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TWI733215B - Power supply device for laser device - Google Patents

Power supply device for laser device Download PDF

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Publication number
TWI733215B
TWI733215B TW108137172A TW108137172A TWI733215B TW I733215 B TWI733215 B TW I733215B TW 108137172 A TW108137172 A TW 108137172A TW 108137172 A TW108137172 A TW 108137172A TW I733215 B TWI733215 B TW I733215B
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power supply
abnormality
frequency
circuit
aforementioned
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TW108137172A
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TW202027390A (en
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山口英正
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日商住友重機械工業股份有限公司
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    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02MAPPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M1/00Details of apparatus for conversion
    • H02M1/32Means for protecting converters other than automatic disconnection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702Details of the driver electronics and electric discharge circuits
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014Monitoring arrangements not otherwise provided for
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02MAPPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M5/00Conversion of AC power input into AC power output, e.g. for change of voltage, for change of frequency, for change of number of phases
    • H02M5/02Conversion of AC power input into AC power output, e.g. for change of voltage, for change of frequency, for change of number of phases without intermediate conversion into DC
    • H02M5/04Conversion of AC power input into AC power output, e.g. for change of voltage, for change of frequency, for change of number of phases without intermediate conversion into DC by static converters
    • H02M5/10Conversion of AC power input into AC power output, e.g. for change of voltage, for change of frequency, for change of number of phases without intermediate conversion into DC by static converters using transformers
    • H02M5/16Conversion of AC power input into AC power output, e.g. for change of voltage, for change of frequency, for change of number of phases without intermediate conversion into DC by static converters using transformers for conversion of frequency
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02MAPPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M7/00Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
    • H02M7/42Conversion of DC power input into AC power output without possibility of reversal
    • H02M7/44Conversion of DC power input into AC power output without possibility of reversal by static converters
    • H02M7/48Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
    • H02M7/53Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
    • H02M7/537Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
    • H02M7/5387Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02MAPPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M1/00Details of apparatus for conversion
    • H02M1/0003Details of control, feedback or regulation circuits
    • H02M1/0038Circuits or arrangements for suppressing, e.g. by masking incorrect turn-on or turn-off signals, e.g. due to current spikes in current mode control

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Lasers (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)

Abstract

[課題] 提供一種提高信賴性之雷射裝置。 [解決手段] 高頻電源(400)向包括一對放電電極(202、204)的電容之共振電路(210)施加高頻電壓(VRF )。過電壓抑制電路(500)抑制共振電路(210)的兩端之間的過電壓。若異常檢測器(600)檢測到異常,則停止來自高頻電源(400)的高頻電壓(VRF )的施加。[Question] Provide a laser device that improves reliability. [Solution] The high-frequency power supply (400) applies a high-frequency voltage (V RF ) to the resonant circuit (210) including a pair of discharge electrodes (202, 204) of the capacitor. The overvoltage suppression circuit (500) suppresses the overvoltage between both ends of the resonance circuit (210). If the abnormality detector (600) detects an abnormality, the application of the high-frequency voltage (V RF ) from the high-frequency power supply (400) is stopped.

Description

雷射裝置用的電源裝置Power supply device for laser device

本發明有關電源裝置。The present invention relates to a power supply device.

作為產業用的加工工具,廣泛普及有雷射加工裝置。關於雷射加工裝置,使用CO2 雷射等的高輸出的氣體雷射。圖1為雷射裝置100R的方塊圖。雷射裝置100R具備雷射共振器200及電源裝置250R。雷射共振器200具備一對放電電極202、204、全反射鏡206、及部分反射鏡208。As industrial processing tools, laser processing devices are widely used. Regarding the laser processing device, a high-output gas laser such as a CO 2 laser is used. Fig. 1 is a block diagram of a laser device 100R. The laser device 100R includes a laser resonator 200 and a power supply device 250R. The laser resonator 200 includes a pair of discharge electrodes 202 and 204, a total reflection mirror 206, and a partial reflection mirror 208.

一對放電電極202、204設置在填充有CO2 等雷射介質氣體之氣體腔內。在一對放電電極202、204之間存在有電容C。該電容C與電感L(電感元件或寄生電感)形成具有共振頻率fRES 之共振電路210。A pair of discharge electrodes 202 and 204 are arranged in a gas cavity filled with a laser medium gas such as CO 2. There is a capacitance C between the pair of discharge electrodes 202 and 204. The capacitor C and the inductance L (inductance element or parasitic inductance) form a resonance circuit 210 having a resonance frequency f RES.

電源裝置250R向共振電路210施加高頻電壓VRF 。高頻電壓VRF 的頻率fRF (以下,稱作同步頻率)設定在共振電路的頻率fRES 的附近。藉由施加高頻電壓VRF ,在一對放電電極202、204之間流過放電電流。藉由放電電流激勵雷射介質氣體而形成反轉分布。激發光在由全反射鏡206和部分反射鏡208所形成之光共振器內往返移動,且藉由通過雷射介質氣體而增幅。所增幅之光的一部分從部分反射鏡208作為輸出而被取出。The power supply device 250R applies a high-frequency voltage V RF to the resonance circuit 210. The frequency f RF of the high-frequency voltage V RF (hereinafter referred to as the synchronization frequency) is set in the vicinity of the frequency f RES of the resonance circuit. By applying the high-frequency voltage V RF , a discharge current flows between the pair of discharge electrodes 202 and 204. The laser dielectric gas is excited by the discharge current to form an inverted distribution. The excitation light moves back and forth in the optical resonator formed by the total reflection mirror 206 and the partial reflection mirror 208, and is amplified by passing through the laser medium gas. A part of the amplified light is taken out from the partial reflection mirror 208 as an output.

電源裝置250R具備:直流電源300,其係生成被穩定化之直流電壓VDC ;以及高頻電源400,其係將直流電壓VDC 轉換成高頻電壓VRF 。 [先前技術文獻] [專利文獻]The power supply device 250R includes a DC power supply 300 that generates a stabilized DC voltage V DC and a high-frequency power supply 400 that converts the DC voltage V DC into a high-frequency voltage V RF . [Prior Technical Documents] [Patent Documents]

[專利文獻1] 日本特開2018-39032號專利公報 [專利文獻2] 日本特開2015-32746號專利公報[Patent Document 1] Japanese Patent Application Publication No. 2018-39032 [Patent Document 2] Japanese Patent Application Publication No. 2015-32746

[發明欲解決之課題][The problem to be solved by the invention]

本發明人等對圖1的雷射裝置100R進行研究之結果,發現以下課題。The inventors of the present invention conducted research on the laser device 100R of FIG. 1 and found the following problems.

若在放電電極202或204中發生接觸不良等,則以開放狀態運行。開放狀態下,電容C變得非常小,因此共振電路的共振頻率成為非常高的值fRES ’。若在該狀態下,繼續施加同步頻率f0 (f0 <fRES ’)的高頻電壓VRF ,則在共振頻率fRES ’中,產生超過高頻電壓VRF 的振幅之非常高的電壓。若該高電壓被施加到高頻電源400的內部的半導體元件(亦即功率電晶體),則可靠性降低。If poor contact or the like occurs in the discharge electrode 202 or 204, the operation is performed in an open state. In the open state, the capacitance C becomes very small, so the resonance frequency of the resonance circuit becomes a very high value f RES '. In this state, if the high-frequency voltage V RF of the synchronous frequency f 0 (f 0 <f RES ') is continuously applied, a very high voltage exceeding the amplitude of the high-frequency voltage V RF will be generated at the resonance frequency f RES ' . If this high voltage is applied to a semiconductor element (that is, a power transistor) inside the high-frequency power supply 400, the reliability is reduced.

本發明係在相關之狀況下完成者,其一種態樣的例示性目的之一在於提供一種提高了可靠性之雷射裝置。 [解決課題之手段]The present invention was completed under relevant conditions, and one of the illustrative purposes of one aspect is to provide a laser device with improved reliability. [Means to solve the problem]

本發明的一種態樣與驅動包括一對放電電極之雷射共振器之電源裝置有關。電源裝置具備:高頻電源,其係向包括一對放電電極的電容之共振電路施加高頻電壓;過電壓抑制電路,其係抑制共振電路的兩端之間或者高頻電源的內部節點的過電壓;開關,其係與過電壓抑制電路串聯:以及異常檢測器,其係若檢測到異常,則打開開關。One aspect of the present invention relates to a power supply device for driving a laser resonator including a pair of discharge electrodes. The power supply device is equipped with: a high-frequency power supply, which applies a high-frequency voltage to a resonance circuit including a pair of discharge electrodes, and an over-voltage suppression circuit, which suppresses the overvoltage between the two ends of the resonance circuit or the internal nodes of the high-frequency power supply. Voltage; switch, which is connected in series with the overvoltage suppression circuit; and an abnormality detector, which turns on the switch if an abnormality is detected.

在此所言之「異常」係在電源裝置內可能導致產生過電壓之異常。藉由設置過電壓抑制電路,在共振電路的共振頻率大大偏離設計值時,能夠抑制過電壓,從而能夠保護包括於高頻電源等中之半導體元件。還有,在不產生過電壓之狀況下,藉由預先關閉開關,能夠防止洩漏電流流過過電壓抑制電路,從而能夠抑制由洩漏電流引起之干擾。The "abnormality" mentioned here is an abnormality that may cause overvoltage in the power supply device. By providing the overvoltage suppression circuit, when the resonance frequency of the resonance circuit greatly deviates from the design value, the overvoltage can be suppressed, thereby being able to protect the semiconductor components included in the high-frequency power supply. In addition, by closing the switch in advance under the condition that no overvoltage is generated, leakage current can be prevented from flowing through the overvoltage suppression circuit, thereby suppressing the interference caused by the leakage current.

雷射共振器的框體亦可經由接地線接地。異常檢測器亦可依據流過接地線之電流來檢測異常。The frame of the laser resonator can also be grounded via a ground wire. The anomaly detector can also detect anomalies based on the current flowing through the ground wire.

雷射共振器的框體經由接地線接地,異常檢測器亦可依據框體的電位來檢測異常。The frame of the laser resonator is grounded via a ground wire, and the anomaly detector can also detect anomalies based on the potential of the frame.

電源裝置還可具備:若異常檢測器檢測到異常,則通知給外部之通知機構。The power supply device may also be equipped with: if an abnormality is detected by the abnormality detector, it will notify an external notification organization.

高頻電源亦可包括逆變器和具有與逆變器的輸出端連接之1次繞組及與雷射共振器連接之2次繞組之變壓器。過電壓抑制電路亦可與變壓器的1次繞組連接。The high-frequency power supply may also include an inverter and a transformer with a primary winding connected to the output terminal of the inverter and a secondary winding connected to the laser resonator. The overvoltage suppression circuit can also be connected to the primary winding of the transformer.

過電壓抑制電路亦可包括電壓抑制器、突波保護裝置、氣體避雷器(突波避雷器)中的至少一個。The overvoltage suppression circuit may also include at least one of a voltage suppressor, a surge protection device, and a gas arrester (surge arrester).

過電壓抑制電路亦可包括串聯連接之複數個元件。各個元件的電容較大時,藉由串聯連接該等,能夠減小過電壓抑制電路的電容。The overvoltage suppression circuit may also include a plurality of elements connected in series. When the capacitance of each element is large, by connecting them in series, the capacitance of the overvoltage suppression circuit can be reduced.

過電壓抑制電路亦可包括電容為一對放電電極的電容的1/10以下的電容器。此時,電容器成為負載,因此能夠防止共振頻率變得過高,從而能夠抑制過電壓。The overvoltage suppression circuit may also include a capacitor having a capacitance of 1/10 or less of the capacitance of a pair of discharge electrodes. At this time, the capacitor becomes a load, so it is possible to prevent the resonance frequency from becoming too high, and it is possible to suppress overvoltage.

過電壓抑制電路亦可包括LCR負載。此時,即使放電電極發生異常而成為開放狀態,亦能夠藉由LCR負載防止共振頻率變得過高,從而能夠抑制過電壓。The overvoltage suppression circuit can also include an LCR load. At this time, even if the discharge electrode becomes an open state due to an abnormality, the LCR load can prevent the resonance frequency from becoming too high, thereby suppressing overvoltage.

另外,在方法、裝置、系統等之間,相互置換以上構成要件的任意組合或本發明的構成要件或表現形式之裝置,作為本發明的態樣是同樣有效。 [發明效果]In addition, among methods, devices, systems, etc., it is equally effective as an aspect of the present invention to replace any combination of the above constituent elements or the constituent elements or expression forms of the present invention with each other. [Effects of the invention]

依本發明的一種態樣,能夠提高雷射裝置的可靠性。According to one aspect of the present invention, the reliability of the laser device can be improved.

以下,根據本發明較佳的實施方式,一邊參閱圖式一邊對本發明進行說明。對示於各圖式之相同或相等的構成要件、構件、處理標註相同元件符號,並適當省略重複之說明。又,實施方式僅為例示並非限定發明,記述於實施方式之所有特徵或其組合並不一定是限制本發明的本質者。Hereinafter, according to the preferred embodiments of the present invention, the present invention will be described with reference to the drawings. The same or equivalent constituent elements, members, and processes shown in the various drawings are denoted by the same reference numerals, and repeated descriptions are appropriately omitted. In addition, the embodiment is merely an illustration and does not limit the invention, and all the features or combinations described in the embodiment do not necessarily limit the essence of the invention.

圖2為實施方式之雷射裝置100的方塊圖。雷射裝置100具備雷射共振器200及電源裝置250。FIG. 2 is a block diagram of the laser device 100 according to the embodiment. The laser device 100 includes a laser resonator 200 and a power supply device 250.

圖2中,雷射共振器200被表示作為等價電路。在一對放電電極202、204之間包括電容C和電阻成分R。電容C與電感L一同形成共振電路210。將該共振電路210的共振頻率設為fRES 。電感L包括電感零件及配線或基板的寄生電感中的至少一者。In FIG. 2, the laser resonator 200 is shown as an equivalent circuit. A capacitor C and a resistance component R are included between the pair of discharge electrodes 202 and 204. The capacitor C and the inductance L form a resonance circuit 210 together. Let the resonance frequency of the resonance circuit 210 be f RES . The inductance L includes at least one of an inductance component and a parasitic inductance of a wiring or a substrate.

電源裝置250向共振電路210施加高頻電壓VRF 。高頻電壓VRF 的頻率fRF (以下,稱作同步頻率)設定在共振電路的頻率fRES 的附近。藉由施加高頻電壓VRF ,在一對放電電極202、204之間流過放電電流。藉由放電電流激勵雷射介質氣體而形成反轉分布。The power supply device 250 applies a high-frequency voltage V RF to the resonance circuit 210. The frequency f RF of the high-frequency voltage V RF (hereinafter referred to as the synchronization frequency) is set in the vicinity of the frequency f RES of the resonance circuit. By applying the high-frequency voltage V RF , a discharge current flows between the pair of discharge electrodes 202 and 204. The laser dielectric gas is excited by the discharge current to form an inverted distribution.

電源裝置250具備:直流電源300、高頻電源400、過電壓抑制電路500、開關SW1、異常檢測器600、通知機構610。關於直流電源300,其輸出端與一對DC鏈310連接而在DC鏈310產生被穩定化成既定的電壓位準之直流電壓(亦稱作DC鏈電壓)VDCThe power supply device 250 includes a DC power supply 300, a high-frequency power supply 400, an overvoltage suppression circuit 500, a switch SW1, an abnormality detector 600, and a notification mechanism 610. Regarding the DC power supply 300, its output terminal is connected to a pair of DC links 310, and the DC link 310 generates a DC voltage (also referred to as a DC link voltage) V DC that is stabilized to a predetermined voltage level.

高頻電源400的輸入與DC鏈310連接而接收DC鏈電壓VDC 。高頻電源400產生具有與共振頻率fRES 相同頻率(同步頻率)fRF 之高頻電壓VRF 並供給到雷射共振器200。高頻電源400的構成並無限定,能夠包括將直流電壓VDC 轉換成交流電壓VAC 之H橋接電路(逆變器)402和升壓H橋接電路402的輸出電壓VAC 之升壓變壓器404。The input of the high frequency power supply 400 is connected to the DC link 310 to receive the DC link voltage V DC . The high-frequency power supply 400 generates a high-frequency voltage V RF having the same frequency (synchronization frequency) f RF as the resonance frequency f RES and supplies it to the laser resonator 200. The composition of the high-frequency power supply 400 is not limited, and it can include an H-bridge circuit (inverter) 402 that converts a DC voltage V DC into an AC voltage V AC and a step-up transformer 404 that boosts the output voltage V AC of the H-bridge circuit 402 .

過電壓抑制電路500構成為能夠抑制共振電路210的兩端之間或者高頻電源的內部節點的過電壓。圖2中,關於過電壓抑制電路500,連接H橋接電路402與升壓變壓器404的連接節點而能夠抑制升壓變壓器404的1次側的電壓的過電壓。The overvoltage suppression circuit 500 is configured to be able to suppress an overvoltage between both ends of the resonance circuit 210 or an internal node of the high-frequency power supply. In FIG. 2, regarding the overvoltage suppression circuit 500, the connection node of the H bridge circuit 402 and the step-up transformer 404 is connected, so that the overvoltage of the voltage on the primary side of the step-up transformer 404 can be suppressed.

為了阻斷過電壓抑制電路500的電流路徑,串聯設置開關SW1與過電壓抑制電路500。In order to block the current path of the overvoltage suppression circuit 500, the switch SW1 and the overvoltage suppression circuit 500 are arranged in series.

若異常檢測器600檢測到雷射裝置100的異常,則斷定異常檢測訊號SABN 並打開開關SW1。在此所言之「異常」係在電源裝置250內能夠導致產生過電壓之異常,換言之,為使共振頻率位移至高於設計值之異常,例如例示出放電電極202、204的接觸不良、電感L的斷開、連接該等之配線的斷開、配線的斷線(斷開)或者由劣化引起之阻抗的增加。再者,電源裝置250可以在發生異常之後斷定異常檢測訊號SABN ,亦可在顯現出異常的預兆之階段斷定異常檢測訊號SABNIf the abnormality detector 600 detects the abnormality of the laser device 100, it determines the abnormality detection signal S ABN and turns on the switch SW1. The "abnormality" referred to here is an abnormality that can cause overvoltage to be generated in the power supply device 250. In other words, an abnormality that shifts the resonance frequency to a value higher than the design value. For example, the discharge electrodes 202 and 204 have poor contact and the inductance L Disconnection, disconnection of wiring such as connection, disconnection (disconnection) of wiring, or increase in impedance caused by deterioration. Further, the power supply device 250 can be concluded that the abnormality detection signal S ABN after an abnormality occurs, the abnormality may appear in the sign of the abnormality detection signal to determine the phase of S ABN.

通知機構610將基於異常檢測器600之異常檢測通知給外部。例如,通知機構610亦可為蜂鳴器和燈、顯示器等直接通知給使用者的通知機構。The notification mechanism 610 notifies the outside of the abnormality detection based on the abnormality detector 600. For example, the notification mechanism 610 may also be a notification mechanism that directly notifies the user such as a buzzer, a lamp, or a display.

或者,通知機構610亦可為與控制蜂鳴器、燈、顯示器之系統側的控制器連接之介面。此時,通知機構610亦可間接地向使用者通知異常的發生。在此時,系統側的控制器將異常發生的通知作為觸發而能夠在適當的時序實施適當的保護處理。Alternatively, the notification mechanism 610 may also be an interface connected to a controller on the system side that controls a buzzer, a lamp, and a display. At this time, the notification mechanism 610 may also indirectly notify the user of the occurrence of the abnormality. At this time, the controller on the system side uses the notification of the occurrence of the abnormality as a trigger to implement appropriate protection processing at an appropriate timing.

以上為電源裝置250的基本構成。接著對其動作進行說明。The above is the basic configuration of the power supply device 250. Next, the operation will be described.

若雷射裝置100中發生異常(或者其預兆),則異常檢測器600斷定異常檢測訊號SABN 並打開開關SW1。藉此,過電壓抑制電路500與高頻電源400連接而過電壓抑制電路500所連接之節點之間的過電壓得到抑制。If an abnormality (or a sign) occurs in the laser device 100, the abnormality detector 600 determines the abnormality detection signal S ABN and turns on the switch SW1. Thereby, the overvoltage suppression circuit 500 is connected to the high-frequency power supply 400, and the overvoltage between the nodes to which the overvoltage suppression circuit 500 is connected is suppressed.

另一方面,在雷射裝置100為正常的狀態下,異常檢測器600否定異常檢測訊號SABN 並關閉開關SW1。因此,過電壓抑制電路500自高頻電源400斷開。On the other hand, when the laser device 100 is in a normal state, the abnormality detector 600 negates the abnormality detection signal S ABN and closes the switch SW1. Therefore, the overvoltage suppression circuit 500 is disconnected from the high-frequency power supply 400.

以上為電源裝置250的動作。依該電源裝置250,藉由設置過電壓抑制電路500,在共振電路210的共振頻率fRES 大大偏離設計值時,能夠抑制過電壓,從而能夠保護包括於高頻電源400等中之半導體元件。還有,在不產生過電壓之狀況下,藉由預先關閉開關SW1,能夠防止洩漏電流流過過電壓抑制電路500,從而能夠抑制由洩漏電流引起之干擾。The above is the operation of the power supply device 250. According to the power supply device 250, by providing the overvoltage suppression circuit 500, when the resonance frequency f RES of the resonance circuit 210 greatly deviates from the design value, the overvoltage can be suppressed, and the semiconductor components included in the high frequency power supply 400 and the like can be protected. Also, by closing the switch SW1 in advance under the condition that no overvoltage is generated, it is possible to prevent leakage current from flowing through the overvoltage suppression circuit 500, thereby suppressing interference caused by the leakage current.

本發明係作為圖2的方塊圖或電路圖來掌握或者涉及源於上述說明之各種裝置、方法者,並非係限定於特定結構者。以下,並非為了限縮本發明的範圍,而是為了有助於理解發明的本質或動作並且明確該等,對更具體的構成例或實施例進行說明。The present invention is grasped as the block diagram or circuit diagram of FIG. 2 or related to various devices and methods derived from the above description, and is not limited to a specific structure. Hereinafter, not to limit the scope of the present invention, but to help understand the essence or action of the present invention and clarify the same, more specific configuration examples or embodiments are described.

‧關於異常檢測器600 若異常檢測器600的檢測速度慢,則開關SW1的開啟被延遲,在延遲期間產生過電壓,從而並不較佳。因此,對異常檢測器600要求比過電壓抑制電路500應有效操作之時序(亦即,實際上產生過電壓之時序)更早地斷定異常檢測訊號SABN 。其中,以下對高速的異常檢測器600進行說明。‧About the abnormality detector 600 If the detection speed of the abnormality detector 600 is slow, the opening of the switch SW1 is delayed, and overvoltage is generated during the delay period, which is not preferable. Therefore, it is required for the abnormality detector 600 to determine the abnormality detection signal S ABN earlier than the timing at which the overvoltage suppression circuit 500 should operate effectively (that is, the timing at which the overvoltage is actually generated). Among them, the high-speed abnormality detector 600 will be described below.

圖3(a)、圖3(b)為表示異常檢測器600的構成例之電路圖。雷射共振器200被金屬的框體(氣體腔室)220覆蓋,框體220經由接地線222接地。3(a) and 3(b) are circuit diagrams showing examples of the configuration of the abnormality detector 600. FIG. The laser resonator 200 is covered by a metal housing (gas chamber) 220, and the housing 220 is grounded via a ground wire 222.

圖3(a)的異常檢測器600依據流過接地線222之電流Ix來判定有無異常。更具體而言,若流過接地線之電流Ix的振幅超過既定的臨界值,則能夠判定為異常。The abnormality detector 600 of FIG. 3(a) determines whether there is an abnormality based on the current Ix flowing through the ground wire 222. More specifically, if the amplitude of the current Ix flowing through the ground wire exceeds a predetermined critical value, it can be determined as abnormal.

圖3(b)的異常檢測器600依據框體220的接地(Grounding)電位Vx來判定有無異常。更具體而言,若電位Vx的振幅超過既定的臨界值,則能夠判定為異常。The abnormality detector 600 of FIG. 3(b) determines whether there is an abnormality based on the grounding potential Vx of the housing 220. More specifically, if the amplitude of the potential Vx exceeds a predetermined critical value, it can be determined to be abnormal.

以上為異常檢測器600的構成例。接著,對異常檢測器600的動作原理進行說明。在放電電極202和框體220之間、放電電極204和框體220之間存在寄生電容Cp。雷射共振器200為正常時,所設計之共振頻率fRES 的電流流過雷射共振器200(電極202、204之間)而能夠忽略寄生電容Cp的影響。此時,流過寄生電容Cp及接地線222之電流Ix實質上為零,並且框體220的電位Vx實質上與接地電壓相等。The above is an example of the configuration of the abnormality detector 600. Next, the operating principle of the abnormality detector 600 will be described. Parasitic capacitance Cp exists between the discharge electrode 202 and the frame 220 and between the discharge electrode 204 and the frame 220. When the laser resonator 200 is normal, the current of the designed resonance frequency f RES flows through the laser resonator 200 (between the electrodes 202 and 204), and the influence of the parasitic capacitance Cp can be ignored. At this time, the current Ix flowing through the parasitic capacitance Cp and the ground line 222 is substantially zero, and the potential Vx of the frame 220 is substantially equal to the ground voltage.

若與放電電極202或放電電極204連接之配線斷線或者阻抗增大,則共振電路210的共振頻率變得高於設計值,從而高頻的電流流過。高頻的電流經由電容值小的寄生電容Cp流過接地線222。藉此,框體220的電位Vx成為非零。If the wiring connected to the discharge electrode 202 or the discharge electrode 204 is disconnected or the impedance increases, the resonance frequency of the resonance circuit 210 becomes higher than the design value, and a high-frequency current flows. The high-frequency current flows through the ground line 222 via the parasitic capacitance Cp having a small capacitance value. Thereby, the potential Vx of the frame 220 becomes non-zero.

依圖3(a)、圖3(b)的異常檢測器600,能夠高速檢測共振電路210的共振頻率的位移,從而能夠在電源裝置250的內部實際上產生過電壓之前(或者即使已經產生亦立即)開啟開關SW1。According to the abnormality detector 600 of Fig. 3(a) and Fig. 3(b), the displacement of the resonance frequency of the resonant circuit 210 can be detected at a high speed, so that the overvoltage can be actually generated inside the power supply device 250 (or even if it has already been generated). Immediately) Turn on switch SW1.

再者,異常檢測器600的異常檢測的方法並不限定於此。亦可嚴格地設定異常判定的臨界值來代替使用響應性低的方式。In addition, the method of abnormality detection by the abnormality detector 600 is not limited to this. Instead of using a method with low responsiveness, the critical value for abnormality determination may be strictly set.

圖4(a)~圖4(d)為表示過電壓抑制電路500的構成例之電路圖。圖4(a)的過電壓抑制電路500包括氣體避雷器502。若氣體避雷器502的端子之間的電壓超過動作開始電壓,則氣體避雷器502成為短路狀態,過電壓抑制電路500的兩端之間的電壓ΔV得到抑制。4(a) to 4(d) are circuit diagrams showing configuration examples of the overvoltage suppression circuit 500. FIG. The overvoltage suppression circuit 500 of FIG. 4(a) includes a gas arrester 502. If the voltage between the terminals of the gas arrester 502 exceeds the operation start voltage, the gas arrester 502 enters a short-circuit state, and the voltage ΔV between both ends of the overvoltage suppression circuit 500 is suppressed.

其中,過電壓抑制電路500的兩端之間的電容小於一對放電電極的電容的1/5為較佳。其原因在於,若過電壓抑制電路500的電容過大,則導致使共振電路210的共振頻率fRES 位移,從而對電路動作帶來影響。在該觀點下,如圖4(a)所示,若由氣體避雷器502單體構成過電壓抑制電路500,則存在電容過大之情況。Among them, the capacitance between the two ends of the overvoltage suppression circuit 500 is preferably less than 1/5 of the capacitance of a pair of discharge electrodes. The reason is that if the capacitance of the overvoltage suppression circuit 500 is too large, the resonance frequency f RES of the resonance circuit 210 is shifted, which affects the circuit operation. From this point of view, as shown in FIG. 4(a), if the overvoltage suppression circuit 500 is composed of a single gas arrester 502, the capacitance may be too large.

這樣的情況下,如圖4(b)所示,串聯連接複數個過電壓抑制元件(突波保護元件)即可。藉此,過電壓抑制電路500的兩端之間的電容成為複數個過電壓抑制元件各自的電容的合成電容,因此能夠設為小於各個過電壓抑制元件的電容。In such a case, as shown in FIG. 4(b), a plurality of overvoltage suppression elements (surge protection elements) may be connected in series. Thereby, the capacitance between both ends of the overvoltage suppression circuit 500 becomes a combined capacitance of the respective capacitances of the plurality of overvoltage suppression elements, and therefore can be made smaller than the capacitance of each overvoltage suppression element.

更詳細而言,圖4(b)的過電壓抑制電路500包括串聯連接之氣體避雷器502和變阻器504。該構成中,若向過電壓抑制電路500的兩端之間施加高電壓ΔV,則氣體避雷器502的端子之間的電壓超過動作開始電壓而成為短路狀態,而高電壓ΔV施加於變阻器504。其結果,電流根據變阻器504的I-V特性而流動,從而能夠抑制高電壓ΔV。能夠使用一般過電壓抑制元件來代替變阻器504,例如亦可使用SPD(氧化鋅型避雷器)或瞬變吸收器(transorb)。In more detail, the overvoltage suppression circuit 500 of FIG. 4(b) includes a gas arrester 502 and a varistor 504 connected in series. In this configuration, when a high voltage ΔV is applied between both ends of the overvoltage suppression circuit 500, the voltage between the terminals of the gas arrester 502 exceeds the operation start voltage and becomes a short-circuit state, and the high voltage ΔV is applied to the varistor 504. As a result, the current flows according to the I-V characteristic of the varistor 504, and the high voltage ΔV can be suppressed. A general overvoltage suppression element can be used instead of the varistor 504, for example, an SPD (Zinc Oxide Lightning Arrester) or a transient absorber (transorb) can also be used.

圖4(a)、圖4(b)的過電壓抑制電路500係響應於過電壓而進行動作者,但並不限定於此,過電壓抑制電路500亦可為預防產生雷射共振器200的開放異常狀態下的過電壓之電路。更具體而言,過電壓抑制電路500在同步頻率fRF 下,相比共振電路210為充分高的高阻抗,在高於同步頻率fRF 的頻率下,亦可具有較低的阻抗。圖4(c)的過電壓抑制電路500包括電容器506。電容器506的電容為一對放電電極202、204的電容的1/5以下,較佳為1/10以下。即使發生開放異常,該電容器506作為負載而殘留,因此能夠防止共振頻率變得過高,從而能夠抑制過電壓。The overvoltage suppression circuit 500 of FIGS. 4(a) and 4(b) operates in response to overvoltage, but it is not limited to this. The overvoltage suppression circuit 500 can also be used to prevent the generation of the laser resonator 200 Open the circuit of overvoltage in abnormal state. More specifically, at the synchronous frequency f RF , the overvoltage suppression circuit 500 has a sufficiently higher impedance than the resonance circuit 210, and can also have a lower impedance at a frequency higher than the synchronous frequency f RF. The overvoltage suppression circuit 500 of FIG. 4(c) includes a capacitor 506. The capacitance of the capacitor 506 is 1/5 or less of the capacitance of the pair of discharge electrodes 202 and 204, preferably 1/10 or less. Even if an open abnormality occurs, the capacitor 506 remains as a load, so it is possible to prevent the resonance frequency from becoming too high, and it is possible to suppress overvoltage.

圖4(d)的過電壓抑制電路500包括LCR負載電路。即使成為開放狀態,亦能夠藉由LCR負載防止共振頻率變得過高,從而能夠抑制過電壓。The overvoltage suppression circuit 500 of FIG. 4(d) includes an LCR load circuit. Even in an open state, the LCR load can prevent the resonance frequency from becoming too high, thereby suppressing overvoltage.

再者,過電壓抑制電路500亦可為並聯連接例示於圖4(a)~圖4(d)之若干電路的結構。Furthermore, the overvoltage suppression circuit 500 may also be a structure in which several circuits illustrated in FIGS. 4(a) to 4(d) are connected in parallel.

圖5為表示電源裝置250的具體的構成例之電路圖。向雷射裝置100輸入指示發光期間(激勵期間)與停止期間之控制訊號(激勵訊號)S1,依據激勵訊號S1進行間歇動作。例如,激勵訊號S1為數kHz左右的重複頻率、佔空比5%左右的脈衝訊號。FIG. 5 is a circuit diagram showing a specific configuration example of the power supply device 250. As shown in FIG. A control signal (excitation signal) S1 indicating a light-emitting period (excitation period) and a stop period is input to the laser device 100, and an intermittent operation is performed according to the excitation signal S1. For example, the excitation signal S1 is a pulse signal with a repetition frequency of about several kHz and a duty ratio of about 5%.

高頻電源400具備H橋接電路(全橋電路)402及升壓變壓器404。高頻電源400具備2個H橋接電路402與升壓變壓器404的組401的系統,該等被並聯連接。當然,亦可以僅由1個系統構成該組401。激勵訊號S1指示激勵區間之位準(例如高位準)時,H橋接電路402進行開關,並向升壓變壓器404的1次繞組施加交流電壓VAC 。H橋接電路402的開關頻率為同步頻率fRF ,例如設定為2MHz左右。其結果,在升壓變壓器404的2次繞組中產生使交流電壓VAC 升壓之高頻電壓VRFThe high-frequency power supply 400 includes an H-bridge circuit (full-bridge circuit) 402 and a step-up transformer 404. The high-frequency power supply 400 includes a system of a group 401 of two H-bridge circuits 402 and a step-up transformer 404, and these are connected in parallel. Of course, the group 401 may be constituted by only one system. When the excitation signal S1 indicates the level of the excitation interval (for example, the high level), the H bridge circuit 402 switches and applies an AC voltage V AC to the primary winding of the step-up transformer 404. The switching frequency of the H-bridge circuit 402 is the synchronization frequency f RF , and is set to about 2 MHz, for example. As a result, the high-frequency voltage V RF that boosts the AC voltage V AC is generated in the secondary winding of the step-up transformer 404.

直流電源300包括電容器組302及充電電路304。電容器組302設置在DC鏈306之間。充電電路304對電容器組302進行充電,恆定地保持電容器組302的電壓VDCThe DC power supply 300 includes a capacitor bank 302 and a charging circuit 304. The capacitor bank 302 is provided between the DC links 306. The charging circuit 304 charges the capacitor bank 302 and constantly maintains the voltage V DC of the capacitor bank 302.

在激勵區間時,H橋接電路402進行開關動作,藉此釋放儲存在電容器組302之能量(電荷),直流電壓VDC 的電壓位準下降。充電電路304向電容器組302供給充電電流,以便補償直流電壓VDC 的電壓位準的下降。亦即,直流電源300亦與激勵訊號S1同步而進行間歇動作。During the excitation interval, the H-bridge circuit 402 performs a switching action, thereby releasing the energy (charge) stored in the capacitor bank 302, and the voltage level of the DC voltage V DC drops. The charging circuit 304 supplies a charging current to the capacitor bank 302 to compensate for the drop in the voltage level of the DC voltage V DC. That is, the DC power supply 300 also performs intermittent operation in synchronization with the excitation signal S1.

再者,亦可由還包括激勵期間而穩定地進行動作之DC/DC轉換器構成直流電源300。Furthermore, the DC power supply 300 may also be constituted by a DC/DC converter that also includes an excitation period and operates stably.

(用途) 接著,對雷射裝置100的用途進行說明。圖6為表示具備雷射裝置100之雷射加工裝置900之圖。雷射加工裝置900對對象物902照射雷射脈衝904,而對對象物902進行加工。對象物902的種類並無特別限定,並且加工的種類亦例示有打孔(鑽孔)、切斷等,但並不限定於此。(use) Next, the use of the laser device 100 will be described. FIG. 6 is a diagram showing a laser processing device 900 equipped with the laser device 100. As shown in FIG. The laser processing device 900 irradiates the target 902 with laser pulses 904 to process the target 902. The type of the object 902 is not particularly limited, and the type of processing includes punching (drilling), cutting, etc., but it is not limited to this.

雷射加工裝置900具備雷射裝置100、光學系統910、控制裝置920、載台930。對象物902載置於載台930上,並根據需要進行固定。載台930根據來自控制裝置920的位置控制訊號S2定位對象物902,並相對地掃描對象物902與雷射脈衝904的照射位置。載台930能夠為1軸、2軸(XY)或3軸(XYZ)。The laser processing device 900 includes a laser device 100, an optical system 910, a control device 920, and a stage 930. The object 902 is placed on the stage 930 and fixed as necessary. The stage 930 positions the object 902 according to the position control signal S2 from the control device 920, and scans the object 902 and the irradiation position of the laser pulse 904 relatively. The stage 930 can be 1-axis, 2-axis (XY), or 3-axis (XYZ).

雷射裝置100根據來自控制裝置920的觸發訊號(激勵訊號)S1進行振蕩而產生雷射脈衝906。光學系統910對對象物902照射雷射脈衝906。光學系統910的構成並無特別限定,能夠包括用於將射束導入到對象物902的反射鏡組、用於射束整形的透鏡或孔徑等。The laser device 100 oscillates according to the trigger signal (excitation signal) S1 from the control device 920 to generate a laser pulse 906. The optical system 910 irradiates the target 902 with laser pulses 906. The configuration of the optical system 910 is not particularly limited, and can include a mirror group for guiding the beam to the object 902, a lens or an aperture for beam shaping, and the like.

控制裝置920統括控制雷射加工裝置900。具體而言,控制裝置920對雷射裝置100間歇地輸出激勵訊號S1。又,控制裝置920生成用於根據記述加工處理之資料(配方)控制載台930的位置控制訊號S2。The control device 920 collectively controls the laser processing device 900. Specifically, the control device 920 outputs the excitation signal S1 to the laser device 100 intermittently. In addition, the control device 920 generates a position control signal S2 for controlling the stage 930 based on the data (recipe) describing the processing.

以上,依據實施方式對本發明進行了說明。該實施方式為例示,能夠依該等各構成要件或各處理製程的組合形成各種變形例,並且該些變形例亦在本發明的範圍內,被本領域技術人員理解。以下,對該些變形例進行說明。In the foregoing, the present invention has been described based on the embodiments. This embodiment is an example, and various modifications can be formed according to the combination of the constituent elements or the processing processes, and these modifications are also within the scope of the present invention and are understood by those skilled in the art. Hereinafter, these modified examples will be described.

對關於過電壓抑制電路的配置的若干變形例進行說明。圖2中,過電壓抑制電路500連接於H橋接電路402與升壓變壓器404之間,但並不限定於此。圖7(a)、圖7(b)為表示過電壓抑制電路500的配置的變形例之圖。Several modifications regarding the configuration of the overvoltage suppression circuit will be described. In FIG. 2, the overvoltage suppression circuit 500 is connected between the H-bridge circuit 402 and the step-up transformer 404, but it is not limited to this. FIGS. 7(a) and 7(b) are diagrams showing modified examples of the arrangement of the overvoltage suppression circuit 500. FIG.

如圖7(a)所示,亦可將過電壓抑制電路500及開關SW1設置在高頻電源400的輸出節點亦即升壓變壓器404的2次側。藉此,2次側的電壓VRF的過電壓得到抑制,進而能夠抑制1次側的過電壓。As shown in FIG. 7(a), the overvoltage suppression circuit 500 and the switch SW1 can also be provided on the output node of the high-frequency power supply 400, that is, on the secondary side of the step-up transformer 404. Thereby, the overvoltage of the voltage VRF on the secondary side is suppressed, and furthermore, the overvoltage on the primary side can be suppressed.

如圖7(b)所示,亦可將過電壓抑制電路500及開關SW1的組與構成H橋接電路402之開關(電晶體)MH、ML各自並聯設置。As shown in FIG. 7(b), the set of the overvoltage suppression circuit 500 and the switch SW1 and the switches (transistors) MH and ML constituting the H-bridge circuit 402 may be respectively arranged in parallel.

亦可將過電壓抑制電路500及開關SW1設置在雷射共振器200側。The overvoltage suppression circuit 500 and the switch SW1 can also be provided on the laser resonator 200 side.

亦對基於異常檢測器之異常檢測方法的若干變形例進行說明。Several modifications of the abnormality detection method based on the abnormality detector are also described.

異常檢測器亦可依據有無雷射裝置的輸出光來判定異常。亦可在雷射裝置不發光時(或者光量下降時),判定為異常。The abnormality detector can also determine abnormalities based on the presence or absence of the output light of the laser device. When the laser device does not emit light (or when the amount of light decreases), it can be judged as abnormal.

異常檢測器亦可依據共振頻率的電流成分來判定異常。亦可在監視流過負載(共振電路)或高頻電源的輸出端之電流,且從檢測值提取共振頻率的成分,共振頻率的電流較小時,判定為異常。The abnormality detector can also determine the abnormality based on the current component of the resonance frequency. It is also possible to monitor the current flowing through the load (resonance circuit) or the output terminal of the high-frequency power supply, and extract the components of the resonance frequency from the detected value. If the current at the resonance frequency is small, it is judged as abnormal.

異常檢測器亦可依據除了共振頻率以外的電流成分來判定異常。亦可在監視流過負載(共振電路)或高頻電源的輸出端之電流,且從檢測值提取除了共振頻率以外的成分,共振頻率以外的電流較大時,判定為異常。The abnormality detector can also determine abnormalities based on current components other than the resonance frequency. It is also possible to monitor the current flowing through the load (resonance circuit) or the output terminal of the high-frequency power supply, and extract components other than the resonance frequency from the detected value. When the current other than the resonance frequency is large, it is determined to be abnormal.

異常檢測器亦可依據發射後高頻電源的輸入電壓的下降幅度來判定異常。若雷射正常發光,則儲存在直流電源的輸出電容器(電容器組)之電荷被放電,直流電壓下降。因此,監視電容器組的電壓,電壓下降幅度小時,能夠判定為異常。The abnormality detector can also determine the abnormality based on the drop range of the input voltage of the high-frequency power supply after transmission. If the laser emits normally, the charge stored in the output capacitor (capacitor bank) of the DC power supply is discharged and the DC voltage drops. Therefore, by monitoring the voltage of the capacitor bank, if the voltage drop width is small, it can be judged as abnormal.

異常檢測器亦可依據比共振頻率高頻率的干擾來判定異常。電流成為高頻時,高頻的輻射干擾或傳導干擾增加。利用天線檢測該干擾,當增加了干擾時,能夠判定為異常。The anomaly detector can also determine anomalies based on interference at a frequency higher than the resonance frequency. When the current becomes a high frequency, high-frequency radiation interference or conduction interference increases. The antenna is used to detect the interference, and when the interference increases, it can be judged as abnormal.

異常檢測器亦可依據一對放電電極之間的電壓來判定異常。雖然施加有高頻電壓,但在共振電路的兩端之間未檢測到充分的電壓時,能夠判定為異常。The abnormality detector can also determine abnormality based on the voltage between a pair of discharge electrodes. Although a high-frequency voltage is applied, when a sufficient voltage is not detected between both ends of the resonance circuit, it can be judged as abnormal.

根據實施方式,使用具體的語句對本發明進行了說明,但實施方式僅表示本發明的原理、應用的一方面,實施方式中,在不脫離技術方案中規定之本發明的思想之範圍內,允許多個變形例或配置的變更。According to the embodiment, the present invention has been described using specific sentences, but the embodiment only represents one aspect of the principle and application of the present invention. In the embodiment, within the scope of the idea of the present invention specified in the technical solution, it is allowed Multiple modifications or configuration changes.

100:雷射裝置 200:雷射共振器 202、204:放電電極 206:全反射鏡 208:部分反射鏡 210:共振電路 250:電源裝置 300:直流電源 302:電容器組 304:充電電路 400:高頻電源 402:H橋接電路 404:升壓變壓器 500:過電壓抑制電路 502:氣體避雷器 504:變阻器 600:異常檢測器 610:通知機構100: Laser device 200: Laser resonator 202, 204: discharge electrode 206: Total reflection mirror 208: Partial reflector 210: Resonance circuit 250: power supply unit 300: DC power supply 302: Capacitor Bank 304: charging circuit 400: high frequency power supply 402: H bridge circuit 404: step-up transformer 500: Overvoltage suppression circuit 502: Gas arrester 504: Varistor 600: Anomaly Detector 610: Notifying Agency

圖1為雷射裝置的方塊圖。 圖2為有關實施方式之雷射裝置的方塊圖。 圖3中,圖3(a)、圖3(b)為表示異常檢測器的構成例之電路圖。 圖4中,圖4(a)~圖4(d)為表示過電壓抑制電路的構成例之電路圖。 圖5為表示電源裝置的具體的構成例之電路圖。 圖6為表示具備雷射裝置之雷射加工裝置之圖。 圖7中,圖7(a)、圖7(b)為表示過電壓抑制電路的配置的變形例之圖。Figure 1 is a block diagram of the laser device. Fig. 2 is a block diagram of a laser device according to an embodiment. In Fig. 3, Figs. 3(a) and 3(b) are circuit diagrams showing configuration examples of an abnormality detector. In Fig. 4, Figs. 4(a) to 4(d) are circuit diagrams showing configuration examples of an overvoltage suppression circuit. Fig. 5 is a circuit diagram showing a specific configuration example of the power supply device. Fig. 6 is a diagram showing a laser processing device equipped with a laser device. In Fig. 7, Figs. 7(a) and 7(b) are diagrams showing modified examples of the arrangement of the overvoltage suppression circuit.

200:雷射共振器 200: Laser resonator

202、204:放電電極 202, 204: discharge electrode

210:共振電路 210: Resonance circuit

250:電源裝置 250: power supply unit

300:直流電源 300: DC power supply

310:DC鏈 310: DC chain

400:高頻電源 400: high frequency power supply

402:H橋接電路 402: H bridge circuit

404:升壓變壓器 404: step-up transformer

500:過電壓抑制電路 500: Overvoltage suppression circuit

600:異常檢測器 600: Anomaly Detector

610:通知機構 610: Notifying Agency

C:電容 C: Capacitance

L:電感 L: Inductance

R:電阻成分 R: Resistance component

SABN:異常檢測訊號 S ABN : Abnormal detection signal

SW1:開關 SW1: switch

VDC:直流電壓(DC鏈電壓) V DC : DC voltage (DC link voltage)

VRF:高頻電壓 V RF : high frequency voltage

Claims (5)

一種電源裝置,係驅動包括一對放電電極之雷射共振器,其特徵為,具備: 高頻電源,其係向包括前述一對放電電極的電容之共振電路施加高頻電壓; 過電壓抑制電路,其係抑制前述共振電路的兩端之間或者前述高頻電源的內部節點的過電壓; 開關,其係與前述過電壓抑制電路串聯設置;及 異常檢測器,其係若檢測到異常,則打開前述開關。A power supply device that drives a laser resonator including a pair of discharge electrodes, and is characterized in that it has: High-frequency power supply, which applies high-frequency voltage to the resonant circuit including the capacitor of the aforementioned pair of discharge electrodes; Overvoltage suppression circuit, which suppresses the overvoltage between the two ends of the aforementioned resonance circuit or the internal node of the aforementioned high-frequency power supply; A switch, which is arranged in series with the aforementioned overvoltage suppression circuit; and The abnormality detector turns on the aforementioned switch if an abnormality is detected. 如申請專利範圍第1項所述之電源裝置,其中, 前述雷射共振器的框體經由接地線接地; 前述異常檢測器依據流過前述接地線之電流來檢測前述異常。The power supply device as described in item 1 of the scope of patent application, wherein: The frame of the aforementioned laser resonator is grounded via a ground wire; The abnormality detector detects the abnormality based on the current flowing through the ground wire. 如申請專利範圍第1項所述之電源裝置,其中, 前述雷射共振器的框體經由接地線接地, 前述異常檢測器依據前述框體的電位來檢測前述異常。The power supply device as described in item 1 of the scope of patent application, wherein: The frame of the aforementioned laser resonator is grounded via a ground wire, The abnormality detector detects the abnormality based on the potential of the housing. 如申請專利範圍第1至3項中任一項所述之電源裝置,其中還具備: 通知機構,其係若前述異常檢測器檢測到異常,則通知給外部。Such as the power supply device described in any one of items 1 to 3 in the scope of patent application, which also has: The notification mechanism is to notify the outside if the abnormality detector detects an abnormality. 如申請專利範圍第1至3項中任一項所述之電源裝置,其中, 前述高頻電源包括: 逆變器;及 變壓器,其係具有與前述逆變器的輸出端連接之1次繞組及與前述雷射共振器連接之2次繞組; 前述過電壓抑制電路與前述變壓器的1次繞組連接。The power supply device described in any one of items 1 to 3 in the scope of patent application, wherein: The aforementioned high-frequency power supplies include: Inverter; and A transformer having a primary winding connected to the output terminal of the aforementioned inverter and a secondary winding connected to the aforementioned laser resonator; The overvoltage suppression circuit is connected to the primary winding of the transformer.
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