[go: up one dir, main page]

Stein et al., 2005 - Google Patents

Kinoform lenses: toward nanometer resolution

Stein et al., 2005

View PDF
Document ID
11396273277896945941
Author
Stein A
Evans-Lutterodt K
Taylor A
et al.
Publication year
Publication venue
Proc. SPIE

External Links

Snippet

While hard x-rays have wavelengths in the nanometer and sub-nanometer range, the ability to focus them is limited by the quality of sources and optics, and not by the wavelength. A few options, including reflective (mirrors), diffractive (zone plates) and refractive (CRL's) are …
Continue reading at www.researchgate.net (PDF) (other versions)

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1876Diffractive Fresnel lenses; Zone plates; Kinoforms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00Gamma- or X-ray microscopes
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00Arrangements for handling radiation or particles
    • G21K2201/06Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements

Similar Documents

Publication Publication Date Title
Evans-Lutterodt et al. Single-element elliptical hard x-ray micro-optics
Jefimovs et al. Zone-doubling technique to produce ultrahigh-resolution x-ray optics
Ice Microbeam‐forming methods for synchrotron radiation
Wilhein et al. Differential interference contrast X-ray microscopy with submicron resolution
Snigirev et al. High energy X-ray micro-optics
US7864415B2 (en) Use of a focusing vortex lens as the objective in spiral phase contrast microscopy
CN101430428B (en) Super-resolution Fresnel zone plate
Schroer et al. Beryllium parabolic refractive x-ray lenses
David et al. Wavelength tunable diffractive transmission lens for hard x rays
US9640291B2 (en) Stacked zone plates for pitch frequency multiplication
US7072442B1 (en) X-ray metrology using a transmissive x-ray optical element
Stein et al. Fabrication of silicon kinoform lenses for hard x-ray focusing by electron beam lithography and deep reactive ion etching
Lengeler et al. Beryllium parabolic refractive x‐ray lenses
Takeuchi et al. Kirkpatrick-Baez type X-ray focusing mirror fabricated by the bent-polishing method
Stein et al. Kinoform lenses: toward nanometer resolution
Xie et al. Fabrication of x-ray diffractive optical elements for laser fusion applications
Tsai et al. Fabrication of spiral-phase diffractive elements using scanning-electron-beam lithography
CN101430427B (en) Manufacturing method of super-resolution photon sieve
Xu et al. Kinoform and saw-tooth X-ray refractive lenses development at SSRF
Alianelli et al. Characterization of germanium linear kinoform lenses at Diamond Light Source
Di Fabrizio et al. X-ray multilevel zone plate fabrication by means of electron-beam lithography: Toward high-efficiency performances
David et al. Wet-etched diffractive lenses for hard X-rays
Shen et al. Azimuthally extreme-ultraviolet focal splitter by modified spiral photon sieves
Snigireva et al. X‐ray Si‐based Integrated Lens System for Wide Range of Hard Synchrotron Radiation
Stein et al. Imaging with single-dimension kinoform lenses