MX2009010309A - Bases nitrogenadas fotoactivables. - Google Patents
Bases nitrogenadas fotoactivables.Info
- Publication number
- MX2009010309A MX2009010309A MX2009010309A MX2009010309A MX2009010309A MX 2009010309 A MX2009010309 A MX 2009010309A MX 2009010309 A MX2009010309 A MX 2009010309A MX 2009010309 A MX2009010309 A MX 2009010309A MX 2009010309 A MX2009010309 A MX 2009010309A
- Authority
- MX
- Mexico
- Prior art keywords
- alkyl
- hydrogen
- nitrogen bases
- substituted
- independently
- Prior art date
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title 2
- 229910052757 nitrogen Inorganic materials 0.000 title 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 125000006702 (C1-C18) alkyl group Chemical group 0.000 abstract 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 2
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 125000005647 linker group Chemical group 0.000 abstract 1
- 125000004957 naphthylene group Chemical group 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Ceramic Engineering (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Plural Heterocyclic Compounds (AREA)
- Indole Compounds (AREA)
Abstract
Se describen compuestos de la fórmula (I), (II) y (III) en donde Ar es por ejemplo fenileno, bifenileno o naftileno, todos los cuales son no sustituidos o sustituidos por alquilo de C1-C4, alquenilo de C2-C4, CN, OR11, SR11, CH2OR11, COOR12, CONR12R13 o halógeno; R1, R2, R7 y R8, independientes entre sí son hidrógeno o alquilo de C1-C6 R3 y R5 juntos y R4 y R6 juntos forman un puente alquileno de C2-C6, el cual es no sustituido o sustituido por uno o más alquilo de C1-C4 R11 es hidrógeno o alquilo C1-C6 R12 y R13 independientes entre sí, por ejemplo, son hidrógeno, fenilo, alquilo de C1-C18, alquilo de C1-C18 el cual está interrumpido por uno o más O; n es 1-10; X es 0, S ó NR10 A y A1 son grupos de enlace apropiados; que son apropiados como bases fotolatentes.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP07105510 | 2007-04-03 | ||
| PCT/EP2008/053456 WO2008119688A1 (en) | 2007-04-03 | 2008-03-25 | Photoactivable nitrogen bases |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2009010309A true MX2009010309A (es) | 2009-10-16 |
Family
ID=38016564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2009010309A MX2009010309A (es) | 2007-04-03 | 2008-03-25 | Bases nitrogenadas fotoactivables. |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US9921477B2 (es) |
| EP (1) | EP2145231B1 (es) |
| JP (1) | JP5606308B2 (es) |
| KR (2) | KR101944734B1 (es) |
| CN (1) | CN101641643B (es) |
| AT (1) | ATE524765T1 (es) |
| CA (1) | CA2681201C (es) |
| MX (1) | MX2009010309A (es) |
| WO (1) | WO2008119688A1 (es) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008037635A1 (en) * | 2006-09-29 | 2008-04-03 | Ciba Holding Inc. | Photolatent bases for systems based on blocked isocyanates |
| KR101944734B1 (ko) | 2007-04-03 | 2019-02-07 | 바스프 에스이 | 광활성화가능한 질소 염기 |
| US9624171B2 (en) * | 2008-06-06 | 2017-04-18 | Basf Se | Photoinitiator mixtures |
| CN101967343A (zh) * | 2010-10-22 | 2011-02-09 | 广州市博兴化工科技有限公司 | 一种光固化色漆 |
| GB2491643A (en) | 2011-06-10 | 2012-12-12 | Lambson Ltd | Method of forming a polymeric material on a substrate |
| US9616460B2 (en) | 2011-12-02 | 2017-04-11 | Toyota Motor Engineering & Manufacturing North America, Inc. | Terminate-on-demand cationic polymerization method for forming a two-dimensional coating |
| US9758607B2 (en) | 2013-10-10 | 2017-09-12 | Research Foundation Of The City University Of New York | Polymer with antibacterial activity |
| DE102014202609B4 (de) | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| CN106537255A (zh) * | 2014-04-18 | 2017-03-22 | 陶氏环球技术有限责任公司 | 用于lcd的彩色滤光片的蒽醌化合物 |
| CN114734628A (zh) * | 2014-06-23 | 2022-07-12 | 卡本有限公司 | 由具有多重硬化机制的材料制备三维物体的方法 |
| JP6731930B2 (ja) | 2015-02-05 | 2020-07-29 | カーボン，インコーポレイテッド | 断続的曝露による付加製造方法 |
| US10391711B2 (en) | 2015-03-05 | 2019-08-27 | Carbon, Inc. | Fabrication of three dimensional objects with multiple operating modes |
| US20180127538A1 (en) | 2015-04-29 | 2018-05-10 | 3M Innovative Properties Company | Composition including a polythiol and a polyepoxide and methods relating to the composition |
| US10471655B2 (en) | 2015-09-04 | 2019-11-12 | Carbon, Inc. | Cyanate ester dual resins for additive manufacturing |
| JP6845226B2 (ja) | 2015-09-09 | 2021-03-17 | カーボン，インコーポレイテッド | 積層造形用エポキシ二重硬化樹脂 |
| US10647873B2 (en) | 2015-10-30 | 2020-05-12 | Carbon, Inc. | Dual cure article of manufacture with portions of differing solubility |
| WO2017079502A1 (en) | 2015-11-05 | 2017-05-11 | Carbon, Inc. | Silicone dual cure resins for additive manufacturing |
| WO2017112653A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Dual precursor resin systems for additive manufacturing with dual cure resins |
| US10787583B2 (en) | 2015-12-22 | 2020-09-29 | Carbon, Inc. | Method of forming a three-dimensional object comprised of a silicone polymer or co-polymer |
| US10343331B2 (en) | 2015-12-22 | 2019-07-09 | Carbon, Inc. | Wash liquids for use in additive manufacturing with dual cure resins |
| US10538031B2 (en) | 2015-12-22 | 2020-01-21 | Carbon, Inc. | Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products |
| US10647054B2 (en) | 2015-12-22 | 2020-05-12 | Carbon, Inc. | Accelerants for additive manufacturing with dual cure resins |
| WO2017112682A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Fabrication of compound products from multiple intermediates by additive manufacturing with dual cure resins |
| US10501572B2 (en) | 2015-12-22 | 2019-12-10 | Carbon, Inc. | Cyclic ester dual cure resins for additive manufacturing |
| US10500786B2 (en) | 2016-06-22 | 2019-12-10 | Carbon, Inc. | Dual cure resins containing microwave absorbing materials and methods of using the same |
| WO2018069526A1 (en) * | 2016-10-14 | 2018-04-19 | Basf Se | Hardenable polymer composition |
| WO2018094131A1 (en) * | 2016-11-21 | 2018-05-24 | Carbon, Inc. | Method of making three-dimensional object by delivering reactive component for subsequent cure |
| CN110036342A (zh) | 2016-12-05 | 2019-07-19 | 阿科玛股份有限公司 | 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物 |
| US11535686B2 (en) | 2017-03-09 | 2022-12-27 | Carbon, Inc. | Tough, high temperature polymers produced by stereolithography |
| US10367228B2 (en) | 2017-04-07 | 2019-07-30 | Seeo, Inc. | Diester-based polymer electrolytes for high voltage lithium ion batteries |
| US10316213B1 (en) | 2017-05-01 | 2019-06-11 | Formlabs, Inc. | Dual-cure resins and related methods |
| CN213006569U (zh) | 2017-06-21 | 2021-04-20 | 卡本有限公司 | 用于增材制造的系统和对分配用于增材制造的树脂有用的分配系统 |
| EP3713559B1 (en) | 2017-11-24 | 2023-06-28 | Lunella Biotech, Inc. | Triphenylphosphonium compounds for use in preventing or treating tumor recurrence, metastasis and radiotherapy resistance or for treating cancer |
| US11135649B2 (en) * | 2018-02-27 | 2021-10-05 | Arizona Board Of Regents On Behalf Of Arizona State University | Direct metal printing with stereolithography |
| US11504903B2 (en) | 2018-08-28 | 2022-11-22 | Carbon, Inc. | 1K alcohol dual cure resins for additive manufacturing |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| US20220011670A1 (en) * | 2020-07-08 | 2022-01-13 | International Business Machines Corporation | Resist underlayer surface modification |
| DE102022110540A1 (de) | 2022-04-29 | 2023-11-02 | tooz technologies GmbH | Verfahren zur anpassung des brechungsindex |
| CN117466862B (zh) * | 2022-07-20 | 2025-10-21 | 天津久日新材料股份有限公司 | 一种含硫光引发剂及其制备方法和应用 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (en) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Coating composition including a blocked basic catalyst |
| CA2163875A1 (en) | 1993-05-26 | 1994-12-08 | Huig Klinkenberg | Coating composition including a uv-deblockable basic catalyst |
| US6362301B1 (en) | 1994-06-13 | 2002-03-26 | Rohm And Haas Company | Curable composition |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| AU713498B2 (en) | 1996-02-22 | 1999-12-02 | Ciba Specialty Chemicals Holding Inc. | Anionic photocatalyst |
| CA2276613C (en) | 1997-01-22 | 2008-02-05 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on .alpha.-amino ketones |
| EP1032576B1 (en) * | 1997-02-26 | 2008-01-16 | Ciba SC Holding AG | Photoactivatable nitrogen-containing bases based on alpha-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
| EP0970085B1 (en) * | 1997-03-18 | 2002-07-24 | Ciba SC Holding AG | Photoactivatable nitrogen-containing bases based on alpha-amino alkenes |
| EP0898202B1 (en) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| AU5620499A (en) | 1998-08-21 | 2000-03-14 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable bases containing nitrogen |
| WO2001092362A1 (en) | 2000-05-26 | 2001-12-06 | Akzo Nobel N.V. | Photoactivatable coating composition |
| KR100938769B1 (ko) * | 2001-10-17 | 2010-01-27 | 시바 홀딩 인크 | 광활성화 가능한 질소 염기 |
| ATE479713T1 (de) * | 2002-04-19 | 2010-09-15 | Basf Se | Plasmainduzierte härtung von beschichtungen |
| RU2381835C2 (ru) | 2004-07-21 | 2010-02-20 | Циба Спешиалти Кемикэлз Холдинг Инк. | Способ фотоактивации и применение катализатора посредством обращенной двустадийной процедуры |
| KR101433684B1 (ko) | 2006-07-17 | 2014-08-25 | 시바 홀딩 인크 | 결합방법 |
| WO2008037635A1 (en) | 2006-09-29 | 2008-04-03 | Ciba Holding Inc. | Photolatent bases for systems based on blocked isocyanates |
| KR101944734B1 (ko) | 2007-04-03 | 2019-02-07 | 바스프 에스이 | 광활성화가능한 질소 염기 |
-
2008
- 2008-03-25 KR KR1020147033474A patent/KR101944734B1/ko not_active Expired - Fee Related
- 2008-03-25 EP EP08718153A patent/EP2145231B1/en not_active Not-in-force
- 2008-03-25 JP JP2010501474A patent/JP5606308B2/ja not_active Expired - Fee Related
- 2008-03-25 CN CN200880009820XA patent/CN101641643B/zh not_active Expired - Fee Related
- 2008-03-25 CA CA2681201A patent/CA2681201C/en not_active Expired - Fee Related
- 2008-03-25 US US12/532,840 patent/US9921477B2/en active Active
- 2008-03-25 AT AT08718153T patent/ATE524765T1/de not_active IP Right Cessation
- 2008-03-25 WO PCT/EP2008/053456 patent/WO2008119688A1/en not_active Ceased
- 2008-03-25 KR KR1020097022890A patent/KR101514093B1/ko not_active Expired - Fee Related
- 2008-03-25 MX MX2009010309A patent/MX2009010309A/es active IP Right Grant
-
2018
- 2018-01-26 US US15/880,695 patent/US10928728B2/en not_active Expired - Fee Related
-
2020
- 2020-10-09 US US17/066,750 patent/US20210033972A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010523515A (ja) | 2010-07-15 |
| EP2145231A1 (en) | 2010-01-20 |
| US9921477B2 (en) | 2018-03-20 |
| KR101944734B1 (ko) | 2019-02-07 |
| CA2681201C (en) | 2016-06-14 |
| KR20100016136A (ko) | 2010-02-12 |
| WO2008119688A1 (en) | 2008-10-09 |
| CN101641643B (zh) | 2013-08-07 |
| US20210033972A1 (en) | 2021-02-04 |
| EP2145231B1 (en) | 2011-09-14 |
| CA2681201A1 (en) | 2008-10-09 |
| KR101514093B1 (ko) | 2015-04-21 |
| JP5606308B2 (ja) | 2014-10-15 |
| US20180217498A1 (en) | 2018-08-02 |
| KR20150005683A (ko) | 2015-01-14 |
| ATE524765T1 (de) | 2011-09-15 |
| CN101641643A (zh) | 2010-02-03 |
| US20100105794A1 (en) | 2010-04-29 |
| US10928728B2 (en) | 2021-02-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG | Grant or registration |