[go: up one dir, main page]

Mitteramskogler et al., 2018 - Google Patents

Fabrication of nanoparticles for biosensing using UV-NIL and lift-off

Mitteramskogler et al., 2018

Document ID
6234508129425808550
Author
Mitteramskogler T
Haslinger M
Shoshi A
Schrittwieser S
Schotter J
Brueckl H
Muehlberger M
Publication year
Publication venue
34th European Mask and Lithography Conference

External Links

Snippet

A novel technique to realize large quantities of stacked multifunctional anisotropic nanoparticles with narrow size distribution is presented. Through the combination of Ultraviolet Nano-Imprint Lithography (UV-NIL), physical vapor deposition and subsequent lift …
Continue reading at www.spiedigitallibrary.org (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y40/00—Manufacture or treatment of nano-structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y10/00—Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic

Similar Documents

Publication Publication Date Title
Choi et al. Fabrication of sub-10-nm silicon nanowire arrays by size reduction lithography
Choi et al. Realization of high aspect ratio metalenses by facile nanoimprint lithography using water-soluble stamps
McLellan et al. Edge spreading lithography and its application to the fabrication of mesoscopic gold and silver rings
Chang et al. From two-dimensional colloidal self-assembly to three-dimensional nanolithography
CN102714140B (en) Lithography method using tilted evaporation
Jiang Large-scale fabrication of periodic nanostructured materials by using hexagonal non-close-packed colloidal crystals as templates
Yan et al. Parallel fabrication of sub-50-nm uniformly sized nanoparticles by deposition through a patterned silicon nitride nanostencil
Schvartzman et al. Robust pattern transfer of nanoimprinted features for sub-5-nm fabrication
Yu et al. Triangular profile imprint molds in nanograting fabrication
Hu et al. Nano-fabrication with a flexible array of nano-apertures
Resnick et al. Initial study of the fabrication of step and flash imprint lithography templates for the printing of contact holes
Zha et al. Sustainable Fabrication and Transfer of High‐Precision Nanoparticle Arrays Using Recyclable Chemical Pattern Templates
Zhao et al. Nanopattern-embedded micropillar structures for security identification
Prone et al. Scalable, Nanometer‐Accurate Fabrication of All‐Dielectric Metasurfaces with Narrow Resonances Tunable from Near Infrared to Visible Wavelengths
Kunkemöller et al. Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas
Mitteramskogler et al. Fabrication of nanoparticles for biosensing using UV-NIL and lift-off
Bonakdar et al. Deep UV microsphere nanolithography to achieve sub-100 nm feature size
Wu et al. Large-area sub-wavelength optical patterning via long-range ordered polymer lens array
Calafiore et al. Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography
Zhu et al. Fabrication of heterogeneous double-ring-like structure arrays by combination of colloidal lithography and controllable dewetting
Yin et al. Tunable metallization by assembly of metal nanoparticles in polymer thin films by photo-or electron beam lithography
Chen et al. Facile large-area photolithography of periodic sub-micron structures using a self-formed polymer mask
Emoto et al. Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing
Yang et al. Fabrication of Ag nanodot array over large area for surface-enhanced Raman scattering using hybrid nanoimprint mold made from AAO template
Haslinger et al. UV-nil based fabrication of plasmon-magnetic nanoparticles for biomolecular sensing