MX2022011056A - Tensioactivos para productos electronicos. - Google Patents
Tensioactivos para productos electronicos.Info
- Publication number
- MX2022011056A MX2022011056A MX2022011056A MX2022011056A MX2022011056A MX 2022011056 A MX2022011056 A MX 2022011056A MX 2022011056 A MX2022011056 A MX 2022011056A MX 2022011056 A MX2022011056 A MX 2022011056A MX 2022011056 A MX2022011056 A MX 2022011056A
- Authority
- MX
- Mexico
- Prior art keywords
- surfactants
- electronics products
- agents
- etchants
- formulated
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/04—Carboxylic acids or salts thereof
- C11D1/10—Amino carboxylic acids; Imino carboxylic acids; Fatty acid condensates thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
- C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C07C229/12—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of acyclic carbon skeletons
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C291/00—Compounds containing carbon and nitrogen and having functional groups not covered by groups C07C201/00 - C07C281/00
- C07C291/02—Compounds containing carbon and nitrogen and having functional groups not covered by groups C07C201/00 - C07C281/00 containing nitrogen-oxide bonds
- C07C291/04—Compounds containing carbon and nitrogen and having functional groups not covered by groups C07C201/00 - C07C281/00 containing nitrogen-oxide bonds containing amino-oxide bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/13—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
- C07C309/14—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton containing amino groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/042—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/34—Organic compounds containing sulfur
- C11D3/3481—Organic compounds containing sulfur containing sulfur in a heterocyclic ring, e.g. sultones or sulfolanes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/38—Alkaline compositions for etching refractory metals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
- G03F7/327—Non-aqueous alkaline compositions, e.g. anhydrous quaternary ammonium salts
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- ing And Chemical Polishing (AREA)
Abstract
a presente invención se refiere a agentes pre-texturizantes, agentes de grabado y agentes decapantes fotorresistentes que pueden formularse para incluir uno o más tensioactivos, de una o más clases de tensioactivos, tales como derivados de aminoácidos que tienen propiedades tensioactivas.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062988175P | 2020-03-11 | 2020-03-11 | |
| PCT/US2021/021595 WO2021183581A1 (en) | 2020-03-11 | 2021-03-09 | Surfactants for electronics products |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2022011056A true MX2022011056A (es) | 2022-12-06 |
Family
ID=75278382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2022011056A MX2022011056A (es) | 2020-03-11 | 2021-03-09 | Tensioactivos para productos electronicos. |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US12460131B2 (es) |
| EP (1) | EP4118165A1 (es) |
| JP (1) | JP7465366B2 (es) |
| KR (1) | KR102867891B1 (es) |
| CN (1) | CN115461429A (es) |
| AU (2) | AU2021234274B9 (es) |
| CA (1) | CA3170088A1 (es) |
| IL (1) | IL296231A (es) |
| MX (1) | MX2022011056A (es) |
| NZ (1) | NZ793239A (es) |
| WO (1) | WO2021183581A1 (es) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI786519B (zh) | 2020-01-29 | 2022-12-11 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI856233B (zh) | 2020-01-29 | 2024-09-21 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| CN115461428B (zh) | 2020-03-11 | 2023-10-10 | 艾德凡斯化学公司 | 用于油气开采的表面活性剂 |
| EP4117618B1 (en) | 2020-03-11 | 2024-06-12 | AdvanSix Resins & Chemicals LLC | Surfactants for personal care and cosmetic products |
| JP2023517663A (ja) | 2020-03-11 | 2023-04-26 | アドバンシックス・レジンズ・アンド・ケミカルズ・リミテッド・ライアビリティ・カンパニー | 洗浄剤製品のための界面活性剤 |
| KR20220161349A (ko) | 2020-03-11 | 2022-12-06 | 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 | 잉크, 페인트 및 접착제를 위한 계면활성제 |
| WO2021183560A1 (en) | 2020-03-11 | 2021-09-16 | Advansix Resins & Chemicals Llc | Surfactants for agricultural products |
| KR102853576B1 (ko) * | 2020-07-13 | 2025-09-03 | 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 | 잉크, 페인트, 및 접착제를 위한 분지형 아미노산 계면활성제 |
Family Cites Families (68)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3213500A (en) | 1963-11-12 | 1965-10-26 | Master Mold & Die Company | Fastener |
| GB1352322A (en) | 1970-04-06 | 1974-05-08 | Ft Products Ltd | Fastener |
| JPS5138691B2 (es) * | 1972-12-19 | 1976-10-23 | ||
| US4276460A (en) | 1979-05-29 | 1981-06-30 | Texas Instruments Incorporated | Printed circuit board switch |
| US4297769A (en) | 1979-12-26 | 1981-11-03 | Unarco Industries, Inc. | Locking stand off |
| US4502193A (en) | 1981-12-14 | 1985-03-05 | Hartwell Corporation | Stand-off fastener |
| US4548744A (en) * | 1983-07-22 | 1985-10-22 | Connor Daniel S | Ethoxylated amine oxides having clay soil removal/anti-redeposition properties useful in detergent compositions |
| JPH0717687B2 (ja) | 1985-06-04 | 1995-03-01 | ライオン株式会社 | 乳化重合用乳化剤 |
| US4664458A (en) | 1985-09-19 | 1987-05-12 | C W Industries | Printed circuit board connector |
| EP0248650B1 (en) | 1986-06-04 | 1992-04-22 | Fujitsu Limited | Magnetic disc device |
| GB2204740B (en) | 1987-05-01 | 1990-11-14 | Otehall Limited | Electrical components |
| DE3939746C2 (de) | 1989-12-01 | 1998-08-20 | Itt Cannon Gmbh | Stift zum verrastbaren Befestigen in einer Bohrung einer Leiterplatte oder dgl. |
| JPH04349284A (ja) | 1991-03-14 | 1992-12-03 | Mitsubishi Electric Corp | 磁気ディスク装置 |
| US5563111A (en) | 1993-08-03 | 1996-10-08 | Kao Corporation | Agricultural chemical composition comprising amine surfactants with at least one ester or amide linkage |
| JPH087556A (ja) | 1994-06-24 | 1996-01-12 | Toshiba Corp | 磁気記録装置 |
| US5580203A (en) | 1994-12-21 | 1996-12-03 | General Instrument Corporation Of Delaware | Resilient snap fitting retainer for printed circuit board mounting or the like |
| DE19525821A1 (de) | 1995-07-15 | 1997-01-16 | Wella Ag | Haarbehandlungsmittel sowie Verfahren zu dessen Herstellung |
| DE19609679C2 (de) | 1996-03-12 | 2000-09-07 | Siemens Ag | Verbundteil |
| JP3750182B2 (ja) | 1996-03-28 | 2006-03-01 | 株式会社エンプラス | 電気部品用ソケット |
| DE19631685A1 (de) | 1996-08-06 | 1998-02-12 | Wella Ag | Hydrolytisch spaltbare Wirkstoffderivate, diese enthaltene Haarbehandlungsmittel und Verfahren zum Behandeln von Haaren |
| US5706559A (en) | 1996-10-18 | 1998-01-13 | Eaton Corporation | Leaf spring tip insert |
| DE29622184U1 (de) | 1996-12-20 | 1997-02-27 | Siemens AG, 80333 München | Einrichtung zur Halterung einer PCMCIA-Card |
| US5958894A (en) | 1997-04-04 | 1999-09-28 | Megabios Corporation | Amphiphilic biguanide derivatives |
| CZ295797B6 (cs) | 1997-04-04 | 2005-11-16 | Bochemie, S.R.O. | Sloučeniny na bázi derivátů omega-aminokyselin, způsob jejich výroby a jejich použití |
| JPH11233910A (ja) | 1998-02-10 | 1999-08-27 | Nec Saitama Ltd | 部品実装方法 |
| US6304986B1 (en) | 1999-03-12 | 2001-10-16 | Iomega Corporation | Method and apparatus for inspecting recording medium for defects |
| US6114757A (en) | 1999-09-27 | 2000-09-05 | Thomas & Betts International, Inc. | Leadless IC socket |
| US6501030B1 (en) | 1999-10-26 | 2002-12-31 | Cisco Technology, Inc. | Grounding plug for printed circuit board |
| JP4183864B2 (ja) * | 1999-10-27 | 2008-11-19 | 花王株式会社 | 第4級アンモニウム塩の製造法 |
| US6702592B1 (en) | 1999-12-03 | 2004-03-09 | Seagate Technology Llc | Printed circuit board assembly with secondary side rigid electrical pin to mate with compliant contact |
| SG112831A1 (en) | 2001-10-25 | 2005-07-28 | Seagate Technology Llc | Printed circuit cable connector attachment assembly |
| GB0203104D0 (en) * | 2002-02-11 | 2002-03-27 | Ici Plc | Surfactants and surfactant compositions |
| KR101162797B1 (ko) * | 2004-08-03 | 2012-07-05 | 아반토르 퍼포먼스 머티리얼스, 인크. | 마이크로일렉트로닉스 기판용 세정 조성물 |
| JP2006294170A (ja) | 2005-04-13 | 2006-10-26 | Toshiba Corp | ディスク装置 |
| US7653847B1 (en) | 2005-05-05 | 2010-01-26 | Seagate Technology Llc | Methods and structure for field flawscan in a dynamically mapped mass storage device |
| JP2008547050A (ja) * | 2005-06-16 | 2008-12-25 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | 硬化フォトレジスト、エッチング後残渣および/または下層反射防止コーティング層の除去のための濃厚流体組成物 |
| US7646556B1 (en) | 2005-07-08 | 2010-01-12 | Seagate Technology Llc | Systems and methods for detecting flaws on a storage disk |
| US7781388B2 (en) * | 2006-05-04 | 2010-08-24 | American Sterilizer Company | Cleaning compositions for hard to remove organic material |
| DE502008001256D1 (de) * | 2007-01-31 | 2010-10-14 | Basf Se | Kationisches konditionierungsmittel |
| US7768736B2 (en) | 2007-03-30 | 2010-08-03 | Seagate Technology Llc | Certifying while servowriting media |
| US8246155B2 (en) | 2007-04-18 | 2012-08-21 | Hewlett-Packard Development Company, L.P. | Fixer for a metallic inkjet ink system |
| JP2010278341A (ja) | 2009-05-29 | 2010-12-09 | Shin-Etsu Chemical Co Ltd | 貼り合わせsos基板 |
| US20110025151A1 (en) | 2009-07-28 | 2011-02-03 | Lim Pohlye | Fluid Dynamic Bearing Motor For Use With A Range Of Rotational Speed Rated Disc Drive Memory Device Products |
| BR112013009964B1 (pt) | 2010-10-25 | 2018-10-16 | Stepan Co | éster amina, derivado, composição de herbicida solúvel em água ou um dispersante agrícola, limpador de superfície áspera, xampu ou condicionador, ou produto de limpeza pessoal ou sabonete e inibidor de corrosão para uso em aplicações de campo petrolífero |
| US8964320B1 (en) | 2010-12-09 | 2015-02-24 | Western Digital Technologies, Inc. | Disk drive defect scanning by writing consecutive data tracks and skipping tracks when reading the data tracks |
| US8599507B2 (en) | 2011-12-06 | 2013-12-03 | HGST Netherlands B.V. | Distributed field self-test for shingled magnetic recording drives |
| CN104145324B (zh) * | 2011-12-28 | 2017-12-22 | 恩特格里斯公司 | 用于选择性蚀刻氮化钛的组合物和方法 |
| US9142246B1 (en) | 2014-10-10 | 2015-09-22 | Seagate Technology Llc | Apparatus and methods to reduce hard disk drive manufacturing test time |
| JP6867309B2 (ja) | 2015-07-22 | 2021-04-28 | ロレアル | ケラチン物質をクレンジングするためのアミノ酸界面活性剤を含有する組成物 |
| US9993408B2 (en) | 2015-09-17 | 2018-06-12 | Johnson & Johnson Consumer Inc. | Compositions comprising zwitterionic alkyl-alkanoylamides and/or alkyl alkanoates |
| CN105802600B (zh) | 2016-03-29 | 2018-11-23 | 大庆市富杰化工有限公司 | 一种注水井用降压増注剂及制备方法 |
| JP6741367B2 (ja) | 2016-04-18 | 2020-08-19 | 日本圧着端子製造株式会社 | 金具 |
| US9552846B1 (en) | 2016-04-28 | 2017-01-24 | Seagate Technology Llc | Variable speed data storage device testing system |
| WO2017199921A1 (ja) | 2016-05-20 | 2017-11-23 | 株式会社Adeka | 抗菌性組成物、それを含む化粧料組成物及び肌用シート状製品 |
| US11518960B2 (en) | 2016-08-24 | 2022-12-06 | Ppg Industries Ohio, Inc. | Alkaline molybdenum cation and phosphonate-containing cleaning composition |
| IT201600130571A1 (it) | 2016-12-23 | 2018-06-23 | Lamberti Spa | Inibitori di idrati di gas |
| CA3069250C (en) * | 2017-07-07 | 2022-07-19 | The Procter & Gamble Company | Cleaning compositions comprising non-alkoxylated esteramines |
| TWI856233B (zh) | 2020-01-29 | 2024-09-21 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI807245B (zh) | 2020-01-29 | 2023-07-01 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI786518B (zh) | 2020-01-29 | 2022-12-11 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI786519B (zh) | 2020-01-29 | 2022-12-11 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI778497B (zh) | 2020-01-29 | 2022-09-21 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| CN115461428B (zh) | 2020-03-11 | 2023-10-10 | 艾德凡斯化学公司 | 用于油气开采的表面活性剂 |
| WO2021183560A1 (en) | 2020-03-11 | 2021-09-16 | Advansix Resins & Chemicals Llc | Surfactants for agricultural products |
| NZ793240A (en) | 2020-03-11 | 2025-09-26 | Advansix Resins & Chemicals Llc | Surfactants for healthcare products |
| KR20220161349A (ko) | 2020-03-11 | 2022-12-06 | 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 | 잉크, 페인트 및 접착제를 위한 계면활성제 |
| EP4117618B1 (en) | 2020-03-11 | 2024-06-12 | AdvanSix Resins & Chemicals LLC | Surfactants for personal care and cosmetic products |
| JP2023517663A (ja) | 2020-03-11 | 2023-04-26 | アドバンシックス・レジンズ・アンド・ケミカルズ・リミテッド・ライアビリティ・カンパニー | 洗浄剤製品のための界面活性剤 |
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2021
- 2021-03-09 US US17/196,994 patent/US12460131B2/en active Active
- 2021-03-09 CN CN202180034693.4A patent/CN115461429A/zh active Pending
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| BR112022017701A2 (pt) | 2022-10-18 |
| NZ793239A (en) | 2025-10-31 |
| AU2024200456B2 (en) | 2025-11-06 |
| CA3170088A1 (en) | 2021-09-16 |
| AU2021234274A1 (en) | 2022-11-10 |
| KR20220165250A (ko) | 2022-12-14 |
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| IL296231A (en) | 2022-11-01 |
| AU2021234274B2 (en) | 2024-01-04 |
| US20210292647A1 (en) | 2021-09-23 |
| US12460131B2 (en) | 2025-11-04 |
| KR102867891B1 (ko) | 2025-10-14 |
| AU2024200456A1 (en) | 2024-02-15 |
| WO2021183581A1 (en) | 2021-09-16 |
| AU2021234274B9 (en) | 2024-01-18 |
| JP2023517670A (ja) | 2023-04-26 |
| JP7465366B2 (ja) | 2024-04-10 |
| CN115461429A (zh) | 2022-12-09 |
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