[go: up one dir, main page]

Tokovinin, 2023 - Google Patents

SOAR WFS Guider: instrument description

Tokovinin, 2023

View PDF
Document ID
15925346621438700631
Author
Tokovinin A
Publication year

External Links

Snippet

The SOAR wavefront-sensing guider (WFSG) was developed primarily because of a desire to provide automated focus of the telescope, rather than requiring periodic manual refocus and consequent telescope overheads. Additionally, the ability to correct low-order …
Continue reading at www.ctio.noirlab.edu (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/004—Manual alignment, e.g. micromanipulators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00—Other optical systems; Other optical apparatus
    • G02B27/0025—Other optical systems; Other optical apparatus for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Other optical systems; Other optical apparatus for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B26/00—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
    • G02B26/08—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating for controlling the direction of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70216—Systems for imaging mask onto workpiece
    • G03F7/70258—Projection system adjustment, alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00—Other optical systems; Other optical apparatus
    • G02B27/64—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
    • G02B27/646—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image compensating for small deviations, e.g. due to vibration or shake
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B23/00—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B21/00—Microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical means

Similar Documents

Publication Publication Date Title
US5991102A (en) Beam protecting device
JP5079558B2 (en) Surface height detection method and apparatus
JP5868854B2 (en) Spin wafer inspection system, high-frequency autofocus mechanism, and beam shaping / directing module
US4585337A (en) Step-and-repeat alignment and exposure system
US6636367B2 (en) Projection exposure device
US20150138372A1 (en) Device and method for measuring a camera
US20150346483A1 (en) Flat-field scanning lenses, systems, and methods
US5946143A (en) Dynamic aberration correction of conformal/aspheric domes and windows for missile and airborne fire control applications
US3614238A (en) Bright line reticle apparatus and optical alignment methods
Ballester et al. Modeling echelle spectrographs
CN110531532A (en) A kind of optical system alignment method and heavy caliber Large Area Telescope Method of Adjustment
US6075612A (en) Optical devices having toroidal mirrors for performing reflectance measurements
JP2002528905A (en) Realization of circular symmetry and reduction of the effects of optical defects and deviations during real-time use of optical devices
JPH0827444B2 (en) Method and apparatus for determining the optical axis of an off-set mirror
Xing et al. Laboratory calibration of star tracker with brightness independent star identification strategy
CN112051669A (en) Optical arrangement and method for correcting central and/or angular errors
Glenn Centroid detector assembly for the AXAF-I alignment test system
Tokovinin SOAR WFS Guider: instrument description
CN106017364A (en) High-accuracy laser large-working-distance auto-collimation device and method
Rigaut et al. NGS2: a focal plane array upgrade for the GeMS multiple tip-tilt wavefront sensor
Lei et al. Research on precision alignment method of a five-mirror optical derotator system
US8045250B1 (en) Optical scanning using rotating parallel plate
Costa et al. PYRAMIR: a near-infrared pyramid wavefront sensor for the Calar Alto adaptive optics system
Acton et al. Lessons learned in the design, construction, and implementation of the WM Keck Observatory AO system
CN117991493B (en) Astronomical telescope optical system on-site adjustment method based on Hartmann detection