[go: up one dir, main page]

MX2018007193A - Deposicion electroquimica de elementos en medios acuosos. - Google Patents

Deposicion electroquimica de elementos en medios acuosos.

Info

Publication number
MX2018007193A
MX2018007193A MX2018007193A MX2018007193A MX2018007193A MX 2018007193 A MX2018007193 A MX 2018007193A MX 2018007193 A MX2018007193 A MX 2018007193A MX 2018007193 A MX2018007193 A MX 2018007193A MX 2018007193 A MX2018007193 A MX 2018007193A
Authority
MX
Mexico
Prior art keywords
elements
aqueous media
electrochemical deposition
electrodeposition
atm
Prior art date
Application number
MX2018007193A
Other languages
English (en)
Inventor
Nulwala Hunaid
Zhou Xu
D Watkins John
Original Assignee
Lumishield Tech Incorporated
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lumishield Tech Incorporated filed Critical Lumishield Tech Incorporated
Publication of MX2018007193A publication Critical patent/MX2018007193A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/42—Electroplating: Baths therefor from solutions of light metals
    • C25D3/44—Aluminium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/16—Electroplating with layers of varying thickness
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

La descripción se refiere a un método para la electrodeposición de al menos un metal sobre una superficie de un sustrato conductor. En algunas modalidades, la electrodeposición se lleva a cabo a una temperatura de aproximadamente 10°C a aproximadamente 70°C, aproximadamente 0.5 atm (50.662 kPa) a aproximadamente 5 atm (506.62 kPa), en una atmósfera que comprende oxígeno. En algunas modalidades, el método comprende electrodepositar el al menos un metal a través de reducción electroquímica de un complejo de metal disuelto en un medio sustancialmente acuoso.
MX2018007193A 2016-02-16 2016-02-16 Deposicion electroquimica de elementos en medios acuosos. MX2018007193A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2016/018050 WO2017142513A1 (en) 2016-02-16 2016-02-16 Electrochemical deposition of elements in aqueous media

Publications (1)

Publication Number Publication Date
MX2018007193A true MX2018007193A (es) 2018-08-23

Family

ID=55442889

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2018007193A MX2018007193A (es) 2016-02-16 2016-02-16 Deposicion electroquimica de elementos en medios acuosos.

Country Status (13)

Country Link
US (1) US20190256994A1 (es)
EP (1) EP3417097B1 (es)
JP (1) JP6718509B2 (es)
KR (1) KR102174846B1 (es)
CN (1) CN108779566A (es)
AU (1) AU2016393673B2 (es)
BR (1) BR112018016802A2 (es)
CA (1) CA3009779C (es)
ES (1) ES2877331T3 (es)
IL (1) IL260354A (es)
MX (1) MX2018007193A (es)
PL (1) PL3417097T3 (es)
WO (1) WO2017142513A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018222977A1 (en) * 2017-06-01 2018-12-06 Lumishield Technologies Incorporated Methods and compositions for electrochemical deposition of metal rich layers in aqueous solutions
WO2020160531A1 (en) * 2019-02-01 2020-08-06 Lumishield Technologies Incorporated Methods and compositions for improved adherence of organic coatings to materials
CN111636078B (zh) * 2020-07-24 2023-11-10 宁波革创新材料科技有限公司 一种水性电镀多孔铝的方法
KR102565001B1 (ko) 2020-12-01 2023-08-09 주식회사 엘지화학 양극 활물질 전구체, 이의 제조방법 및 이를 이용한 양극 활물질의 제조방법

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR529229A (fr) * 1920-07-27 1921-11-25 Noren Leonie Procédé permettant de recouvrir d'une couche d'aluminium, un fil ou autre objet en cuivre
DE2453829C2 (de) * 1974-11-13 1983-04-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Additiven und ihre Verwendung als Glanzbildner
US4601958A (en) 1984-09-26 1986-07-22 Allied Corporation Plated parts and their production
EP0786539A2 (en) * 1996-01-26 1997-07-30 Elf Atochem North America, Inc. High current density zinc organosulfonate electrogalvanizing process and composition
JP3039374B2 (ja) * 1996-05-30 2000-05-08 住友金属工業株式会社 耐燃料腐食性に優れためっき鋼板
EP1162289A1 (en) * 2000-06-08 2001-12-12 Lucent Technologies Inc. Palladium electroplating bath and process for electroplating
US6911068B2 (en) * 2001-10-02 2005-06-28 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
US7371467B2 (en) * 2002-01-08 2008-05-13 Applied Materials, Inc. Process chamber component having electroplated yttrium containing coating
KR20060009930A (ko) * 2003-05-12 2006-02-01 알케마 인코포레이티드 고순도 설폰산 전해질 용액
CA2526401C (en) * 2003-05-19 2010-03-23 Arkema Inc. Zinc lanthanide sulfonic acid electrolytes
KR100855531B1 (ko) * 2004-04-13 2008-09-01 어플라이드 머티어리얼스, 인코포레이티드 전기 도금된 이트륨 함유 코팅을 갖는 프로세스 챔버 요소
US20080257744A1 (en) * 2007-04-19 2008-10-23 Infineon Technologies Ag Method of making an integrated circuit including electrodeposition of aluminium
US20120055612A1 (en) * 2010-09-02 2012-03-08 International Business Machines Corporation Electrodeposition methods of gallium and gallium alloy films and related photovoltaic structures
JP2014156614A (ja) * 2011-04-11 2014-08-28 Hitachi Ltd 電気アルミニウムめっき液
US20130310569A1 (en) 2012-05-21 2013-11-21 Hunaid Nulwala Triazolide based ionic liquids
US8753761B2 (en) * 2012-07-27 2014-06-17 Sun Catalytix Corporation Aqueous redox flow batteries comprising metal ligand coordination compounds
FR3008718B1 (fr) * 2013-07-16 2016-12-09 Snecma Procede de fabrication d'une sous-couche metallique a base de platine sur un substrat metallique
US20150122661A1 (en) * 2013-11-05 2015-05-07 Rohm And Haas Electronic Materials Llc Plating bath and method
KR101815412B1 (ko) * 2014-02-21 2018-01-04 니혼 파커라이징 가부시키가이샤 직류 음극 전해용 조성물, 윤활 피막이 형성된 금속 재료 및 그 제조 방법
WO2016004189A1 (en) * 2014-07-03 2016-01-07 Nulwala Hunaid B Selected compositions for aluminum processes and devices

Also Published As

Publication number Publication date
EP3417097A1 (en) 2018-12-26
EP3417097B1 (en) 2021-04-07
IL260354A (en) 2018-08-30
AU2016393673A1 (en) 2018-06-28
ES2877331T3 (es) 2021-11-16
WO2017142513A1 (en) 2017-08-24
US20190256994A1 (en) 2019-08-22
AU2016393673B2 (en) 2020-04-30
JP6718509B2 (ja) 2020-07-08
CN108779566A (zh) 2018-11-09
KR20180107101A (ko) 2018-10-01
CA3009779C (en) 2021-03-23
KR102174846B1 (ko) 2020-11-05
JP2019505665A (ja) 2019-02-28
PL3417097T3 (pl) 2021-11-02
BR112018016802A2 (pt) 2018-12-26
CA3009779A1 (en) 2017-08-24

Similar Documents

Publication Publication Date Title
MX2023007188A (es) Procesamiento de material hibrido de perovskita.
MX2018007193A (es) Deposicion electroquimica de elementos en medios acuosos.
WO2013016447A3 (en) Catalysts for low temperature electrolytic co2 reduction
MX389017B (es) Método de la aplicación de recubrimiento de cristal ultrafino por conversión de fosfatos.
MY174332A (en) Protecting anodes from passivation in alloy plating systems
MX2016013455A (es) Metodo para galvanizar un tira de metal movil y tira de metal recubierta producida de este modo.
MX391294B (es) Un proceso para recubrir superficies metálicas de sustratos con composiciones acuosas en forma de una dispersión y/o una suspensión que contiene por lo menos un aglutinante estabilizado.
WO2018058089A3 (en) Process and composition for removing metal sulfides
WO2016124921A3 (en) Electrolyte for electroplating
FR3050740B1 (fr) Electrode metal / chalcogenure metallique a haute surface specifique
PH12015502287B1 (en) Electrolytic cell for metal electrowinning
GB2560291A8 (en) Method for stripping flexible substrate
WO2015138274A3 (en) Electroplating of metals on conductive oxide substrates
MX2023002873A (es) Metodo controlado para depositar una capa de cromo o aleacion de cromo sobre al menos un sustrato.
RU2015128877A (ru) Раствор для формирования металлической пленки и способ формирования металлической пленки
MY175045A (en) Film formation system and film formation method for forming metal film
NZ720017A (en) Photovoltaic systems and spray coating processes for producing photovoltaic systems
WO2010023258A8 (de) Verfahren zur anodischen dehydrodimerisierung von substituierten arylalkoholen
WO2015121790A3 (es) Proceso de cromado trivalente continuo
MY208727A (en) Method of coating a substrate with an aqueous suspension containing metal carbide particles
MX2015016474A (es) Metodo para revestir con pintura por inmersion sustratos conductores de electricidad mientras el revestimiento con pintura por inmersion es postratado con una composicion de sol-gel acuosa antes de curar el revestimiento.
MX2010003358A (es) Sistema y metodo de enchapado de aleaciones metalicas usando tecnologia galvanica.
CA3010553A1 (en) Method for producing a corrosion resistant metal substrate and corrosion resistant metal substrate provided thereby
WO2015007983A3 (fr) Procede de fabrication d'une sous-couche metallique a base de platine sur un substrat metallique
MX2016014381A (es) Modificacion de pretratamiento de metal para mayor cobertura de superficie.