Russak et al., 1992 - Google Patents
Magnetic and structural characterization of sputtered FeN multilayer filmsRussak et al., 1992
- Document ID
- 18173686016248764261
- Author
- Russak M
- Jahnes C
- Klokholm E
- Lee J
- Re M
- Webb B
- Publication year
- Publication venue
- Journal of Magnetism and Magnetic Materials
External Links
Snippet
The magnetic and structural properties of ferromagnetic FeN thin films. FeN/FeN (ferromagnetic/paramagnetic) and FeN/SiO 2 multilayers deposited in a rotational dc magnetron sputter system were investigated. Monolithic films containing⋍ 2 at% N 2 had …
- 229910015140 FeN 0 title abstract description 49
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Comprising only the magnetic material without bonding agent
- G11B5/66—Comprising only the magnetic material without bonding agent consisting of several layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/032—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
- H01F1/04—Metals or alloys
- H01F1/047—Alloys characterised by their composition
- H01F1/053—Alloys characterised by their composition containing rare earth metals
- H01F1/055—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
- H01F1/0551—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 in the form of particles, e.g. rapid quenched powders or ribbon flakes
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Terada et al. | Synthesis of iron-nitride films by means of ion beam deposition | |
| Russak et al. | Magnetic and structural characterization of sputtered FeN multilayer films | |
| Russak et al. | Magnetic and structural characterization of sputtered FeN multilayer films | |
| Aboaf et al. | Magnetic, transport, and structural properties of iron-platinum thin films | |
| Shibaya et al. | Preparation by sputtering of thick Sendust film suited for recording head core | |
| Ohkoshi et al. | Effects of Air pressure and substrate bias on magnetic properties and microstructure in amorphous TbCo sputtered films | |
| Takahashi et al. | Magnetocrystalline anisotropy for/spl alpha/'-Fe-C and/spl alpha/'-Fe-N films | |
| Brunsch et al. | Evaporated amorphous GdCo-films with perpendicular anisotrophy by controlled oxygen contamination | |
| Maeda | Effect of magnetic field in rf sputtering on the crystal orientation and magnetic properties of Co‐Cr perpendicular anisotropy films | |
| Sayama et al. | SmCo/sub 5/-based thin films with high magnetic anisotropy for perpendicular magnetic recording | |
| Jin et al. | Fe-Cr-N soft magnetic thin films | |
| EP0324854A1 (en) | Optomagnetic recording medium and process for its manufacture | |
| US6117282A (en) | Method of producing amorphous Co-Tb magnetic recording thin films | |
| Byeon et al. | High moment FeTiN thin films for high density recording heads | |
| Naoe et al. | A reactive sputtering method for preparation of berthollide type of iron oxide films | |
| Mapps et al. | CoNbFe soft magnetic thin‐film backlayers for glass computer disks | |
| Choe et al. | High coercivity CoPtCr, CoPt films deposited at high power and high bias conditions for hard bias applications in magnetoresistive heads | |
| Kiriake et al. | Preparation of iron nitride thin films by magnetron sputtering under surface magnetic field on substrates | |
| Jones Jr | Fabrication of film heads with high moment materials | |
| Sakakima et al. | Magnetic properties of compositionally modulated Fe-based nitride alloy films | |
| Yao et al. | Formation and magnetic properties of Fe16N2 films prepared by ion-beam-assisted deposition | |
| Hoshi et al. | Preparation of permalloy films using facing‐type targets and a high‐rate and low‐temperature sputtering method | |
| Choh et al. | The effects of an applied magnetic field on the magnetic properties of RF sputtered amorphous CoZrNb thin films | |
| Furukawa et al. | Soft Magnetic Properties of Nanocrystalline Fe-Ceramic Films | |
| Kubota et al. | Magnetism and crystal structure of Fe/Si multilayered films prepared by ion beam sputtering |