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Takao et al., 1977 - Google Patents

Magnetic Properties of Ferromagnetic Thin Films Prepared by Ion Plating

Takao et al., 1977

Document ID
450216019628711693
Author
Takao M
Ohta Y
Tasaki A
Publication year
Publication venue
Japanese Journal of Applied Physics

External Links

Snippet

Thin films of Fe, Co and their alloys were prepared by ion plating. Metals were evaporated in the argon gas atmosphere of about 0.01 Torr, by applying a dc electric field of 2 kV/15 cm between the substrate and the evaporation source. Since evaporated metal atoms, which …
Continue reading at iopscience.iop.org (other versions)

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/64Comprising only the magnetic material without bonding agent
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/34Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering

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