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Tjerkstra et al., 2000 - Google Patents

Multi-walled microchannels: free-standing porous silicon membranes for use in/spl mu/TAS

Tjerkstra et al., 2000

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Document ID
13362629016398225598
Author
Tjerkstra R
Gardeniers G
Kelly J
van den Berg A
Publication year
Publication venue
Journal of microelectromechanical systems

External Links

Snippet

Electrochemically formed porous silicon (PS) can be released from the bulk silicon substrate by underetching at increased current density. Using this technique, two types of channels containing free-standing layers of PS were constructed, which were failed multi-walled …
Continue reading at www.researchgate.net (PDF) (other versions)

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICRO-STRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICRO-STRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of micro-structural devices or systems
    • B81C2201/01—Manufacture or treatment of micro-structural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0111—Bulk micromachining
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

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