[go: up one dir, main page]

Singhapong et al., 2024 - Google Patents

Multilayer optics for synchrotron applications

Singhapong et al., 2024

View PDF
Document ID
13503410561863185358
Author
Singhapong W
Bowen C
Wang H
Sawhney K
Lunt A
Publication year
Publication venue
Advanced Materials Technologies

External Links

Snippet

X‐ray multilayer optics play a vital role in synchrotron optics due to their ability to generate constructive interference. These devices typically consist of several tens to hundreds of periods of alternating layers coated on a substrate. In contrast to single‐layer mirrors that …
Continue reading at advanced.onlinelibrary.wiley.com (PDF) (other versions)

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062Devices having a multilayer structure
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00Arrangements for handling radiation or particles
    • G21K2201/06Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00Arrangements for handling radiation or particles
    • G21K2201/06Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00Gamma- or X-ray microscopes

Similar Documents

Publication Publication Date Title
Yan et al. Hard x-ray nanofocusing by multilayer Laue lenses
Andreev et al. Multilayer optics for XUV spectral region: technology fabrication and applications
Chkhalo et al. Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics
Singhapong et al. Multilayer optics for synchrotron applications
Barysheva et al. Precision imaging multilayer optics for soft X-rays and extreme ultraviolet bands
Howells et al. Principles and applications of zone plate X-ray microscopes
US8331027B2 (en) Ultra-high density diffraction grating
Dhez et al. Instrumental aspects of x-ray microbeams in the range above 1 keV
Ghafoor et al. Impact of B4C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrors
Eriksson et al. Morphology control in Ni/Ti multilayer neutron mirrors by ion-assisted interface engineering and B4C incorporation
Störmer et al. Ultra-precision fabrication of 500 mm long and laterally graded Ru/C multilayer mirrors for X-ray light sources
Lider Multilayer X-ray interference structures
Zhu et al. Studies on the stress and thermal properties of Mo/B4C and MoxC1-x/B4C multilayers
Chkhalo et al. Grazing incidence mirrors with enhanced reflectance in the soft X-ray region
Pershyn et al. Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Kamijo et al. Hard X-ray microbeam experiments with a sputtered-sliced Fresnel zone plate and its applications
Jiang et al. Basic principle and performance characteristics of multilayer beam conditioning optics
Wei et al. Background Pressure Induced Structural and Chemical Change in NiV/B4C Multilayers Prepared by Magnetron Sputtering
IJpes et al. High reflectance ultrashort period W/B4C x-ray multilayers via intermittent ion polishing
IJpes et al. Interface smoothing in short-period W/B4C multilayers using neon ion beam polishing
Morawe Graded multilayers for synchrotron optics
Dietsch et al. Multilayer X-ray optics for energies E> 8 keV and their application in X-ray analysis
Schroer et al. X-ray optics
Tamura et al. Multilevel-type multilayer X-ray lens (Fresnel zone plate) by sputter deposition
Meltchakov et al. Performance of multilayer coatings in relationship to microstructure of metal layers. Characterization and optical properties of Mo/Si multilayers in extreme ultra-violet andx-ray ranges