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MA34085B1 - Procédé d'approvisionnement en fluor - Google Patents

Procédé d'approvisionnement en fluor

Info

Publication number
MA34085B1
MA34085B1 MA35242A MA35242A MA34085B1 MA 34085 B1 MA34085 B1 MA 34085B1 MA 35242 A MA35242 A MA 35242A MA 35242 A MA35242 A MA 35242A MA 34085 B1 MA34085 B1 MA 34085B1
Authority
MA
Morocco
Prior art keywords
devices
site
elemental fluorine
fluoride
conveying
Prior art date
Application number
MA35242A
Other languages
Arabic (ar)
English (en)
Inventor
Maurizio Paganin
Original Assignee
Solvay
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solvay filed Critical Solvay
Publication of MA34085B1 publication Critical patent/MA34085B1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/20—Fluorine
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/32—Hydrogen storage
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)

Abstract

Le fluor élémentaire est utilisé comme agent de gravure pour la fabrication de dispositifs électroniques, notamment des dispositifs semi-conducteurs, des dispositifs microélectromécaniques, des transistors à couches minces, des écrans plats et des panneaux solaires, et comme agent de nettoyage de chambres principalement pour les appareils de PECVD. À cet effet, le fluor est souvent produit sur site. L'invention concerne un procédé qui empêche la contamination du fluor élémentaire par des impuretés gazeuses telles que l'air ou l'humidité en le produisant sur site et en l'acheminant jusqu'au point d'utilisation sous une pression supérieure à la pression ambiante.
MA35242A 2010-03-26 2011-03-22 Procédé d'approvisionnement en fluor MA34085B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP10157904 2010-03-26
PCT/EP2011/054338 WO2011117234A2 (fr) 2010-03-26 2011-03-22 Procédé d'approvisionnement en fluor

Publications (1)

Publication Number Publication Date
MA34085B1 true MA34085B1 (fr) 2013-03-05

Family

ID=42501303

Family Applications (1)

Application Number Title Priority Date Filing Date
MA35242A MA34085B1 (fr) 2010-03-26 2011-03-22 Procédé d'approvisionnement en fluor

Country Status (12)

Country Link
US (1) US8871174B2 (fr)
EP (1) EP2552828A2 (fr)
JP (2) JP6208009B2 (fr)
KR (1) KR20130079363A (fr)
CN (1) CN102822088A (fr)
BR (1) BR112012024035A2 (fr)
MA (1) MA34085B1 (fr)
MY (1) MY162759A (fr)
SG (1) SG184131A1 (fr)
TW (1) TWI539030B (fr)
WO (1) WO2011117234A2 (fr)
ZA (1) ZA201207051B (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130023126A1 (en) * 2010-04-08 2013-01-24 Solvay Sa Method for the manufacture of electronic devices with purified fluorine
TWI586842B (zh) * 2010-09-15 2017-06-11 首威公司 氟之製造工廠及使用彼之方法
US10423248B2 (en) * 2011-10-28 2019-09-24 Wacom Co., Ltd. Touch-sensitive system with motion filtering
US9757775B2 (en) 2012-09-10 2017-09-12 Solvay Sa Chamber cleaning method using F2 and a process for manufacture of F2 for this method
WO2014037486A1 (fr) * 2012-09-10 2014-03-13 Solvay Sa Procédé de nettoyage de chambre utilisant du f2 à basse pression
EP3104418B8 (fr) * 2015-06-08 2018-04-04 Meyer Burger (Germany) GmbH Procédé et dispositif destinés à texturer une surface en silicium
JP6792158B2 (ja) * 2016-02-09 2020-11-25 セントラル硝子株式会社 フッ素化合物ガスの精製方法
CN112639352B (zh) * 2018-09-03 2023-04-07 昭和电工株式会社 含氟气的气体的供给方法和供给设备

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4711680A (en) * 1983-05-23 1987-12-08 Rockwell International Corporation Pure fluorine gas generator
JP2002510379A (ja) 1997-09-25 2002-04-02 フェニックス アクチエンゲゼルシャフト 空気ばね懸架システム
GB9904925D0 (en) 1999-03-04 1999-04-28 Surface Tech Sys Ltd Gas delivery system
WO2000051937A1 (fr) 1999-03-04 2000-09-08 Surface Technology Systems Limited Systeme de production de gaz
JP3645495B2 (ja) * 2000-04-07 2005-05-11 東洋炭素株式会社 フッ素ガス発生装置
US20020156321A1 (en) * 2001-02-13 2002-10-24 Syvret Robert George Continuous preparation of high purity Bis(fluoroxy)difluoromethane (BDM) at elevated pressure
US20030121796A1 (en) * 2001-11-26 2003-07-03 Siegele Stephen H Generation and distribution of molecular fluorine within a fabrication facility
US6857447B2 (en) 2002-06-10 2005-02-22 Advanced Technology Materials, Inc. Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases
JP3905433B2 (ja) * 2002-07-11 2007-04-18 レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード フッ素ガス生成装置
GB0216828D0 (en) * 2002-07-19 2002-08-28 Boc Group Plc Apparatus and method for fluorine production
JP3527735B1 (ja) * 2002-11-20 2004-05-17 東洋炭素株式会社 フッ素ガス発生装置
WO2006043125A1 (fr) 2004-10-20 2006-04-27 L'air Liquide, Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude Generateur de gaz fluor
US7163036B2 (en) 2004-12-22 2007-01-16 The Boc Group Plc Method of supplying fluorine
JP5037021B2 (ja) * 2005-12-19 2012-09-26 昭和電工株式会社 フッ素ガスの供給方法およびその装置
KR20170116213A (ko) 2006-04-10 2017-10-18 솔베이 플루오르 게엠베하 에칭 방법
JP2009024222A (ja) * 2007-07-20 2009-02-05 Toyo Tanso Kk フッ素系ガス及び水素ガス発生装置
US20120178262A1 (en) 2009-09-18 2012-07-12 Solvay Fluor Gmbh Process for the manufacture of wafers for solar cells at ambient pressure
DE212011100116U1 (de) 2010-07-05 2013-02-22 Solvay Sa Spülbox für Fluorzufuhr
EP2404872A1 (fr) 2010-07-05 2012-01-11 Solvay SA Conteneur de fluorine
JP5931867B2 (ja) 2010-08-05 2016-06-08 ソルヴェイ（ソシエテ アノニム） フッ素の精製方法
TWI586842B (zh) 2010-09-15 2017-06-11 首威公司 氟之製造工廠及使用彼之方法
DE212011100142U1 (de) 2010-09-16 2013-04-24 Solvay Sa Fluorgasanlage

Also Published As

Publication number Publication date
MY162759A (en) 2017-07-14
US20130012027A1 (en) 2013-01-10
KR20130079363A (ko) 2013-07-10
SG184131A1 (en) 2012-10-30
US8871174B2 (en) 2014-10-28
ZA201207051B (en) 2014-03-26
JP6169668B2 (ja) 2017-07-26
WO2011117234A3 (fr) 2012-06-07
EP2552828A2 (fr) 2013-02-06
JP6208009B2 (ja) 2017-10-04
TW201139744A (en) 2011-11-16
JP2013524000A (ja) 2013-06-17
CN102822088A (zh) 2012-12-12
WO2011117234A2 (fr) 2011-09-29
TWI539030B (zh) 2016-06-21
BR112012024035A2 (pt) 2016-08-30
JP2016033264A (ja) 2016-03-10

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