[go: up one dir, main page]

Beckert et al., 2001 - Google Patents

Development of a vertical wafer stage for high-vacuum applications

Beckert et al., 2001

Document ID
12435067179406686132
Author
Beckert E
Hoffmann A
Saffert E
Publication year
Publication venue
Microelectronic engineering

External Links

Snippet

Several new manufacturing techniques in the semiconductor industries increase the demands on the process equipment. Severe environment conditions, such as vacuum, aggressive media and high temperatures, often meet aspired accuracy in the sub-micron …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70691—Handling of masks or wafers
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects

Similar Documents

Publication Publication Date Title
US6639225B2 (en) Six-axis positioning system having a zero-magnetic-field space
Kim et al. High-precision magnetic levitation stage for photolithography
KR100471018B1 (en) Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects
TW574632B (en) Stage apparatus and exposure apparatus
JPH10503890A (en) Positioning device with article table not subject to vibration
JP2015111714A (en) Substrate process apparatus and method
KR20120005967A (en) Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method
JP2005046941A (en) Stage unit with cable fine movement unit
EP0916038B1 (en) Motion damper with electrical amplifier, and lithographic device with such a motion damper
US6794660B2 (en) Long stroke mover for a stage assembly
Wu et al. A novel two-dimensional sensor with inductive spiral coils
Beckert et al. Development of a vertical wafer stage for high-vacuum applications
US6693284B2 (en) Stage apparatus providing multiple degrees of freedom of movement while exhibiting reduced magnetic disturbance of a charged particle beam
Kunioka et al. XY stage driven by ultrasonic linear motors for the electron-beam x-ray mask writer EB-X3
US6903346B2 (en) Stage assembly having a follower assembly
US20040160132A1 (en) System and method to reduce the effect of reactive forces on a stage using a balance mass
US6515381B1 (en) Cantilever stage
JP2012531030A (en) Exposure apparatus and device manufacturing method
JP2024506377A (en) Capacitive sensor devices and magnetic bearing assemblies with such capacitive sensor devices
JPS6037729A (en) Sample stage
Jung et al. Characteristics comparison of planar stages using repulsive and attractive type of surface actuator principle
Tolstykh et al. Planar stage for precision motion applications
Martel et al. Infrastructure suited for supporting a fleet of wireless miniature robots designed for atomic-scale operations
JP2001217172A (en) Stage device and exposure device
Jaeger et al. Nanopositioning and measuring technique