[go: up one dir, main page]

Wiswell, 2012 - Google Patents

DESIGN AND FABRICATION OF SERPENTINE-HINGED SILICON MICRO-MIRROR DEVICES

Wiswell, 2012

View PDF
Document ID
609903939424913561
Author
Wiswell N
Publication year

External Links

Snippet

Seven different actuating micro-mirror designs were created and verified via finite element analysis. Two were straight torsion beam hinge designs representative of previous work at Cal Poly; the remaining five were new designs incorporating serpentine hinges. The surface …
Continue reading at digitalcommons.calpoly.edu (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70216—Systems for imaging mask onto workpiece
    • G03F7/70341—Immersion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B26/00—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
    • G02B26/08—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means

Similar Documents

Publication Publication Date Title
Madou Fundamentals of microfabrication: the science of miniaturization
Miyajima et al. High-aspect-ratio photolithography for MEMS applications
Elwenspoek et al. Mechanical microsensors
Quero et al. Microfabrication technologies used for creating smart devices for industrial applications
TWI734534B (en) Mounted hollow-core fibre arrangement
Garcia et al. Fabrication of a MEMS micromirror based on bulk silicon micromachining combined with grayscale lithography
Lee et al. Vertical-actuated electrostatic comb drive with in situ capacitive position correction for application in phase shifting diffraction interferometry
Judy Micromechanisms using sidewall beams
Weigel et al. Ultralow expansion glass as material for advanced micromechanical systems
Garcia et al. Nanoimprint lithography for grayscale pattern replication of MEMS mirrors in a 200 mm wafer
Wiswell DESIGN AND FABRICATION OF SERPENTINE-HINGED SILICON MICRO-MIRROR DEVICES
Weigel et al. Deep etching of Zerodur glass ceramics in a fluorine-based plasma
WO2005015311A2 (en) Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method
Zarzycki et al. Fabrication of MEMS devices-a scanning micro mirror case study
US8770050B2 (en) Method of measuring micro- and nano-scale properties
Young Development and experimental analysis of a micromachined Resonant Gyrocope
Haneveld Nanochannel fabrication and characterization using bond micromachining
Ishimori et al. Si-wafer bending technique for a three-dimensional microoptical bench
Waldis et al. High-fill factor micro-mirror array for multi object spectroscopy
Canonica et al. Development of MEMS-based programmable slit mask for multi-object spectroscopy
Al-Qargholi Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays: Entwicklung, Evaluierung und Optimierung von Herstellungsprozessen für mikrospiegelbasierte Lichtlenksysteme
Pires Development of a MEMS actuator for optical modulation enabling enhanced photonic sensing
Feinerman et al. Agile micromirrors with three degrees of freedom manufactured with liquid MEMS technology
Chesbro Design, Fabrication, and Characterization of Electrostatically-Actuated Silicon Micro-Mirrors
Que Micromachined sensors and actuators based on bent-beam suspensions