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MX2022003838A - Pelicula de carburo de silicio y vanadio, elemento revestido con pelicula de carburo de silicio y vanadio, y metodo de fabricacion del elemento revestido con pelicula de carburo de silicio y vanadio. - Google Patents

Pelicula de carburo de silicio y vanadio, elemento revestido con pelicula de carburo de silicio y vanadio, y metodo de fabricacion del elemento revestido con pelicula de carburo de silicio y vanadio.

Info

Publication number
MX2022003838A
MX2022003838A MX2022003838A MX2022003838A MX2022003838A MX 2022003838 A MX2022003838 A MX 2022003838A MX 2022003838 A MX2022003838 A MX 2022003838A MX 2022003838 A MX2022003838 A MX 2022003838A MX 2022003838 A MX2022003838 A MX 2022003838A
Authority
MX
Mexico
Prior art keywords
vanadium
film
silicon
carbide
element coated
Prior art date
Application number
MX2022003838A
Other languages
English (en)
Inventor
Satoru Habuka
Hiroyuki Matsuoka
Original Assignee
Dowa Thermotech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Thermotech Co Ltd filed Critical Dowa Thermotech Co Ltd
Publication of MX2022003838A publication Critical patent/MX2022003838A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/90—Carbides
    • C01B32/907—Oxycarbides; Sulfocarbides; Mixture of carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D37/00—Tools as parts of machines covered by this subclass
    • B21D37/01—Selection of materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Mounting, Exchange, And Manufacturing Of Dies (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

Una película de carburo de silicio y vanadio contiene vanadio, silicio y carbono, en la que el total de una concentración de elemento de vanadio, una concentración de elemento de silicio y una concentración de elemento de carbono en la película es de 90% at o más.
MX2022003838A 2019-09-30 2020-09-29 Pelicula de carburo de silicio y vanadio, elemento revestido con pelicula de carburo de silicio y vanadio, y metodo de fabricacion del elemento revestido con pelicula de carburo de silicio y vanadio. MX2022003838A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019180086 2019-09-30
PCT/JP2020/036806 WO2021065865A1 (ja) 2019-09-30 2020-09-29 珪炭化バナジウム膜、珪炭化バナジウム膜被覆部材および珪炭化バナジウム膜被覆部材の製造方法

Publications (1)

Publication Number Publication Date
MX2022003838A true MX2022003838A (es) 2022-05-13

Family

ID=75272280

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2022003838A MX2022003838A (es) 2019-09-30 2020-09-29 Pelicula de carburo de silicio y vanadio, elemento revestido con pelicula de carburo de silicio y vanadio, y metodo de fabricacion del elemento revestido con pelicula de carburo de silicio y vanadio.

Country Status (4)

Country Link
US (1) US12459823B2 (es)
JP (1) JP7667645B2 (es)
MX (1) MX2022003838A (es)
WO (1) WO2021065865A1 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7702802B2 (ja) * 2021-04-08 2025-07-04 Ｄｏｗａサーモテック株式会社 珪炭化バナジウム膜被覆部材およびその製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69408405T2 (de) * 1993-11-11 1998-08-20 Nissin Electric Co Ltd Plasma-CVD-Verfahren und Vorrichtung
JPH07300649A (ja) 1994-04-27 1995-11-14 Kobe Steel Ltd 耐摩耗性および耐酸化性に優れた硬質皮膜及び高硬度部材
JP3798100B2 (ja) 1997-02-17 2006-07-19 独立行政法人科学技術振興機構 放電表面処理方法及びその処理装置
CN105803393B (zh) * 2016-03-25 2019-01-29 中国科学院宁波材料技术与工程研究所 一种强韧耐磨涂层及其制备方法
US10157736B2 (en) * 2016-05-06 2018-12-18 Lam Research Corporation Methods of encapsulation
JP6963932B2 (ja) 2017-08-14 2021-11-10 Ｄｏｗａサーモテック株式会社 珪炭窒化バナジウム膜、珪炭窒化バナジウム膜被覆部材およびその製造方法

Also Published As

Publication number Publication date
US20220411271A1 (en) 2022-12-29
US12459823B2 (en) 2025-11-04
JP2021055189A (ja) 2021-04-08
WO2021065865A1 (ja) 2021-04-08
JP7667645B2 (ja) 2025-04-23

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