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MX2010004851A - Metodo para depositar capas electricamente aislantes. - Google Patents

Metodo para depositar capas electricamente aislantes.

Info

Publication number
MX2010004851A
MX2010004851A MX2010004851A MX2010004851A MX2010004851A MX 2010004851 A MX2010004851 A MX 2010004851A MX 2010004851 A MX2010004851 A MX 2010004851A MX 2010004851 A MX2010004851 A MX 2010004851A MX 2010004851 A MX2010004851 A MX 2010004851A
Authority
MX
Mexico
Prior art keywords
electrically insulating
insulating layers
depositing electrically
voltage
spark discharge
Prior art date
Application number
MX2010004851A
Other languages
English (en)
Inventor
Christian Wohlrab
Juergen Ramm
Original Assignee
Oerlikon Trading Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag filed Critical Oerlikon Trading Ag
Publication of MX2010004851A publication Critical patent/MX2010004851A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H01J37/32064—Circuits specially adapted for controlling the arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Arc Welding Control (AREA)

Abstract

La invención se refiere a un pprocedimiento para activar una fuente de arco, en la cual se produce o aplica una descarga de chispas en una superficie de un objetivo (5), y la descarga de chispas simultáneamente se alimenta con una corriente directa, a la cual está asignada una tención a CD, como también una corriente de pulsos producida mediante una señal de tensión aplicada periódicamente. La tensión en la fuente de arco se eleva durante varios microsegundos o la forma de la señal de la señal de tensión esencialmente se selecciona libremente.
MX2010004851A 2007-11-08 2008-02-29 Metodo para depositar capas electricamente aislantes. MX2010004851A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/937,071 US9605338B2 (en) 2006-10-11 2007-11-08 Method for depositing electrically insulating layers
PCT/EP2008/052521 WO2009059807A1 (de) 2007-11-08 2008-02-29 Verfahren zum abscheiden elektrisch isolierender schichten

Publications (1)

Publication Number Publication Date
MX2010004851A true MX2010004851A (es) 2010-06-11

Family

ID=39535327

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2010004851A MX2010004851A (es) 2007-11-08 2008-02-29 Metodo para depositar capas electricamente aislantes.

Country Status (13)

Country Link
US (1) US9605338B2 (es)
EP (1) EP2208216B1 (es)
JP (1) JP5876985B2 (es)
KR (1) KR20100091199A (es)
CN (1) CN101855699B (es)
BR (1) BRPI0820346A2 (es)
ES (1) ES2445397T3 (es)
MX (1) MX2010004851A (es)
PL (1) PL2208216T3 (es)
PT (1) PT2208216E (es)
RU (1) RU2510097C2 (es)
TW (1) TW200920869A (es)
WO (1) WO2009059807A1 (es)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090052174A (ko) * 2007-11-20 2009-05-25 아이시스(주) 확산박막 증착 방법 및 장치
US20110045208A1 (en) * 2008-02-12 2011-02-24 Imott Inc. Diamond-like carbon film forming apparatus and method of forming diamond-like carbon film
DE102010038605B4 (de) * 2010-07-29 2012-06-14 Hüttinger Elektronik Gmbh + Co. Kg Zündschaltung zum Zünden eines mit Wechselleistung gespeisten Plasmas
CN102409303A (zh) * 2010-09-25 2012-04-11 北京北方微电子基地设备工艺研究中心有限责任公司 一种靶材功率加载方法、靶材电源及半导体处理设备
DE102011016681A1 (de) * 2011-04-11 2012-10-11 Oerlikon Trading Ag, Trübbach Kohlenstofffunkenverdampfung
DE102011117994A1 (de) * 2011-11-09 2013-05-16 Oerlikon Trading Ag, Trübbach HIPIMS-Schichten
DE102013112039B4 (de) * 2013-10-31 2015-05-07 Borgwarner Ludwigsburg Gmbh Korona-Zündsystem für einen Verbrennungsmotor und Verfahren zur Steuerung eines Korona-Zündsystems
EP3063309B1 (de) * 2013-11-03 2022-10-12 Oerlikon Surface Solutions AG, Pfäffikon Oxidationsbarriereschicht
KR102215808B1 (ko) * 2014-05-13 2021-02-17 아고르 알바 에쓰에이 진공 중 음극성 아크 물리 기상 증착(pvd)에서의 매크로 입자를 필터링하기 위한 방법
JP5997417B1 (ja) * 2015-06-24 2016-09-28 キヤノンアネルバ株式会社 真空アーク成膜装置および成膜方法
KR102156989B1 (ko) * 2015-06-24 2020-09-16 캐논 아네르바 가부시키가이샤 진공 아크 성막 장치 및 성막 방법
WO2018056584A1 (ko) 2016-09-21 2018-03-29 삼성전자 주식회사 피부 상태 측정 방법 및 이를 위한 전자 장치

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JPH0142574Y2 (es) 1984-09-10 1989-12-13
JPS6442574A (en) 1987-08-07 1989-02-14 Nissin Electric Co Ltd Arc power source device for vacuum arc discharge type pvd device
US5310607A (en) 1991-05-16 1994-05-10 Balzers Aktiengesellschaft Hard coating; a workpiece coated by such hard coating and a method of coating such workpiece by such hard coating
DE4401986A1 (de) 1994-01-25 1995-07-27 Dresden Vakuumtech Gmbh Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür
CH688863A5 (de) 1994-06-24 1998-04-30 Balzers Hochvakuum Verfahren zum Beschichten mindestens eines Werkstueckes und Anlage hierfuer.
JP3060876B2 (ja) * 1995-02-15 2000-07-10 日新電機株式会社 金属イオン注入装置
DE19518781C1 (de) 1995-05-22 1996-09-05 Fraunhofer Ges Forschung Vakuumbeschichteter Verbundkörper und Verfahren zu seiner Herstellung
JP4120974B2 (ja) * 1997-06-17 2008-07-16 キヤノンアネルバ株式会社 薄膜作製方法および薄膜作製装置
JP4502475B2 (ja) 2000-08-04 2010-07-14 株式会社神戸製鋼所 硬質皮膜および耐摩耗部材並びにその製造方法
DE10115390A1 (de) * 2000-12-22 2002-06-27 Mitsubishi Materials Corp Toki Beschichtetes Schneidwerkzeug
JP4109503B2 (ja) * 2002-07-22 2008-07-02 日新電機株式会社 真空アーク蒸着装置
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RU2246719C1 (ru) * 2003-07-04 2005-02-20 Общество с ограниченной ответственностью "Интроскан" Способ облучения конверсионной мишени импульсами тока ускоренных электронов и устройство для его реализации
US20060066248A1 (en) * 2004-09-24 2006-03-30 Zond, Inc. Apparatus for generating high current electrical discharges
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SG160397A1 (en) * 2005-03-24 2010-04-29 Oerlikon Trading Ag Hard material layer
US9997338B2 (en) * 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source

Also Published As

Publication number Publication date
CN101855699B (zh) 2014-10-29
EP2208216A1 (de) 2010-07-21
PL2208216T3 (pl) 2014-03-31
BRPI0820346A2 (pt) 2015-05-12
US20080286496A1 (en) 2008-11-20
ES2445397T3 (es) 2014-03-03
CN101855699A (zh) 2010-10-06
PT2208216E (pt) 2013-12-17
RU2510097C2 (ru) 2014-03-20
JP5876985B2 (ja) 2016-03-02
EP2208216B1 (de) 2013-11-06
US9605338B2 (en) 2017-03-28
TW200920869A (en) 2009-05-16
KR20100091199A (ko) 2010-08-18
JP2011503350A (ja) 2011-01-27
RU2010123193A (ru) 2011-12-20
WO2009059807A1 (de) 2009-05-14

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