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Wong et al., 2004 - Google Patents

Interface and oxide traps in high-κ hafnium oxide films

Wong et al., 2004

Document ID
12049749888856572830
Author
Wong H
Zhan N
Ng K
Poon M
Kok C
Publication year
Publication venue
Thin Solid Films

External Links

Snippet

The origins of the interface trap generation and the effects of thermal annealing on the interface and bulk trap distributions are studied in detail. We found that oxidation of the HfO2/Si interface, removal of deep trap centers, and crystallization of the as-deposited film …
Continue reading at www.sciencedirect.com (other versions)

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