[go: up one dir, main page]

MX2019007730A - Pelicula de nitruro de silicio y vanadio, miembro recubierto con la pelicula de nitruro de silicio y vanadio y metodo para la fabricacion del mismo. - Google Patents

Pelicula de nitruro de silicio y vanadio, miembro recubierto con la pelicula de nitruro de silicio y vanadio y metodo para la fabricacion del mismo.

Info

Publication number
MX2019007730A
MX2019007730A MX2019007730A MX2019007730A MX2019007730A MX 2019007730 A MX2019007730 A MX 2019007730A MX 2019007730 A MX2019007730 A MX 2019007730A MX 2019007730 A MX2019007730 A MX 2019007730A MX 2019007730 A MX2019007730 A MX 2019007730A
Authority
MX
Mexico
Prior art keywords
nitride film
silicon nitride
vanadium silicon
vanadium
element concentration
Prior art date
Application number
MX2019007730A
Other languages
English (en)
Inventor
Matsuoka Hiroyuki
Sakakibara Wataru
Habuka Satoru
Original Assignee
Dowa Thermotech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Thermotech Co Ltd filed Critical Dowa Thermotech Co Ltd
Publication of MX2019007730A publication Critical patent/MX2019007730A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D37/00—Tools as parts of machines covered by this subclass
    • B21D37/01—Selection of materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D37/00—Tools as parts of machines covered by this subclass
    • B21D37/20—Making tools by operations not covered by a single other subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21J—FORGING; HAMMERING; PRESSING METAL; RIVETING; FORGE FURNACES
    • B21J13/00—Details of machines for forging, pressing, or hammering
    • B21J13/02—Dies or mountings therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Mounting, Exchange, And Manufacturing Of Dies (AREA)
  • Forging (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

Una película de nitruro de silicio y vanadio formada como una película dura para un material de base satisface 0.30 = a/b = 1.7 y 0.24 = b = 0.36 cuando a = concentración de elemento de vanadio [en%]/(concentración de elemento de vanadio [en%] + concentración de elemento se silicio [en%] + concentración de elemento de nitrógeno [en%] y b = concentración de elemento de vanadio [en%] + concentración de elemento de silicio [en%] + concentración de elemento de nitrógeno [en%]), y tiene una dureza de 2300 HV o más.
MX2019007730A 2016-12-28 2017-12-28 Pelicula de nitruro de silicio y vanadio, miembro recubierto con la pelicula de nitruro de silicio y vanadio y metodo para la fabricacion del mismo. MX2019007730A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016255179 2016-12-28
PCT/JP2017/047249 WO2018124279A1 (ja) 2016-12-28 2017-12-28 珪窒化バナジウム膜、珪窒化バナジウム膜被覆部材およびその製造方法

Publications (1)

Publication Number Publication Date
MX2019007730A true MX2019007730A (es) 2019-10-15

Family

ID=62709660

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2019007730A MX2019007730A (es) 2016-12-28 2017-12-28 Pelicula de nitruro de silicio y vanadio, miembro recubierto con la pelicula de nitruro de silicio y vanadio y metodo para la fabricacion del mismo.

Country Status (4)

Country Link
US (1) US11072857B2 (es)
JP (1) JP6928549B2 (es)
MX (1) MX2019007730A (es)
WO (1) WO2018124279A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6963932B2 (ja) * 2017-08-14 2021-11-10 Ｄｏｗａサーモテック株式会社 珪炭窒化バナジウム膜、珪炭窒化バナジウム膜被覆部材およびその製造方法
JP7304725B2 (ja) * 2018-09-04 2023-07-07 Ｄｏｗａサーモテック株式会社 珪窒化バナジウム膜被覆部材およびその製造方法
TW202146701A (zh) * 2020-05-26 2021-12-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 氣相沉積系統、在基材上形成氮化釩層之方法、直接液體注入系統
TWI766776B (zh) * 2020-07-27 2022-06-01 環球晶圓股份有限公司 碳化矽晶碇及其製備方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3909658B2 (ja) 2001-06-15 2007-04-25 ユケン工業株式会社 バナジウム系被膜の成膜方法及びバナジウム系被膜処理無機製品
JP2005046975A (ja) 2003-07-31 2005-02-24 Nachi Fujikoshi Corp バナジウム系被覆工具
JP4959122B2 (ja) 2004-09-27 2012-06-20 株式会社アルバック バナジウム含有膜の形成方法
WO2016171273A1 (ja) 2015-04-23 2016-10-27 日立金属株式会社 被覆金型およびその製造方法

Also Published As

Publication number Publication date
US11072857B2 (en) 2021-07-27
JP2018109233A (ja) 2018-07-12
WO2018124279A1 (ja) 2018-07-05
US20190390331A1 (en) 2019-12-26
JP6928549B2 (ja) 2021-09-01

Similar Documents

Publication Publication Date Title
MX2025003987A (es) Antagonistas de cinasa progenitora hematopoyetica 1 (hpk1) y sus usos
PH12022551524A1 (en) Irak degraders and uses thereof
WO2021127283A3 (en) Irak degraders and uses thereof
IN2015KN00588A (es)
ZA202403101B (en) Antiviral prodrugs and nanoformulations thereof
MX2020007799A (es) Inhibidores de cinasa no derrepresible de control de aminoacido general 2 (gcn2) y sus usos.
EP3466884A4 (en) SILICONE-COATED METAL PARTICLES, SILICONE-COATED METAL PARTICLES AND METHOD OF MANUFACTURING THEREOF
EP4438117A3 (en) Tyk2 inhibitors and uses thereof
MX2019007730A (es) Pelicula de nitruro de silicio y vanadio, miembro recubierto con la pelicula de nitruro de silicio y vanadio y metodo para la fabricacion del mismo.
PH12022551522A1 (en) Smarca degraders and uses thereof
SG10201801141TA (en) Selective deposition of silicon oxide
WO2018006074A3 (en) Compounds and methods for modulating rna function
EP3421560A4 (en) CORROSION PROTECTION COATING COMPOSITION, CORROSION PROTECTIVE COATING FILM, SUBSTRATE WITH CORROSION PROTECTIVE COATING FILM AND METHOD FOR THE PRODUCTION THEREOF
WO2018107155A8 (en) SUL-RICH AND N-H-FREE PERHYDRIDOPOLYSILZANE COMPOSITIONS, SYNTHESIS AND USES THEREOF
EP4234552A3 (en) 3-phosphoglycerate dehydrogenase inhibitors and uses thereof
WO2020061431A3 (en) Thiol-containing composition
MY165455A (en) Silicon-nitride-containing separating layer having high hardness
EP4302827A3 (en) Rapamycin analogs and uses thereof
MX2021001520A (es) Metodos para retardar la ocurrencia de diabetes tipo 2 de nuevo inicio y para desacelerar el progreso de y tratamiento de la diabetes tipo 2.
PH12016501670A1 (en) Protective-film-forming film and method of manufacturing semiconductor chip with protective film
EA201991053A1 (ru) Спрей-аэрозоль, содержащий жизнеспособные виды бактерий
MX2020006339A (es) Un sustrato de acero recubierto por inmersion en caliente.
MX394145B (es) Pelicula de carbonitruro de vanadio-silicio, miembro recubierto con pelicula de carbonitruro de vanadio-silicio, y metodo para fabricar la misma.
WO2017052308A3 (ko) 유기소자에 사용되는 유기화합물 및 이를 이용한 유기소자의 제조방법
MY189253A (en) Semiconductor wafer comprising a monocrystalline group-iiia nitride layer