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MX2015008897A - Aparato y metodo de mantenimiento de eficiencia galvanoplastia con baño de cromo trivalente. - Google Patents

Aparato y metodo de mantenimiento de eficiencia galvanoplastia con baño de cromo trivalente.

Info

Publication number
MX2015008897A
MX2015008897A MX2015008897A MX2015008897A MX2015008897A MX 2015008897 A MX2015008897 A MX 2015008897A MX 2015008897 A MX2015008897 A MX 2015008897A MX 2015008897 A MX2015008897 A MX 2015008897A MX 2015008897 A MX2015008897 A MX 2015008897A
Authority
MX
Mexico
Prior art keywords
trivalent chromium
plating efficiency
maintaining
bath plating
bath
Prior art date
Application number
MX2015008897A
Other languages
English (en)
Other versions
MX382861B (es
Inventor
George Bokisa
Original Assignee
Coventya Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coventya Inc filed Critical Coventya Inc
Publication of MX2015008897A publication Critical patent/MX2015008897A/es
Publication of MX382861B publication Critical patent/MX382861B/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007—Current directing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/08—Deposition of black chromium, e.g. hexavalent chromium, CrVI

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

Un aparato para mantener la eficacia del baño de chapado de cromo trivalente incluye una solución acuosa de baño de galvanoplastia, que incluye iones de cromo trivalente y un compuesto de azufre, y una fuente de radiación ultravioleta (UV) que proporciona la radiación UV al baño eficaz para inhibir una reducción en la eficacia de chapado del baño.
MX2015008897A 2013-01-10 2014-01-10 Aparato y metodo de mantenimiento de eficiencia galvanoplastia con baño de cromo trivalente. MX382861B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361750974P 2013-01-10 2013-01-10
PCT/US2014/011108 WO2014110416A1 (en) 2013-01-10 2014-01-10 Apparatus and method of maintaining trivalent chromium bath plating efficiency

Publications (2)

Publication Number Publication Date
MX2015008897A true MX2015008897A (es) 2016-02-05
MX382861B MX382861B (es) 2025-03-13

Family

ID=51167405

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2015008897A MX382861B (es) 2013-01-10 2014-01-10 Aparato y metodo de mantenimiento de eficiencia galvanoplastia con baño de cromo trivalente.

Country Status (8)

Country Link
US (1) US10167564B2 (es)
EP (1) EP2943601B1 (es)
KR (2) KR20150123794A (es)
CN (1) CN105264122B (es)
BR (1) BR112015016551B1 (es)
CA (1) CA2897973C (es)
MX (1) MX382861B (es)
WO (1) WO2014110416A1 (es)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3147388A1 (en) * 2015-09-25 2017-03-29 Enthone, Incorporated Flexible color adjustment for dark cr(iii)-platings
WO2017155671A1 (en) * 2016-03-11 2017-09-14 Applied Materials, Inc. Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment
US10294570B2 (en) 2016-04-11 2019-05-21 Hamilton Sundstrand Corporation Method for making corrosion resistant coating
US20170306515A1 (en) * 2016-04-21 2017-10-26 Macdermid Acumen, Inc Dark Colored Chromium Based Electrodeposits
EP3428321A1 (en) * 2017-07-10 2019-01-16 Tata Steel IJmuiden B.V. Method of producing an electrolyte for electrodeposition of a chromium-chromium oxide layer
CN107419310B (zh) * 2017-09-28 2020-01-03 永星化工(上海)有限公司 一种三价铬镀层及其制备方法
US20210172081A1 (en) * 2017-12-13 2021-06-10 Jcu Corporation Trivalent chromium plating solution and method for chromium-plating using same
US20210317589A1 (en) * 2018-07-03 2021-10-14 Jcu Corporation Trivalent chromium plating solution and chromium plating method using same
WO2020189802A1 (ko) * 2019-03-15 2020-09-24 유한회사 한국신기술 황(s) 성분이 없는 시안-카르복시기 복합제로 이루어진 3가 크롬 이온의 2가 산화 방지제 및 이를 포함하는 3가 크롬 전기 도금액
JP7467758B2 (ja) * 2020-12-11 2024-04-15 アトテック ドイチュラント ゲー・エム・ベー・ハー ウント コー． カー・ゲー 暗色クロム層を基板に電着させる方法および少なくとも片面が暗色クロム層で完全に覆われた基板
EP4083268A1 (en) * 2021-04-30 2022-11-02 Atotech Deutschland GmbH & Co. KG Electroplating composition for depositing a chromium or chromium alloy layer on a substrate
EP4101947A1 (en) * 2021-06-10 2022-12-14 Atotech Deutschland GmbH & Co. KG Method for electrodepositing a dark chromium layer, substrate comprising same, and electroplating bath thereof

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JPS507732A (es) * 1973-05-23 1975-01-27
JPS5060435A (es) * 1973-09-29 1975-05-24
US5196109A (en) * 1991-08-01 1993-03-23 Geoffrey Scott Trivalent chromium electrolytes and plating processes employing same
RU2015209C1 (ru) * 1991-08-20 1994-06-30 Производственное объединение "Уральский оптико-механический завод" Устройство для хромирования мелких изделий
DE19525509C2 (de) * 1994-07-22 1997-10-02 Lpw Anlagen Gmbh Anwendung der UV/H¶2¶O¶2¶-Oxidationsbehandlung zur betriebsmäßigen Wiederverwendungs- oder Weiterverwendungsaufbereitung eines Bades für die galvanotechnische Beschichtung von Gegenständen mit metallischen Überzügen
KR100263317B1 (ko) * 1997-09-29 2000-08-01 이중구 도금액반응부산물제거장치및방법
DE10014260B4 (de) * 2000-03-22 2009-03-19 Lpw-Blasberg Anlagen Gmbh Verfahren zur galvanotechnischen Beschichtung von Gegenständen
EP1310582A1 (en) * 2001-11-07 2003-05-14 Shipley Company LLC Process for electrolytic copper plating
US6805786B2 (en) * 2002-09-24 2004-10-19 Northrop Grumman Corporation Precious alloyed metal solder plating process
DE10325101A1 (de) * 2003-06-03 2004-12-30 Atotech Deutschland Gmbh Verfahren zum Auffüllen von µ-Blind-Vias (µ-BVs)
KR100947380B1 (ko) * 2007-08-10 2010-03-15 기아자동차주식회사 차체 도장라인의 전착 도장 시스템용 양극액 살균장치
DE102007040005A1 (de) * 2007-08-23 2009-02-26 Ewh Industrieanlagen Gmbh & Co. Kg Verfahren zum Abscheiden funktioneller Schichten aus einem Galvanikbad
KR101111445B1 (ko) * 2009-09-25 2012-02-15 한양화학(공) 3가 크롬 피막 형성용 수성 조성물 및 이를 이용한 흑색의 3가 크롬 피막 형성 방법
ES2578503T3 (es) * 2011-05-03 2016-07-27 Atotech Deutschland Gmbh Baño de electrometalizado y método para producir capas de cromo oscuras
US9758884B2 (en) * 2012-02-16 2017-09-12 Stacey Hingley Color control of trivalent chromium deposits

Also Published As

Publication number Publication date
EP2943601A1 (en) 2015-11-18
EP2943601B1 (en) 2020-08-12
CA2897973A1 (en) 2014-07-17
KR20150123794A (ko) 2015-11-04
MX382861B (es) 2025-03-13
KR102384016B1 (ko) 2022-04-08
US20150354085A1 (en) 2015-12-10
EP2943601A4 (en) 2016-08-24
WO2014110416A1 (en) 2014-07-17
US10167564B2 (en) 2019-01-01
CA2897973C (en) 2021-06-22
CN105264122A (zh) 2016-01-20
BR112015016551B1 (pt) 2021-08-31
BR112015016551A2 (pt) 2017-07-11
KR20210059807A (ko) 2021-05-25
CN105264122B (zh) 2018-11-02

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