[go: up one dir, main page]

US20170092606A1 - Semiconductor device and method of manufacturing the same - Google Patents

Semiconductor device and method of manufacturing the same Download PDF

Info

Publication number
US20170092606A1
US20170092606A1 US15/336,926 US201615336926A US2017092606A1 US 20170092606 A1 US20170092606 A1 US 20170092606A1 US 201615336926 A US201615336926 A US 201615336926A US 2017092606 A1 US2017092606 A1 US 2017092606A1
Authority
US
United States
Prior art keywords
semiconductor device
substrate
semiconductor chip
redistribution layer
molding portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US15/336,926
Inventor
Masanori Onodera
Junichi Kasai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cypress Semiconductor Corp
Original Assignee
Cypress Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cypress Semiconductor Corp filed Critical Cypress Semiconductor Corp
Priority to US15/336,926 priority Critical patent/US20170092606A1/en
Assigned to SPANSION LLC reassignment SPANSION LLC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KASAI, JUNICHI, ONODERA, MASANORI
Assigned to CYPRESS SEMICONDUCTOR CORPORATION reassignment CYPRESS SEMICONDUCTOR CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SPANSION LLC
Publication of US20170092606A1 publication Critical patent/US20170092606A1/en
Assigned to MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT reassignment MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT PATENT SECURITY AGREEMENT Assignors: CYPRESS SEMICONDUCTOR CORPORATION, SPANSION LLC
Priority to US16/601,837 priority patent/US11018105B2/en
Assigned to MUFG UNION BANK, N.A. reassignment MUFG UNION BANK, N.A. ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN INTELLECTUAL PROPERTY Assignors: MORGAN STANLEY SENIOR FUNDING, INC.
Assigned to CYPRESS SEMICONDUCTOR CORPORATION, SPANSION LLC reassignment CYPRESS SEMICONDUCTOR CORPORATION RELEASE OF SECURITY INTEREST Assignors: MUFG UNION BANK, N.A.
Abandoned legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • H01L24/07—Structure, shape, material or disposition of the bonding areas after the connecting process
    • H01L24/08—Structure, shape, material or disposition of the bonding areas after the connecting process of an individual bonding area
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49838—Geometry or layout
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5388—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates for flat cards, e.g. credit cards
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • H01L24/03—Manufacturing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10—Bump connectors ; Manufacturing methods related thereto
    • H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/17—Structure, shape, material or disposition of the bump connectors after the connecting process of a plurality of bump connectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/19—Manufacturing methods of high density interconnect preforms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93—Batch processes
    • H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/568—Temporary substrate used as encapsulation process aid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68345—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self supporting substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/023—Redistribution layers [RDL] for bonding areas
    • H01L2224/0233—Structure of the redistribution layers
    • H01L2224/02333—Structure of the redistribution layers being a bump
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105—Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/12105—Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/19—Manufacturing methods of high density interconnect preforms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/20—Structure, shape, material or disposition of high density interconnect preforms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321—Disposition
    • H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732—Location after the connecting process
    • H01L2224/73251—Location after the connecting process on different surfaces
    • H01L2224/73267—Layer and HDI connectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92—Specific sequence of method steps
    • H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222—Sequential connecting processes
    • H01L2224/92242—Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92244—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a build-up interconnect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93—Batch processes
    • H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01005—Boron [B]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01006—Carbon [C]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01029—Copper [Cu]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01033—Arsenic [As]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01047—Silver [Ag]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01075—Rhenium [Re]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01078—Platinum [Pt]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01079—Gold [Au]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/14—Integrated circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151—Die mounting substrate
    • H01L2924/153—Connection portion
    • H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151—Die mounting substrate
    • H01L2924/156—Material
    • H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181—Encapsulation
    • H01L2924/1815—Shape
    • H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18162—Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect

Definitions

  • This invention generally relates to a semiconductor device d a method of manufacturing the semiconductor device, and in particular, relates to a small scale semiconductor device and method of manufacturing the semiconductor device.
  • CSP wafer level package
  • a flip chip ball grid array (FC-BGA) is used in a conventional art of the wafer level package.
  • a plurality of semiconductor chips are flip-chip mounted on a glass epoxy substrate and the semiconductor chips are resin-sealed with molding using an epoxy resin in order to manufacture semiconductor devices of the wafer level package.
  • an outer connection electrode such as a solder ball is connected to the glass epoxy substrate.
  • each of the semiconductor chips is out off with dicing.
  • the wafer level package is manufactured.
  • a quantity of the semiconductor chips to be mounted gets larger as an area of the glass epoxy substrate gets larger.
  • a manufacturing cost of the semiconductor device may be therefore reduced because the quantity of the semiconductor chips that are cut off with one dicing gets larger.
  • Document 1 Japanese Patent Application Publication No. 2001-250902 discloses a wafer level package in which a semiconductor chip is implanted in a ceramics substrate having a recess and a redistribution layer (RDL) is formed on the semiconductor chip.
  • the invention disclosed in Document 1 is characterized in that the ceramics substrate having the recess is used instead of the glass epoxy substrate.
  • Document 2 discloses a wafer level package in which a sheet-shaped insulating film having an opening according to the size of the semiconductor chip is used, the semiconductor chip is implanted in the opening, and a redistribution layer is formed on the semiconductor chip.
  • the invention disclosed in Document 2 is characterized in that the sheet-shaped insulating film having the opening is used instead of the glass epoxy substrate and the outer connection electrode is connected to the semiconductor chip through two redistribution layers.
  • the glass epoxy substrate may be warped because of heat generated during molding, if a large area glass epoxy substrate is used.
  • a yield ratio of the semiconductor device may be reduced, because a problem is made in reliability of the semiconductor device when the glass epoxy substrate is warped. It is therefore difficult to use the large area glass epoxy substrate. Reduction of the manufacturing cost is limited.
  • the glass epoxy substrate needs a certain thickness.
  • the semiconductor chip is not able to be flip-chip mounted if the semiconductor chip does not have a certain thickness.
  • a reduction of the height of the semiconductor device may be limited approximately 1 mm.
  • the manufacturing cost gets higher because it is necessary to form a recess on the ceramics substrate.
  • the height of the semiconductor device gets higher, because two redistribution layers are necessary and the quantity of components is large.
  • the present invention provides a semiconductor device having a low height and a manufacturing cost and provides a method of manufacturing the semiconductor device.
  • a semiconductor device including a semiconductor chip, a bump electrode, a molding portion, a redistribution layer, and an outer connection electrode.
  • the bump electrode is provided on an upper face of the semiconductor chip.
  • the molding portion encapsulates an entire side face of the semiconductor chip and seals the bump electrode so that apart of the bump electrode is exposed.
  • the redistribution layer is provided on an upper face of the molding portion and is electrically coupled to the semiconductor chip via the bump electrode.
  • the outer connection electrode is provided on an upper face of the redistribution layer and is electrically coupled to the bump electrode via the redistribution layer.
  • the semiconductor device needs fewer components, compared to a semiconductor device that needs two redistribution layers in accordance with Document 2. It is therefore possible to reduce a manufacturing cost of the semiconductor device. Further, it is possible to reduce a height of the semiconductor device compared to a semiconductor device having two redistribution layers, because the semiconductor device needs only one redistribution layer.
  • FIG. 1 is a schematic cross sectional view of a semiconductor device in accordance with a first embodiment
  • FIG. 2A and FIG. 2B illustrate a schematic diagram accounting for an interval between each outer connection terminal and an interval between each bump electrode of the semiconductor device in accordance with the first embodiment
  • FIG. 3 illustrates a schematic cross sectional view of a semiconductor device in accordance with a second embodiment
  • FIG. 4 illustrates a schematic cross sectional view of a semiconductor device in accordance with a third embodiment
  • FIG. 5A , FIG. 5B , FIG. 5C , FIG. 5D , and FIG. 5E illustrate a schematic cross sectional view accounting for a method of manufacturing a semiconductor device in accordance with a fourth embodiment.
  • FIG. 6A, 6B and FIG. 6C illustrate a schematic cross sectional view accounting for the method of manufacturing the semiconductor device in accordance with the fourth embodiment
  • FIG. 7A and FIG. 7B illustrate a schematic cross sectional view accounting for the method of manufacturing the semiconductor device in accordance with the fourth embodiment.
  • FIG. 8 illustrates a schematic cross sectional view accounting for the method of manufacturing the semiconductor device in accordance with the fourth embodiment.
  • FIG. 1 illustrates a schematic cross sectional view of a semiconductor device 100 in accordance with a first embodiment.
  • the semiconductor device 100 has a semiconductor chip 10 , a bump electrode 12 , a molding portion 14 , a redistribution layer 16 and an outer connection electrode 18 .
  • the semiconductor chip 10 is made of silicon or the like.
  • the bump electrode 12 is made of Au (gold), a solder or the like, and has a height of approximately 300 ⁇ m.
  • the molding portion 14 seals an entire side face of the semiconductor chip 10 and seals the bump electrode 12 so that a part of the bump electrode 12 is exposed.
  • the molding portion 14 is made of an epoxy resin or the like.
  • the molding portion 14 restrains a breaking of the semiconductor chip 10 caused by an impact from outside.
  • the redistribution layer 16 is provided on an upper face of the molding portion 14 .
  • the redistribution layer 16 is made of copper or the like.
  • the redistribution layer 16 is formed with a plating method, a sputtering method or the like.
  • the redistribution layer 16 is electrically coupled to the semiconductor chip 10 via the bump electrode 12 .
  • the outer connection electrode 18 is made of Au, a solder or the like, and has a height of approximately 300 ⁇ m.
  • the outer connection electrode 18 acts as a connection terminal when the semiconductor device 100 is connected to an external circuit substrate or the like.
  • the semiconductor device 100 may be electrically coupled to outside with one redistribution layer.
  • the semiconductor device 100 needs fewer components, compared to a semiconductor device that needs two redistribution layers in accordance with Document 2. It is therefore possible to reduce a manufacturing cost of the semiconductor device 100 . Further, it is possible to reduce a height of the semiconductor device 100 compared to a semiconductor device having two redistribution layers, because the semiconductor device 100 needs only one redistribution layer.
  • the upper face of the bump electrode 12 and the upper face of the molding portion 14 are flat. It is possible to form the redistribution layer accurately on the upper face of the molding portion 14 with the sputtering method, the plating method or the like, when the upper face of the bump electrode 12 and the molding portion 14 is flat. It is therefore possible to improve a yield ratio of the semiconductor device 100 . And it is possible to reduce the manufacturing cost of the semiconductor device 100 .
  • FIG. 2A illustrates a top view of the semiconductor device 100 shown in FIG. 1 .
  • FIG. 2B illustrates a schematic view of the semiconductor device 100 shown in FIG. 2A in a case where the redistribution layer 16 and the outer connection electrode 18 are not provided.
  • the bump electrode 12 acts as an outer connection electrode.
  • intervals between each of the outer connection electrodes are referred to as “L 1 ” and “L 2 ” respectively.
  • the L 1 shown in FIG. 2A is longer than the L 2 shown in FIG. 2B .
  • the L 2 is reduced, when the semiconductor chip 10 is miniaturized as the semiconductor device is downsized.
  • FIG. 2A and FIG. 2B it is easy to determine a position of the semiconductor device 100 at an external circuit substrate when the semiconductor device 100 is mounted on the circuit substrate even if the semiconductor chip 10 is miniaturized, if the L 1 is longer than the L 2 .
  • FIG. 3 illustrates a schematic cross sectional view of the semiconductor device 100 a in accordance with the second embodiment.
  • the semiconductor device 100 a is different from the semiconductor device 100 shown in FIG. 1 in a point that a substrate 20 is further provided on a lower face of the semiconductor chip 10 .
  • the other structure is the same as that shown in FIG. 1 . And an explanation of the structure is omitted.
  • the substrate 20 is fixed to the lower face of the semiconductor chip 10 with a fixing portion 22 .
  • the fixing portion 22 is made of an adhesive resin such as an epoxy resin or the like.
  • the semiconductor device 100 a may be electrically connected to outside with one redistribution layer 16 . Therefore, the semiconductor device 100 a needs fewer components, compared to a semiconductor device in accordance with Document 2. It is therefore possible to reduce a manufacturing cost of the semiconductor device 100 a. Further, it is possible to reduce a height of the semiconductor device 100 a compared to the semiconductor device in accordance with Document 2, because the semiconductor device 100 a has one redistribution layer 16 .
  • the substrate 20 is a silicon substrate.
  • a warpage amount of a silicon substrate caused by heat is less than that of a glass epoxy substrate. It is therefore possible to manufacture a plenty of the semiconductor devices 100 a all together if the silicon substrate is used. It is therefore possible to reduce the manufacturing cost of the semiconductor device 100 a.
  • FIG. 4 illustrates a schematic cross sectional view of the semiconductor device 100 b in accordance with the third embodiment.
  • the semiconductor device 100 b is different from the semiconductor device 100 shown in FIG. 1 in a point that an insulating portion 24 is further provided.
  • the other structure is the same as that shown in FIG. 1 . And an explanation of the structure is omitted.
  • the insulating portion 24 is formed so that the insulating portion 24 covers the entire side face and the entire upper face of the redistribution layer 16 and a part of the outer connection electrode 18 is exposed.
  • the insulating portion 24 is made of a resin or he like such as polyimide or the like.
  • the semiconductor device 100 b it is possible to restrain an electrical short between each of the outer connection electrodes 18 , because the insulating portion 24 is provided.
  • the yield ratio of the semiconductor device 100 b may be therefore improved and the manufacturing cost may be reduced.
  • the insulating portion 24 may be formed so that the insulating portion 24 covers the entire side face and the entire upper face of the redistribution layer 16 and a part of the outer connection electrode 18 is exposed in the semiconductor device 100 a in accordance with the second embodiment shown in FIG. 3 . In this case, it is possible to restrain the electrical short between each of the outer connection electrodes 18 with the insulating portion 24 .
  • the manufacturing method in accordance with the fourth embodiment includes a step of forming a bump electrode on a semiconductor chip, a step of fixing the semiconductor chip on a substrate, a step of forming a molding portion, a step of forming a redistribution layer and a step of forming an outer connection electrode.
  • FIG. 5A through FIG. 5E , FIG. 6A through FIG. 6C , FIG. 7A , FIG. 7B and FIG. 8 illustrate a schematic cross sectional view accounting for the manufacturing method of the semiconductor device in accordance with the fourth embodiment.
  • the bump electrode 12 mad of Au, a solder or the like is formed on the upper face of the semiconductor chip 10 made of silicon or the like.
  • the substrate 20 having a wafer shape is arranged in a mold 26 having a recess 28 .
  • the mold 26 is not limited in particular.
  • the mold 26 may be a metallic mold.
  • the substrate 20 is a silicon substrate.
  • a warpage amount of a silicon substrate caused by heat is less than that of a glass epoxy substrate. It is therefore possible to use a silicon substrate that is a large area wafer. It is therefore possible to manufacture a plenty of the semiconductor devices all together if the silicon substrate is used. And it is possible to reduce the manufacturing cost of the semiconductor device.
  • the fixing portion 22 may be made of an adhesive resin or the like such as an epoxy resin.
  • the entire of the semiconductor chip 10 and the entire of the bump electrode 12 are sealed with an epoxy resin or the like, and are molded. Thus the molding portion 14 is formed.
  • the substrate 20 having the wafer shape is arranged in the metallic mold 26 having the recess 28 , and is sealed. It is therefore not necessary to provide the metallic mold 26 according to the size of each semiconductor device having different size from each other, when a various kinds of the semiconductor devices are manufactured. It is further possible to manufacture a plenty of the semiconductor devices, compared to a case where each semiconductor chip is arranged in each recess of a wafer as is the case of the manufacturing method disclosed in Document 1. It is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • a metallic mold having a recess is not used, but a ceramics substrate having a recess is used in a sealing step.
  • manufacturing the metallic mold 26 having the recess 28 is less expensive than manufacturing the ceramics substrate having the recess. With the method in accordance with the embodiment, it is therefore possible to reduce the manufacturing cost of the semiconductor device, compared to the manufacturing method disclosed in Document 1.
  • the sealed semiconductor chip 10 and so on is extracted from the metallic mold 26 .
  • the molding portion 14 is fabricated so that a part of the upper face of the bump electrode 12 is exposed.
  • a machining process such as grinding process may be used during the fabrication of the molding portion 14 . It is therefore possible to form the molding portion 14 so that the molding portion 14 seals the entire of the semiconductor chip 10 and a part of the bump electrode 12 is exposed, by fabricating the molding portion 14 so that a part of the upper face of the bump electrode 12 is exposed.
  • the molding portion 14 is fabricated so that the upper face of the molding portion 14 and the upper face of the bump electrode 12 get flat. It is possible to form the redistribution layer accurately on the upper face of the molding portion 14 with the sputtering method, the plating method or the like as described later, if the upper face of the molding portion 14 and the upper face of the bump electrode 12 are fabricated to be flat. It is therefore possible to improve the yield ratio of the semiconductor device and to reduce the manufacturing cost of the semiconductor device.
  • the fabrication of the molding portion 14 is not always necessary if the molding portion 14 having the same structure can be formed.
  • the redistribution layer 16 is formed on the upper face of the molding portion 14 so as to be electrically coupled to the bump electrode 12 .
  • the redistribution layer 16 is made of copper or the like, and is formed with the sputtering method, the plating method or the like.
  • the insulating portion 24 is formed so that the insulating portion 24 covers the entire side face and the entire upper face of the redistribution layer 16 and a region of the redistribution layer 16 where the outer connection electrode 18 is to be connected is exposed.
  • An insulating sheet such as polyimide may be used as the insulating portion 24 . It is possible to form the insulating portion 24 so that the region of the redistribution layer 16 where the outer connection electrode 18 is to be connected is exposed, by making a hole in advance at a region of the insulating sheet where the outer connection electrode 18 is to be formed. It is not always necessary that the insulating portion 24 is formed shown in FIG. 6B . However, it is possible to restrain the electrical short between each of the outer connection electrodes 18 if the insulating portion 24 is formed. And it is possible to improve the yield ratio and to reduce the manufacturing cost.
  • the outer connection electrode 18 made of Au or a solder is formed on the upper face of the redistribution layer 16 an that the outer connection electrode 18 is electrically coupled to the bump electrode 12 via the redistribution layer 16 .
  • the manufacturing method in accordance with the embodiment it is possible to manufacture the semiconductor device that is to be electrically coupled to outside with one redistribution layer. It is therefore possible to reduce the quantity of components, compared to a semiconductor device that needs two redistribution layers in accordance with Document 2. It is therefore possible to reduce the manufacturing cost of the semiconductor device. Further, it is possible to reduce the height of the semiconductor device, because the semiconductor device needs only one redistribution layer.
  • the substrate 20 may be removed after the formation of the outer connection electrode 18 shown in FIG. 6C .
  • FIG. 7A illustrates a schematic cross sectional view accounting for the step of removing the substrate 20 .
  • the substrate 20 may be removed with a machining process such as a grinding process. With the method, it is possible to further reduce the height of the semiconductor device, compared to the case where the substrate 20 is provided.
  • the thickness of the semiconductor chip 10 and the molding portion 14 may be reduced in the step of removing the substrate 20 shown in FIG. 7A . That is, the thickness of the semiconductor chip 10 and the molding portion 14 may be controlled to be a desirable one in the step of removing the substrate 20 with the machining process or the like. With the method, it is possible to manufacture the semiconductor device having the thickness of approximately 0.5 mm, although the thickness of the conventional semiconductor device is limited to approximately 1 mm.
  • the semiconductor device may be individuated as shown in FIG. 7B after removing the substrate 20 shown in FIG. 7A .
  • the semiconductor device may be individuated as shown in FIG. 8 after forming the outer connection electrode 18 shown in FIG. 6C .
  • the methods it is possible to manufacture the semiconductor device having one semiconductor chip 10 .
  • the substrate 20 , the molding portion 14 and the insulating portion 24 may be cut off with dicing so that one semiconductor chip 10 is included in the semiconductor device, as a method of individuating the semiconductor device.
  • FIG. 7B and FIG. 8 the semiconductor device is individuated so that one semiconductor chip 10 is included in the semiconductor device.
  • the semiconductor device may be individuated so that two semiconductor chips 10 are included in the semiconductor device.
  • a semiconductor device including a semiconductor chip, a bump electrode, a molding portion, a redistribution layer, and an outer connection electrode.
  • the bump electrode is provided on an upper face of the semiconductor chip.
  • the molding portion encapsulates an entire side face of the semiconductor chip and seals the bump electrode so that a part of the bump electrode is exposed.
  • the redistribution layer is provided on an upper face of the molding portion and is electrically coupled to the semiconductor chip via the bump electrode.
  • the outer connection electrode is provided on an upper face of the redistribution layer and is electrically coupled to the bump electrode via the redistribution layer.
  • the semiconductor device needs fewer components, compared to a semiconductor device that needs two redistribution layers in accordance with Document 2. It is therefore possible to reduce a manufacturing cost of the semiconductor device. Further it is possible to reduce a height of the semiconductor device compared to a semiconductor device having two redistribution layers, because the semiconductor device needs only one redistribution layer.
  • the upper face of the bump electrode and the upper face of the molding portion are flat. With the structure, it is easy to form the redistribution layer on the upper face of the molding portion with a sputtering method, a plating method or the like. It is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • an interval between each of the outer connection electrodes is larger than that between each of the bump electrodes.
  • the semiconductor device may further include a substrate that is fixed to a lower face of the semiconductor chip.
  • the substrate is a silicon substrate.
  • a warpage amount of a silicon substrate caused by heat is less than that of a glass epoxy substrate. It is therefore possible to manufacture a plenty of the semiconductor devices all together if the silicon substrate is used. It is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • the semiconductor device may further include an insulating portion.
  • the insulating portion may cover an entire side face and an entire upper face of the redistribution layer. And a part of the outer connection electrode may be exposed. With the structure, it is possible to restrain the electrical short between the outer connection electrodes with the insulating portion. Therefore, the yield ratio of the semiconductor device may be improved. And the manufacturing cost of the semiconductor device may be reduced.
  • a method of manufacturing a semiconductor device including: forming a bump electrode on an upper face of a semiconductor chip; fixing the semiconductor chip to an upper face of a substrate; forming a molding portion that seals an entire of the semiconductor chip and seals the bump electrode so that a part of the bump electrode is exposed; forming a redistribution layer on an upper face of the molding portion so that the redistribution layer is electrically coupled to the bump electrode; and forming an outer connection electrode on an upper face of the redistribution layer so that the redistribution layer is electrically coupled to the bump electrode via the redistribution layer.
  • the method it is possible to manufacture a semiconductor device that may be electrically coupled to outside with one redistribution layer. It is therefore possible to reduce a manufacturing cost of the semiconductor device, because the semiconductor device needs fewer components. Further, it is possible to reduce a height of the semiconductor device, because the semiconductor device needs only one redistribution layer.
  • the substrate is a silicon substrate.
  • a warpage amount of a silicon substrate caused by heat is less than that of a glass epoxy substrate. It is therefore possible to manufacture a plenty of the semiconductor devices all together if the silicon substrate is used. It is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • the step of forming the molding portion includes arranging the substrate in a mold having a recess and forming the molding portion so as to seal the semiconductor chip.
  • the method it is possible to arrange a wafer to be divided into semiconductor devices in the mold having the recess. It is therefore not necessary to provide a mold according to the size of each semiconductor device having different size from each other, when a various kinds of the semiconductor devices are manufactured. And it is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • the step of forming the molding portion includes fabricating the upper face of the molding portion and an upper face of the bump electrode to be flat.
  • the method it is possible to form the redistribution layer accurately on the upper face of the molding portion with a sputtering method, a plating method or the like. It is therefore possible to improve the yield ratio of the semiconductor device. And it is possible to reduce the manufacturing cost of the semiconductor device.
  • the method may further include removing the substrate after forming the outer connection electrode. With the method, it is possible to reduce the height of the semiconductor device, because the substrate is removed.
  • the step of removing the substrate includes reducing a thickness of the semiconductor chip and a thickness of the molding portion. With the method, it is possible to reduce the height of the semiconductor device.
  • the method further includes forming an insulating portion after forming the redistribution layer, and the insulating portion is formed so that the insulating portion covers an entire side face and an entire upper face of the redistribution layer and a region of the redistribution layer where the outer connection electrode is to be connected is exposed.
  • the electrical short between each of the outer connection electrodes is restrained, because the insulating portion is provided. It is therefore possible to improve the yield ratio of the semiconductor device. And it is possible to reduce the manufacturing cost of the semiconductor device.
  • the method may further include individuating the semiconductor device after forming the outer connection electrode. With the method, it is possible to manufacture the semiconductor chip having a desirable quantity of the semiconductor chip.

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Geometry (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

A semiconductor device includes a semiconductor chip, a bump contact, and encapsulating layer, an insulating layer and a connection terminal.

Description

    RELATED APPLICATION
  • This Application is a continuation of U.S. application Ser. No. 12/039,511, filed on Feb. 28, 2008, which claims priority to Japanese Patent Application 2007-048693 filed Feb. 28,2007, both of which are incorporated by reference herein in their entirety.
    • TECHNICAL FIELD
  • This invention generally relates to a semiconductor device d a method of manufacturing the semiconductor device, and in particular, relates to a small scale semiconductor device and method of manufacturing the semiconductor device.
    • BACKGROUND OF THE INVENTION
  • Recently, there is a demand for downsizing a semiconductor device that is used for a portable electronic device such as a mobile phone or a nonvolatile record media of an IC memory card. A wafer level package (CSP) is being developed in an art where a semiconductor device is downsized.
  • A flip chip ball grid array (FC-BGA) is used in a conventional art of the wafer level package. A plurality of semiconductor chips are flip-chip mounted on a glass epoxy substrate and the semiconductor chips are resin-sealed with molding using an epoxy resin in order to manufacture semiconductor devices of the wafer level package. After that, an outer connection electrode such as a solder ball is connected to the glass epoxy substrate. And each of the semiconductor chips is out off with dicing. With the manufacturing hod, the wafer level package is manufactured. In accordance with the manufacturing method, a quantity of the semiconductor chips to be mounted gets larger as an area of the glass epoxy substrate gets larger. A manufacturing cost of the semiconductor device may be therefore reduced because the quantity of the semiconductor chips that are cut off with one dicing gets larger.
  • Japanese Patent Application Publication No. 2001-250902 (hereinafter referred to as Document 1) discloses a wafer level package in which a semiconductor chip is implanted in a ceramics substrate having a recess and a redistribution layer (RDL) is formed on the semiconductor chip. The invention disclosed in Document 1 is characterized in that the ceramics substrate having the recess is used instead of the glass epoxy substrate.
  • Japanese Patent Application Publication No. 2004-221417 (hereinafter referred to as Document 2) discloses a wafer level package in which a sheet-shaped insulating film having an opening according to the size of the semiconductor chip is used, the semiconductor chip is implanted in the opening, and a redistribution layer is formed on the semiconductor chip. The invention disclosed in Document 2 is characterized in that the sheet-shaped insulating film having the opening is used instead of the glass epoxy substrate and the outer connection electrode is connected to the semiconductor chip through two redistribution layers.
  • In accordance with the manufacturing method of the conventional art, the glass epoxy substrate may be warped because of heat generated during molding, if a large area glass epoxy substrate is used. A yield ratio of the semiconductor device may be reduced, because a problem is made in reliability of the semiconductor device when the glass epoxy substrate is warped. It is therefore difficult to use the large area glass epoxy substrate. Reduction of the manufacturing cost is limited. The glass epoxy substrate needs a certain thickness. The semiconductor chip is not able to be flip-chip mounted if the semiconductor chip does not have a certain thickness. A reduction of the height of the semiconductor device may be limited approximately 1 mm.
  • In accordance with the invention disclosed in Document 1, the manufacturing cost gets higher because it is necessary to form a recess on the ceramics substrate. And in accordance with the invention disclosed in Document 2, it is necessary that an insulating film should be provided according to the size of is the built-in semiconductor chip. Therefore, the manufacturing cost gets higher when various kinds of the wafer level packages are manufactured. The height of the semiconductor device gets higher, because two redistribution layers are necessary and the quantity of components is large.
    • SUMMARY OF THE INVENTION
  • The present invention provides a semiconductor device having a low height and a manufacturing cost and provides a method of manufacturing the semiconductor device.
  • According to an aspect of the present invention, preferably, there is provided a semiconductor device including a semiconductor chip, a bump electrode, a molding portion, a redistribution layer, and an outer connection electrode. The bump electrode is provided on an upper face of the semiconductor chip. The molding portion encapsulates an entire side face of the semiconductor chip and seals the bump electrode so that apart of the bump electrode is exposed. The redistribution layer is provided on an upper face of the molding portion and is electrically coupled to the semiconductor chip via the bump electrode. The outer connection electrode is provided on an upper face of the redistribution layer and is electrically coupled to the bump electrode via the redistribution layer. With the structure, the semiconductor device may be electrically coupled to outside with one redistribution layer. Therefore, the semiconductor device needs fewer components, compared to a semiconductor device that needs two redistribution layers in accordance with Document 2. It is therefore possible to reduce a manufacturing cost of the semiconductor device. Further, it is possible to reduce a height of the semiconductor device compared to a semiconductor device having two redistribution layers, because the semiconductor device needs only one redistribution layer.
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a schematic cross sectional view of a semiconductor device in accordance with a first embodiment;
  • FIG. 2A and FIG. 2B illustrate a schematic diagram accounting for an interval between each outer connection terminal and an interval between each bump electrode of the semiconductor device in accordance with the first embodiment;
  • FIG. 3 illustrates a schematic cross sectional view of a semiconductor device in accordance with a second embodiment;
  • FIG. 4 illustrates a schematic cross sectional view of a semiconductor device in accordance with a third embodiment;
  • FIG. 5A, FIG. 5B, FIG. 5C, FIG. 5D, and FIG. 5E illustrate a schematic cross sectional view accounting for a method of manufacturing a semiconductor device in accordance with a fourth embodiment.
  • FIG. 6A, 6B and FIG. 6C illustrate a schematic cross sectional view accounting for the method of manufacturing the semiconductor device in accordance with the fourth embodiment;
  • FIG. 7A and FIG. 7B illustrate a schematic cross sectional view accounting for the method of manufacturing the semiconductor device in accordance with the fourth embodiment; and
  • FIG. 8 illustrates a schematic cross sectional view accounting for the method of manufacturing the semiconductor device in accordance with the fourth embodiment.
    •  DETAILED DESCRIPTION
  • A description will now be given of best modes for carrying out the present invention.
    • First Embodiment
  • FIG. 1 illustrates a schematic cross sectional view of a semiconductor device 100 in accordance with a first embodiment. As shown in FIG. 1, the semiconductor device 100 has a semiconductor chip 10, a bump electrode 12, a molding portion 14, a redistribution layer 16 and an outer connection electrode 18.
  • The semiconductor chip 10 is made of silicon or the like. There is provided the bump electrode 12 on an upper face of the semiconductor chip 10. The bump electrode 12 is made of Au (gold), a solder or the like, and has a height of approximately 300 μm. The molding portion 14 seals an entire side face of the semiconductor chip 10 and seals the bump electrode 12 so that a part of the bump electrode 12 is exposed. The molding portion 14 is made of an epoxy resin or the like. The molding portion 14 restrains a breaking of the semiconductor chip 10 caused by an impact from outside. There is provided the redistribution layer 16 on an upper face of the molding portion 14. The redistribution layer 16 is made of copper or the like. The redistribution layer 16 is formed with a plating method, a sputtering method or the like. The redistribution layer 16 is electrically coupled to the semiconductor chip 10 via the bump electrode 12. There is provided the outer connection electrode 18 on an upper face of the redistribution layer 16 so as to be electrically coupled to the bump electrode 12 via the redistribution layer 16. The outer connection electrode 18 is made of Au, a solder or the like, and has a height of approximately 300 μm. The outer connection electrode 18 acts as a connection terminal when the semiconductor device 100 is connected to an external circuit substrate or the like.
  • The semiconductor device 100 may be electrically coupled to outside with one redistribution layer. The semiconductor device 100 needs fewer components, compared to a semiconductor device that needs two redistribution layers in accordance with Document 2. It is therefore possible to reduce a manufacturing cost of the semiconductor device 100. Further, it is possible to reduce a height of the semiconductor device 100 compared to a semiconductor device having two redistribution layers, because the semiconductor device 100 needs only one redistribution layer.
  • It is preferable that the upper face of the bump electrode 12 and the upper face of the molding portion 14 (a face where the redistribution layer 16 is to be provided) are flat. It is possible to form the redistribution layer accurately on the upper face of the molding portion 14 with the sputtering method, the plating method or the like, when the upper face of the bump electrode 12 and the molding portion 14 is flat. It is therefore possible to improve a yield ratio of the semiconductor device 100. And it is possible to reduce the manufacturing cost of the semiconductor device 100.
  • It is preferable that an interval between each of the outer connection electrodes 18 is larger than that between each of the bump electrodes 12. FIG. 2A illustrates a top view of the semiconductor device 100 shown in FIG. 1. FIG. 2B illustrates a schematic view of the semiconductor device 100 shown in FIG. 2A in a case where the redistribution layer 16 and the outer connection electrode 18 are not provided. In FIG. 2B, the bump electrode 12 acts as an outer connection electrode. In FIG. 2A and FIG. 2B, intervals between each of the outer connection electrodes are referred to as “L1” and “L2” respectively.
  • As shown in FIG. 2A and FIG. 2B, the L1 shown in FIG. 2A is longer than the L2 shown in FIG. 2B. Generally, the L2 is reduced, when the semiconductor chip 10 is miniaturized as the semiconductor device is downsized. However, it is not easy to reduce an interval between connection terminals of the circuit substrate on the side of the semiconductor device according to the L2, even if the L2 is reduced. On the other hand, as shown in FIG. 2A and FIG. 2B, it is easy to determine a position of the semiconductor device 100 at an external circuit substrate when the semiconductor device 100 is mounted on the circuit substrate even if the semiconductor chip 10 is miniaturized, if the L1 is longer than the L2. And it is possible to restrain an electrical short between each of the outer connection electrodes 18 because the L1 is long. It is therefore possible to use the outer connection electrode 18 having a larger size. It is therefore possible to improve connection strength in a case where the semiconductor device 100 is mounted on an external circuit substrate.
    • Second Embodiment
  • A description will be given of a semiconductor device 100 a in accordance with a second embodiment. FIG. 3 illustrates a schematic cross sectional view of the semiconductor device 100 a in accordance with the second embodiment. The semiconductor device 100 a is different from the semiconductor device 100 shown in FIG. 1 in a point that a substrate 20 is further provided on a lower face of the semiconductor chip 10. The other structure is the same as that shown in FIG. 1. And an explanation of the structure is omitted.
  • As shown in FIG. 3, the substrate 20 is fixed to the lower face of the semiconductor chip 10 with a fixing portion 22. The fixing portion 22 is made of an adhesive resin such as an epoxy resin or the like.
  • The semiconductor device 100 a may be electrically connected to outside with one redistribution layer 16. Therefore, the semiconductor device 100 a needs fewer components, compared to a semiconductor device in accordance with Document 2. It is therefore possible to reduce a manufacturing cost of the semiconductor device 100 a. Further, it is possible to reduce a height of the semiconductor device 100 a compared to the semiconductor device in accordance with Document 2, because the semiconductor device 100 a has one redistribution layer 16.
  • It is preferable that the substrate 20 is a silicon substrate. A warpage amount of a silicon substrate caused by heat is less than that of a glass epoxy substrate. It is therefore possible to manufacture a plenty of the semiconductor devices 100 a all together if the silicon substrate is used. It is therefore possible to reduce the manufacturing cost of the semiconductor device 100 a.
    • Third Embodiment
  • A description will be given of a semiconductor device 100 b in accordance with a third embodiment. FIG. 4 illustrates a schematic cross sectional view of the semiconductor device 100 b in accordance with the third embodiment. The semiconductor device 100 b is different from the semiconductor device 100 shown in FIG. 1 in a point that an insulating portion 24 is further provided. The other structure is the same as that shown in FIG. 1. And an explanation of the structure is omitted.
  • As shown in FIG. 4, the insulating portion 24 is formed so that the insulating portion 24 covers the entire side face and the entire upper face of the redistribution layer 16 and a part of the outer connection electrode 18 is exposed. The insulating portion 24 is made of a resin or he like such as polyimide or the like.
  • In accordance with the semiconductor device 100 b, it is possible to restrain an electrical short between each of the outer connection electrodes 18, because the insulating portion 24 is provided. The yield ratio of the semiconductor device 100 b may be therefore improved and the manufacturing cost may be reduced.
  • The insulating portion 24 may be formed so that the insulating portion 24 covers the entire side face and the entire upper face of the redistribution layer 16 and a part of the outer connection electrode 18 is exposed in the semiconductor device 100 a in accordance with the second embodiment shown in FIG. 3. In this case, it is possible to restrain the electrical short between each of the outer connection electrodes 18 with the insulating portion 24.
    • Fourth Embodiment
  • In a fourth embodiment, a description will be given of a method of manufacturing the semiconductor device in accordance with the above-mentioned embodiment. The manufacturing method in accordance with the fourth embodiment includes a step of forming a bump electrode on a semiconductor chip, a step of fixing the semiconductor chip on a substrate, a step of forming a molding portion, a step of forming a redistribution layer and a step of forming an outer connection electrode. FIG. 5A through FIG. 5E, FIG. 6A through FIG. 6C, FIG. 7A, FIG. 7B and FIG. 8 illustrate a schematic cross sectional view accounting for the manufacturing method of the semiconductor device in accordance with the fourth embodiment.
  • As shown in FIG. 5A, the bump electrode 12 mad of Au, a solder or the like is formed on the upper face of the semiconductor chip 10 made of silicon or the like.
  • Next, as shown in FIG. 5B, the substrate 20 having a wafer shape is arranged in a mold 26 having a recess 28. The mold 26 is not limited in particular. The mold 26 may be a metallic mold. It is preferable that the substrate 20 is a silicon substrate. A warpage amount of a silicon substrate caused by heat is less than that of a glass epoxy substrate. It is therefore possible to use a silicon substrate that is a large area wafer. It is therefore possible to manufacture a plenty of the semiconductor devices all together if the silicon substrate is used. And it is possible to reduce the manufacturing cost of the semiconductor device.
  • Next, as shown in FIG. 5C, the semiconductor chip 10 is fixed to the upper face of the substrate 20 with the fixing portion 22. The fixing portion 22 may be made of an adhesive resin or the like such as an epoxy resin.
  • Next, as shown in FIG. 5D, the entire of the semiconductor chip 10 and the entire of the bump electrode 12 are sealed with an epoxy resin or the like, and are molded. Thus the molding portion 14 is formed.
  • In accordance with the manufacturing method, the substrate 20 having the wafer shape is arranged in the metallic mold 26 having the recess 28, and is sealed. It is therefore not necessary to provide the metallic mold 26 according to the size of each semiconductor device having different size from each other, when a various kinds of the semiconductor devices are manufactured. It is further possible to manufacture a plenty of the semiconductor devices, compared to a case where each semiconductor chip is arranged in each recess of a wafer as is the case of the manufacturing method disclosed in Document 1. It is therefore possible to reduce the manufacturing cost of the semiconductor device. In the manufacturing method disclosed in Document 1, a metallic mold having a recess is not used, but a ceramics substrate having a recess is used in a sealing step. Here, manufacturing the metallic mold 26 having the recess 28 is less expensive than manufacturing the ceramics substrate having the recess. With the method in accordance with the embodiment, it is therefore possible to reduce the manufacturing cost of the semiconductor device, compared to the manufacturing method disclosed in Document 1.
  • Next, as shown in FIG. 5E, the sealed semiconductor chip 10 and so on is extracted from the metallic mold 26. And the molding portion 14 is fabricated so that a part of the upper face of the bump electrode 12 is exposed. A machining process such as grinding process may be used during the fabrication of the molding portion 14. It is therefore possible to form the molding portion 14 so that the molding portion 14 seals the entire of the semiconductor chip 10 and a part of the bump electrode 12 is exposed, by fabricating the molding portion 14 so that a part of the upper face of the bump electrode 12 is exposed.
  • It is preferable that the molding portion 14 is fabricated so that the upper face of the molding portion 14 and the upper face of the bump electrode 12 get flat. It is possible to form the redistribution layer accurately on the upper face of the molding portion 14 with the sputtering method, the plating method or the like as described later, if the upper face of the molding portion 14 and the upper face of the bump electrode 12 are fabricated to be flat. It is therefore possible to improve the yield ratio of the semiconductor device and to reduce the manufacturing cost of the semiconductor device.
  • In the fourth embodiment, as shown in FIG. 5E, a description is given of a method of fabricating the molding portion 14 so that a part of the upper face of the bump electrode 12 is exposed, as a method of forming the molding portion 14 so that the molding portion 14 covers the entire of the semiconductor chip 10 and a part of the bump electrode 12 is exposed. However, the fabrication of the molding portion 14 is not always necessary if the molding portion 14 having the same structure can be formed. However, it is possible to fabricate the molding portion 14 so that the upper face of the molding portion 14 and the upper face of the bump electrode 12 get flat in the step of fabricating the molding portion 14 and to form the redistribution layer accurately, if the method includes the step of fabricating the molding portion 14. It is possible to reduce the manufacturing cost, because the yield ratio is improved if the method includes the step of fabricating the molding portion 14.
  • Next, as shown in FIG. 6A, there is formed the redistribution layer 16 on the upper face of the molding portion 14 so as to be electrically coupled to the bump electrode 12. The redistribution layer 16 is made of copper or the like, and is formed with the sputtering method, the plating method or the like.
  • Next, as shown in FIG. 6B, the insulating portion 24 is formed so that the insulating portion 24 covers the entire side face and the entire upper face of the redistribution layer 16 and a region of the redistribution layer 16 where the outer connection electrode 18 is to be connected is exposed. An insulating sheet such as polyimide may be used as the insulating portion 24. It is possible to form the insulating portion 24 so that the region of the redistribution layer 16 where the outer connection electrode 18 is to be connected is exposed, by making a hole in advance at a region of the insulating sheet where the outer connection electrode 18 is to be formed. It is not always necessary that the insulating portion 24 is formed shown in FIG. 6B. However, it is possible to restrain the electrical short between each of the outer connection electrodes 18 if the insulating portion 24 is formed. And it is possible to improve the yield ratio and to reduce the manufacturing cost.
  • Next, as shown in FIG. 6C, the outer connection electrode 18 made of Au or a solder is formed on the upper face of the redistribution layer 16 an that the outer connection electrode 18 is electrically coupled to the bump electrode 12 via the redistribution layer 16. With the manufacturing method in accordance with the embodiment, it is possible to manufacture the semiconductor device that is to be electrically coupled to outside with one redistribution layer. It is therefore possible to reduce the quantity of components, compared to a semiconductor device that needs two redistribution layers in accordance with Document 2. It is therefore possible to reduce the manufacturing cost of the semiconductor device. Further, it is possible to reduce the height of the semiconductor device, because the semiconductor device needs only one redistribution layer.
  • The substrate 20 may be removed after the formation of the outer connection electrode 18 shown in FIG. 6C. FIG. 7A illustrates a schematic cross sectional view accounting for the step of removing the substrate 20. The substrate 20 may be removed with a machining process such as a grinding process. With the method, it is possible to further reduce the height of the semiconductor device, compared to the case where the substrate 20 is provided.
  • And the thickness of the semiconductor chip 10 and the molding portion 14 may be reduced in the step of removing the substrate 20 shown in FIG. 7A. That is, the thickness of the semiconductor chip 10 and the molding portion 14 may be controlled to be a desirable one in the step of removing the substrate 20 with the machining process or the like. With the method, it is possible to manufacture the semiconductor device having the thickness of approximately 0.5 mm, although the thickness of the conventional semiconductor device is limited to approximately 1 mm.
  • And the semiconductor device may be individuated as shown in FIG. 7B after removing the substrate 20 shown in FIG. 7A. And the semiconductor device may be individuated as shown in FIG. 8 after forming the outer connection electrode 18 shown in FIG. 6C. With the methods, it is possible to manufacture the semiconductor device having one semiconductor chip 10. The substrate 20, the molding portion 14 and the insulating portion 24 may be cut off with dicing so that one semiconductor chip 10 is included in the semiconductor device, as a method of individuating the semiconductor device. In FIG. 7B and FIG. 8, the semiconductor device is individuated so that one semiconductor chip 10 is included in the semiconductor device. However, the semiconductor device may be individuated so that two semiconductor chips 10 are included in the semiconductor device.
  • The various aspects of the present invention are summarized below.
  • According to an aspect of the present invention, preferably, there is provided a semiconductor device including a semiconductor chip, a bump electrode, a molding portion, a redistribution layer, and an outer connection electrode. The bump electrode is provided on an upper face of the semiconductor chip. The molding portion encapsulates an entire side face of the semiconductor chip and seals the bump electrode so that a part of the bump electrode is exposed. The redistribution layer is provided on an upper face of the molding portion and is electrically coupled to the semiconductor chip via the bump electrode. The outer connection electrode is provided on an upper face of the redistribution layer and is electrically coupled to the bump electrode via the redistribution layer. With the structure, the semiconductor device may be electrically coupled to outside with one redistribution layer. Therefore, the semiconductor device needs fewer components, compared to a semiconductor device that needs two redistribution layers in accordance with Document 2. It is therefore possible to reduce a manufacturing cost of the semiconductor device. Further it is possible to reduce a height of the semiconductor device compared to a semiconductor device having two redistribution layers, because the semiconductor device needs only one redistribution layer.
  • It is preferable that the upper face of the bump electrode and the upper face of the molding portion are flat. With the structure, it is easy to form the redistribution layer on the upper face of the molding portion with a sputtering method, a plating method or the like. It is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • It is preferable that an interval between each of the outer connection electrodes is larger than that between each of the bump electrodes. With the structure, it is easy to determine a position of the semiconductor device when the semiconductor device is connected to outside with the outer connection electrode, even if the semiconductor chip is very small. An electrical short between each of the outer connection electrodes is restrained when the interval between each of the outer connection electrodes is long. It is therefore possible to use a large outer connection electrode. It is therefore possible to improve connection strength between the semiconductor device and an external component.
  • The semiconductor device may further include a substrate that is fixed to a lower face of the semiconductor chip.
  • It is preferable that the substrate is a silicon substrate. A warpage amount of a silicon substrate caused by heat is less than that of a glass epoxy substrate. It is therefore possible to manufacture a plenty of the semiconductor devices all together if the silicon substrate is used. It is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • The semiconductor device may further include an insulating portion. The insulating portion may cover an entire side face and an entire upper face of the redistribution layer. And a part of the outer connection electrode may be exposed. With the structure, it is possible to restrain the electrical short between the outer connection electrodes with the insulating portion. Therefore, the yield ratio of the semiconductor device may be improved. And the manufacturing cost of the semiconductor device may be reduced.
  • According to an aspect of the present invention, preferably, there is provided a method of manufacturing a semiconductor device including: forming a bump electrode on an upper face of a semiconductor chip; fixing the semiconductor chip to an upper face of a substrate; forming a molding portion that seals an entire of the semiconductor chip and seals the bump electrode so that a part of the bump electrode is exposed; forming a redistribution layer on an upper face of the molding portion so that the redistribution layer is electrically coupled to the bump electrode; and forming an outer connection electrode on an upper face of the redistribution layer so that the redistribution layer is electrically coupled to the bump electrode via the redistribution layer. With the method, it is possible to manufacture a semiconductor device that may be electrically coupled to outside with one redistribution layer. It is therefore possible to reduce a manufacturing cost of the semiconductor device, because the semiconductor device needs fewer components. Further, it is possible to reduce a height of the semiconductor device, because the semiconductor device needs only one redistribution layer.
  • It is preferable that the substrate is a silicon substrate. A warpage amount of a silicon substrate caused by heat is less than that of a glass epoxy substrate. It is therefore possible to manufacture a plenty of the semiconductor devices all together if the silicon substrate is used. It is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • It is preferable that the step of forming the molding portion includes arranging the substrate in a mold having a recess and forming the molding portion so as to seal the semiconductor chip. With the method, it is possible to arrange a wafer to be divided into semiconductor devices in the mold having the recess. It is therefore not necessary to provide a mold according to the size of each semiconductor device having different size from each other, when a various kinds of the semiconductor devices are manufactured. And it is therefore possible to reduce the manufacturing cost of the semiconductor device.
  • It is preferable that the step of forming the molding portion includes fabricating the upper face of the molding portion and an upper face of the bump electrode to be flat. With the method, it is possible to form the redistribution layer accurately on the upper face of the molding portion with a sputtering method, a plating method or the like. It is therefore possible to improve the yield ratio of the semiconductor device. And it is possible to reduce the manufacturing cost of the semiconductor device.
  • The method may further include removing the substrate after forming the outer connection electrode. With the method, it is possible to reduce the height of the semiconductor device, because the substrate is removed.
  • It is preferable that the step of removing the substrate includes reducing a thickness of the semiconductor chip and a thickness of the molding portion. With the method, it is possible to reduce the height of the semiconductor device.
  • It is preferable that the method further includes forming an insulating portion after forming the redistribution layer, and the insulating portion is formed so that the insulating portion covers an entire side face and an entire upper face of the redistribution layer and a region of the redistribution layer where the outer connection electrode is to be connected is exposed. With the method, the electrical short between each of the outer connection electrodes is restrained, because the insulating portion is provided. It is therefore possible to improve the yield ratio of the semiconductor device. And it is possible to reduce the manufacturing cost of the semiconductor device.
  • The method may further include individuating the semiconductor device after forming the outer connection electrode. With the method, it is possible to manufacture the semiconductor chip having a desirable quantity of the semiconductor chip.
  • While the above description constitutes the preferred embodiments of the present invention, it will be appreciated that the invention is susceptible of modification, variation and change without departing from the proper scope and fair meaning of the accompanying claims.
  • The present invention is based on Japanese Patent Application No. 2007-048693 filed on Feb. 28, 2007, the entire disclosure of which is hereby incorporated by reference.

Claims (8)

1-20. (canceled)
21. A package, comprising:
a substrate;
a semiconductor chip comprising a first surface adjacent to the substrate and a second surface on the opposite side of the semiconductor chip from the first surface, wherein the semiconductor chip comprises a plurality of contacts disposed on the second surface;
an encapsulating layer disposed over the second surface of the semiconductor chip and over the plurality of contacts;
an insulating layer disposed over the encapsulating layer; and
a plurality of connection terminals disposed in the insulating layer.
22. The package of claim 21, wherein the contacts comprise bump contacts.
23. The package of claim 21, wherein the insulating layer has a third surface adjacent to the encapsulating layer and has a fourth surface on the opposite side of the insulating layer from the encapsulating layer, and wherein the connection terminals extend beyond the fourth surface.
24. The package of claim 21, further comprising a fixing material disposed between the substrate and the first surface of the semiconductor chip.
25. The package of claim 21, wherein the substrate comprises silicon.
26. The package of claim 21, wherein the encapsulating layer comprises epoxy resin.
27. The package of claim 21, wherein the connection terminals comprise gold.
US15/336,926 2007-02-28 2016-10-28 Semiconductor device and method of manufacturing the same Abandoned US20170092606A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US15/336,926 US20170092606A1 (en) 2007-02-28 2016-10-28 Semiconductor device and method of manufacturing the same
US16/601,837 US11018105B2 (en) 2007-02-28 2019-10-15 Semiconductor device and method of manufacturing the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-048693 2007-02-28
JP2007048693A JP2008211125A (en) 2007-02-28 2007-02-28 Semiconductor device and manufacturing method thereof
US12/039,511 US9508651B2 (en) 2007-02-28 2008-02-28 Semiconductor device and method of manufacturing the same
US15/336,926 US20170092606A1 (en) 2007-02-28 2016-10-28 Semiconductor device and method of manufacturing the same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US12/039,511 Continuation US9508651B2 (en) 2007-02-28 2008-02-28 Semiconductor device and method of manufacturing the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US16/601,837 Continuation US11018105B2 (en) 2007-02-28 2019-10-15 Semiconductor device and method of manufacturing the same

Publications (1)

Publication Number Publication Date
US20170092606A1 true US20170092606A1 (en) 2017-03-30

Family

ID=39787146

Family Applications (3)

Application Number Title Priority Date Filing Date
US12/039,511 Active 2031-06-09 US9508651B2 (en) 2007-02-28 2008-02-28 Semiconductor device and method of manufacturing the same
US15/336,926 Abandoned US20170092606A1 (en) 2007-02-28 2016-10-28 Semiconductor device and method of manufacturing the same
US16/601,837 Active US11018105B2 (en) 2007-02-28 2019-10-15 Semiconductor device and method of manufacturing the same

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US12/039,511 Active 2031-06-09 US9508651B2 (en) 2007-02-28 2008-02-28 Semiconductor device and method of manufacturing the same

Family Applications After (1)

Application Number Title Priority Date Filing Date
US16/601,837 Active US11018105B2 (en) 2007-02-28 2019-10-15 Semiconductor device and method of manufacturing the same

Country Status (2)

Country Link
US (3) US9508651B2 (en)
JP (1) JP2008211125A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008211125A (en) 2007-02-28 2008-09-11 Spansion Llc Semiconductor device and manufacturing method thereof
JP5570855B2 (en) 2010-03-18 2014-08-13 新光電気工業株式会社 Wiring substrate and manufacturing method thereof, semiconductor device and manufacturing method thereof
US8535989B2 (en) * 2010-04-02 2013-09-17 Intel Corporation Embedded semiconductive chips in reconstituted wafers, and systems containing same
US8963285B2 (en) * 2013-03-08 2015-02-24 Infineon Technologies Ag Semiconductor device and method of manufacturing thereof
US9576910B2 (en) * 2015-03-11 2017-02-21 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor packaging structure and manufacturing method thereof
IT201700055983A1 (en) * 2017-05-23 2018-11-23 St Microelectronics Srl PROCEDURE FOR PRODUCING SEMICONDUCTOR, SEMICONDUCTOR AND CORRESPONDENT CIRCUIT DEVICES
CN111370320B (en) * 2018-12-26 2022-07-08 中芯集成电路（宁波）有限公司 Packaging method
CN111370338B (en) * 2018-12-26 2022-07-08 中芯集成电路（宁波）有限公司 Packaging method

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6498389B1 (en) * 2001-07-16 2002-12-24 Samsung Electronics Co., Ltd. Ultra-thin semiconductor package device using a support tape
US20050012409A1 (en) * 2003-07-17 2005-01-20 Jeumont S.A. Device for cooling and electrical machine, in particular a synchronous electrical machine having permanent magnets
US20060131745A1 (en) * 2004-12-14 2006-06-22 Mitsubishi Denki Kabushiki Kaisha Semiconductor device and manufacturing method therefor
US20060138674A1 (en) * 2003-05-28 2006-06-29 Siliconware Precision Industries Co., Ltd. Method for fabricating thermally enhanced semiconductor package
US20060237827A1 (en) * 2005-04-21 2006-10-26 Industrial Technology Research Institute Thermal enhanced low profile package structure and method for fabricating the same
US20060252232A1 (en) * 2005-04-28 2006-11-09 Ryosuke Usui Circuit device and method of manufacturing thereof
US20070017862A1 (en) * 2005-07-22 2007-01-25 Shaver Donald S Water recycling, high-pressure spray tire wash system
US20070114661A1 (en) * 2005-11-23 2007-05-24 Choi Seung-Yong Semiconductor package and method of fabricating the same

Family Cites Families (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08236586A (en) * 1994-12-29 1996-09-13 Nitto Denko Corp Semiconductor device and manufacturing method thereof
US5616958A (en) * 1995-01-25 1997-04-01 International Business Machines Corporation Electronic package
US5851911A (en) * 1996-03-07 1998-12-22 Micron Technology, Inc. Mask repattern process
EP1189270A3 (en) * 1996-07-12 2003-07-16 Fujitsu Limited Semiconductor device
JP2982729B2 (en) * 1997-01-16 1999-11-29 日本電気株式会社 Semiconductor device
JP2000150701A (en) * 1998-11-05 2000-05-30 Shinko Electric Ind Co Ltd Semiconductor device, connection substrate used therefor, and method of manufacturing the same
JP3565319B2 (en) * 1999-04-14 2004-09-15 シャープ株式会社 Semiconductor device and manufacturing method thereof
US6181569B1 (en) * 1999-06-07 2001-01-30 Kishore K. Chakravorty Low cost chip size package and method of fabricating the same
TW569424B (en) * 2000-03-17 2004-01-01 Matsushita Electric Industrial Co Ltd Module with embedded electric elements and the manufacturing method thereof
US6281046B1 (en) * 2000-04-25 2001-08-28 Atmel Corporation Method of forming an integrated circuit package at a wafer level
US6462410B1 (en) * 2000-08-17 2002-10-08 Sun Microsystems Inc Integrated circuit component temperature gradient reducer
US6518089B2 (en) * 2001-02-02 2003-02-11 Texas Instruments Incorporated Flip chip semiconductor device in a molded chip scale package (CSP) and method of assembly
TWI283831B (en) * 2001-02-28 2007-07-11 Elpida Memory Inc Electronic apparatus and its manufacturing method
DE10137184B4 (en) * 2001-07-31 2007-09-06 Infineon Technologies Ag Method for producing an electronic component with a plastic housing and electronic component
US6841413B2 (en) * 2002-01-07 2005-01-11 Intel Corporation Thinned die integrated circuit package
TW577160B (en) * 2002-02-04 2004-02-21 Casio Computer Co Ltd Semiconductor device and manufacturing method thereof
US6979904B2 (en) * 2002-04-19 2005-12-27 Micron Technology, Inc. Integrated circuit package having reduced interconnects
KR100593049B1 (en) * 2002-08-09 2006-06-28 가시오게산키 가부시키가이샤 Semiconductor device and method of manufacturing the same
US6965160B2 (en) * 2002-08-15 2005-11-15 Micron Technology, Inc. Semiconductor dice packages employing at least one redistribution layer
US20050012225A1 (en) * 2002-11-15 2005-01-20 Choi Seung-Yong Wafer-level chip scale package and method for fabricating and using the same
US6818996B2 (en) * 2002-12-20 2004-11-16 Lsi Logic Corporation Multi-level redistribution layer traces for reducing current crowding in flipchip solder bumps
US7388294B2 (en) * 2003-01-27 2008-06-17 Micron Technology, Inc. Semiconductor components having stacked dice
US6841883B1 (en) * 2003-03-31 2005-01-11 Micron Technology, Inc. Multi-dice chip scale semiconductor components and wafer level methods of fabrication
WO2004090938A2 (en) * 2003-04-02 2004-10-21 Honeywell International Inc. Thermal interconnect and interface systems, methods of production and uses thereof
WO2004090033A1 (en) * 2003-04-07 2004-10-21 Hitachi Chemical Co., Ltd. Epoxy resin molding material for sealing use and semiconductor device
US7312101B2 (en) * 2003-04-22 2007-12-25 Micron Technology, Inc. Packaged microelectronic devices and methods for packaging microelectronic devices
JP2004349361A (en) * 2003-05-21 2004-12-09 Casio Comput Co Ltd Semiconductor device and method of manufacturing the same
US8269329B2 (en) * 2003-07-24 2012-09-18 Via Technologies, Inc. Multi-chip package
US7459781B2 (en) * 2003-12-03 2008-12-02 Wen-Kun Yang Fan out type wafer level package structure and method of the same
US7056766B2 (en) * 2003-12-09 2006-06-06 Freescale Semiconductor, Inc. Method of forming land grid array packaged device
WO2005109503A2 (en) * 2004-05-06 2005-11-17 Koninklijke Philips Electronics N.V. A method of assembly and assembly thus made
JP2005350647A (en) * 2004-05-11 2005-12-22 Nitto Denko Corp Liquid epoxy resin composition
JP2005340567A (en) * 2004-05-28 2005-12-08 Fuji Xerox Co Ltd Surface luminescence type semiconductor laser element and its manufacturing method
TWI273666B (en) * 2004-06-30 2007-02-11 Athlete Fa Corp Method and device for mounting conductive ball
JP4575071B2 (en) * 2004-08-02 2010-11-04 新光電気工業株式会社 Manufacturing method of electronic component built-in substrate
US20070018308A1 (en) * 2005-04-27 2007-01-25 Albert Schott Electronic component and electronic configuration
US7745944B2 (en) * 2005-08-31 2010-06-29 Micron Technology, Inc. Microelectronic devices having intermediate contacts for connection to interposer substrates, and associated methods of packaging microelectronic devices with intermediate contacts
JP2007103737A (en) * 2005-10-05 2007-04-19 Sharp Corp Semiconductor device
US7768125B2 (en) * 2006-01-04 2010-08-03 Stats Chippac Ltd. Multi-chip package system
US7675157B2 (en) * 2006-01-30 2010-03-09 Marvell World Trade Ltd. Thermal enhanced package
KR100703816B1 (en) * 2006-04-21 2007-04-04 삼성전자주식회사 Wafer Level Semiconductor Module and Manufacturing Method Thereof
DE102006032073B4 (en) * 2006-07-11 2016-07-07 Intel Deutschland Gmbh Electrically conductive composite of a component and a carrier plate
US20080088004A1 (en) * 2006-10-17 2008-04-17 Advanced Chip Engineering Technology Inc. Wafer level package structure with build up layers
JP4902558B2 (en) * 2007-01-31 2012-03-21 三洋電機株式会社 Manufacturing method of semiconductor module
JP2008211125A (en) 2007-02-28 2008-09-11 Spansion Llc Semiconductor device and manufacturing method thereof

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6498389B1 (en) * 2001-07-16 2002-12-24 Samsung Electronics Co., Ltd. Ultra-thin semiconductor package device using a support tape
US20060138674A1 (en) * 2003-05-28 2006-06-29 Siliconware Precision Industries Co., Ltd. Method for fabricating thermally enhanced semiconductor package
US20050012409A1 (en) * 2003-07-17 2005-01-20 Jeumont S.A. Device for cooling and electrical machine, in particular a synchronous electrical machine having permanent magnets
US20060131745A1 (en) * 2004-12-14 2006-06-22 Mitsubishi Denki Kabushiki Kaisha Semiconductor device and manufacturing method therefor
US20060237827A1 (en) * 2005-04-21 2006-10-26 Industrial Technology Research Institute Thermal enhanced low profile package structure and method for fabricating the same
US20060252232A1 (en) * 2005-04-28 2006-11-09 Ryosuke Usui Circuit device and method of manufacturing thereof
US20070017862A1 (en) * 2005-07-22 2007-01-25 Shaver Donald S Water recycling, high-pressure spray tire wash system
US20070114661A1 (en) * 2005-11-23 2007-05-24 Choi Seung-Yong Semiconductor package and method of fabricating the same

Also Published As

Publication number Publication date
US20090072394A1 (en) 2009-03-19
US11018105B2 (en) 2021-05-25
JP2008211125A (en) 2008-09-11
US9508651B2 (en) 2016-11-29
US20200058610A1 (en) 2020-02-20

Similar Documents

Publication Publication Date Title
US11018105B2 (en) Semiconductor device and method of manufacturing the same
US8183092B2 (en) Method of fabricating stacked semiconductor structure
US7115441B2 (en) Semiconductor package with semiconductor chips stacked therein and method of making the package
US7545048B2 (en) Stacked die package
US9034693B2 (en) Integrated circuit package with open substrate and method of manufacturing thereof
US7462930B2 (en) Stack chip and stack chip package having the same
US6982485B1 (en) Stacking structure for semiconductor chips and a semiconductor package using it
US20070181989A1 (en) Microelectronic devices, stacked microelectronic devices, and methods for manufacturing such devices
US8685834B2 (en) Fabrication method of package structure with simplified encapsulation structure and simplified wiring
US20090085134A1 (en) Wafer-level image sensor module, method of manufacturing the same, and camera module
US20110074037A1 (en) Semiconductor device
US20070176269A1 (en) Multi-chips module package and manufacturing method thereof
WO2007083351A1 (en) Semiconductor device and method for manufacturing same
JP2003188263A (en) Method for manufacturing semiconductor integrated circuit chip and semiconductor package using the semiconductor integrated circuit chip
CN1917156B (en) Encapsulated chip scale package having flip-chip on lead frame structure and method
US20090014827A1 (en) Image sensor module at wafer level, method of manufacturing the same, and camera module
JP4494240B2 (en) Resin-sealed semiconductor device
US20030234442A1 (en) Semiconductor package and method for fabricating the same
CN112259525B (en) Semiconductor device and method of manufacturing semiconductor device
US20020187591A1 (en) Packaging process for semiconductor package
KR100876107B1 (en) Wafer level package and manufacturing method thereof
US7656021B2 (en) Integrated circuit package system with pedestal structure
KR100673378B1 (en) Chip scale multilayer chip package and its manufacturing method
EP1283547A1 (en) Packaging process for semiconductor package
JP2004281981A (en) Semiconductor device and manufacturing method thereof

Legal Events

Date Code Title Description
AS Assignment

Owner name: SPANSION LLC, CALIFORNIA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:ONODERA, MASANORI;KASAI, JUNICHI;SIGNING DATES FROM 20080418 TO 20080422;REEL/FRAME:041357/0330

AS Assignment

Owner name: CYPRESS SEMICONDUCTOR CORPORATION, CALIFORNIA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:SPANSION LLC;REEL/FRAME:041836/0001

Effective date: 20150601

AS Assignment

Owner name: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL

Free format text: PATENT SECURITY AGREEMENT;ASSIGNORS:CYPRESS SEMICONDUCTOR CORPORATION;SPANSION LLC;REEL/FRAME:042326/0396

Effective date: 20170421

Owner name: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT, MARYLAND

Free format text: PATENT SECURITY AGREEMENT;ASSIGNORS:CYPRESS SEMICONDUCTOR CORPORATION;SPANSION LLC;REEL/FRAME:042326/0396

Effective date: 20170421

STPP Information on status: patent application and granting procedure in general

Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER

STPP Information on status: patent application and granting procedure in general

Free format text: FINAL REJECTION MAILED

AS Assignment

Owner name: MUFG UNION BANK, N.A., CALIFORNIA

Free format text: ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN INTELLECTUAL PROPERTY;ASSIGNOR:MORGAN STANLEY SENIOR FUNDING, INC.;REEL/FRAME:050896/0366

Effective date: 20190731

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION

AS Assignment

Owner name: SPANSION LLC, CALIFORNIA

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:MUFG UNION BANK, N.A.;REEL/FRAME:059410/0438

Effective date: 20200416

Owner name: CYPRESS SEMICONDUCTOR CORPORATION, CALIFORNIA

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:MUFG UNION BANK, N.A.;REEL/FRAME:059410/0438

Effective date: 20200416