MX2023000569A - Agentes tensoactivos de aminoacidos ramificados para productos electronicos. - Google Patents
Agentes tensoactivos de aminoacidos ramificados para productos electronicos.Info
- Publication number
- MX2023000569A MX2023000569A MX2023000569A MX2023000569A MX2023000569A MX 2023000569 A MX2023000569 A MX 2023000569A MX 2023000569 A MX2023000569 A MX 2023000569A MX 2023000569 A MX2023000569 A MX 2023000569A MX 2023000569 A MX2023000569 A MX 2023000569A
- Authority
- MX
- Mexico
- Prior art keywords
- amino acid
- branched amino
- electronics products
- acid surfactants
- surfactants
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/38—Cationic compounds
- C11D1/46—Esters of carboxylic acids with amino alcohols; Esters of amino carboxylic acids with alcohols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/38—Cationic compounds
- C11D1/62—Quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/38—Cationic compounds
- C11D1/65—Mixtures of anionic with cationic compounds
- C11D1/655—Mixtures of sulfonated products with alkylolamides of carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/75—Amino oxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
- C11D1/92—Sulfobetaines ; Sulfitobetaines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
-
- H10P50/642—
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- H10P50/287—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Weting (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Biochemistry (AREA)
Abstract
Agentes de pretexturizado, grabadores y agentes eliminadores de fotorresistencia pueden formularse para incluir uno o más agentes tensoactivos ramificados, de una o más clases de agentes tensoactivos, tales como derivados de aminoácidos que tienen propiedades activas de superficie.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063051187P | 2020-07-13 | 2020-07-13 | |
| PCT/US2021/041342 WO2022015677A2 (en) | 2020-07-13 | 2021-07-12 | Branched amino acid surfactants for electronics products |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2023000569A true MX2023000569A (es) | 2023-03-09 |
Family
ID=77265204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2023000569A MX2023000569A (es) | 2020-07-13 | 2021-07-12 | Agentes tensoactivos de aminoacidos ramificados para productos electronicos. |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US12071578B2 (es) |
| EP (1) | EP4179056A2 (es) |
| JP (1) | JP7470249B2 (es) |
| KR (2) | KR102807717B1 (es) |
| CN (1) | CN116601275A (es) |
| AU (2) | AU2021307398B2 (es) |
| BR (1) | BR112023000525A2 (es) |
| CA (1) | CA3184842A1 (es) |
| MX (1) | MX2023000569A (es) |
| WO (1) | WO2022015677A2 (es) |
| ZA (1) | ZA202301112B (es) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4179051A1 (en) * | 2020-07-13 | 2023-05-17 | AdvanSix Resins & Chemicals LLC | Branched amino acid surfactants for cleaning products |
| CN118703070A (zh) * | 2020-07-13 | 2024-09-27 | 艾德凡斯化学公司 | 用于油墨、涂料和胶粘剂的支链氨基酸表面活性剂 |
| BR112023000521A2 (pt) * | 2020-07-13 | 2023-01-31 | Advansix Resins & Chemicals Llc | Tensoativos de aminoácidos ramificados para uso em produtos de cuidados com a saúde |
| TWI865805B (zh) * | 2020-07-28 | 2024-12-11 | 美商Cmc材料有限責任公司 | 包含陰離子性及陽離子性抑制劑之cmp組合物 |
| TW202346540A (zh) * | 2022-05-25 | 2023-12-01 | 日商東京應化工業股份有限公司 | 蝕刻劑組成物 |
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|---|---|---|---|---|
| US4176232A (en) | 1968-06-27 | 1979-11-27 | Rohm And Haas Company | Sulfonic acid salts of acyloxyalkylamines |
| US4550137A (en) | 1983-03-28 | 1985-10-29 | Ppg Industries, Inc. | Lactam derived salts of sulfonic acids as latent acid catalysts |
| JPH01190798A (ja) | 1988-01-27 | 1989-07-31 | Kao Corp | 漂白剤組成物 |
| AU4712189A (en) | 1989-01-03 | 1990-07-12 | Amway Corporation | Nonionic laundry detergent composition |
| JP3425227B2 (ja) | 1994-07-15 | 2003-07-14 | 花王株式会社 | 液体漂白剤組成物 |
| DE69528883T2 (de) | 1994-07-27 | 2003-09-18 | Kao Corp., Tokio/Tokyo | Flüssige weichmacher und quaternäre ammoniumsalze |
| JP3502679B2 (ja) | 1995-01-19 | 2004-03-02 | 花王株式会社 | 第4級アンモニウム塩の製造方法 |
| JP3502680B2 (ja) | 1995-01-19 | 2004-03-02 | 花王株式会社 | 第4級アンモニウム塩の製造方法 |
| JP3563473B2 (ja) | 1995-02-24 | 2004-09-08 | 花王株式会社 | 新規な第4級アンモニウム塩及びその製造法 |
| JP3221811B2 (ja) | 1995-02-27 | 2001-10-22 | 花王株式会社 | 液体柔軟仕上剤組成物 |
| JP3469974B2 (ja) | 1995-10-09 | 2003-11-25 | 花王株式会社 | 液体柔軟仕上剤組成物 |
| GB2310659A (en) | 1996-02-27 | 1997-09-03 | Procter & Gamble | Cationic detergent compounds |
| KR100288769B1 (ko) | 1998-07-10 | 2001-09-17 | 윤종용 | 포토레지스트용스트리퍼조성물 |
| DE19831702A1 (de) | 1998-07-15 | 2000-01-20 | Henkel Kgaa | Nichtwäßrige Flüssigwaschmittel mit Bleiche |
| JP4357656B2 (ja) | 1999-08-06 | 2009-11-04 | 花王株式会社 | 第4級アンモニウム塩 |
| DE10021538B4 (de) | 2000-05-03 | 2008-06-19 | Henkel Kgaa | Wäschenachbehandlungsmittel mit Farbschutz |
| US20030060390A1 (en) | 2001-03-07 | 2003-03-27 | The Procter & Gamble Company | Rinse-added fabric conditioning composition for use where residual detergent is present |
| EP1502942A1 (en) | 2003-07-29 | 2005-02-02 | Clariant International Ltd. | Solid softener composition |
| JP4156467B2 (ja) | 2003-08-06 | 2008-09-24 | 花王株式会社 | 融解温度が降下された4級アンモニウム塩含有組成物の製造法 |
| DE602004008217T2 (de) | 2004-03-29 | 2008-05-15 | Clariant Produkte (Deutschland) Gmbh | Einfach dispergierbare konzentrierte Esterquat Zusammensetzungen |
| TW200710205A (en) * | 2005-06-16 | 2007-03-16 | Advanced Tech Materials | Dense fluid compositions for removal of hardened photoresist, post-etch residue and/or bottom anti-reflective coating layers |
| NZ577910A (en) | 2007-01-12 | 2012-04-27 | Novartis Ag | Process for preparing 5-biphenyl-4-amino-2-methyl pentanoic acid |
| US20120295447A1 (en) * | 2010-11-24 | 2012-11-22 | Air Products And Chemicals, Inc. | Compositions and Methods for Texturing of Silicon Wafers |
| JP2012116755A (ja) | 2010-11-29 | 2012-06-21 | Asahi Kasei Fibers Corp | 水性毛髪化粧料 |
| JP2012227304A (ja) * | 2011-04-19 | 2012-11-15 | Hayashi Junyaku Kogyo Kk | エッチング液組成物およびエッチング方法 |
| DE102011086924A1 (de) | 2011-11-23 | 2013-05-23 | Henkel Ag & Co. Kgaa | Haarkonditionierende Mittel |
| US20150141315A1 (en) | 2012-06-15 | 2015-05-21 | Rhodia Operations | Method to recover or increase water absorbency of polyester textile |
| JP2014129269A (ja) | 2012-12-28 | 2014-07-10 | Kao Corp | オレフィンの製造方法 |
| DE102013214081A1 (de) | 2013-07-18 | 2015-01-22 | Evonik Industries Ag | Neue aminosäuremodifizierte Siloxane, Verfahren zu ihrer Herstellung und Anwendung |
| US20160340610A1 (en) | 2014-01-17 | 2016-11-24 | Rhodia Operations | Method for stabilizing a softening composition |
| CN106459836B (zh) | 2014-06-18 | 2021-01-26 | 罗地亚经营管理公司 | 包含季铵化合物、阳离子多糖、非离子多糖以及芳香材料或香料的组合物 |
| CN107257847A (zh) | 2014-12-22 | 2017-10-17 | 罗地亚经营管理公司 | 包含多糖和疏水性化合物的固体组合物、其工艺和用途 |
| EP3237591B1 (en) | 2014-12-22 | 2019-05-29 | Rhodia Operations | A solid composition comprising a quaternary ammonium compound and a polysaccharide, the process and use thereof |
| US10073351B2 (en) * | 2014-12-23 | 2018-09-11 | Versum Materials Us, Llc | Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation |
| US20180002639A1 (en) | 2015-01-16 | 2018-01-04 | Rhodia Operations | Method for reducing greying of a fabric |
| DE102015223826A1 (de) | 2015-12-01 | 2016-09-15 | Henkel Ag & Co. Kgaa | Leistungsstarke Haarbehandlungsmittel mit strukturstärkendem Effekt |
| EP3390603A4 (en) | 2015-12-15 | 2019-07-10 | Rhodia Operations | METHOD FOR INCREASING THE STABILITY OF A COMPOSITION USING QAC AND POLYSACCHARIDES |
| WO2017100992A1 (en) | 2015-12-15 | 2017-06-22 | Rhodia Operations | Compositions comprising quat and polysaccharides |
| JP6096969B1 (ja) * | 2016-04-26 | 2017-03-15 | 株式会社フジミインコーポレーテッド | 研磨材、研磨用組成物、及び研磨方法 |
| BR112018074072A2 (pt) | 2016-05-26 | 2019-03-06 | Rhodia Operations | composição sólida para a purificação do açúcar |
| EP3532025B1 (en) | 2016-10-28 | 2021-02-24 | Unilever N.V. | Personal care compositions comprising surface-modified particles and non-volatile functionalised silicone |
| JP2020502380A (ja) | 2016-12-15 | 2020-01-23 | ローディア オペレーションズ | 布帛処理用の組成物 |
| EP4410317A3 (en) * | 2017-04-28 | 2024-10-30 | Acuitas Therapeutics Inc. | Novel carbonyl lipids and lipid nanoparticle formulations for delivery of nucleic acids |
| CA3069250C (en) * | 2017-07-07 | 2022-07-19 | The Procter & Gamble Company | Cleaning compositions comprising non-alkoxylated esteramines |
| WO2019036030A1 (en) | 2017-08-17 | 2019-02-21 | Acuitas Therapeutics, Inc. | LIPIDS FOR USE IN LIPID NANOPARTICLE FORMULATIONS |
| CN111433184B (zh) | 2017-12-05 | 2025-06-06 | 巴斯夫欧洲公司 | 氨基酸酯的有机磺酸盐及其制备方法 |
| BR112023000293A2 (pt) * | 2020-07-09 | 2023-03-21 | Advansix Resins & Chemicals Llc | Tensoativos de aminoácidos ramificados |
-
2021
- 2021-07-12 AU AU2021307398A patent/AU2021307398B2/en active Active
- 2021-07-12 BR BR112023000525A patent/BR112023000525A2/pt unknown
- 2021-07-12 JP JP2023502604A patent/JP7470249B2/ja active Active
- 2021-07-12 WO PCT/US2021/041342 patent/WO2022015677A2/en not_active Ceased
- 2021-07-12 MX MX2023000569A patent/MX2023000569A/es unknown
- 2021-07-12 US US17/373,713 patent/US12071578B2/en active Active
- 2021-07-12 KR KR1020237004528A patent/KR102807717B1/ko active Active
- 2021-07-12 EP EP21752311.7A patent/EP4179056A2/en active Pending
- 2021-07-12 KR KR1020257015160A patent/KR20250073513A/ko active Pending
- 2021-07-12 CN CN202180062655.XA patent/CN116601275A/zh active Pending
- 2021-07-12 CA CA3184842A patent/CA3184842A1/en active Pending
-
2023
- 2023-01-26 ZA ZA2023/01112A patent/ZA202301112B/en unknown
-
2024
- 2024-07-25 AU AU2024205104A patent/AU2024205104B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| AU2024205104A1 (en) | 2024-08-15 |
| AU2024205104B2 (en) | 2025-10-23 |
| US20220017821A1 (en) | 2022-01-20 |
| WO2022015677A3 (en) | 2022-03-10 |
| CN116601275A (zh) | 2023-08-15 |
| KR20250073513A (ko) | 2025-05-27 |
| AU2021307398A1 (en) | 2023-03-02 |
| BR112023000525A2 (pt) | 2023-01-31 |
| EP4179056A2 (en) | 2023-05-17 |
| AU2021307398B2 (en) | 2024-06-27 |
| JP7470249B2 (ja) | 2024-04-17 |
| US12071578B2 (en) | 2024-08-27 |
| CN116601275A8 (zh) | 2023-09-12 |
| JP2023534937A (ja) | 2023-08-15 |
| KR20230050327A (ko) | 2023-04-14 |
| WO2022015677A2 (en) | 2022-01-20 |
| KR102807717B1 (ko) | 2025-05-14 |
| ZA202301112B (en) | 2024-05-30 |
| NZ796921A (en) | 2025-07-25 |
| CA3184842A1 (en) | 2022-01-20 |
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