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Rumyantsev et al., 2001 - Google Patents

Thin n-GaN films with low level of 1/f noise

Rumyantsev et al., 2001

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Document ID
13887102841259232412
Author
Rumyantsev S
Pala N
Shur M
Gaska R
Levinshtein M
Asif Khan M
Simin G
Hu X
Yang J
Publication year
Publication venue
Electronics Letters

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The authors report on the results of measurements of low frequency noise in thin (60 nm) Si- doped n-type gallium nitride (GaN) films grown on sapphire. At room temperature, the noise spectra have the form of 1/f noise with a Hooge parameter α~ 2× 10-3. This value of α is …
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    • H01L29/772Field effect transistors
    • H01L29/778Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
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