MX2014000238A - Nano-layer coating for high performance tools. - Google Patents
Nano-layer coating for high performance tools.Info
- Publication number
- MX2014000238A MX2014000238A MX2014000238A MX2014000238A MX2014000238A MX 2014000238 A MX2014000238 A MX 2014000238A MX 2014000238 A MX2014000238 A MX 2014000238A MX 2014000238 A MX2014000238 A MX 2014000238A MX 2014000238 A MX2014000238 A MX 2014000238A
- Authority
- MX
- Mexico
- Prior art keywords
- thickness
- coating
- layers
- nano
- nanolayer
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 173
- 239000011248 coating agent Substances 0.000 title claims abstract description 138
- 239000002052 molecular layer Substances 0.000 title claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 238000005520 cutting process Methods 0.000 claims description 46
- 238000000151 deposition Methods 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 33
- 239000010936 titanium Substances 0.000 claims description 32
- 230000008021 deposition Effects 0.000 claims description 30
- 229910052719 titanium Inorganic materials 0.000 claims description 21
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 16
- 229910052721 tungsten Inorganic materials 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 14
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 14
- 229910052782 aluminium Inorganic materials 0.000 claims description 13
- 239000010937 tungsten Substances 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 238000005553 drilling Methods 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 230000005855 radiation Effects 0.000 claims description 7
- 238000000227 grinding Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 6
- 238000009834 vaporization Methods 0.000 claims description 6
- 230000008016 vaporization Effects 0.000 claims description 6
- 238000009826 distribution Methods 0.000 claims description 5
- 239000002070 nanowire Substances 0.000 claims description 5
- 229910001018 Cast iron Inorganic materials 0.000 claims description 4
- 229910016523 CuKa Inorganic materials 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 4
- 238000002441 X-ray diffraction Methods 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- 239000010935 stainless steel Substances 0.000 claims description 4
- 239000010959 steel Substances 0.000 claims description 4
- 229910000997 High-speed steel Inorganic materials 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 239000004568 cement Substances 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 230000007423 decrease Effects 0.000 claims description 3
- 238000009499 grossing Methods 0.000 claims description 3
- 238000011002 quantification Methods 0.000 claims description 3
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- 239000008208 nanofoam Substances 0.000 claims description 2
- 238000005266 casting Methods 0.000 claims 1
- 238000013139 quantization Methods 0.000 claims 1
- 230000001747 exhibiting effect Effects 0.000 abstract description 4
- 238000012360 testing method Methods 0.000 description 16
- 238000005240 physical vapour deposition Methods 0.000 description 15
- 239000007787 solid Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 12
- 229910008482 TiSiN Inorganic materials 0.000 description 11
- QRXWMOHMRWLFEY-UHFFFAOYSA-N isoniazide Chemical compound NNC(=O)C1=CC=NC=C1 QRXWMOHMRWLFEY-UHFFFAOYSA-N 0.000 description 11
- 229910016905 AlxTi Inorganic materials 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 229910008484 TiSi Inorganic materials 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 7
- 238000007254 oxidation reaction Methods 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- LLQPHQFNMLZJMP-UHFFFAOYSA-N Fentrazamide Chemical compound N1=NN(C=2C(=CC=CC=2)Cl)C(=O)N1C(=O)N(CC)C1CCCCC1 LLQPHQFNMLZJMP-UHFFFAOYSA-N 0.000 description 4
- 229910010038 TiAl Inorganic materials 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- GPTXWRGISTZRIO-UHFFFAOYSA-N chlorquinaldol Chemical compound ClC1=CC(Cl)=C(O)C2=NC(C)=CC=C21 GPTXWRGISTZRIO-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000000635 electron micrograph Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- 229910001141 Ductile iron Inorganic materials 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 238000000441 X-ray spectroscopy Methods 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000006115 industrial coating Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- -1 thi Chemical compound 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0617—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/44—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/351—Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Drilling Tools (AREA)
- Laminated Bodies (AREA)
Abstract
The present invention relates to a coated body comprising a substrate and a coating onto the substrate, the coating having a nanolaminated coating system having a nanolaminated coating structure of alternating A and B layers (AlxTi1-x-yWy)N / (Ti1-Z-uSizWu)N, the individual thickness of each nanolayer being maximal 200 nm and the nanolaminated coating structure exhibiting a fine-grained structure.
Description
NANOCAPAS COATING FOR TOOLS OF
HIGH PERFORMANCE
Field of the Invention
The present invention relates to a hard nanolayer coating system or a nano-laminated coating structure and a method for depositing it on a substrate surface. More specifically, the nanolayer coating system according to the present invention relates to a coating system that includes nanolayers of type A and nanolaps of type B. Nanolayers of type A contain aluminum, Al, titanium, Ti, and nitrogen , N, and nanolaps of type B contain titanium, Ti, silicon, Si, and nitrogen, N. Additionally, according to the present invention, preferably at least some of the nanolayers of type A and / or nanolayers of type B also includes tungsten, W.
The terms "nanolayer coating system", "nanolaminate coating structure", "nanolaminate structure" and "nanolame structure" are used without distinction in the context of the present invention and have the same meaning.
The coating system and the deposition method according to the present invention are especially suitable for the manufacture of high performance solid carbide drills, which allow a higher productivity in
automotive applications such as machining of steel and cast iron compared to the state of the art.
Background of the Invention
The cutting tools are generally methods of (chemical vapor deposition) CVD and / or (physical vapor deposition) PVD to achieve better efficiency when cutting operations. PVD and CVD coatings for cutting tools are designed primarily to provide improved wear resistance and oxidation resistance, however, to achieve higher efficiency, the coating design must be adapted for each application particular with respect to the most convenient combination of coating properties. Because of this, many different types of PVD (physical vapor deposition) and CVD (chemical vapor deposition) coatings have been developed so far.
In US5580653 a hard coating having a given composition is proposed by the following formula (AIxT.x.ySiyMC ^ zNz) where 0.05 < x < 0.75, 0.01 < y = 0.1, and 0.6 = z = 1. It was indicated that if x is less than 0.05, or y is less than 0.01, then it is impossible to perform to a sufficient degree the improvement in the properties of resistance to oxidation. Additionally, it was indicated that if x exceeds 0.75 o and exceeds 0.1, the crystalline structure of the coating changes from a cubic structure to a hexagonal structure, with a consequent decrease in the resistance properties to the
hardness and wear. For the deposition of the coating physical vapor deposition methods, more specifically arc discharge anodizing processes, in which the alloyed lenses have the same metal composition as the desired metal composition in the coating used as the base material.
In US6586122 it was mentioned, however, that the mere addition of Si to conventional TiAIN coating films can improve the oxidation resistance by more or less 1.2 times, which is insufficient to take into account the current market demands of high speed cutting. Additionally in US6586122 it was explained that although the addition of Si to a Ti-based coating film may slightly improve its oxidation resistance, it can not sufficiently improve the static wear resistance of the original coating film and, for therefore, it leads to little improvement. In addition to this it was mentioned that the coating films that simply contain Si are more fragile due to the great compressive stress remarkable than a coating film that does not contain Si, and this excessive compressive tension makes the coating film prone to peel quickly from the surface. substrate of the cutting tool.
Therefore, the authors of document US6586122 propose a multilayer coated cutting tool
If it can exhibit sufficient cutting performance, particularly excellent oxidation resistance and wear resistance, comprising a cutting tool substrate, and a multilayer coating film, such a multilayer coating film comprises a first hard coating film formed on such a substrate that does not contain Si and a second hard coating film containing Si. The first hard coating film comprises one or more metallic elements selected from the group consisting of Ti, Al and Cr, and one or more non-metallic elements selected from the group consisting of N, B, Cy O;) while the second hardcoat film comprises Si and one or more metallic elements selected from the group consisting of groups 4a, 5a and 6a of the periodic table and Al, and one or more non-metallic elements selected from the group consisting of N, B, C and O. To sufficiently improve the cutting performance of the cutting tool the second hard coating film should be a polycrystalline film of segregated composition comprising a phase having a relatively high concentration of Si and a phase having a relatively high concentration low of Si. This second hardcoat film should be deposited so as to offer an amorphous or microcrystalline structure in which the hard, Si-rich crystalline grains (have an average grain size of
preferably not more than 50 nm) are dispersed in a matrix constituted by a phase containing a relatively small amount of Si. It was further mentioned that a multilayer hard coating film exhibits particularly a small special compressive stress and improved wear resistance as well as improved adhesion to the substrate of the cutting tool due to the special structure of the second hard coating film. On the other hand, it was explained that such kind of hard coating films containing Si which contain different phases with different amounts of Si can not be formed by conventional coating methods but by coating methods involving sequential or periodic changes of energy. ion during the coating, for example, PVD coating methods in which a substrate pulse bias voltage is applied which is sequentially or periodically changed between the positive voltage and the negative voltage during the coating process. In this way, sequential or periodic changes in ion energy occur, which also produces changes in the ion diffusion behavior and subsequently generates variations in Si concentration in the hard coating film containing Si. It was also indicated that also the coating temperature is an important factor to control the behavior of the ion diffusion and,
therefore, to control the crystalline form, particularly the grain size of the crystals constituting the high concentration phase of Si in the second hard coating film of the multilayer coating film.
WO2010140958 discloses a cutting tool for machining by chip removal comprising a body of a hard alloy of cemented carbide, cement, ceramics, cubic boron nitride raw material or high speed steel, in which a hard and wear-resistant PVD coating is deposited, characterized in that said coating comprises a polycrystalline nano-laminated structure and a column of alternate layers A and B where the layer A is (Til-xAlxMelp) Na, with 0.3 < x < 0.95, preferably 0.45 < x < 0.75, 0.90 < a <; 1.10, preferably 0.96 < a < 1.04, 0 = p < 0.15, and Me1 is one or more of Zr, Y, V, Nb, Mo and W, and where layer B (Til-y-zSiyMe2z) Nb, with 0.05 < and < 0.25, preferably 0.05 < and < 0.18, 0 < z 0.4, 0.9 < b < 1.1, preferably 0.96 b < 1.04, and Me2 is one or more of Y, V, Nb, Mo, W and Al, with a nano-laminated structure thickness between 0.5 and 20 μ? T ?, preferably between 0.5 and 10 μ? T ?, an average width of column between 20 and 1,000 nm, and an individual average thickness of layers A and B between 1 and 50 nm.
Objective of the Present Invention
It is an object of the present invention to provide a coating system for high cutting tools
performance, particularly, a broadband coating for solid carbide drills of high performance that allow a higher productivity compared to the state of the art, particularly in automotive applications such as steel and cast iron machining. Additionally it is an object of the present invention to provide a convenient industrial coating method for manufacturing the aforementioned high performance coated tools. Additionally, the coating method according to the present invention should be robust and simple as possible.
The aforementioned objective is achieved by the present invention by providing a hard nanolayer coating system and a coating deposition method thereof specially designed to improve the efficiency of high performance cutting tools.
Brief Description of the Figures
To better explain the present invention, figures 1 to 8 will be used for the description:
Figure 1: Sketch of the architecture of the coating according to the present invention
Figure 2: Cutting Test 1
Figure 3: Cutting Test 2
Figure 4: Cutting Test 3
Figure 5: Electron micrographs scanned in section
fractured cross section of the inventive coating, a) nanolaminated structure deposited at 570 ° C, b) nano-laminated structure deposited at 500 ° C.
Figure 6: Example of the measurement method for calculating the residual stress s in the nano-laminated structure comprised in the inventive coating 3 referred to as inventive 3 in Figure 7.
Figure 7: Calculated residual stress s of four different inventive coatings 1, 2, 3 and 4.
Figure 8: Schematic diagram showing the definition of the factor F10 / 9o for the inventive coating 1.
Detailed description of the invention
The hard nanolayer coating system (5) according to the present invention relates to a multilayer coating system that includes type A nanolayers and type B nanolayers alternatively deposited with each other. Type A nanolaps containing aluminum, Al, titanium, Ti, and nitrogen, N, and nanolayers of type B containing titanium, thi, silicon, Si, and nitrogen, N. Preferentially, at least some nanolayers of type A and / or at least some nanolayers of type B including tungsten, W.
Each nanolayer of type A or B included in the hard nanolayer coating system according to the present invention having essentially a maximum individual layer thickness of less than 200 nm.
Within the present invention a nanobilayer point will be defined as the sum of the thickness of two nanolayers, respectively of a nanolayer of type A and of a nanolayer of type B, which are deposited one of each repeatedly (at least twice) .
It was determined that the coating systems are as described above, but have a nanobilayer point of approximately 300 nm or more exhibit markedly lower cutting performance.
Therefore, a preferred embodiment of the hard nanolayer coating system according to the present invention is characterized in that it essentially has nanobilayer dots less than 300 nm.
A further preferred embodiment of the hard nanolayer coating system according to the present invention additionally comprises nanolayers of type A and B having an element composition according to the following formulas:
• Nanolayer A: (AlxTi | .x.yWy) N with x e y in atomic% and where 0.50 = x = 0.65 and 0 < and < 0.10
• Nanolayer B: (Ti | .z-uSizWu) N with z and u in atomic% and where 0.05 = z = 0.30 and 0 = u < 0.10
Additionally a preferred embodiment of the nanolayer coating system according to the present invention comprises at least four or preferably at least
ten individual nanowires, respectively at least two nanolayers of type A and two nanolayers of type B or preferably at least five nanolayers of type A and five nanolaps of type B, where nanolayers of type A and nanolaps of type B are deposited alternatively, that is, each of the type A nanolayers deposited in each of the corresponding type B nanolayers and / or each of the type B nanolayers deposited in each of the corresponding type A nanolayers.
A hard nanolayer coating system (5) according to the present invention is drawn in Figure 1. The hard nanolayer coating system in Figure 1 comprises an amount n of nanolaps of type A, respectively A ,, A2, A3 ... An, and a number m of nanolayers of type B, respectively B ,, B2, B3 ... Bm, the thickness of nanolaps of type A is denoted as dA, respectively dA ^ dA2, dA3 ... dAn, and the thickness of type B nanolaps are denoted as dB, respectively dB, dB2, dB3 ... dBm. According to the present invention, the quantity of nanolayers of type A is preferably the same as the quantity of nanolayers of type B: n = m or at least n s m
In the other preferred embodiment of the hard nanolayer coating system according to the present invention the thickness of type A nanolayers and the thickness of type B nanolayers are almost equal: dA = dB, respectively
dAn = dBm and Ai = dA2 = dA3 = ... dAn and dB, = dB2 = dB3 = .. dBm
Particularly, a very good cutting performance was observed by the layer coatings deposited according to the present invention when the thickness of the layers B was greater than the thickness of the layers A. Therefore, in another preferred embodiment of the coating system of hard nanolayers according to the present invention the thickness of the nanolayers of type A is smaller than the thickness of the nanolayers of type B: dA < dB or preferably dA < < dB, respectively dAn < dBm or preferably dAn < dBm, where dAi = dA2 = dA3 = ... dAn and dB! = dB2 = dB3 = ... dBm
In a preferred embodiment of the hard nanolayer coating system according to the present invention, the thickness of the nanolayers of type A is equal to or smaller than the thickness of the nanolayers of type B and the thickness of the individual nanolayers A and the thickness of the individual nanolayers B varies along the thickness of the total coating: dA = dB, respectively dAn = dBm, where
a) dAi = dA2 > dA3 ... = dAn and dB, = dB2 = dB3 > ... dBm, or b) dA! = dA2 = dA3 = ... dAn and dB, = dB2 = dB3 = ... dBm, oc) At least a portion of the total coating thickness comprises nanolayers of type A and nanolaps of type B deposited according to a) and at least a portion of the total coating thickness comprises type A nanolayers and type B nanolamps deposited according to b)
As shown in Figure 1 the architecture of a hard nanolayer coating system according to the present invention may further include an intermediate layer (2) between the substrate (1) and the hard nanolayer coating system composed of the nanolayers A and the alternating nanolaps B. The thickness and composition of the intermediate layer (2) should be selected, for example, to influence the texture of the hard nanolayer coating system and achieve reduced stress in the coating. Additionally, a top layer (3) can also be deposited in the last layer of the nanolayer coating system composed of the nanolayers A and the alternating nanolaps B as shown in Figure 1.
In one embodiment of the present invention between the substrate (1) and the hard nanolayer coating system is deposited an intermediate layer (2) consisting of AITiN or AITiWN having the same concentration ratio of these Al and Ti or Al , Ti and W in the nanolayers A that are the hard nanowire coating system.
In another embodiment of the present invention, an upper layer (3) is deposited in the last layer of the nanolayer coating system composed of the nanolayers A and the alternating nanolayers B to provide a special surface color.
The intermediate layer (2) and the upper layer (3) should be deposited as thinly as possible.
The coatings (AlxTi | -x-yWy) N / (Ti | -z.uSizWu) N according to the present invention were deposited in the high performance solid carbide drills using PVD techniques. More precisely, the coatings were deposited by anodized arc deposition methods in an Innova coating machine from Oerlikon Balzers. Especially suitable coating parameters for the deposition of the coatings according to the present invention were:
• N2-Pressure: 4 - 7 Pa
• DC substrate bias voltage: -20 - -60 V
• Temperature: 450 - 700 ° C
• Current arc was set for each experiment considering the class of arc evaporator used for the evaporation of the target material and the desired thickness of the nanolayers.
Another important aspect of the present invention is the significant influence of the kind of evaporator arc used for deposition of the coating.
Different types of coating were deposited according to the present invention, using different types of arc evaporators. Arc evaporators of the type described in Patent Documents WO2010088947 and US61 / 357272 were found to be particularly very convenient for the deposition of the coatings according to the present invention. Using these kinds of evaporators
of arc it was possible to obtain the coatings exhibiting the lower content of the hexagonal phase, inherent compressive stresses not too high and a preferred texture, which results in particularly good coating properties and better cutting performance.
Using the aforementioned arc evaporators it was possible to deposit the coatings according to the present invention which exhibit an excellent combination of high oxidation resistance, high stiffness and intrinsic low compressive stress which results in excellent cutting performance particularly for drilling operations.
The coatings according to the present invention also exhibit superior performance by cutting tests than the coatings of the state of the art as shown in Figures 2, 3 and 4.
Both arc evaporators or arc evaporation sources mentioned above were decisive for the deposition of the coatings according to the present invention. In each case the configuration of the arc evaporation source and the operational mode influenced the coating properties. In particular, it was possible to influence the microstructure of the nano-laminated coatings by rotating the fine grain instead of the column form, thereby obtaining a non-column structure but a fine grain structure. The formation of these structures
The fine-grained films in the nanoclaminated films deposited according to the present invention can be clearly seen in Figure 5. The figures shown in Figure 5 correspond to the scanned electron micrographs in fractured cross-section of two coatings deposited according to the present invention. invention and comprise a nanolaminate structure (5) of alternate layers A and B, where layers A are layers of AITiN and layers B are nanolayers of TiSiN, respectively, and having a bilayer point (the sum of the thickness of a layer A and a layer B alternately deposit with each other at least twice, ie forming at least one structure AB / A / B or B / A / B / A) of about 50 nm or less. The nano-laminated structures shown in Figures 5a and 5b were deposited while maintaining a substrate temperature during coating of approximately 570 ° C and 500 ° C, respectively. Both nano-laminated structures exhibit a fine grain structure with different grain size.
The produced nano-laminated structures exhibiting a fine-grained structure according to the present invention are particularly more advantageous for the prevention of cracking propagation than similar layers exhibiting a columnar structure. This can be caused by the difference in the distribution of the grain boundary or the limit of the crystal in the nano-laminated structure. In a columnar structure the crystals grow as parallel columns bearing, so
thus, a long crystal boundary extending in the substrate through the thickness of the coating facilitates the propagation of cracking along the thickness of the coating in the direction of the substrate and, therefore, results in a faster delamination of the coating or coating failure. In contrast to a column structure, a fine-grained structure having type taste that which is produced according to the present invention, comprises the fine grains whose crystal boundary or grain boundary does not extend into the substrate through the thickness of the grain. coating and, therefore, stops the propagation of cracking along the thickness of the coating in the direction towards the substrate.
Possibly due to the reason explained above, the fine-grained structures exhibited by the nano-laminated structures formed in accordance with the present invention show particularly good cutting during drilling and crushing in relation to life time, fatigue resistance, resistance to Crater wear, fracture toughness and oxidation resistance make the structures in columns.
The average residual stress, s, of the nanolaminated structure of the alternating nanolayers A and B comprised in the inventive coatings according to the present invention were measured and the measured values of some deposited inventive coatings are shown in Figure 7. The stresses are evaluated by XRD measurements using
the sin2u method. Measurements were made using CuKa radiation from peak 200 to approximately 43 ° 2T. The method used for calculating the residual stresses in the nanolaminate coating structures deposited according to the present invention are exemplary shown in Figure 6 using the inventive coating example 3. The inventive coating 3 comprises a nanolaminate structure of the AITiN nanolayers and TiSiN alternate, the global nanolaminate structure that has the composition averages at the atomic percentage of 20.3% Ti, 14.18% Al, 2.15% Si and 55.37% N, measured by X-ray spectroscopy of dispersive energy. The bilayer point was less than 50 nm. The inventive coating 3 was deposited by the techniques of PVD by arc using the TiAl metallurgical powder compound having a composition in the atomic percentage of 60% Al / 40% Ti for the deposition of the TiAIN layers and the TiAl target compound. which has a composition in the atomic percentage of 85% Ti / 15% Si for the deposition of TiSiN layers.
In a preferred embodiment of a coating according to the present invention, the nanolaminated structure of the alternating nanolayers A and B exhibit an average residual stress, s, between 2 and 5 GPa, preferably between 2.5 and 4 GPa, more preferably between 2.8 and 4 GPa. These recommended values of the residual stress can be particularly advantageous for the drilling and grinding operations.
In another preferred embodiment of the present invention a nanolaminate (AlxTi | -x-yWy) N / (Ti | .2-uSizWu) N with y = u ° = 0 is deposited by means of PVD arc techniques using as basic material the AITi objectives made by the metallurgical powder techniques and the TiSi objectives made by the metallurgical smelting techniques for the deposition of the nanolayers (AlxT¡ix) N and (Tii-z-uSiz) N, respectively.
In a further preferred embodiment of the present invention a nanolaminate (AlxTi | -x.yWy) N / (Ti | -2-uSizWu) N with y = u ° = 0 is deposited by means of PVD arc techniques using as a material basic AITi objectives made by metallurgical powder techniques and TiSi objectives also made by metallurgical powder techniques for the deposition of nanolayers (AlxTh-x) N and (Ti1-z-uSiz) N, respectively.
Example 1. Deposition of the coating according to the present invention
Coatings of AITiN / TiSiN having a bilayer point of about 5-30 nm were deposited in the solid carbide drills of high performance 0 8.5 mm in a coating machine of the Oerlikon Balzers company of the Innova type by the following conditions of Coating: N2-Pressure: 6 Pa
Substrate bias voltage: -40 V (CD)
Temperature: 570 ° C
The objectives have an element composition of
Al06Ti0.4 and Tio.e5Sio.15 were used respectively for the deposition of the nanolayer of AITiN and TiSiN. The objectives of the basic materials were evaporated using the arc evaporators of the type proposed by Krassnitzer et al. in the patent document WO2010088947, figure 15 of the patent. When adjusting the arc evaporators for the deposition of the coating the internal permanent magnet (centric) was placed behind far (back) in relation to the objective and the permanent external magnets were placed at a distance of 8 mm in relation to the objective. The arc evaporators were operated by setting a current coil of -0.3 A and a current arc of 140 A. The coated cutting tools were ptreated using different mechanical methods to improve the surface quality.
The ptreated solid carbide drills coated according to Example 1 were tested by cutting tests 1 and 3 and exhibit an impressively superior cutting performance in all the cutting tests (see Figures 2 and 4), alm50% of the time of operation increased. The results in the cutting tests were not essentially modified by the ptreatment technique.
Figure 2 shows the results obtained by cutting test 1, which was carried out with the solid carbide drilled holes 8.5 mm by the following cutting parameters:
Cutting speed vc: 180 m / min
Feeding f: 0.252 mm / rev
Step holes, ap: 40 mm
Workpiece material: 1.7225 (42CrMo4) at Rm = 900 MPa Figure 4 shows the results obtained by cutting test 3, which was performed with solid carbide drilled holes 08.5 mm by the following cutting parameters: Speed cutting vc: 100 m / min
Feeding f: 0.22 mm / rev
Step holes, ap: 40 mm
Material of the workpiece: EN-GJS-600-3 (nodular cast iron)
Example 2 of the coating deposition according to the present invention:
Coatings of AITiN / TiSiN having a bilayer point of about 8-15 nm were deposited in the solid carbide drills of high performance 0 8.5 mm in a coating machine of the company Oerikon Balzers of the Innova type by means of the following conditions of the covering:
Pressure of N2: 5 Pa
Polarization voltage of the substrate: -30 V (CD)
Temperature: 570 ° C
The targets that have an element composition of ?? 0.6 ~? 0.4 and of Ti.75Sio.25 were respectively used for the deposition of the nanolayer of AITiN and TiSiN. The objectives of
base material were evaporated using arc evaporators of the same type as those described in example 1. For the adjustment of the magnet system the internal permanent magnet was also placed in relation to the targets, while the outer permanent magnets were respectively placed in a distance of 8 mm and 10 mm from the TiAl and TiSi lenses. The arc evaporators for the evaporation of the TiAl and TiSi objectives were respectively operated by setting the coil currents of -0.3 A and -0.5 A and the arc currents of 140 A and 160 A.
Example 3. Deposition of the coating according to the present invention:
The coatings of AITiN / TiSiN having a bilayer point of about 5-30 nm were deposited in the solid carbide drills of high performance 0 8.5 mm in a coating machine of the company Oerlikon Balzers of the Innova type by means of the following conditions of the covering:
N2-Pressure: 6 Pa
Polarization voltage of the substrate: -50 V (CD)
Temperature: 500 ° C
The objectives that have a composition of the element of Al0 and io.4 and of T08oSio.2o were used respectively for the deposition of the nanolayer of AITiN and TiSiN. The targets of the base material were evaporated using arc evaporators
same type used in examples 1 and 2. The arc evaporators were operated by the same parameters as those used in example 1.
The coatings deposited according to examples 2 and 3 also showed very good cutting performance in similar cutting tests as those described in the cut test 1 and 3.
Example 4 Deposition of the coating according to the present invention:
The coatings of AITiN / TiSiN according to the present invention having a bilayer point of about 5-30 nm were deposited in the solid carbide drills of high yield 0 8.5 mm. For the evaporation of the Ti A I and TiSi objectives, the arc evaporators of the type described in the US Pat. No. 61/357272 were used. This type of arc evaporators comprises a cathode (objective), an anode and a magnetic medium, which allows the current lines of the magnetic field to be conducted to the anode, which is placed in direct proximity of the cathode. The arc evaporators were operated for the evaporation of the TiAl- and TiSi lenses that respectively fix the coil currents of 1.0 A and 1.2 A and the arc currents of 200 A and 180 A.
The solid carbide drills coated according to example 4 were also post-treated and their cutting operation
it was evaluated when cutting test 2. The results of cut test 2 are shown in figure 3.
Figure 3 shows the results obtained by the cutting test 2, which was carried out with solid carbide drilled holes or 8.5 mm by the following parameters: Cutting speed vc: 80 m / min
Feed f: 0.284 mm / rev
Step holes, ap: 40 mm
Workpiece material: 1.7225 (42CrMo4) at Rm = 900 MPa Example 5. Coating deposition according to the present invention:
The coatings of AITiN / TiSiN according to the present invention having a bilayer point of about 30, 50, 75, 100, 150, 180, 200, 250 and 300 nm were deposited in different batches in the solid carbide drills of high efficiency 0 8.5 mm using arc evaporators of the same type as those used in example 4. The arc currents in the range of 160-200 A and 180-200 A were respectively set for the evaporation of the material of the TiSi lenses. and AITi. The coil current was also adjusted accordingly.
In general coatings that have nanobilayer spots of approximately 300 nm exhibited marked lower cut performance, while coatings that have lower nanobatch points of 100
nm exhibited particularly better cutting performance. The results by the cutting tests of the high performance solid carbide drills 0 8.5 mm coated according to example 4 were good compared to those obtained by the cutting tests of the solid carbide drilled holes according to the examples 1 -3.
Using the aforementioned arc evaporators it was possible to deposit the coatings according to the present invention which exhibit hardness values of the coatings of about 36-46 GPa and Young's values of about 400-470 GPa. Both the hardness of the coating and the Young's modulus values were measured using the nanoindentation techniques.
Additionally, the coatings deposited according to the present invention exhibit a texture intensity of 200/100 = 10 determined by X-ray examinations.
The ratio of the peak width PW | _i 0 g0 was calculated using the formula: PW, PW PW, 90%, where PW | 10% are of a significant width of 200 to 10% and 90% of the maximum pirco intensity, respectively. Peak 200 is measured at approximately 43 ° on axis 2T using X-ray diffraction with CuKa2 radiation. The diffraction line was corrected with respect to the contribution of CuKa2 radiation, diffraction (smoothing) and background statistics. The peak like this
obtained 200 measured in the nano-laminated structure of the alternate layers A and B which are comprised in the inventive coating 1 is exemplary shown in Figure 8.
The characteristic values of PW | _10 / 9o of the nano-laminated coating structures of the alternate layers A and B (AlxTi | -x-yWy) N / (T¡i-2-ySizWu) N deposited according to the present invention are describe in table 1:
Table 1: PW | _10 / gm measured for the nanofoam coating structures (AlxTi | - > -yWy) N / (Ti | -z-ySizWu) N deposited according to the present invention which are comprised in the inventive coatings 1, 2, 3 and 4.
In another preferred embodiment of the present invention nanolaminated the characteristics of (AlxTi | -x.yWy) N / (Ti | -2.ySizWu) N is a ratio of peak width PW | _10 / 9o measured at the peak 200 43 ° in axis 2, using X-ray diffraction with CuKa, according to the method described above, of less than 7.5, preferably less than 7.
The present invention discloses a coated body, preferably a coated tool comprising a
body (1), in which is deposited a hard and wear-resistant PVD coating characterized in that the coating comprises a nano-laminated structure (5) of the alternate layers A and B A1, A2, A3, ... An and B1, B2, B3 ... Bm, respectively, where layer A is (AlxTi | -x-yWy) N, with 0.50 = x = 0.65 and 0 = y = 0.10, where the coefficients given by x, 1-x and ey correspond at the atomic concentration of aluminum, titanium and tungsten, respectively, considering only the aluminum, titanium and tungsten elements for the quantification of the element in layer A where layer B is / (Ti1-z-ySizWu) N with 0.05 = z = 0.30 and 0 = u = 0.10, where the coefficient given by 1-zu, zyu correspond to the atomic concentration of titanium, silicon and tungsten, respectively, considering only the elements of titanium, silicon and tungsten for the quantification of the element in such said layer B, with a thickness of the nano-laminated structure and between 0.01 and 30 pm, preferably between 1 and 15 pm, an average individual thickness of the layers of A and B is between 1 and 200 nm, respectively, preferably between 1 and 50 nm, more preferably between 1 and 30 nm, characterized in which the nano-laminated structure of the alternate layers A and B exhibits a fine-grained structure.
More preferably the coated body is a cutting tool comprising a body (1) of a hard alloy of cemented carbide-based material,
cement, ceramic, or high speed steel.
Preferably, the thickness of the layers A (A1, A2, A3 ... An), referred to as dA1, dA2, dA3 ... dAn, is equal to or smaller than the thickness of the layers B (B1, B2, B3 ... Bm), referred to as dB1, dB2, dB3 ... dBm, included in the nano-laminated structure of the alternate layers A and B, preferably the thickness of the layers A is equal to or smaller than ¾ of the thickness of the layers B: dA1 = ¾ dB1, dA2 = ¾ dB2, dA3 = ¾ dB3, dAn < ¾ dBm,
Preferably in at least a portion of the total thickness of the nano-laminated structure:
- the thickness of layers A and / or the thickness of the remaining constant of layers B, so that dA1 = dA2 = dA3 ... = dAn and / or dB1 = dB2 = dB3 ... = dBm,
I
- the thickness of the layers A and / or the thickness of the increases of the layers B, so that dA1 > dA2 > dA3 ... = dAn and / or dB1 > dB2 > dB3 ... = dBm,
I
- the thickness of layers A and / or the thickness of the decreases of layers B, so that dA1 = dA2 = dA3 ... = ¡dAn and / or dB1 = dB2 = dB3 ... = dBm
Preferably, a nano-laminated coating structure comprised in the coating of a coated body as mentioned above:
- the sum of the thicknesses of a type A nanolayer and a type B nanolayer alternately deposited together form a nanobilayer point of less than 300 nm, preferably less than 100 nm, more preferably between 5 and 50 nm, and
- such a nano-laminated coated structure comprises at least a total of four individual nanolayers A and B alternately deposited together forming a multi-layer architecture A1 / B1 / A2 / B2 / or B1 / A1 / B2 / A2, preferably at least one total of ten individual nanowires that form a multi-layered architecture
A1 / B1 / A2 / B2 / A3 / B3 / A4 / B4 / A5 / B5 or B1 / A1 / B2 / A2 / B3 / A3 / B4 / A4 / B5 / A5.
Preferably, in the nano-laminated coating structure comprised in the coating of a coated body as mentioned above:
- the nano-laminated structure characterizes a fine-grained structure comprising the grains whose largest size is 1/3 of the total thickness of the nano-laminated coating structure.
Preferably, in the nano-laminated coating structure comprised in the coating of a coated body as mentioned above:
- the nano-laminated structure characterizes a fine grain structure comprising grains having an average size
maximum 1,000 nm, preferably between 10 and 800 nm, more preferably between 10 and 400 nm.
According to the present invention, the nano-laminated coating structure comprised in the above-mentioned coated body can be or can comprise an equidimensional structure in which the grains have approximately the same dimensions in all directions.
According to the present invention, the nano-laminated coating structure comprised in the aforementioned coated body coating can have an average residual stress, s, which is between 2, and 5 GPa, preferably between 3 and 4 GPa.
According to the present invention, the nano-laminated coating structure comprised in the coating of the aforementioned coated body can have a peak width ratio, PWi_10 / 9o, which is less than 7.5, preferably less than 7, where :
- PW | _10% 0 = ° PW | _90%,
PW | _10% o = oPW | _90% are the meaning of the full width of peak 200 at 10% and 90% of peak peak intensity, respectively, and
- peak 200 was measured using X-ray diffraction with CuKa radiation at approximately 43 ° on axis 2T. The line of diffraction was corrected with respect to the contribution of the
CuKct2 radiation, from the diffraction (smoothing) and background statistics.
In a preferred embodiment of a coating according to the present invention, the coating comprises:
- at least one intermediate layer (2) deposited between the substrate (1) and said nano-laminated coating film (5), and / or
- at least one upper layer (3) deposited in the outer nanocoat of the nano-laminated coating film (5).
Preferably, the coated body according to the present invention is a drilling or grinding tool.
Preferably, the coated body according to the present invention is used for drilling or grinding operations, more preferably for drilling steel, stainless steel, or cast iron or crushing hardened steel or stainless steel.
A preferred method for manufacturing a coated body according to the present invention is an arc PVD method characterized by the use of at least one arc vaporization source for the deposition of the nanolayer coating film on the surface of the substrate, wherein at least one source of arc vaporization comprises a magnetic field distribution provided in a target
which generates magnetic fields in and on the target surface, where the magnetic field distribution comprises the marginal permanent magnets and at least one ring coil positioned behind the target, whose internal diameter defined by the coils is smaller than or equal to, and in any case is not considerably larger than the diameter of the objective, the marginal permanent magnets can be moved away from the objective essentially perpendicular to the surface of the objective and the projection of the marginal permanent magnets on the surface of the objective is further away from the center of the surface of the lens by comparing the projection of the coil of the ring on the surface of the objective, the internal permanent magnet or inside, centric is in the rear placed far from the rear in relation to the objective and the magnet permanent external or outside is placed at a distance of several millimeters in relation to the target, preferably between 6 and 10 mm, more preferably 8 mm. Preferably, when using this method for the deposition of the nano-laminated coating structure according to the present invention, a negative current of the coil is applied, the applied coil current is preferably between -0.1 and -1 A.
Another additional preferred method for manufacturing a coated body according to the present invention is an arc PVD method characterized by the use of at least one arc vaporization source for the deposition of the
coating of nanolayers on the surface of the substrate, wherein at least one source of arc vaporization comprises a target used as a cathode, an anode placed in the direct vicinity of the cathode, and magnetic means for conducting the current lines of the magnetic field to the anode. Preferably when using this method for the deposition of the nano-laminated coating structure according to the present invention a positive coil current is applied, the current of the applied coil is preferably between 0.5 and 2 A.
Preferably, the method applied for the deposition of the nano-laminated coating structures according to the present invention comprises the use of the base material of the coating of:
- at least one composite target made by means of metallurgical powder techniques, comprising aluminum and titanium and / or tungsten is used for the deposition of the nanocoat of type A, and / or
- at least one composite target made by metallurgical metal techniques, comprising titanium and silicon and / or tungsten is used for the deposition of the type B nanolayer.
Claims (17)
1. A tool comprising a body 1, preferably a cutting tool comprising a body of a hard alloy of material based on cemented carbide, cement, ceramics, cubic boron nitride or high speed steel, on which a coating is deposited of hard and wear resistant PVD characterized in that the coating comprises a nano-laminated structure 5 of layers A and B A1, A2, A3, ... An and B1, B2, B3 ... Bm, respectively, where layer A is (AlxTii-x.yWy) N, with 0.50 = 0.65 and 0 = 0.10, where the coefficients given by x, 1-x and ey correspond to the atomic concentration of aluminum, titanium and tungsten, respectively, considering only the aluminum elements , titanium and tungsten for the quantization element in such layer A, and where layer B is (T¡.2-uSizWu) N, with 0.05 = z = 0.30 and 0 = u = 0.10, where the coefficients given by 1-zu, zyu correspond to the atomic concentration of titanium, silicon and tungst ene, respectively, considering only the elements of titanium, silicon and tungsten for the quantification of the element in such layer B, with a nano-laminated structure thickness between 0.01 and 30 μ ??, preferably between 1 and 15 μ?. , an average individual thickness of the layers of A and B is between 1 and 200 nm, respectively, preferably between 1 and 50 nm, more preferably between 1 and 30 nm, characterized in such The nanofoam structure of layers A and B exhibits a fine grain structure.
2. The coated body according to the claim 1, characterized in that the thickness of the layers of A, designated as dA1, dA2, dA3 ... dAn, is equal to or smaller than the thickness of the layers of B, denoted as dB1, dB2, dB3 ... dBm , comprised in the nano-laminated structure of the alternate layers A and B, preferably the thickness of the layers of A is equal to or smaller than ¾ of the thickness of the layers B: dA1 < 3Á dB1, dA2 = ¾ dB2, dA3 = ¾ dB3, dAn = ¾ dBm.
3. The coated body according to the claim 2, characterized in that in at least a portion of the total thickness of the nano-laminated structure is - the thickness of layers A and / or the thickness of the remaining constant of layers B, so that dA1 = dA2 = dA3 ... = dAn and / or dB1 = dB2 = dB3 ... = dBm, and / or the thickness of the layers A and / or the thickness of the layers B increases, so that dA1 = dA2 > dA3 ... > dAn and / or dB1 = dB2 = dB3 ... = dBm, I - the thickness of the layers A and / or the thickness of the decreases of the layers B, so that dA1 = dA2 < dA3 ... < dAn and / or dB1 = dB2 < dB3 ... < dBm
4. The coated body according to any of the preceding claims characterized in that - in such a nanolayer coating system the sum of the thicknesses of a nanolayer of type A and a nanolayer of type B alternately deposited with each other forming a nanobilayer point is less than 300 nm, preferably less than 100 nm, more preferably between 5 and 50 nm, and - such nanolayer coating system comprises at least a total of four individual nanolayers A and B alternately deposited together forming a multilayer structure A1 / B1 / A2 / B2 / or B1 / A1 / B2 / A2, preferably at least one total of ten individual nanowires that form a multi-layered architecture A1 / B 1 / A2 / B2 / A3 / B3 / A4 / B4 / A5 / B5 or B1 / A1 / B2 / A2 / B3 / A3 / B4 / A4 / B5 /TO 5.
5. The coated body according to any of the preceding claims, characterized in that such a nano-laminated fine grain structure provides grains whose largest size is 1/3 of the total thickness of the nano-laminated structure.
6. The coated body according to any of the preceding claims characterized in that such a fine-grained nano-laminated structure provides grains whose average size is maximum 1,000 nm, preferably between 10 and 800 nm, more preferably between 10 and 400 nm.
7. The coated body according to the preceding claims in such a nano-laminated structure is or comprises an equidimensional structure in which the grains have approximately the same dimensions in all the addresses.
8. The coated body according to the preceding claims characterized in that such a nano-laminated structure characterizes an average residual tension, a, between 2.5 and 5 GPa, preferably between 2.5 and 4 GPa.
9. The coated body according to the preceding claims, characterized in that such nano-laminated structure provides a ratio of the peak width PW, 10/9 or less than 7.5, preferably less than 7, where PW | _io% 0 = 0PWi_i or / PWi_9o% are the meaning of the full peak width 200 at 10% and 90% of the maximum peak intensity, respectively, and - the peak 200 is measured using X-ray diffraction with the CuKa radiation at approximately 43 ° on the 2T axis, and the diffraction line is corrected with respect to the contribution of the CuKa2 radiation, from the diffraction statistics (smoothing) ) and the background.
10. The coated body according to the preceding claims, characterized in that said coating comprises - at least one intermediate layer 2 deposited between the substrate 1 and such nanolayer coating film 5, and / or - at least one top layer 3 deposited in the outermost nanowire of the nanolayer coating film 5.
11. The coated body according to the preceding claims, characterized in that said body is a drilling or grinding tool.
12. The use of a coated body according to any of the preceding claims for cutting operations, preferably for drilling or grinding operations, more preferably for drilling steel, stainless steel, or cast iron or grinding stainless steel hard.
13. The method for manufacturing a coated body according to any of the preceding claims 1 to 11 within which at least one arc vaporization source is used for the deposition of the nanolayer coating film on the surface of the substrate, characterized in which at least one source of arc evaporation comprises a magnetic field distribution provided in a target to generate magnetic fields in and on the target surface, where the magnetic field distribution comprises marginal permanent magnets and at least one ring coil placed behind the target, whose internal diameter defined by the coils is smaller than or equal to, and in any case not considerably larger than the diameter of the target, and the marginal permanent magnets can be moved away from the target essentially perpendicular to the surface of the target. objective and projection of magnets marginal permanent on the surface of the objective is additionally far from the center of the surface of the objective by comparison to the projection of the ring coil on the surface of the objective, the permanent magnet centric, internal or inside, the downtown permanent magnet is placed in the far back in relation to the objective and the permanent magnet outside or outside, it is placed at a distance of several millimeters in relation to the target, preferably between 6 and 10 mm, more preferably approximately 8 mm.
14. The method according to claim 13, characterized in that a negative current of the coil is applied, the current of the coil preferably applied between -0.1 and -1 A.
15. The method for manufacturing a coated body according to any of the preceding claims from 1 to 11, within which at least one source of arc vaporization is used for the deposition of the nanolayer coating film on the substrate surface, characterized in that at least one source of arc evaporation comprises a target used as a cathode, an anode placed in direct proximity to the cathode, and magnetic means that allow the current lines of the magnetic field to be conducted to the anode.
16. The method according to claim 15, characterized in that a positive current of the coil is applied, the current of the applied coil preferably being between 0.5 and 2 A.
17. The method according to the preceding claims from 11 to 15, characterized in that as the base material for the deposition of the nano-laminated structure at least one composite target made by means of metallurgical powder techniques, comprising aluminum and titanium and / or tungsten, is used for the deposition of type A nanolayer, and / or at least one composite target made by metallurgical casting techniques, comprising titanium and silicon and / or tungsten, is used for the deposition of the type B nanolayer.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161503038P | 2011-06-30 | 2011-06-30 | |
| PCT/EP2012/002673 WO2013000557A1 (en) | 2011-06-30 | 2012-06-25 | Nano-layer coating for high performance tools |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MX2014000238A true MX2014000238A (en) | 2014-02-27 |
| MX347702B MX347702B (en) | 2017-05-09 |
Family
ID=46545721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2014000238A MX347702B (en) | 2011-06-30 | 2012-06-25 | Nano-layer coating for high performance tools. |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US9200371B2 (en) |
| EP (1) | EP2726648B1 (en) |
| JP (1) | JP6236601B2 (en) |
| KR (1) | KR101979041B1 (en) |
| CN (1) | CN103764873B (en) |
| AR (1) | AR086812A1 (en) |
| BR (1) | BR112013033654B1 (en) |
| CA (1) | CA2840536C (en) |
| ES (1) | ES2763959T3 (en) |
| HU (1) | HUE047421T2 (en) |
| IN (1) | IN2013DN11282A (en) |
| MX (1) | MX347702B (en) |
| PH (1) | PH12014500036A1 (en) |
| PL (1) | PL2726648T3 (en) |
| RU (1) | RU2602577C2 (en) |
| WO (1) | WO2013000557A1 (en) |
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| WO2015156383A1 (en) * | 2014-04-10 | 2015-10-15 | 株式会社タンガロイ | Coated tool |
| DE102014018915A1 (en) * | 2014-12-22 | 2016-06-23 | Oerlikon Surface Solutions Ag, Trübbach | AlCrN-based coating for improved resistance to crater wear |
| CN105112858B (en) * | 2015-08-31 | 2018-01-12 | 科汇纳米技术（深圳）有限公司 | A kind of nano combined cutter coat of sandwich construction |
| KR102122139B1 (en) | 2015-09-04 | 2020-06-11 | 오에스지 가부시키가이샤 | Rigid film and hard film coating member |
| WO2017037956A1 (en) * | 2015-09-04 | 2017-03-09 | オーエスジー株式会社 | Hard coating and hard coating-covered member |
| WO2018078731A1 (en) | 2016-10-25 | 2018-05-03 | オーエスジー株式会社 | Hard coating and member coated with hard coating |
| US10570501B2 (en) * | 2017-05-31 | 2020-02-25 | Kennametal Inc. | Multilayer nitride hard coatings |
| JP7266810B2 (en) * | 2017-09-05 | 2023-05-01 | エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン | Al-enriched AlTiN film |
| RU2671780C1 (en) * | 2017-10-30 | 2018-11-06 | Общество с ограниченной ответственностью "Сборные конструкции инструмента, фрезы Москвитина" | Working part of cutting tool |
| RU2675872C1 (en) * | 2018-02-06 | 2018-12-25 | Общество с ограниченной ответственностью "Сборные конструкции инструмента, фрезы Москвитина" | Cutting tool for handling products made of hard-to-cut materials |
| JP7031791B2 (en) | 2019-05-09 | 2022-03-08 | 株式会社Moldino | Cover cutting tool |
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-
2012
- 2012-06-25 BR BR112013033654-4A patent/BR112013033654B1/en active IP Right Grant
- 2012-06-25 MX MX2014000238A patent/MX347702B/en active IP Right Grant
- 2012-06-25 US US14/130,076 patent/US9200371B2/en active Active
- 2012-06-25 WO PCT/EP2012/002673 patent/WO2013000557A1/en not_active Ceased
- 2012-06-25 HU HUE12737477A patent/HUE047421T2/en unknown
- 2012-06-25 CA CA2840536A patent/CA2840536C/en active Active
- 2012-06-25 ES ES12737477T patent/ES2763959T3/en active Active
- 2012-06-25 CN CN201280041995.5A patent/CN103764873B/en active Active
- 2012-06-25 JP JP2014517500A patent/JP6236601B2/en active Active
- 2012-06-25 PL PL12737477T patent/PL2726648T3/en unknown
- 2012-06-25 RU RU2014102998/02A patent/RU2602577C2/en active
- 2012-06-25 PH PH1/2014/500036A patent/PH12014500036A1/en unknown
- 2012-06-25 KR KR1020147002594A patent/KR101979041B1/en active Active
- 2012-06-25 EP EP12737477.5A patent/EP2726648B1/en active Active
- 2012-06-29 AR ARP120102353A patent/AR086812A1/en active IP Right Grant
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Also Published As
| Publication number | Publication date |
|---|---|
| BR112013033654A2 (en) | 2017-03-01 |
| US20140147683A1 (en) | 2014-05-29 |
| AR086812A1 (en) | 2014-01-22 |
| IN2013DN11282A (en) | 2015-05-15 |
| HUE047421T2 (en) | 2020-04-28 |
| PH12014500036A1 (en) | 2022-05-02 |
| US9200371B2 (en) | 2015-12-01 |
| KR20140047688A (en) | 2014-04-22 |
| KR101979041B1 (en) | 2019-05-15 |
| CN103764873B (en) | 2016-01-13 |
| EP2726648B1 (en) | 2019-09-11 |
| WO2013000557A1 (en) | 2013-01-03 |
| EP2726648A1 (en) | 2014-05-07 |
| PL2726648T3 (en) | 2020-03-31 |
| JP6236601B2 (en) | 2017-11-29 |
| MX347702B (en) | 2017-05-09 |
| ES2763959T3 (en) | 2020-06-01 |
| RU2602577C2 (en) | 2016-11-20 |
| CN103764873A (en) | 2014-04-30 |
| JP2014523968A (en) | 2014-09-18 |
| BR112013033654B1 (en) | 2020-12-29 |
| RU2014102998A (en) | 2015-08-10 |
| CA2840536A1 (en) | 2013-01-03 |
| CA2840536C (en) | 2019-04-02 |
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