydroxycyclohexyl) -panoid, or possess aromatic nuclei such as N, N- bis (2-hydroxyethyl) aniline op, p'-bis (2-hydroxyethylamino) -diphenylmethane. The glycidyl ethers may also be derived from mononuclear phenols such as resorcinol or hydroquinone, or are based on polynuclear phenols such as bis (4-hydroxyphenyl) methane, 4,4'-di-idroxybiphenyl, bis (4-hydroxyphenyl) sulfone, 1,1 , 2,2-tetrakis (4-hydroxyphenyl) ethane, 2,2-bis (4-hydroxyphenyl) propane, 2,2-bis (3,5-dibromo-4-hydroxyphenyl) -propane and novolaks obtained when condensing aldehydes such as formaldehyde, acetaldehyde, chloral or furfuraldehyde, with phenols such as phenol or with phenols whose nuclei are replaced by chlorine atoms or alkyl groups with 1 to 9 carbon atoms, examples are 4-chlorophenol, 2-methylphenol or 4-tert-butylphenol or by condensation with bisphenols, those of the type specified above. III) Poly (N-glycidyl) compounds which are obtained by dehydrochlorination of the reaction products of epichlorohydrin with amines containing at least two active hydrogens bound with amino nitrogen. These amines, for example, are aniline, n-butylamine, bis (4-aminophenyl) -methane, m-xylylenediamine or bis (4-methylaminophenyl) methane. The poly (N-glycidyl) compounds also include triglycidyl isocyanurate, N, N'-diglycidyl derivatives of cycloalkylene ureas such as ethylene urea or 1,3-propylene urea and diglycidyl derivatives of hydantoins such as 5,5-dimethylhydantoin. IV) Poly (S-glycidyl) compounds or, for example, di-S-glycidyl derivatives which are obtained from dithiols such as ethane-1,2-dithiol or bis (4-mercaptomethylphenyl) ether. V) Cycloaliphatic epoxy resins for example bis (2, 3-epoxycyclopentyl) ether, 2,3-epoxy-cyclopentyl glycidyl ether, 1,2-bis (2,3-epoxycyclopentyloxy) ethane or 3,4-epoxycyclohexyl-methyl-3 '4' -epoxycyclohexanecarboxylate. However, it is also possible to use epoxy resins where the 1,2-epoxide groups are connected to different heteroatoms and / or functional groups; These compounds include, for example, the N, N, 0-triglycidyl derivative of 4-aminophenol, the glycidyl ether, the glycidyl ester of salicylic acid, N-glycidyl-N '- (2-glycidyloxypropyl) -5,5-dimethylhydantoin or glycidyloxy-1,3-bis (5,5-dimethyl-1-glycidylhydantoin-3-yl) -panode. Mixtures of epoxy resins can also be used as component B). A composition wherein component B) is an epoxy resin or a mixture of different epoxy resins, therefore also conforms to this invention. The compositions comprise the photoinitiator, component A), preferably in an amount of 0.01 to 10% by weight based on component B). In addition to the photoinitiator, component A), the photopolymerizable mixtures may include different additives. Examples of these are thermal inhibitors that are intended to prevent premature polymerization, such as hydroquinone, hydroquinone derivatives, p-methoxyphenol, β-naphthol or sterically hindered phenols, such as 2,6-di (tert-butyl) -p-cresol , for example. To increase storage stability in the dark, it is possible for example to use copper compounds, such as copper naphthenate, stearate or octoate, phosphorus compounds such as triphenylphosphine, tributylphosphine, triethyl phosphite, triphenyl phosphite or tribenzyl phosphite, compounds of quaternary ammonium, such as tetramethylammonium chloride or trimethylbenzylammonium chloride, or hydroxylamine derivatives such as N-diethylhydroxylamine. To exclude atmospheric oxygen during polymerization, it is possible to add paraffin or similar wax-like substances that, due to their lack of solubility in the polymer, migrate to the surface at the beginning of the polymerization, where they form a transparent surface layer that prevents the entry of air It is also possible to apply an oxygen impermeable layer. Light stabilizers, which may be added in a small amount, are UV absorbers, such as those for example of the hydroxyphenylbenzotriazole, hydroxyphenylbenzophenone, oxalamide or hydroxyphenyl-s-triazine type. Individual compounds or mixtures of these compounds can be used with or without the use of sterically hindered amines (HALS). Illustrative examples of these UV absorbers and light stabilizers are the following: 1. 2- (2'-Hydroxyphenyl) benzotriazoles. for example 2- (2'-hydroxy-5 • -methylphenyl), -1, 2- (3 ', 5'-di-tert-butyl-2'-hydroxyphenyl) benzotriazole, 2-5'-tert-butyl- 2 '-hydroxyphenyl) benzotriazole, 2- (2'-hydroxy-5' - (1,1,3,3-tetramethylbutyl) phenyl) benzotriazole, 2- (3 ', 5'-di-tert-butyl-2' -hydroxyphenyl) -5-chloro-benzotriazole, 2- (3'-tert-butyl-2'-hydroxy-5'-methylphenyl) -5-chloro-benzotriazole, 2- (3'-sec-butyl-5 '- tert-butyl-2 '-hydroxy-enyl) -benzotriazole, 2- (2'-hydroxy-4'-octyl-oxy-enyl) -benzotriazole, 2- (3', 5'-di-tert-amyl-2'-hydroxyphenyl) -benzotriazole, 2- (3 ', 5'-bis- (OI, a-dimethylbenzyl) -2'-hydroxy-f-enyl) benzotriazole, a mixture of 2- (3'-tert-butyl-2'-hydroxy- 5 '- (2-Octyloxycarbonylethyl) phenyl) -5-chloro-benzotriazole, 2- (3'-tert-butyl-5' - [2- (2-ethylhexyloxy) carbonylethyl] -2-hydroxyphenyl) -5-chloro- benzotriazole, 2- (3'-tert-butyl-2'-hydroxy-5 '- (2-methoxycarbonylethyl) phenyl) -5-chloro-benzotriazole, 2- (3'-er-but i 1-2' -hydroxy) - 5 '- (2-methoxycarbonylethyl) phenyl) benzotriazole, 2- (3'-tert-butyl-2'-hydroxy-5' - (2-octyloxycarbonyl-ethyl) phenyl) benzotriazole, 2- (3'-tert-butyl) -5 '- [2- (2-ethexyloxy) carbonylethyl] -2'-hydroxy-f-enyl) benzotriazole, 2- (3'-dodecyl-2'-hydroxy-5'-methylphenyl) -benzotriazole and 2- (3'-tert-butyl-2'-hydroxy-5 '- (2-isooctyloxycarbonylethyl) f-enylbenzotriazole, 2,2'-methylenebis [4- (1,1,3,3-tetramethylbutyl) -6-benzotriazole-2 -ilf enol]; the transesterification product of 2- [3'-tert-butyl-5 '- (2-methoxycarbonylethyl) -2'-hydroxyphenyl] -2H-benzotriazole with polyethylene glycol 300; [R-CH2CH2-COO (CH2) 3] 2- where R = 3 '-tert-butyl-4' -hydroxy-5'-2H-benzotriazol-2-ylfenyl. 2. 2-Hydroxybenzofenones, for example the 4-hydroxy, 4-methoxy, 4-octyloxy, 4-decyloxy, 4-dodecyloxy, 4-benzyloxy, 4, 2 ', 4' -trihydroxy and 2'-hydroxy derivatives 4, 4'-dimethoxy. 3. Esters of substituted and unsubstituted benzoic acids, such as for example 4-tert-butyl phenyl salicylate, phenyl salicylate, octylphenyl salicylate, dibenzoyl resorcinol, bis (4-tert-butylbenzoyl) resorcinol, benzoyl resorcinol, 2,4-di-ter- butyl-phenyl-3,5-di-tert-butyl-4-hydroxybenzoate, hexadecyl-3,5-di-tert-butyl-4-hydroxybenzoate, octadecyl-3,5-di-tert-butyl-4-hydroxy-benzoate, -methyl-4,6-di-tert-butylphenyl-3,5-di-tert-butyl-4-hydroxy-benzoate. 4_. Acrylates, for example ethyl a-cyano-β, β-diphenylacrylate, isooctyl a-cyano-β, β-diphenylacrylate, methyl α-carbomethoxy-cinnamate, methyl α-cyano-β-methyl-p-methoxy-cinnamate, butyl a -cyano-ß-methyl-p-methoxy-cinnamate, methyl a-carbomethoxy-p-methoxy-cinnamate and N- (β-carbomethoxy-β-cyanovinyl) -2-methylindoline. 5. Sterically hindered amines, for example bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (2,2,6,6-tetramethyl-4-piperidyl) succinate, bis (1, 2, 2, 6, 6-pentamethyl-4-piperidyl) -sebacate, bis (l, 2,2,6,6-pentamethyl-4-piperidyl) n-butyl-3,5-di-tert-butyl-4-idroxybenzylmalonate , the condensate of 1- (2-hydroxyethyl) -2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid, the condensate of N, N'-bis (2, 2, 6,6-tetramethyl- 4-piperidyl) hexa-methylenediamine and 4-tert-octylamino-2,6-dichloro-1,3,5-triazine, tris (2, 2, 6, 6-tetramethyl-4-piperidyl) nitrilotriacetate, tetrakis- (2 , 2,6,6-tetramethyl-4-piperidyl) -1,2,3,4-butane-tetracarboxylate, 1,1 '- (1,2-ethanedyl) -bis (3,3,5,5,5-tetramethylpiperazinone ), 4-benzoyl-2,2,6,6-tetramethylpiperidine, 4-stearyloxy -2,6,6,6-tetramethyl-piperidine, bis (1,2-, 2,6,6-pentamethylpiperidyl) -2-n -butyl-2- (2-hydroxy-3,5-di-tert-butylbenzyl) malonate, 3-n-octyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro [4. 5] decan-2, 4-dione, bi s (1-octyloxy-2, 2, 6, 6-tetramethylpiperidyl) sebacate, bis (1-octyloxy-2,6,6,6-tetramethylpiperidyl) succinate, Condensate of N, N'-bis (2, 2, 6,6-tetramethyl-4-piperidyl) hexamethylenediamine and 4-morpholin-2,6-dichloro-1,3,5-triazine, the condensate of 2-chloro- 4, 6-bis (4-n-butylamino-2, 2,6,6-tetramethylpiperidyl) -1,3,5-triazine and 1,2-bis (3-amino-propylamino) ethane, the condensate of 2- chloro-4,6-di- (4-n-butylamino-1,2,2,6,6-pentamethylpiperidyl) -1,3,5-triazine and 1,2-bis (3-amino-propylamino) ethane 8-acetyl-3-dodecyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro [4.5] decan-2,4-dione, 3-dodecyl- (2,2,6,6) -tetramethyl-4-piperidyl) pyrrolidin-2,5-dione, 3-dodecyl-1- (1,2,2,6,6-pentamethyl-4-piperidyl) pyrrolidin-2, 5-dione. 6. Oxamides, for example 4,4'-dioctyloxyoxanilide, 2,2'-diethoxy-oxanilide, 2,2'-dioctyloxy-5,5'-di-tert-butoxyanilide, 2,2'-didodecyloxy-5, 5 '-di-tert-butoxyanilide, 2-ethoxy-2'-eti loxanyl ida, N, N' -bis (3-dimethylaminopropyl) oxamide, 2-ethoxy-5-tert-butyl-2-ethoxyanilide and its mixture with 2 -ethoxy-2'-ethyl-5,4'-di-tert-butoxyanilide, mixtures of o- and p-methoxy disubstituted oxanilides and mixtures of disubstituted o- and p-ethoxy oxanilides. 7. 2- (2-Hydroxyphenyl) -1,3,5-triazines, for example 2,4,6-tris (2-hydroxy-4-octyloxyphenyl) -1,3,5-triazine, 2- (2-hydroxy) 4-octyloxyphenyl) -4,6-bis (2,4-dimethylphenyl) -1,3,5-triazine, 2- (2,4-dihydroxyphenyl) -4,6-bis (2,4-dimethylphenyl) -1 , 3, 5-triazine, 2,4-bis (2-hydroxy-4-propyl-oxyphenyl) -6- (2,4-dimethylphenyl) -1,3,5-triazine, 2- (2-hydroxy) -4 -octyloxyphenyl) -4,6-bis (4-methylphenyl) -1,3,5-triazine, 2- (2-hydroxy-4-dodecyloxyphenyl) -4,6-bis (2,4-dimethyl-phenyl) - 1,3,5-triazine, 2- (2-hydroxy-4-tridecyloxyphenyl) -4,6-bis (2,4-dimethylphenyl) -1,3,5-triazine, 2- [2-hydroxy-4- (2-hydroxy-3-butyloxy-propoxy) phenyl] -4,6-bis (2,4-dimethyl) -1, 3,5-triazine, 2- [2-hydroxy-4- (2-hydroxy-3-octyloxy-propyloxy) phenyl] -4,6-bis (2,4-dimethyl) -1,3,5-triazine , 2- [4- (dodecyloxy / tridecyloxy-2-hydroxypropoxy) -2-hydroxy-phenyl] -4,6-bis (2,4-dimethylphenyl) -1,3,5-triazine. 8. Phosphites and phosphonites, for example triphenyl phosphite, diphenyl alkyl phosphites, phenyl dialkyl phosphites, tris (nonylphenyl) phosphite, trilauryl phosphite, trioctadecyl phosphite, distearyl pentaerythritol diphosphite, tris (2,4-di-tert-butylphenyl) phosphite, diisodecyl penta-erythritol diphosphite, bis (2,4-di-tert-butylphenyl) pentaerythritol diphosphite, bis (2,6-di-tert-butyl-4-methylphenyl) -pentaerythritol diphosphite, diisodecyloxypentaerythritol diphosphite, bis (2, 4-di) -tert-butyl-6-methylphenyl) pentaerythritol diphosphite, bis (2,4,6-tris (tert-butyl-phenyl) pentaerythritol diphosphite, tristearyl sorbitol triphosphite, tetrakis (2,4-di-tert-butyl-phenyl) - 4, 4 '-biphenylene diphosphonite, 6-isooctyloxy-2, 4,8,10-tetra-tert-butyl-12H-dibenz - [d, g] -1,3, 2-dioxaphosphozin, 6-fluoro-2, 4.8, 10-tetra-tert-butyl-12-methyl-dibenz- [d, g] -1, 3, 2-dioxaphosphozin, bis (2,4-di-tert-foutyl-6-methylphenyl) methyl phosphite , bis (2,4-di-tert-butyl-6-methylphenyl) ethyl phosphite, illustrative examples of additional additives are: Fillers and reinforcing agents, for example calcium carbonate, silicates, glass fibers, glass beads, asbestos, talc, kaolin, mica, barium sulfate, metal oxides and hydroxides, carbon black, graphite, wood sawdust and flours or fibers of other natural products, synthetic fibers. Other additives, for example plasticizers, lubricants, emulsifiers, pigments, rheology additives, catalysts, flow control agents, optical brighteners, flameproofing agents, antistatic agents and blowing agents.

In addition to the additives indicated above, it is also possible that additional coinitiators are present. In general, these are dyes that improve the total quantum yield for example by energy transfer or transfer to electrons. Examples of suitable dyes which can be added as coinitiators are triarylmethanes, for example malachite green, indolines, thiazines, for example methylene blue, xanthones, thioxanthones, oxazines, acridines or phenazines, for example safranin and rhodamines of the formula wherein R is alkyl or aryl; and R 'is hydrogen, an alkyl or aryl radical, for example Rhodamine B, Rhodamine 6G or Violamine R, and also Sulforhodamine B or Sulforhodamine G. Preference is given to thioxanthones, oxazine, acridines, phenazines and rhodamines. Bleaching combinations with borates are also convenient in this connection, as described among others in US 4772530, GB 2307474, GB 2307473, GB 2307472 and EP 775706.

In addition to the base-catalysable binders (curable) described above, component B), the composition can also include other binders equally. It is possible to use, for example, additional olefinically unsaturated compounds. The unsaturated compounds may include one or more olefinic double bonds. They may be low molecular mass (monomeric) or high molecular mass (oligomeric). Examples of monomers having a double bond are alkyl acrylates or L-hydroxyalkyl acrylates or alkyl methacrylates or hydroxyalkyl methacrylates, such as ethyl, butyl, 2-ethylhexyl or 2-hydroxyethyl acrylate, isobornyl acrylate, methyl methacrylate or ethyl methacrylates. Silicone acrylates are also of interest. Additional examples are acrylonitrile, acrylamide, methacrylamide, N-substituted (meth) acrylamides, vinyl esters such as vinyl acetate, vinyl ethers such as isobutyl vinyl ether, styrene, alkyl- and halostyrene, N-vinylpyrrolidone, vinyl chloride or vinylidene chloride. . Examples of monomers having several double enalces are the diacrylates of ethylene glycol, propylene glycol, neopentyl glycol, hexamethylene glycol or bisphenol A, 4,4'-bis (2-acryloyl-oxyethoxy) diphenylpropane, trimethylolpropane triacrylate, pentaerythritol triacrylate or pentaerythritol tetraacrylate, vinyl acrylate, divinyl benzene, divinyl succinate, diallyl phthalate, triaryl phosphate, triaryl isocyanurate or tris (2-acryloylethyl) isocyanurate. Examples of polyunsaturated compounds of higher molecular mass (oligomers) are acrylated epoxy resins, acrylated polyesters or polyesters containing vinyl ether groups or epoxy groups, polyurethanes and polyethers. Additional examples of unsaturated oligomers are unsaturated polyester resins which are primarily prepared from maleic acid, phthalic acid and one or more diols and have molecular weights of about 500 to 3000. In addition, it is also possible to employ vinyl ether monomers and oligomers and also oligomers terminated with maleate with polyester, polyurethane, polyether, polyvinyl ether and epoxy main chains. In particular, combinations of oligomers and polymers that carry vinyl ether are as described in WO 90/01512 and are very convenient. Copolymers of vinyl ether and monomers functionalized with maleic acid are also convenient. Unsaturated oligomers of this type can also be referred to as prepolymers. Particularly suitable examples are esters of ethylenically unsaturated carboxylic acids and polyols or polyepoxides and polymers having ethylenically unsaturated groups in the chain or in side or side groups, such as polyesters, polyamides and polyurethanes and their unsaturated copolymers, alkyd resins, butadiene copolymers and polybutadiene, copolymers of isoprene and polyisoprene, copolymers and polymers having (meth) acrylic groups in secondary chains and mixtures of one or more of these polymers. If in addition, these monomers are used, oligomers / polymers curable by radicals, then it is judicious to add an additional photoinitiator that dissociates into radicals. These photoinitiators are known and produced industrially. Examples are benzophenone, benzophenone derivatives, acetophenone, acetophenone derivatives, for example a-hydroxycycloalkyl phenyl ketones, dialkoxyacetophenones, a-hydroxy- or a-aminoacetophenones, 4-aroyl-1,3-dioxolanes, benzoyl alkyl ethers and benzyl ketals, monoacyl phosphine oxides, bisacylphosphine oxides, ferrocenium compounds or titanocenes. Examples are given in EP-A-284 561. Polymer systems of this type, wherein curing / entanglement is carried out by different mechanisms are also referred to as hybrid systems. It is also possible to add non-reactive binders to novel compositions, which is particularly judicious if the photopolymerizable compounds are liquids or viscous substances. The amount of the non-reactive binder for example may be 5-95%, preferably 10-90% and in particular 40-90% by weight based on the total solids content. The selection of the non-reactive binder is made according to the field of use and with the properties required for this use, such as the possibility for development in aqueous and organic solvent systems, substrates adhesion and sensitivity to oxygen. Examples of suitable binders are polymers having a molecular weight of about 5,000-2,000,000, preferably 10,000-1,000,000. Examples are homo- and copolymeric acrylates and methacrylates, for example copolymers of methyl methacrylate / ethyl acrylate / methacrylic acid, poly (alkyl methacrylates), poly (alkyl acrylates); cellulose esters and ethers such as cellulose acetate, cellulose acetate butyrate, methyl cellulose, ethyl cellulose; polyvinyl butyral, polyvinyl formal, cyclized rubber, polyethers such as polyethylene oxide, polypropylene oxide, polytetrahydrofuran; polystyrene, polycarbonate, polyurethane, chlorinated polyolefins, polyvinyl chloride, copolymers of vinyl chloride / vinylidene chloride, copolymers of vinylidene chloride with acrylonitrile, methyl methacrylate and vinyl acetate, polyvinyl acetate, copolymer (ethylene vinyl acetate), polymers such as polycaprolactam and poly (hexamethylene adipamide) and polyesters such as poly (ethylene glycol terephthalate) and poly (hexamethylene glycol succinate). Additionally, the invention provides a method for carrying out base catalyzed reactions comprising exposing light with a wavelength of 200 nm to 650 nm, a novel composition as described above. In some cases, it may be advantageous to carry out heating during or after exposure to light. In this way it is possible in many cases to accelerate the entanglement reaction. The light sensitivity of the novel compositions generally extends from about 200 nm through the UV region and into the infrared region (about 20,000 nm, in particular 1200 nm) and therefore extends over a very wide range. Convenient radiation comprises for example sunlight or light from artificial light sources. Therefore, a large number of very different types of light sources can be used. Both point sources and flat radiators (mats or lamp benches) are convenient. Examples are carbon arc lamps, xenon arc lamps, mercury lamps of medium pressure, high pressure and low pressure, if desired adulterated with metal halides (metal halogen lamps) metal vapor lamps excited by microwaves, excimer lamps, superactinic fluorescent tubes, fluorescent lamps, incandescent argon lamps, electronic flashing lamps, high intensity lamps or photographic projectors, electron beams and X-rays, which are produced by synchrotrons or laser plasma. The distance between the lamp and the substrate according to the invention to be exposed may vary depending on the application and the type and / or lamp energy, for example between 2 and 150 cm. Laser light sources, for example excimer lasers, are also particularly suitable. Laser in the visible region or in the IR region can also be used. The high sensitivity of the novel materials and the possibility of adapting a colorant as a co-initiator to the laser line is very advantageous here. By this method it is possible to produce printed circuits in the electronics industry, lithographic offset printing plates or relief printing plates and also photographic recording or recording materials. The novel compositions can be used for various purposes, for example as printing inks, as transparent coatings, as white paints, for example for wood or metal, as coating materials, among others for paper, wood, metal or plastic, as coatings in dust, such as coatings curable with daylight, to mark buildings and roads, for photographic reproduction processes, for holographic recording materials, for image recording processes or for the production of printing plates that can be revealed using organic solvents or aqueous alkaline media, for the production of masks for stencil printing, or dental filling materials, such as adhesives including pressure sensitive adhesives, such as laminating resins, as mordant protective layers or permanent protective layers and as welding masks for electronic circuits, for the production of article s three-dimensional by mass curing (UV curing in transparent molds) or by the stereolithography process, as described for example in U.S. Pat. No. 4,575,330, for the preparation of composite materials (for example styrenic polyesters which may contain glass fibers and / or other fibers and other auxiliaries (and other thick layer compositions, for the coating or encapsulation of electronic components, or as coatings for optical fibers) In paint systems, it is common to use mixtures of a prepolymer with polyunsaturated monomers that also contain a monosaturated monomer.The prepolymer here is primarily responsible for the properties of the coating film and varying it allows the worker to dexterously in the specialty it influences the properties of the cured film.The polyunsaturated monomer functions as an interlayer which makes the coating film insoluble.The monounsaturated monomer functions as a reactive diluent through which the viscosity is reduced without the need to use a solvent. unsaturated polyester, pri Usually used are used in two-component systems in conjunction with a mono-unsaturated monomer, preferably styrene. For photoresistors, one-component specific systems are frequently used, for example polymaleimides, polyhalcondes or polyimides as described in DE-A-2 308 830. The novel photocurable compositions are suitable for example as coating materials for substrates of all types, they are examples are wood, textiles, paper, ceramics, glass, plastics such as polyesters, polyethylene terephthalate, polyolefins or cellulose acetate, especially in the form of films and also metals such as Al, Cu, Ni, Fe, Zn, Mg or Co and GaAs , Si or Si02, in which it is the intention to apply a protective coating or by an image-like exposure of an image. The substrates can be coated by applying a liquid composition, a solution or suspension to the substrate. The selection of the solvent and the concentration depend predominantly on the time of composition and the coating process. The solvent must be inert; in other words, it should not undergo any chemical reaction with the components and should be able to be removed again after the coating operation in the drying process. Examples of suitable solvents are ketones, ethers and esters, such as methyl ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, N-methylpyrrolidone, dioxane, tetrahydrofuran, 2-methylethoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 1 , 2-dimethoxyethane, ethyl acetate, n-butyl acetate and ethyl 3-ethoxypropionate. Using known coating processes, the solution is uniformly applied to a substrate, for example by spin coating, dip coating, spatula coating, curtain coating, brushing or brushing, spraying especially by electrostatic spraying and reverse roll coating, and by electrophoretic deposition. It is also possible to apply the photosensitive layer to a temporary flexible support and then to coat final acetate for example a circuit board with copper coating by layer transfer by lamination. The amount applied (layer thickness) and the nature of the substrate (layer support) are functions of the desired field of application. The range of layer thicknesses generally comprises values from about 0.1 μm to more than 100 μm. The novel radiation-sensitive compositions can also be subjected to image exposure. In this case, they are used as negative protective layers. They are suitable for electronic components (electroplating protective coatings, etching protective coatings and welding protective coatings), for the production of printing plates, such as offset printing plates, flexographic and relief printing plates or stencil printing plates, for the production of marking seals and can be used for etching molded articles or as protective micro-layers in the production of integrated circuits. There is a wide range of variation correspondingly in the possible layer supports and in the processing conditions of the coated substrates. The term "image-like" exposure refers to both exposure through a photomask containing a predetermined pattern, for example a slide, exposure by a laser beam moving under computer control, for example on the substrate surface coated and in this way generates an image and irradiation with electron beams controlled by computer. Following the exposure as an image of the material and before development, it may be advantageous to carry out a brief heat treatment, where only the exposed parts are thermally cured. The temperatures employed in general are 50-150 ° C and preferably 80-130 ° C; The duration of the term treatment in general is between 0.25 and 10 minutes. An additional field of use for light curing is that of metal coatings, for example the surface coating of metal panels and tubes, cans or bottle caps and curing in polymer coatings, for example of floor or wall coverings, based on PVC Examples of the curing of paper coatings is the colorless varnishing of labels, recording linings or book covers. This invention also relates to the use of a compound of the formula I as photoinitiator for addition reactions or photochemically induced base-catalyzed substitution reactions, in particular for curing molded articles, made from composite compositions, wherein R1 # R2, R3, R4, R5, R12, R13, R14, R15 and m has the preferred meanings and meanings set forth above. Another subject of this invention is the aforementioned use for the preparation of coatings, molded articles or photo-structured layers. The compound usually consists of a self-supporting matrix material, for example a fiberglass cloth, or else for example vegetable fibers [see K.-P. Mieck, T. Reussmann in Kunststoffe 85 (1995), 366-370], which is impregnated with the light-cured formulation. The molded articles made from materials produced with the novel compounds reach a high level of mechanical stability and strength. The novel compounds can also be used as light curing agents in molding, impregnation and coating compositions, such as described in EP-A-7086. These compositions, for example, are gel-coating resins, which are subjected to strict requirements regarding their curing activity and resistance to yellowing and to fiber-reinforced molded articles such as light diffusion panels that are planar or have longitudinal or transverse corrugation. . Examples and preferences of substitution reactions or base catalyzed addition reactions were established above. In other aspects, this invention relates to a coated substrate that has been covered on at least one surface with a composition as described above and to a process for the photographic production of relief images, wherein a coated substrate is subjected to Exposure in image fashion and then the unexposed areas are removed with a solvent. Of particular interest in this context is the aforementioned exposure by means of a laser beam. This invention also relates to the use of novel compounds for the preparation of coatings, molding compositions or photo-structured layers.

In other of these aspects, this invention relates to novel interlaced or polymerized compositions. The following examples illustrate the invention in more detail. As in the remainder of the description and in the claims, parts and percentages are given by weight unless stated otherwise. If alkyl or alkoxy radicals having more than three carbon atoms are indicated without reference to their isomeric form, then the respective n-isomers are intended. The following abbreviations are used in Examples: "Ph" for phenyl, "Me" for methyl, "Et" for ethyl, He for hexyl, "Ar" for aryl, "DMSO" for di-me-tyl sulfoxide, "U.V." for ultraviolet spectrum, "I.R." for infrared spectrum, "H NMR" for hydrogen nuclear magnetic resonance spectrum (indication of displacement values in ppm), "13C NMR, for carbon nuclear magnetic resonance spectrum (indication of displacement values in ppm) Examples A: Preparation of the bromides and iodides General procedure A nitrogenous base equivalent is stirred in diethyl ether at room temperature.An equivalent of a solution of the corresponding a-bromoketone in toluene is added and the reaction mixture is stirred by one hour The precipitated bromide is filtered, washed with diethyl ether and the solvent is removed under vacuum, yielding the product with yields of 80 to 90% In the examples, the extinction coefficients e denote the molar extinction coefficients in unit 1 / mol cm Example Al Analysis for C 14 H 22 NO Br: calculated: C 56.01; H 7.39; N 4.67; Br 26.61. Found: C 56.02; H 7.34; N 4.45; Br 26.82. U.V. (CHC13) max. at 255 nm (e 13300). X H NMR (CDC13): 8.03 (2H, d, ArH), 7.38 (1 H, t, ArH), 7.23 (2H, m, ArH), 5.20 (2H, s, CH2), 3.69 (6H, q, CH2CH3) and 1.16 (9H, t, CH2CH3). Example A2 U.V. (CHC13) max. at 294 nm (e 16800) * H NMR (CDCl 3): 8.37 (2H, d, ArH), 7.00 (2H, d, ArH), 5.44 (2H, s, CH2), 3.88 (9H, qys, CH2CH3 and OCH3 ) and 1.41 (9H, t, CH2CH3) Example A3 U.V. (MeOH) max. at 261 nm (e 12800). H NMR (CDCl 3): 8.63 (2H, d, ArH), 8.30 (2H, d, ArH), 5.84 (2H, s, CH2), 3.86 (6H, q, CH2CH3) and 1.41 (9H, t, CH2CH3) . Example A4 U.V. (CHCI3) max. at 243 nm (e 3000) and 305 nm (e 24000).

X H NMR (CDCl 3): 8.41 (2 H, d, Ar H), 7.74 (2 H, d, Ar H), 7.58 (2H, d, ArH), 7.44 (3H, m, ArH), 5.57 (2H, s, CH2), 3.87 (6H, q, CH2CH3) and 1. 42 (9H, t, CH2CH3). E j us A5 Br U.V. (H20) max. at 252 nm (e 14100). H NMR (D20): 8.01 (2H, d, ArH), 7.79 (ΔH, t, ArH), 7.6 ((2H, t, ArH), 3.81 (6H, t, NCH2) and 3.31 (6H, t, NCH2 Example A6 Analysis for C15H21N2OBr: calculated C 55.39; H 6.51; N 8.61; Br 24.57; found: C 55.11; H 6.59; N 8. 70; Br 24.65. U.V. (CHC13) max. at 259 nm (e 14000). X H NMR (CDCl 3): 8.15 (2H, d, ArH), 7.50 (ΔH, t, ArH), 7.37 (2H, t, ArH), 6.03 (ÍH, q, CH), 3.99 (3H, t, NCH2), 3.85 (3H, t, NCH2), 3.14 (6H, m, NCH2) and 1.59 (3H, d, CH3). Example A7 O ^ feti Q- 2Br- O U.V. (H20) max. at 254 nm (e 28200). X H NMR (DzO): 8.01 (4H, d, ArH), 7.80 (2H, t, ArH), 7.62 (4H, t, ArH) and 4.50 (12H, s, NCH2). Example A8 U.V. (MeOH) max. at 256 nm (e 23500). H NMR (D20): 8.07 (4H, d, ArH), 7.82 (2H, t, ArH), 7.66 (4H, t, ArH), 5.74 (2H, q, CH), 4.53 (6H, m, NCH2), 4.30 (6H, m, NCH2) and 1.85 (6H, d, CH3). Example A9 U.V. (CD3CN) max. to 245 (e 14600) and 281 (e 1500). X H NMR (DMSO): 9.06 (H, S, Ar H), 8.05 (2 H, d, Ar H), 7.80-7.60 (5 H, m, Ar H), 6.06 (2 H, s, CH 2) and 3.95 (3 H, s, NCH3). AlO example H NMR (CDC13): 8.07 (2H, d, ArH), 7.63 (1H, t, ArH), 7.50 (2H, t, ArH), 5.57 (2H, s, CH2), 3.67 (4H, m, NCH2) and 3.5-1.3 (12H, m, CH2). Example All X H NMR (CDC13): 8.02 (2 H, d, Ar H), 7.61 (H, t, Ar H), 7.48 (2 H, t, Ar H), 5.33 (2 H, s, CH 2). 3.84 (2H, t, NCH2), 3.67 (4H, m, NCH2), 3.14 (2H, m, CH2) and 2.3-2.1 (4H, m, CH2). Example A12 U.V. (CHCI3) max. at 297 nm (e 22000). H NMR (CDC13): 8.08 (2H, d, ArH), 7.67 (2H, d, ArH), 7.54 (2H, d, ArH), 7.37 (3H, m, ArH), 5.37 (2H, s, CH2) , 3.84 (2H, t, NCH2), 3.54 (4H, m, NCH2), 3.11 (2H, m, CH2) and 2.3-2.1 (4H, m, CH2). Example A13 Br a H NMR (CDCl 3): 8.57 (H, s, Ar H), 8.07 (2 H, d, Ar H), 7.64-7.50 (6 H, m, Ar H), 4.96 (2 H, s, CH 2), 3.94 (2 H, t, NCH2), 3.82 (2H, t, NCH2), 3.65 (4H, t, CH2), 3.45-3.30 (6H, m, CH2) and 2.4-2.1 (6H, m, CH2). Example Al4 U.V. (CHCI3) max. at 245 nm (e 30500), 291 nm (e 22300), 371 nm (e 17500) and 403 nm (e 14900). X H NMR (CDCl 3): 9.10 (1 H, d, Ar H), 8.66 (1 H, d, Ar H), 8.3-7.8 (7 H, m, Ar H), 5.56 (2 H, s, CH 2), 3.85 (2 H, t, NCH2), 3.57 (2H, t, NCH2), 3.23 (2H, t, CH2) and 2.4-2.1 (6H, m, CH2). The a-iodoketones are prepared from commercially available a-bromoketones by a Finkelstein reaction. The iodides are prepared in analogy to the bromides described above. Example A15"Analysis for C ^ H ^ NO!: Calculated: C 43.30, H 5.29, N 4.59, 1 41.59, found: C 43.32, H 5.22, N 4.59, 1 41.82, UV (CHC13) max at 246 nm (e 25800 ). * H NMR (CD3CN): 8.00 (2H, d, ArH), 7.70 (H, t, ArH), 7.57 (2H, t, ArH), 5.18 (2H, s, CH2) and 3.37 (9H, s) , CH3) Example Al6 U.V. (CHC13) max. at 249 nm (e 18900). X H NMR (CDCl 3): 8.19 (2 H, d, Ar H), 7.58 (H, t, Ar H), 7.43 (2H, t, ArH), 5.25 (2H, s, CH2), 3.82 (6H, q, CH2CH3) and 1.34 (9H, t, CH2CH3). Example A17 U.V. (CHCI3) max. at 245 nm (e 10300) and 295 nm (e 18100). H NMR (CDCl 3): 8.25 (2H, d, ArH), 6.93 (2H, d, ArH), 5.20 (2H, s, CH2), 3.82 (9H, qys, CH2CH3 and 0CH3) and 1.37 (9H, t, CH2CH3).

Example Al 8 H NMR (CDCl 3): 8.59 (2 H, d, Ar H), 8.32 (2 H, d, Ar H), 5.68 (2 H, s, CH 2), 3.86 (6 H, q, CH 2 CH 3) and 1.44 (9 H, t, CH 2 CH 3) . Example Al 9 U.V. (CHC13) max. at 244 nm (e 11100) and 305 nm (e 23400). H NMR (CDCl 3): 8.38 (2 H, d, Ar H), 7.72 (2 H, d, Ar H), 7.57 (2 H, d, Ar H), 7.42 (3 H, m, Ar H), 5.40 (2 H, s, CH 2) , 3.88 (6H, q, CH2CH3) and 1.42 (9H, t, CH2CH3). Example A20 U.V. (MeOH) max. at 249 nm (e 14900). X H NMR (D 20): 8.00 (2H, d, ArH), 7.78 (1H, t, ArH), 7.64 (2H, t, ArH), 3.81 (6H, t, NCH2) and 3.31 (6H, t, NCH2) .

Example A21 Analysis for C22H26N20212: calculated: C 43.73; H 4.34; N 4.64; 1 42.00. found: C 43.29; H 4.24; N 4.29; 1 41.82. U.V. (MeOH) max. at 252 nm (e 28400). H NMR (DMSO): 8.04 (4H, d, ArH), 7.79 (2H, t, ArH), 7.64 (4H, t, ArH), 5.55 (4H, s, CH2) and 4.31 (12H, s, NCH2) . Example A22 U.V. (CH3CN) max. to 246 (e 27400). X H NMR (DMSO): 9.03 (H, s, Ar H), 8.05 (2 H, d, Ar H), 7.80-7.60 (5 H, m, Ar H), 6.04 (2 H, s, CH 2) and 3.95 (3 H, s, NCH3). Example A23 or rT ^ .N '.

Analysis for C15H17N201: calculated: C 48.93; H.65; N 7.61; 1 34.46. found: C 48.89; H 4.60; N 7.34; 1 34.48. U.V. (CH3CN) max. at 257 (e 20500), 289 nm (e 26200) and 364 (e 7000). H NMR (DMSO): 8.18 (2H, d, ArH), 8.03 (2H, d, ArH), 7.76. (1H, t, ArH), 7.64 (2H, d, ArH), 7.12 (2H, d, ArH), 5.96 (2H, s, CH2) and 3.23 (6H, s, NCH3). Example A24 Analysis for C20H42N7OP21: calculated: C 41.03; H 7.23; N 16. 75/1 21.68. found: C 40.62 / H 7.49 / N 17.10 / 1 21.56. Example A25 OR U.V. (CHC13) max. at 245 nm (e 9500), 288 nm (e 23500) and 366 nm (e 4100).

H NMR (CDCl 3): 7.98 (2H, d, ArH), 6.92 (2H, d, ArH), 5.35 (2H, s, CH2), 3.81 (3H, s, OCH3), 3.65 (4H, m, NCH2) and 3.5-1.3 (12H, m, CH2). Example A26 , U.V. (CHCI3) max. at 247 nm (e 9800) and 287 nm (e 19500). H NMR (CDC13): 7.97 (2H, d, ArH), 6.95 (2H, d, ArH), 5.14 (2H, s, CH2), 3.85 (5H, m, NCH2 and OCH3), 3.55 (4H, m, NCH2), 3.10 (2H, m, NCH2) and 2.4-2.2 (4H, m, CH2). Example A27 l.R. (KBr): 1690 cm-1, 1665 cm "1 (C = 0). H NMR (CDC13): 8.72 (ΔH, s, ArH), 8.02 (2H, m, ArH), 7. 85 (2H, m, ArH), 7.56 (2H, m, ArH), 5.45 (2H, s, CH2), 3.84 (2H, t, NCH2), 3.58 (4H, m, NCH2), 3.17 (2H, m, CH2) and 2.3-2.1 (4H, m, CH2). Example A28: l.R. (KBr): 1695 cm "1, 1665 was" 1 (C = 0), 1640 cm-1. X H NMR (CDCl 3): 8.95 (H, d, Ar H), 8.43 (H, d, Ar H), 8.14 (ÍH, dd, ArH), 7.54 (4H, m, ArH), 5.42 (2H, s, CH2), 3.91 (2H, t, NCH2), 3.71 (2H, t, NCH2), 3.62 (2H, t, NCH2), 3.25 (2H, t, NCH2) and 2.4-2.2 (4H, m, CH2) '. Examples B: Preparation of borate salts General procedure for the preparation of tetraphenylborates One equivalent of the bromides is stirred in water at room temperature and one equivalent of an aqueous solution of sodium tetraphenyl borate is added. The precipitated tetraphenyl borate salt is isolated by filtration, washed with water and dried under vacuum, yielding the product in 95% yield.

Example Bl BPh Analysis for C38H42NOB: calculated:: C 84.59 / H 7. 85 / N 2.60 / found: C 84.31 / H 8.18 / N 2.16. U.V. (CHC13) max. at 251 nm (e 18900). X H NMR (CDCl 3): 7.63 (3 HL, m, Ar H), 7.28 (lOH, m, Ar H), 6.94 (8 H, t, Ar H), 6.80 (4 H, t, Ar H), 3.78 (2 H, s, CH 2) , 2.81 (6H, q, CH2CH3) and 0.75 (9H, t, CH2CH3). 13 C NMR (CDCl 3): 189.93, 165.96, 165.17, 164.39, 163.61, 136.72, 135. 49, 133.99, 129.44, 128.43, 128.37, 128.24, 128.04, 127. 87, 127.81, 127.66, 127.48, 127.40, 127.37, 126.24, 126. 20, 126.16, 126.12, 122.27, 116.68, 58.60, 54.50 and 7. 41. Example B2 Analysis for C39H44N02B: calculated:: C 82.24 / H 7.79 / N 2.46 / found: C 82.05 / H 8.21 / N 2.24. 'H NMR (DMSO): 8.04 (2H, d, ArH), 7.16 (lOH, m, ArH), 6.93 (8H, t, ArH), 6.80 (4H, t, ArH), 5.09 (2H, s, CH2 ), 3.89 (3H, s, OCH3), 3.59 (6H, q, CH2CH3) and 1.20 (9H, t, CH2CH3). Example B3 Ph Analysis for C44H46NOB: calculated:: C 85.84 / H 7.53 / N 2.28 / found: C 85.86 / H 7.55 / N 2.04. X H NMR (DMSO): 8.15 (2 H, d, Ar H), 7.95 (2 H, d, Ar H), 7.81 (2 H, d, Ar H), 7.50 (3 H, m, Ar H), 7.17 (8 H, m, Ar H) , 6.93 (8H, t, ArH), 6.80 (4H, t, ArH), 5.21 (2H, s, CH2), 3.62 (6H, q, CH2CH3) and 1.25 (9H, t, CH2CH3). Example B4 Analysis for C35H36NOB: calculated:: C 84.50 / H 7.29 / N 2.82; found: C 84.52 / H 7.29 / N 2.64. X H NMR (DMSO): 7.99 (2 H, d, Ar H), 7.77 (H, t, Ar H), 7.63 (2 H, t, Ar H), 7.18 (8 H, m, Ar H), 6.93 (8 H, t, Ar H) , 6.79 (4H, t, ArH), 5.27 (2H, s, CH2) and 3.31 (9H, s, CH3). Example B5 Analysis for C 38 H 39 N 2 O B: calculated:: C 82.90 / H 7.14 / N 5.09; found: C 82.78 / H 7.12 / N 4.79.

H NMR (CD3COCD3): 8.02 (2H, d, ArH), 7.71 (ΔH, t, ArH), 7.58 (2H, t, ArH), 7.35 (8H, m, ArH), 6.92 (8H, m, ArH) , 6.77 (4H, m, ArH), 3.87 (6H, m, NCH2) and 3.33 (6H, m, NCH2). Example B6 Analysis for C70H66N2OB:: calculated: C 85.02 / H 6.73 / N 2. 83 / found: C 84.97 / H 6.60 / N 2.87. XH NMR (CD3COCD3): 8.00 (4H, d, ArH), 7.77 (2H, t, ArH), 7.60 (4H, t, ArH), 7.34 (16H, m, ArH), 6.93 (16H, m, ArH) , 6.78 (8H, m, ArH), 5.63 (2H, s, CH2) and 4.69 (12H, m, NCH2). Example B7 Analysis for C39H41NOB: calculated :: C 82.97 / H 7.32 / N 4. 96 / found: C 82.67 / H 7.11 / N 4.92. X H NMR (CD 3 COCD 3): 8.00 (2 H, d, Ar H), 7.67 (H, t, Ar H), 7.50 (2 H, t, Ar H), 7.22 (8 H, m, Ar H), 6.79 (8 H, m, Ar H) , 6.64 (4H, m, ArH), 5.45 (ÍH, q, CH), 3.83 (3H, m, NCH2), 3.57 (3H, m, NCH2), 3.16 (6H, m, NCH2) and 1.65 (3H, d, CH3).

Example B8 L? L NMR (CD3COCD3): 7.97 (4H, d, ArH), 7.66 (2H, t, ArH), 7.51 (4H, t, ArH), 7.22 (16H, m, ArH), 6.79 (16H, m, ArH), 6.65 (8H, m, ArH), 5.88 (2H, m, CH), 4.57 (6H, m, NCH2), 4.35 (6H, m, NCH2) and 1.78 (6H, m, CH3). Example B9 * H NMR (CDCl 3): 7.57 (2H, d, ArH), 7.5-6.8 (22H, m, ArH), 3.88 (3H, s, OCH3), 3.85 (2H, S, CH2), 3.23 (2H, m , CH2), 3.06 (3H, m, CH2), 2.87 (H, m, CH2), 2.53 (2H, t, CH2), 1.87 (2H, m, CH2) and 1.7-1.3 (6H, m, CH2) . BIO example BPh, Analysis for C 39 H 39 N 2 O B: calculated: C 83.27 / H 6.99; N 4.98; found: C 82.90; H 7.20; N 4.97. H NMR (C6D6): 7.78 (3H, m, ArH), 7.61 (5H, m, ArH), 7.15 (14H, m, ArH), 6.77 (3H, m, ArH), 3.35 (2H, s, CH2) , 2.22 (2H, q, CH2). , 1.8-1.0 (12H, m, CH2) and 0.23 (9H, t, CH3). Example Bll Analysis for C40H43N2O2B: calculated: C 80.80; H 7.29; N, 4.71; found: C 81.01; H 7.29; N 4.62. U.V. (CH3CN) max. at 275 nm (e 20100). XH NMR (CDC13): 7.62 (2H, d, ArH), 7.5-6.8 (22H, m, ArH), 3.90 (3H, s, OCH3), 3.79 (2H, s, CH2), 3.51 (2H, t, CH2), 3. 17 (2H, t, CH2), 2.79 (2H, t, CH2), 2.53 (2H, t, CH2) and 1.86 (6H, m, CH2). Example B12 U.V. (CHC1X max at 243 nm (e 11800), 274 nm (e 14900) and 312 nm (e 9400).

X H NMR (CDC13): 7.88 (H, d, Ar H), 7.45 (8 H, m, Ar H), 6.94 (8 H, t, Ar H), 6.57 (H, d, Ar H), 6.41 (H, d, Ar H) , 4.07 (2H, s, CH2), 3.86 (3H, s, OCH3), 3.61 (3H, s, OCH3), 3.00 (2H, t, CH2), 2.65 (2LH, t, CH2), 2.56 (2H, t, CH2), 1.53 (2H, t, CH2) and 1.30 (6H, m, CH2). Example B13 Analysis for C45H43N2OB: calculated: C 84.63; H 6.79; N 4.39; found: C 84.50; H 6.84; N 4.35. XH NMR (CDC13): 7.7-6.7 (29H, m, ArH), 3.71 (2H, s, CH2), 3.08 (2H, t, NCH2), 2.72 (2H, t, NCH2) 253 (2H, t, NCH2 ) and 1.7-1.4 (6H, m, CH2). Example B14 Analysis for C43H41N.OB: calculated :: C 84.31; H 6.75; N 4.57; found: C 84.20; H 6.82; N 4.50. U.V. (CH3CN) max. at 250 nm (e 63000) and 284 nm (e 10100). X H NMR (CD 3 CN): 8.58 (H, s, Ar H), 8.00 (4 H, m, Ar H), 7.68 (2 H, m, Ar H), 7.27 (8 H, m, Ar H), 6.98 (8 H, m, Ar H) , 6.83 (4H, t, ArH), 5.04 (2H, s, CH2), 3.71 (2H, t, NCH2), 3.40 (4H, m, NCH2), 2.77 (2H, t, CH2) and 2.1-1.8 ( 6H, m, CH2). Example B15 U.V. (CHC13) max. at 246 nm (e 40700), 292 nm (e 21100), 374 nm (e 16600) and 406 nm (e 15600). Example B16 l.R. (KBr): 1695 cm "1 1680 cm" 1 (C = 0), 1665 cm "1, 1640 cm" 1. X H NMR (CD 3 COCD 3): 9.01 (ΔH, d, ArH), 8.54 (ΔH, d, ArH), 8.16 (1H, dd, ArH), 7.86 (ΔH, d, ArH), 7.78 (2H, dd, ArH) , 7.64 (HH, m, ArH), 7.35 (8H, m, ArH), 6.79 (4H, t, ArH), 5.18 (2H, s, CHX, 3.70 (2H, t, NCH2), 3.58 (2H, t , NCH2), 3.40 (2H, dd, NCH2) and 2.7-2.1 (6H, m, CH2) Preparation of the tetra (4-fluorophenyl) borate salts One equivalent of the bromides is stirred in water at room temperature and one equivalent of an aqueous solution of sodium tetra (4-fluorophenyl) borate dihydrate is added.The precipitated tetra (4-fluorophenyl) borate salt is isolated by filtration, washed with water and dried under vacuum to give the product in quantitative yield.

U.V. (CHC13) max. at 255 nm (e 16100). x? i NMR (CDC13): 7.81 (2H, d, ArH), 7.63 (ΔH, t, ArH), 7.45 (2H, t, ArH), 7.16 (8H, m, ArH), 6.67 (8H, m, ArH), 4.36 (2H, s, CH2), 3.32 (6H, q, CH2CH3) and 1.08 (9H, t, CH2CH3). 13C NMR (C6D6): 162.34, 159.20, 137.61, 135.69, 129.57, 128.52, 128. 20, 127.88, 116.92, 54.67 and 7.44. Example B18 Analysis for C39H35N2OBF4: calculated: C 73.82; H 5.56; N 4.41; found: C 73.62; H 5.55; N 4.63. U.V. (CHCI3) max. at 246 nm (e 20700). XH NMR (C6Db): 7.74 (2H, d, ArH), 7.61 (8H, m, ArH), 7.34-7.15 (3H, m, ArH), 6.91 (8H, m, ArH), 4.09 (2H, s, CH2), 2.22 (2H, q, CH2), 1.8-1.0 (12H, m, CH2) and 0.23 (9H, t, CH3) 13C NMR (CDCl3): 197.79, 167.20, 163.43, 141.89, 139.85, 134.37, 133.53 , 117.48, 117.43, 117.19, 117.15, 64.01, 59.94, 51.83, 47.73, 35.70, 24.15 and 23.16. Preparation of tetra (2, 3,4,5,6-Pentafluorophenyl) borate salt One equivalent of the bromides is stirred in water at room temperature and one equivalent of a methanolic / aqueous solution (3/1) of tetra (2). , 3, 4, 5, 6 -pentafluorophenyl) borate tetraethylammonium, is added. The precipitated tetra (2,3,4,5,5-pentafluorophenyl) borate is isolated by filtration, washed with water and dried under vacuum giving the product with a 75% yield. Example B19 U.V. (CHC13) max. at 256 nm (e 12800). H NMR (CDC13): 7.85 (2H, d, ArH), 7.63 (1H, t, ArH), 7.44 (2H, t, ArH), 4.60 (2H, s, CH2), 3.52 (6H, q, CH2CH3) and 1.17 (9H, t, CH2CH3). Preparation of the tri (3-fluorophenyl) hexylborate salt An equivalent of the bromides is stirred in water at room temperature and one equivalent of a methanolic solution of tetramethyl ammonium tri (3-fluorophenyl) hexyl borate is added. The precipitated tri (3-fluorophenyl) hexyl borate salt is isolated by filtration, washed with water and dried in vacuo to give the product in 75% yield. Example B20 U.V. (CHC13) max. at 252 nm (e 17600). X H NMR (CDCl 3): 7.68 (3 H, m, Ar H), 7.49 (2 H, t, Ar H), 7.22 (3 H, d, Ar H), 6.99 (6 H, m, Ar H), 6.53 (3 H, m, Ar H) , 3.78 (2H, s, CH2), 2.99 (6H, q, CH2CH3) and 1.4-0.7 (22H, m, CH2 and CH3). Example B21: U.V. (CHCI3) max. Bei 257 nm (e 89900), 369 nm (e 6300) and 388 nm (e 5800). X H NMR (CDCl 3): 8.62 (δH, s, ArH), 8.11 (2H, m, ArH), 7.62-7.45 (6H, m, ArH), 7.08 (3H, m, ArH), 6.87 (6H, m, ArH), 6.41 (3H, m, ArH), 4.24 (2H, s, CH2), 3.44 (2H, t, NCH2), 3.15 (2H, t, NCH2), 3.04 (2H, t, NCH2), 2.51 ( 2H, t, CH2), 2.01-1.7 (4H, m, CHJ and 1.3-0.7 (13H, m, CH2 and CH3) Example B22: U.V. (CHC13) max. at 256 nm (e 55600), 298 nm (e 11400) and 346 nm (e 2400). X H NMR (CDC13): 8.21 (1H, s, ArH), 8.01 (ΔH, d, ArH), 7.90 (2H, m, ArH), 7.81 (ΔH, d, ArH), 7.64 (2H, m, ArH) , 7.21 (3H, m, ArH), 6.94 (6H, m, ArH), 6.49 (3H, m, ArH), 4.16 (2H, S, CH2), 3.44 (2H, t, NCH2), 3.06 (2H, t, NCH2), 2.87 (2H, t, NCH2), 2.14 (2H, t, CH2), 2.0-1.7 (4H, m, CH2) and 1.3-0.7 (13H, m, CH_ and CH3). Example B23: U.V. (CHCI3) max. at 246 nm (e 34800), 292 nm (e 24100), 371 nm (e 18500) and 404 nm (e 15800). X H NMR (CDCl 3): 9.16 (ΔI, d, ArH), 8.3-7.9 (8H, m, ArH), 7.3-6.8 (9H, m, ArH), 6.50 (3H, m, ArH), 4.32 (2H, s, CH2), 3.36 (2H, t, NCH,), 3.01 (2H, t, NCH2), 2.91 (2H, t, NCH2), 2.18 (2H, t, CH2), 2.0-1.7 (4H, m, CH2) and 1.3-0.6 (13H, m, CH2 and CH3). Example B24 XH NMR (CD3COCD3): 8.00 (4H, d, ArH), 7.77 (2H, t, ArH), 7. 60 (4H, t, ArH), 7.34 (16H, m, ArH), 6.93 (16H, m, ArH), 6. 78 (8H, m, "ArH), 5.63 (2H, s, CH2) and 4.69 (12H, m, NCH2), 7. 22 (3H, d, ArH), 6.99 (6H, m, ArH), 6.53 (3H, m, ArH), 3. 78 (2H, s, CH2), 2.99 (6H, q, CH2CH3) and 1.4-0.7 (22H, m, CH2 and CH3). Example B25 ^? NMR (CDCl 3): 7.47 (2H, d, ArH), 7.0-6.4 (14H, m, ArH), 4.04 (2H, s, CH2), 3.69 (3H, s, OCH3), 3.16 (2H, m, CH2 ), 3.00 (3H, m, CH2), 2.85 (H, m, CH2), 2.62 (2H, m, CH2), 1.91 (2H, m, CH2) and 1.7-0.6 (19H, m, CH2). Example B26 U.V. (CHCI3) max. at 247 nm (e 24100). X H NMR (CDCl 3): 7.62 (3 H, m, Ar H), 7.44 (2 H, m, Ar H), 7.05 (3 H, m, Ar H), 6.86 (6 H, m, Ar H), 6.42 (3 H, m, Ar H) , 3.97 (2H, S, CH,), 2.62 (2H, t, NCH2), 2.50 (2H, t, NCH2), 2.33 (2H, t, NCH _,), 1.74 (2H, t, CH2), 1.29 ( 2H, m, CH2) and 1.15 (2H, m, CH2). Example B27 X H NMR (CDCl 3): 7.62 (2 H, d, Ar H), 7.08 (3 H, m, Ar H), 6.86 (8 H, m, Ar H), 6.42 (3 H, m, Ar H), 3.96 (2 H, s, CH 2) , 3.81 (3H, s, 0CH3), 3.30 (2H, t, CH2), '2.94 (2H, t, CH2), 2.75 (2H, t, CH2), 2.03 (2H, t, CH2), 1.76 (4H , m, CH2) and 1.3- 0.6 (13H, m, CH; and CH3). Preparation of tetra (3-methylphenyl) borate salt An equivalent of the bromides is stirred in dimethylformamide at room temperature and one equivalent of a solution of tetrakis (3-methylphenyl) borate cesium in dimethylformamide is added. The precipitated tetrakis (3-methylphenyl) borate salt is isolated by filtration, washed several times with water and dried under vacuum. Example B28 U.V. (CHC1J max at 245 nm (e 17200) and 298 nm (e 23000).

XH NMR (CDC13): 7.57 (5H, m, ArH), 7.43 (4H, m, ArH), 7.31 (4H, m, ArH), 7.21 (4H, m, ArH), 6.77 (4H, t, ArH), 6.57 (4H, d, ArH), 3.51 _ (2H, s, CH2), 3.02 (2H, t, CH2), 2.64 (2H, t, CHX, 2.49 (2H, t, CH,), 2.05 (12H, s, CH3) and 1.7-1.4 (9H, m, CH3) Example B29: X H NMR (CDCl 3): 9.16 (1H, d, ArH), 8.38 (1H, d, ArH), 8.28- 8.03 (7H, m, ArH), 7.44 (4H, m, ArH), 7.21 (4H, m, ArH), 7.77 (4H, t, ArH),, 6.57 (4H, d, ArH), 3.51 (2H, s, CH2), 3. 02 (2H, t, CHJ, 3.64 (2H, t, CH2), 2.49 (2H, t, CHJ, 2.05 (12H, s, CH3) and 1.7-1.4 (9H, m, CH3) Example B30: U.V. (CHC13) max. at 245 nm (e 31900) and 305 nm (e 41800). * H NMR (CDCl 3): 7.71-7.31 (20H, m, ArH), 6.86-6.57 (6H, m, ArH), 3.88 (2H, s, CHJ, 3.24 (2H, t, CHj, 2.87 (2H, t , CHJ, 2.62 (2H, t, CHJ, 2.05 (12H, s, CH3) and 2.4-1.5 (42H, m, CH2 and CH3) Examples of Application C Procedure for the addition of Michael initiated by UV with dimethylmalonate and n -butylacrylate The latent base (7.4 x 10"5 moles) and 2,2,6,6-tetramethyl-1-piperidinyloxy (7.4 x 10" 5 moles) are dissolved in a 1: 1 mixture of dimethylmalonate and n-butylacrylate ( 200 mg, 7.4 x 10"4 moles) This mixture is irradiated by a silica flask using a high pressure mercury vapor lamp (200 watt) at a distance of 30 cm. Example Cl A compound of Example B13 is used.After 2 hours of exposure to light, a 55% reaction is found and after 100 hours 100% is reacted Example C2 A compound of Example B30 is used. achieves entanglement by exposure to visible light Examples of Use D Base catalysis with oligomeric / polymeric compounds Example DI Preparation of urethane acrylate based on isophorone diisocyanate and 4-hydroxybutylacrylate. The reaction is carried out under nitrogen and all commercially available chemicals used are used without further purification. 1566.8 g (13.78 moles of NCO) of isophorone diisocyanate, 2.3 g of dibutyltin dilaurate, 2. 3 g of 2, 5-diter-butyl-p-cresol and 802.8 g of butylacetate are placed in a three-necked flask equipped with condenser and addition funnel. Dry nitrogen is bubbled through the reaction mixture and the temperature rises slowly to 60 ° C.

Subsequently, 1987 g (13.78 moles) of 4-hydroxybutylacrylate are added, the reaction solution is slowly heated to 80 ° C. The temperature is maintained at 80 ° C and the addition funnel is rinsed with butylacetate (86.6 g). The reaction is observed by titration of the residual amount of isocyanate and is terminated when the isocyanate content is less than 0.2% based on the solid. The reaction product obtained has the following physical properties: Residual amount of 4-hydroxybutylacrylate: < 0.002%, based on the solid (HPLC analysis), color: < < Gardner 1, viscosity: 43 cPa s (20 ° C), solid: 79.3% (1 hour at 140 ° C), GPC data (polystyrene standard), Mn 778, Mw 796, d = 1.02.

. Preparation of a malonate polyester The reaction is carried out under nitrogen and all commercially available products are employed without further purification. In a reaction vessel equipped with a stirrer and condenser, 1045 g of 1.5 pentanediol, 1377.4 g of diethyl malonate and 242.1 g of xylene are carefully refluxed. The maximum temperature of the reaction mixture is 196 ° C while the temperature is maintained at 79 ° C in the condenser head. 862 g of ethanol in this manner are isolated by distillation corresponding to a reaction at 97.7%. Xylene is then stripped under vacuum at a temperature of 200 ° C. The polymer thus obtained has a solids content of 98.6%, a viscosity of 2710 mmPas and an acid number of 0.3 mg KOH / g, based on the solid. Mn is 1838, Mw is 3186, color is 175 on the APHA scale (process of the American Public Health Association, "Hazen color unit", ISO 6271). Cured with UV radiation 6.4 x 10"'moles of the photoinitiator of Example B28 are dissolved in a 1: 1 mixture of the above urethane acrylate and the polyester malonate (400 mg, total amount) This mixture is emptied into a glass plate at a 50 μm film and irradiated using a mercury vapor lamp with high pressure (200 W) at a distance of 30 cm.The film is tack-free after 30 minutes.

Claims (19)

CLAIMS 1. A compound of the formula (I) where m is 1 or 2 and corresponds to the number of positive charges of the cation; x is phenyl, naphthyl, phenanthryl, anthracyl, pyrenyl, 5, 6, 7, 8-tetrahydro-2-naphthyl, 5,6,7,8-tetrahydro-1-naphthyl, thienyl, benzo [b] thienyl, naphtho [ 2,3-b] thienyl, thiantrenyl, dibenzofuryl, chromenyl, xanthenyl, thioxanthyl, phenoxyntinyl, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolizinyl, isoindolyl, indolyl, indazolyl, purinyl, quinolizinyl, isoquinolyl, quinolyl, phthalazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, cinolinyl, pteridinyl, carbazolyl, beta-carbolinyl, phenanthridinyl, acridinyl, perimidinyl, phenanthrolinyl, phenazinyl, isothiazolyl, phenothiazinyl, isoxazolyl, furazanyl, terphenyl, stilbenyl, fluorenyl or phenoxazinyl, these radicals are unsubstituor mono- or polysubstituby alkyl with 1 to 18 carbon atoms, alkenyl with 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, NR6R7, N3, OH, CN, OR8 , SRb / C (0) Rj, C (O) OR? 0 or hal geno, or R: is a radical of the formula A or B
1. R2, R3 and R4 each independently are alkyl with 1 to 18 carbon atoms, alkenyl with 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, or phenyl, or R2 and R3 and / or R4 and R3 each forms independently of the other, an alkylene bridge with 2 to 12 carbon atoms; or R2, R3, R4 together with the linking nitrogen atom are a phosphazene base of the type P1 # P2 < t / 4 > or a group of structural formula (a), (b), (c), (d), (e), (f) or (g) where k and 1 each independently of the other is a number from 2 to 12; Rs, R6 / R7, R8, R9 and R10 are hydrogen or alkyl with 1 to 18 carbon atoms; or R5 and Rx together with the linking carbon atoms are a benzocyclopentanone radical; RX1 is alkyl with 1 to 18 carbon atoms, alkenyl with 2 to 18 carbon atoms, alkynyl with 2 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, NO, NR6R7, OH, CN, OR8, SR8, C (0) R9, C (O) OR10 or halogen; and n is 0 or 1, 2 or 3; R12, R13 and R14 are phenyl or other aromatic hydrocarbon, these radicals are unsubstituor mono- or polysubstituby alkyl having 1 to 18 carbon atoms, alkenyl with 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, OH, CN, OR8, SR8, C (0) R9, C (O) OR10 or halogen; R1S is alkyl having 1 to 18 carbon atoms, phenyl or other aromatic hydrocarbon, the phenyl and aromatic hydrocarbon radicals are unsubstituor mono- or polysubstituby alkyl having 1 to 18 carbon atoms, alkenyl having 3 to 18 carbon atoms, alkynyl with 3 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N02, OH, CN, OR8, SR8, C (0) R9, C (O) OR10 or halogen, or R15 is a radical / and X is alkylene with 1 to 20 carbon atoms, alkylene 2 to 20 carbon atoms, which is interrupby -O-, -S- or NRP or X is provided that if R? : , R13, R14 and R15 are simultaneously phenyl, (a) R2, R3 and R "are not simultaneously methyl / and (b) R2, R3 and R4 together are not
2. 2 . A compound according to claim 1, characterized in that Rx is phenyl, naphthyl, pyrenyl, thioxanthyl or phenothiazinyl, these radicals are alkyl with 1 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms unsubstituor mono- or polysubstitu NR6R, CN, N02, SR8 or 0R-.
3. 3. A compound according to claim 1, characterized in that R2, R3 and R4 each independently of the other is alkyl with 1 to 18 carbon atoms or R2 and R3 and / or R4 and R3 each independently of the other form an alkylene bridge with 2 to 12 carbon atoms / or R2, R3, R4 together with the nitrogen bonds are a group of the structural formulas (a), (b), (c), (d), (e), (f), (g), (h) or a phosphazene base of the type Px, P2 or P < t / 4 > .
4. 4. A compound according to claim 1• characterized in that R2, R3 and R4 each independently of the other is alkyl with 1 to 18 carbon atoms, or R2, R3, R4 together with the nitrogen atom are a group of the structural formula (a), (b) , (c), (d) or (e).
5. 5. A compound according to claim 1, characterized in that R12, R13, RX4 are phenyl, biphenylyl, naphthyl, anthracyl or phenanthryl, these radicals are unsubstituted or mono- or polysubstituted by alkyl with 1 to 18 carbon atoms, haloalkyl with 1 to 18 carbon atoms, N0_, OH, CN, 0R8 or halogen and R15 is alkyl with 1 to 18 carbon atoms or phenyl which is unsubstituted or mono- or polysubstituted by alkyl with 1 to 18 carbon atoms, haloquyl with 1 to 18 carbon atoms, N02, OH, CN, 0R8 or halogen.
6. 6. A process for the preparation of a compound of the formula I, which comprises reacting in a first step, a nitrogenous base of the formula II NR2R3R4 (II) with an α-halogen ketone of the formula III Halogen CH R, (III) R5 O to a compound of formula IV (IV) and in a second step, reacting the compound of the formula IV with a compound of the formula V to the compound of formula I, wherein halogen is bromine or iodine, and M is Na, K or ammonium, and Rx, R2, R3, R4, R5, R12, R13, R14 and R15 have the meanings and preferred meanings claimed in claim 1.
7. 7. A composition, characterized in that it comprises: A) at least one compound of the formula (I) and (B) at least one organic compound that is capable of a substitution reaction or addition reaction catalyzed by base .
8. 8. A composition according to claim 7, characterized in that the component B) is an organic material crosslinkable or anionically polymerizable.
9. 9. A composition according to claim 7, characterized in that component B) is one of the following systems: a) an acrylate copolymer having alkoxysilane or alkoxysiloxane side groups, b) a two component system comprising a polyester and / or polyacrylate containing hydroxyl group and an aliphatic or aromatic polyisocyanate, c) a two-component system comprising a polyepoxide and a functional polyacrylate, wherein the polyacrylate contains carboxyl or anhydride groups, d) a two-component system comprising a polyester or polyacrylate containing hydroxyl group modified with silicone or modified with fluorine and an aliphatic or aromatic polyisocyanate, e) a two-component system comprising a (poly) ketimine and an aliphatic or aromatic polyisocyanate, f) a two-component system comprising a (poly) ketimine and an unsaturated acrylate resin or an acetoacetate resin or methyl a-acrylamidomethylglycollate , h) a two component system comprising a (poly) oxazolidine and a polyacrylate containing anhydride groups, or an unsaturated acrylate resin or a polyisocyanate, i) a two component system comprising a polyacrylate containing epoxy group and a polyacrylate containing carboxyl group, 1) an allyl glycidyl ether-based polymer, m) a two-component system comprising a (poly) alcohol and a (poly) isocyanate, n) a two-component system comprising a carbonyl compound a, beta-ethylenically unsaturated and a compound containing activated CH2 groups.
10. 10. A composition according to claim 7, characterized in that component B) is one of the following systems: b) a. a two-component system comprising a polyester and / or polyacrylate containing hydroxyl group and an aliphatic or aromatic polyisocyanate, c) a two-component system comprising a functional polyacrylate and a polyepoxide, wherein the polyacrylate contains carboxyl or anhydride groups, i ) a two-component system comprising a polyacrylate containing the epoxy group and a polyacrylate containing the carboxyl group, m) a two-component system comprising a (poly) alcohol and a (poly) isocyanate and n) a - two-component system comprising a carbonyl α, beta-ethylenically unsaturated compound and a compound containing activated CH 2 groups.
11. 11. A composition according to claim 7, characterized in that the component B) is an epoxy resin or a mixture of different epoxy resins.
12. 12. A composition according to claim 7, characterized in that component A is present in an amount of 0.01 to 10% by weight based on component B).
13. 13. A composition according to claim 7, characterized in that it additionally comprises a sensitizer selected from the group consisting of thioxanthones, oxazines, acridines, phenazines and rhodamines.
14. 14. A process for carrying out base catalyzed reactions, characterized in that it comprises exposing a composition according to claim 7, to light having a wavelength in the range of 200 nm to 650 nm.
15. 15. A method according to claim 14, characterized in that it comprises heating the composition before or after exposure to light.
16. 16. Use of an organic compound according to claim 1, as photoinitiator for addition reactions or photochemically induced base-catalyzed substitution reactions.
17. 17. Use of an organic compound according to claim 1, as a photoinitiator for the preparation of coatings, molding compounds or photo-structured layers.
18. 18. A coated substrate, at least coated on a surface with a composition according to claim 7.
19. 19. A polymerized or interlaced composition according to claim 7.