TWI709595B - 聚矽氧聚合物之製造方法 - Google Patents
聚矽氧聚合物之製造方法 Download PDFInfo
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- TWI709595B TWI709595B TW106100663A TW106100663A TWI709595B TW I709595 B TWI709595 B TW I709595B TW 106100663 A TW106100663 A TW 106100663A TW 106100663 A TW106100663 A TW 106100663A TW I709595 B TWI709595 B TW I709595B
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- Prior art keywords
- acid
- silane
- polysiloxane polymer
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- -1 polysiloxane Polymers 0.000 title claims abstract description 170
- 229920000642 polymer Polymers 0.000 title claims abstract description 94
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 90
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 41
- 150000007524 organic acids Chemical class 0.000 claims abstract description 51
- 150000001875 compounds Chemical class 0.000 claims abstract description 44
- 229920005573 silicon-containing polymer Polymers 0.000 claims abstract description 36
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 60
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 30
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 21
- 238000006482 condensation reaction Methods 0.000 claims description 21
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 20
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 16
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 15
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 14
- 125000005395 methacrylic acid group Chemical group 0.000 claims description 12
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 12
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 12
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 9
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 9
- 239000011976 maleic acid Substances 0.000 claims description 9
- NWOCYUUCGHLIEG-UHFFFAOYSA-N trimethoxy-[(4-methoxyphenyl)methyl]silane Chemical compound COC1=CC=C(C[Si](OC)(OC)OC)C=C1 NWOCYUUCGHLIEG-UHFFFAOYSA-N 0.000 claims description 9
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 8
- 239000004215 Carbon black (E152) Substances 0.000 claims description 7
- 239000001530 fumaric acid Substances 0.000 claims description 7
- 229930195733 hydrocarbon Natural products 0.000 claims description 7
- 150000002430 hydrocarbons Chemical group 0.000 claims description 7
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 claims description 6
- 235000006408 oxalic acid Nutrition 0.000 claims description 6
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 claims description 5
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims description 5
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 claims description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 3
- 239000003513 alkali Substances 0.000 abstract description 19
- 238000003860 storage Methods 0.000 abstract description 6
- 230000007774 longterm Effects 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 23
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 21
- 238000003786 synthesis reaction Methods 0.000 description 21
- 239000002585 base Substances 0.000 description 16
- 238000006460 hydrolysis reaction Methods 0.000 description 16
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 15
- 230000007062 hydrolysis Effects 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- 229910000077 silane Inorganic materials 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 13
- 239000007787 solid Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 10
- 238000005342 ion exchange Methods 0.000 description 10
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 238000000926 separation method Methods 0.000 description 8
- 125000005372 silanol group Chemical group 0.000 description 8
- YEMJITXWLIHJHJ-UHFFFAOYSA-N di(propan-2-yloxy)silane Chemical compound CC(C)O[SiH2]OC(C)C YEMJITXWLIHJHJ-UHFFFAOYSA-N 0.000 description 7
- SACPKRUZWRIEBW-UHFFFAOYSA-N dipropoxysilane Chemical compound CCCO[SiH2]OCCC SACPKRUZWRIEBW-UHFFFAOYSA-N 0.000 description 7
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 238000010992 reflux Methods 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 6
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 6
- 239000008096 xylene Substances 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 4
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 4
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 4
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 4
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 4
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- SHFJWMWCIHQNCP-UHFFFAOYSA-M hydron;tetrabutylazanium;sulfate Chemical compound OS([O-])(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC SHFJWMWCIHQNCP-UHFFFAOYSA-M 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 125000001360 methionine group Chemical group N[C@@H](CCSC)C(=O)* 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 4
- 125000005504 styryl group Chemical group 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 235000002906 tartaric acid Nutrition 0.000 description 4
- 239000011975 tartaric acid Substances 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000005711 Benzoic acid Substances 0.000 description 3
- YASYEJJMZJALEJ-UHFFFAOYSA-N Citric acid monohydrate Chemical compound O.OC(=O)CC(O)(C(O)=O)CC(O)=O YASYEJJMZJALEJ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000001361 adipic acid Substances 0.000 description 3
- 235000011037 adipic acid Nutrition 0.000 description 3
- 239000000010 aprotic solvent Substances 0.000 description 3
- 235000010233 benzoic acid Nutrition 0.000 description 3
- GQVVQDJHRQBZNG-UHFFFAOYSA-N benzyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CC1=CC=CC=C1 GQVVQDJHRQBZNG-UHFFFAOYSA-N 0.000 description 3
- FWHCICFSRKHJQE-UHFFFAOYSA-N benzyl-(2,2-dimethoxyethoxy)-ethoxysilane Chemical compound COC(CO[SiH](OCC)CC1=CC=CC=C1)OC FWHCICFSRKHJQE-UHFFFAOYSA-N 0.000 description 3
- ZPECUSGQPIKHLT-UHFFFAOYSA-N bis(ethenyl)-dimethoxysilane Chemical compound CO[Si](OC)(C=C)C=C ZPECUSGQPIKHLT-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 3
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 3
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 3
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 3
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229960004889 salicylic acid Drugs 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 3
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 3
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 3
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 3
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 3
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 3
- PCKKWAQWPDUAOD-UHFFFAOYSA-N (4-methoxyphenyl)methyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)CC1=CC=C(OC)C=C1 PCKKWAQWPDUAOD-UHFFFAOYSA-N 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- QYCGBAJADAGLLK-UHFFFAOYSA-N 1-(cyclohepten-1-yl)cycloheptene Chemical group C1CCCCC=C1C1=CCCCCC1 QYCGBAJADAGLLK-UHFFFAOYSA-N 0.000 description 2
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- 125000006176 2-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
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- DAJFVZRDKCROQC-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)CCCOCC1CO1 DAJFVZRDKCROQC-UHFFFAOYSA-N 0.000 description 2
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 2
- KBSDLBVPAHQCRY-UHFFFAOYSA-N 307496-19-1 Chemical group C1CC=CCC1CC[Si](O1)(O2)O[Si](O3)(C4CCCC4)O[Si](O4)(C5CCCC5)O[Si]1(C1CCCC1)O[Si](O1)(C5CCCC5)O[Si]2(C2CCCC2)O[Si]3(C2CCCC2)O[Si]41C1CCCC1 KBSDLBVPAHQCRY-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
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- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- BOACTKAMZOOEGM-UHFFFAOYSA-N C1(=CC=CC=C1)C(C1=CC=CC=C1)[SiH](OCC)OCC Chemical compound C1(=CC=CC=C1)C(C1=CC=CC=C1)[SiH](OCC)OCC BOACTKAMZOOEGM-UHFFFAOYSA-N 0.000 description 2
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- DGPFXVBYDAVXLX-UHFFFAOYSA-N dibutyl(diethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)CCCC DGPFXVBYDAVXLX-UHFFFAOYSA-N 0.000 description 1
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- VDXFKFNGIDWIQQ-UHFFFAOYSA-N diethoxy(dipentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)CCCCC VDXFKFNGIDWIQQ-UHFFFAOYSA-N 0.000 description 1
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- JXOHGGNKMLTUBP-JKUQZMGJSA-N shikimic acid Natural products O[C@@H]1CC(C(O)=O)=C[C@H](O)[C@@H]1O JXOHGGNKMLTUBP-JKUQZMGJSA-N 0.000 description 1
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- PJLHNSWILUSPNO-UHFFFAOYSA-M tetramethylazanium;thiocyanate Chemical compound [S-]C#N.C[N+](C)(C)C PJLHNSWILUSPNO-UHFFFAOYSA-M 0.000 description 1
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- GKXDJYKZFZVASJ-UHFFFAOYSA-M tetrapropylazanium;iodide Chemical compound [I-].CCC[N+](CCC)(CCC)CCC GKXDJYKZFZVASJ-UHFFFAOYSA-M 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- GNQQPTRATSISPA-UHFFFAOYSA-N triethoxy(2-ethylbutyl)silane Chemical group CCO[Si](OCC)(OCC)CC(CC)CC GNQQPTRATSISPA-UHFFFAOYSA-N 0.000 description 1
- ALVYUZIFSCKIFP-UHFFFAOYSA-N triethoxy(2-methylpropyl)silane Chemical compound CCO[Si](CC(C)C)(OCC)OCC ALVYUZIFSCKIFP-UHFFFAOYSA-N 0.000 description 1
- VBSUMMHIJNZMRM-UHFFFAOYSA-N triethoxy(2-phenylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC1=CC=CC=C1 VBSUMMHIJNZMRM-UHFFFAOYSA-N 0.000 description 1
- ILKWUBMCQXSBFE-UHFFFAOYSA-N triethoxy(3-phenylprop-2-enyl)silane Chemical compound CCO[Si](OCC)(OCC)CC=CC1=CC=CC=C1 ILKWUBMCQXSBFE-UHFFFAOYSA-N 0.000 description 1
- SHVOOORFDZIMDB-UHFFFAOYSA-N triethoxy(3-phenylpropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCC1=CC=CC=C1 SHVOOORFDZIMDB-UHFFFAOYSA-N 0.000 description 1
- FHVAUDREWWXPRW-UHFFFAOYSA-N triethoxy(pentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)OCC FHVAUDREWWXPRW-UHFFFAOYSA-N 0.000 description 1
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- UVHQNHAPYJVORK-UHFFFAOYSA-N trimethoxy(3-phenylpropyl)silane Chemical compound CO[Si](OC)(OC)CCCC1=CC=CC=C1 UVHQNHAPYJVORK-UHFFFAOYSA-N 0.000 description 1
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- JRSJRHKJPOJTMS-MDZDMXLPSA-N trimethoxy-[(e)-2-phenylethenyl]silane Chemical compound CO[Si](OC)(OC)\C=C\C1=CC=CC=C1 JRSJRHKJPOJTMS-MDZDMXLPSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- KKLAORVGAKUOPZ-UHFFFAOYSA-M trimethyl(phenyl)azanium;iodide Chemical compound [I-].C[N+](C)(C)C1=CC=CC=C1 KKLAORVGAKUOPZ-UHFFFAOYSA-M 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/32—Post-polymerisation treatment
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
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- Materials For Photolithography (AREA)
Abstract
本發明為一種聚矽氧聚合物之製造方法,其將特定的聚矽氧化合物,在鹼的存在下進行水解‧縮合反應後之相對於100重量份聚矽氧聚合物的有機酸的含量為0.0001重量份以上0.03重量份以下。
本發明之聚矽氧聚合物之製造方法,在聚矽氧聚合物的製造過程中於高溫下濃縮時,可抑制聚矽氧聚合物之分子量的增加。依本發明之聚矽氧聚合物之製造方法所製造的聚矽氧聚合物,即使經長時間保存,分子量的增加或黏度的變化亦小,保存穩定性優良。
Description
本發明係有關於一種聚矽氧聚合物之製造方法。
使用於液晶顯示元件或半導體元件等電子零件的電子材料需具有對可見光的穿透性高、可耐受製造元件時的各種處理步驟之耐熱性、耐藥品性、抗裂性等特性。聚矽氧聚合物由於具有對可見光的穿透性高、耐熱性佳等特性而備受矚目。
聚矽氧聚合物係藉由將水解性矽化合物在鹼的存在下進行水解、縮合反應後,藉由濃縮等去除溶媒或副產物來合成。於水解反應中,鍵結於矽原子的水解性取代基受到水解,而形成矽醇基。此矽醇基會進一步與其他的矽醇基或未反應的水解性基進行縮合反應而形成矽氧烷鍵。然後,此反應接連不斷地重複,而形成聚矽氧聚合物。以矽醇基而言,在縮合反應中,並非所有的矽醇基都會被消耗,而是在反應後仍有一部分的矽醇基殘留。若殘留此種反應性高的矽醇基,則在高溫下進行濃縮時矽醇基會進行縮合反應,與濃縮前的聚矽氧相比,因聚矽氧聚合物之分子量增加,而無法獲得具目標特性的聚矽氧聚合物。
為提升包含聚矽氧聚合物之組成物的穩定性,吾人進行各種研究。舉例來說,有人揭露一種對包含聚矽氧聚合物的組成物,添加相對於100重量份聚矽氧聚合物為0.1重量份以上的酸之方法(專利文獻1)。然而,於此方法中,所大量添加的酸,在製造元件時,已成致使聚矽氧聚合物的特性惡化之原因。又,此等方法由於係於聚矽氧聚合物的製造後添加酸,所以在聚矽氧聚合物的製造過程中於高溫下進行濃縮時,聚矽氧聚合物會發生變質,而無法獲得目標聚矽氧聚合物。
從而,便要求一種在製造元件時不會對聚矽氧聚合物的特性造成影響,而且,在聚矽氧聚合物的製造過程中於高溫下濃縮時,可抑制聚矽氧聚合物之分子量的增加的聚矽氧聚合物之製造方法。
專利文獻1 日本特開2010-112966號公報
本發明係提供一種在聚矽氧聚合物的製造過程中於高溫下濃縮時,可抑制聚矽氧聚合物之分子量的增加的方法。
本發明之聚矽氧聚合物之製造方法為一種將選自包含式(1)所示之化合物
R1R2Si(OR3)2 (1)
(式中,R1、R2表示烴基、環氧丙基、或、甲基丙烯醯基,R1、R2可為相同的基,亦可為不同的基,式中,R3表示烴基)、式(2)所示之化合物R4Si(OR5)3 (2)
(式中,R4表示烴基、環氧丙基、或、甲基丙烯醯基,R5表示烴基)、及式(3)所示之化合物Si(OR6)4 (3)
(式中,R6表示烴基)
之群組中的至少1種化合物,在鹼的存在下進行水解‧縮合反應後之相對於100重量份聚矽氧聚合物的有機酸的含量為0.0001重量份以上0.03重量份以下的聚矽氧聚合物之製造方法。
本發明之聚矽氧聚合物之製造方法,在聚矽氧聚合物的製造過程中於高溫下濃縮時,可抑制聚矽氧聚合物之分子量的增加。
本發明之聚矽氧聚合物之製造方法,在聚矽氧聚合物的製造過程中於高溫下濃縮時,可抑制聚矽氧聚合物對鹼溶液的溶解性的變化。
依本發明之聚矽氧聚合物之製造方法所製造的聚矽氧聚合物,即使經長時間保存,分子量的增加或黏度的變化亦小,保存穩定性優良。
依本發明之聚矽氧聚合物之製造方法所製造的聚矽氧聚合物係作為液晶顯示元件或半導體元件等電子零件的耐熱性材料等而有用。
依本發明之聚矽氧聚合物之製造方法所製造的聚矽氧聚合物可應用於塗料或接著劑等廣泛領域中。
本發明之聚矽氧聚合物之製造方法,其將選自包含式(1)所示之化合物R1R2Si(OR3)2 (1)
(式中,R1、R2表示烴基、環氧丙基、或、甲基丙烯醯基,R1、R2可為相同的基,亦可為不同的基,式中,R3表示烴基)、式(2)所示之化合物R4Si(OR5)3 (2)
(式中,R4表示烴基、環氧丙基、或、甲基丙烯醯基,式中,R5表示烴基)、及式(3)所示之化合物Si(OR6)4 (3)
(式中,R6表示烴基)
之群組中的至少1種化合物,在鹼的存在下進行水解‧縮合反應後之相對於100重量份聚矽氧聚合物的有機酸的含量為0.0001重量份以上0.03重量份以下。
式(1)所示之化合物R1R2Si((OR3)2 (1)
中,R1、R2表示烴基、環氧丙基、或、甲基丙烯醯基,R1、R2可為相同的有機基,亦可為不同的有機基。
作為烴基,較佳為碳數1~20之直鏈狀烴基、分支狀烴基、環狀烴基、芳香族烴基。
作為碳數1~20之直鏈狀烴基,較佳為甲基、乙基、乙烯基、正丙基、正丁基、正戊基。
作為分支狀烴基,較佳為異丙基、異丁基、二級丁基、三級丁基、2-乙基丁基、3-乙基丁基、2,2-二乙基丙基。
作為環狀烴基,較佳為環丙基、環丁基、環戊基、環己基、環己烯基、環己烯基乙基、環辛烯基、環戊二烯基、雙環庚烯基、雙環庚基、金剛烷基。
作為芳香族烴基,較佳為苯基、苯甲基、苯乙基、苯丙基、肉桂基、苯乙烯基、三苯甲基、甲苯甲醯基、萘基、異丙苯基、甲磺醯基、二甲苯基、甲氧基苯甲基。
此等烴基當中,更佳為甲基、乙基、乙烯基、正丙基、環丙基、環丁基、環戊基、環己基、金剛烷基、苯基、苯甲基、甲氧基苯甲基。
環氧丙基較佳為3-環氧丙氧基丙基或2-(3,4-環氧環己基)乙基。
甲基丙烯醯基較佳為3-甲基丙烯醯氧基丙基。
R3為烴基。
作為烴基,較佳為碳數1~20之直鏈狀烴基、分支狀烴基。
作為碳數1~20之直鏈狀烴基,較佳為甲基、乙基、正丙基。
作為分支狀烴基,較佳為異丙基等的烴基。
從而,作為式(1)所示之化合物的具體例,可舉出二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二甲基二正丙氧基矽烷、二甲基二異丙氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、二乙基二正丙氧基矽烷、二乙基二異丙氧基矽烷、二乙烯基二甲氧基矽烷、二乙烯基二乙氧基矽烷、二乙烯基二正丙氧基矽烷、二乙烯基二異丙氧基矽烷、二正丙基三甲氧基矽烷、二正丙基三乙氧基矽烷、二正丙基二正丙氧基矽烷、二正丙基二異丙氧基矽烷、二正丁基二甲氧基矽烷、二正丁基二乙氧基矽烷、二正丁基二正丙氧基矽烷、二正丁基二異丙氧基矽烷、二正戊基二甲氧基矽烷、二正戊基二乙氧基矽烷、二正戊基二正丙氧基矽烷、二正戊基二異丙氧基矽烷、二異丙基二甲氧基矽烷、二異丙基二乙氧基矽烷、二異丙基二正丙氧基矽烷、二異丙基二異丙氧基矽烷、二異丁基二甲氧基矽烷、二異丁基二乙氧基矽烷、二異丁基二正丙氧基矽烷、二異丁基二異丙氧基矽烷、二-二級丁基二甲氧基矽烷、二-二級丁基二乙氧基矽烷、二-二級丁基二正丙氧基矽烷、二-二級丁基二異丙氧基矽烷、二-三級丁基二甲氧基矽烷、二-三級丁基
二乙氧基矽烷、二-三級丁基二正丙氧基矽烷、二-三級丁基二異丙氧基矽烷、二-2-乙基丁基二甲氧基矽烷、二-2-乙基丁基二乙氧基矽烷、二-2-乙基丁基二正丙氧基矽烷、二-2-乙基丁基二異丙氧基矽烷、二-3-乙基丁基二甲氧基矽烷、二-3-乙基丁基二乙氧基矽烷、二-3-乙基丁基二正丙氧基矽烷、二-3-乙基丁基二異丙氧基矽烷、二-2,2-二乙基丙基二甲氧基矽烷、二-2,2-二乙基丙基二乙氧基矽烷、二-2,2-二乙基二正丙氧基矽烷、二-2,2-二乙基丙基二異丙氧基矽烷、二環丙基二甲氧基矽烷、二環丙基二乙氧基矽烷、二環丙基二正丙氧基矽烷、二環丙基二異丙氧基矽烷、二環丁基二甲氧基矽烷、二環丁基二乙氧基矽烷、二環丁基二正丙氧基矽烷、二環丁基二異丙氧基矽烷、二環戊基二甲氧基矽烷、二環戊基二乙氧基矽烷、二環戊基二正丙氧基矽烷、二環戊基二異丙氧基矽烷、二環己基二甲氧基矽烷、二環己基二乙氧基矽烷、二環己基二正丙氧基矽烷、二環己基二異丙氧基矽烷、二環己烯基二甲氧基矽烷、二環己烯基二乙氧基矽烷、二環己烯基二正丙氧基矽烷、二環己烯基二異丙氧基矽烷、二環己烯基乙基二甲氧基矽烷、二環己烯基乙基二乙氧基矽烷、二環己烯基乙基二正丙氧基矽烷、二環己烯基乙基二異丙氧基矽烷、二環辛烯基二甲氧基矽烷、二環辛烯基二乙氧基矽烷、二環辛烯基二正丙氧基矽烷、二環辛烯基二異丙氧基矽烷、二環戊二烯基丙基二甲氧基矽烷、二環戊二烯基丙基二乙氧基矽烷、二環戊二烯基丙基二正丙氧基矽烷、二環戊二烯基丙基二
異丙氧基矽烷、二雙環庚烯基二甲氧基矽烷、二雙環庚烯基二乙氧基矽烷、二雙環庚烯基二正丙氧基矽烷、二雙環庚烯基二異丙氧基矽烷、二雙環庚基二甲氧基矽烷、二雙環庚基二乙氧基矽烷、二雙環庚基二正丙氧基矽烷、二雙環庚基二異丙氧基矽烷、二金剛烷基二甲氧基矽烷、二金剛烷基二乙氧基矽烷、二金剛烷基二正丙氧基矽烷、二金剛烷基二異丙氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷、二苯基二正丙氧基矽烷、二苯基二異丙氧基矽烷、二苯甲基二甲氧基矽烷、二苯甲基二乙氧基矽烷、二苯甲基二正丙氧基矽烷、二苯甲基二異丙氧基矽烷、二苯乙基二甲氧基矽烷、二苯乙基二乙氧基矽烷、二苯乙基二正丙氧基矽烷、二苯乙基二異丙氧基矽烷、二苯丙基二甲氧基矽烷、二苯丙基二乙氧基矽烷、二苯丙基二正丙氧基矽烷、二苯丙基二異丙氧基矽烷、二肉桂基二甲氧基矽烷、二肉桂基二乙氧基矽烷、二肉桂基二正丙氧基矽烷、二肉桂基二異丙氧基矽烷、二苯乙烯基二甲氧基矽烷、二苯乙烯基二乙氧基矽烷、二苯乙烯基二正丙氧基矽烷、二苯乙烯基二異丙氧基矽烷、二(三苯甲基)二甲氧基矽烷、二(三苯甲基)二乙氧基矽烷、二(三苯甲基)二正丙氧基矽烷、二(三苯甲基)二異丙氧基矽烷、二甲苯甲醯基二甲氧基矽烷、二甲苯甲醯基二乙氧基矽烷、二甲苯甲醯基二正丙氧基矽烷、二甲苯甲醯基二異丙氧基矽烷、二萘基二甲氧基矽烷、二萘基二乙氧基矽烷、二萘基二正丙氧基矽烷、二萘基二異丙氧基矽烷、二異丙苯基二甲氧基矽烷、二異
丙苯基二乙氧基矽烷、二異丙苯基二正丙氧基矽烷、二異丙苯基二異丙氧基矽烷、二甲磺醯基三甲氧基矽烷、二甲磺醯基二乙氧基矽烷、二甲磺醯基二正丙氧基矽烷、二甲磺醯基二異丙氧基矽烷、二(二甲苯基)二甲氧基矽烷、二(二甲苯基)二乙氧基矽烷、二(二甲苯基)二正丙氧基矽烷、二(二甲苯基)二異丙氧基矽烷、二甲氧基苯甲基二甲氧基矽烷、二甲氧基苯甲基二乙氧基矽烷、二甲氧基苯甲基二正丙氧基矽烷、二甲氧基苯甲基二異丙氧基矽烷、二-3-環氧丙氧基丙基二甲氧基矽烷、二-3-環氧丙氧基丙基二乙氧基矽烷、二-3-環氧丙氧基丙基二正丙氧基矽烷、二-3-環氧丙氧基丙基二異丙氧基矽烷、二-2-(3,4-環氧環己基)乙基二甲氧基矽烷、二-2-(3,4-環氧環己基)乙基二乙氧基矽烷、二-2-(3,4-環氧環己基)乙基二正丙氧基矽烷、二-2-(3,4-環氧環己基)乙基二異丙氧基矽烷、二-3-甲基丙烯醯氧基丙基二甲氧基矽烷、二-3-甲基丙烯醯氧基丙基二乙氧基矽烷、二-3-甲基丙烯醯氧基丙基二正丙氧基矽烷、二-3-甲基丙烯醯氧基丙基二異丙氧基矽烷等。
此等當中,於本發明中,較佳為使用二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二甲基二正丙氧基矽烷、二甲基二異丙氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、二乙基二正丙氧基矽烷、二乙基二異丙氧基矽烷、二乙烯基二甲氧基矽烷、二乙烯基二乙氧基矽烷、二乙烯基二正丙氧基矽烷、二乙烯基二異丙氧基矽烷、二正丙基二甲氧基矽烷、二正丙基二乙氧
基矽烷、二正丙基二正丙氧基矽烷、二正丙基二異丙氧基矽烷、二環丙基二甲氧基矽烷、二環丙基二乙氧基矽烷、二環丙基二正丙氧基矽烷、二環丙基二異丙氧基矽烷、二環丁基二甲氧基矽烷、二環丁基二乙氧基矽烷、二環丁基二正丙氧基矽烷、二環丁基二異丙氧基矽烷、二環戊基二甲氧基矽烷、二環戊基二乙氧基矽烷、二環戊基二正丙氧基矽烷、二環戊基二異丙氧基矽烷、二環己基二甲氧基矽烷、二環己基二乙氧基矽烷、二環己基二正丙氧基矽烷、二環己基二異丙氧基矽烷、二金剛烷基二甲氧基矽烷、二金剛烷基二乙氧基矽烷、二金剛烷基二正丙氧基矽烷、二金剛烷基二異丙氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷、二苯基二正丙氧基矽烷、二苯基二異丙氧基矽烷、二苯甲基二甲氧基矽烷、二苯甲基二乙氧基矽烷、二苯甲基二正丙氧基矽烷、二苯甲基二異丙氧基矽烷、二萘基二甲氧基矽烷、二萘基二乙氧基矽烷、二萘基二正丙氧基矽烷、二萘基二異丙氧基矽烷、二甲氧基苯甲基二甲氧基矽烷、二甲氧基苯甲基二乙氧基矽烷、二甲氧基苯甲基二正丙氧基矽烷、二甲氧基苯甲基二異丙氧基矽烷、二-2-(3,4-環氧環己基)二甲氧基矽烷、二-2-(3,4-環氧環己基)二乙氧基矽烷、二-2-(3,4-環氧環己基)二正丙氧基矽烷、二-2-(3,4-環氧環己基)二異丙氧基矽烷、二-3-環氧丙氧基丙基二甲氧基矽烷、二-3-環氧丙氧基丙基二乙氧基矽烷、二-3-環氧丙氧基丙基二正丙氧基矽烷、二-3-環氧丙氧基丙基二異丙氧基矽烷、二-3-甲基丙烯醯氧基丙基二甲氧基矽
烷、二-3-甲基丙烯醯氧基丙基二乙氧基矽烷、二-3-甲基丙烯醯氧基丙基二正丙氧基矽烷、二-3-甲基丙烯醯氧基丙基二異丙氧基矽烷。
式(1)所示之化合物更佳為二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、二乙烯基二甲氧基矽烷、二乙烯基二乙氧基矽烷、二正丙基二甲氧基矽烷、二正丙基二乙氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷、二萘基二甲氧基矽烷、二萘基二乙氧基矽烷、二甲氧基苯甲基二甲氧基矽烷、二甲氧基苯甲基二乙氧基矽烷、二-2-(3,4-環氧環己基)二甲氧基矽烷、二-2-(3,4-環氧環己基)二乙氧基矽烷、二-3-環氧丙氧基丙基二甲氧基矽烷、二-3-環氧丙氧基丙基二乙氧基矽烷、二-3-甲基丙烯醯氧基丙基二甲氧基矽烷、二-3-甲基丙烯醯氧基丙基二乙氧基矽烷。式(1)所示之化合物再更佳為二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二苯基二甲氧基矽烷、或、二苯基二乙氧基矽烷。
就式(2)之化合物加以說明。
R4Si(OR5)3 (2)
R4為烴基、環氧丙基、或、甲基丙烯醯基。
烴基較佳為碳數1~20之直鏈狀烴基、分支狀烴基、環狀烴基、芳香族烴基。
碳數1~20之直鏈狀烴基較佳為甲基、乙基、乙烯基、正丙基、正丁基、正戊基等的烴基。
分支狀烴基較佳為異丙基、異丁基、二級丁基、三級丁基、2-乙基丁基、3-乙基丁基、2,2-二乙基丙基等的烴基。
環狀烴基較佳為環丙基、環丁基、環戊基、環己基、環己烯基、環己烯基乙基、環辛烯基、環戊二烯基、雙環庚烯基、雙環庚基、金剛烷基。
芳香族烴基較佳為苯基、苯甲基、苯乙基、苯丙基、肉桂基、苯乙烯基、三苯甲基、甲苯甲醯基、萘基、異丙苯基、甲磺醯基、二甲苯基、甲氧基苯甲基。
此等烴基當中,更佳為甲基、乙基、乙烯基、正丙基、環丙基、環丁基、環戊基、環己基、金剛烷基、苯基、苯甲基、甲氧基苯甲基。
環氧丙基較佳為3-環氧丙氧基丙基或2-(3,4-環氧環己基)乙基。
甲基丙烯醯基較佳為3-甲基丙烯醯氧基丙基。
R5為烴基。作為烴基,較佳為碳數1~20之直鏈狀烴基、分支狀烴基。
碳數1~20之直鏈狀烴基較佳為甲基、乙基、正丙基。
作為分支狀烴基,較佳為異丙基等的烴基。
從而,作為式(2)所示之化合物的具體例,可舉出甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三正丙氧基矽烷、甲基三異丙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三正丙氧基矽烷、乙基三
異丙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三正丙氧基矽烷、乙烯基三異丙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、正丙基三正丙氧基矽烷、正丙基三異丙氧基矽烷、正丁基三甲氧基矽烷、正丁基三乙氧基矽烷、正丁基三正丙氧基矽烷、正丁基三異丙氧基矽烷、正戊基三甲氧基矽烷、正戊基三乙氧基矽烷、正戊基三正丙氧基矽烷、正戊基三異丙氧基矽烷、異丙基三甲氧基矽烷、異丙基三乙氧基矽烷、異丙基三正丙氧基矽烷、異丙基三異丙氧基矽烷、異丁基三甲氧基矽烷、異丁基三乙氧基矽烷、異丁基三正丙氧基矽烷、異丁基三異丙氧基矽烷、二級丁基三甲氧基矽烷、二級丁基三乙氧基矽烷、二級丁基三正丙氧基矽烷、二級丁基三異丙氧基矽烷、三級丁基三甲氧基矽烷、三級丁基三乙氧基矽烷、三級丁基三正丙氧基矽烷、三級丁基三異丙氧基矽烷、2-乙基丁基三甲氧基矽烷、2-乙基丁基三乙氧基矽烷、2-乙基丁基三正丙氧基矽烷、2-乙基丁基三異丙氧基矽烷、3-乙基丁基三甲氧基矽烷、3-乙基丁基三乙氧基矽烷、3-乙基丁基三正丙氧基矽烷、3-乙基丁基三異丙氧基矽烷、2,2-二乙基丙基三甲氧基矽烷、2,2-二乙基丙基三乙氧基矽烷、三正丙氧基矽烷、2,2-二乙基丙基三異丙氧基矽烷、環丙基三甲氧基矽烷、環丙基三乙氧基矽烷、環丙基三正丙氧基矽烷、環丙基三異丙氧基矽烷、環丁基三甲氧基矽烷、環丁基三乙氧基矽烷、環丁基三正丙氧基矽烷、環丁基三異丙氧基矽烷、環戊基三甲氧基矽烷、環戊基三乙氧基矽烷、
環戊基三正丙氧基矽烷、環戊基三異丙氧基矽烷、環己基三甲氧基矽烷、環己基三乙氧基矽烷、環己基三正丙氧基矽烷、環己基三異丙氧基矽烷、環己烯基三甲氧基矽烷、環己烯基三乙氧基矽烷、環己烯基三正丙氧基矽烷、環己烯基三異丙氧基矽烷、環己烯基乙基三甲氧基矽烷、環己烯基乙基三乙氧基矽烷、環己烯基乙基三正丙氧基矽烷、環己烯基乙基三異丙氧基矽烷、環辛烯基三甲氧基矽烷、環辛烯基三乙氧基矽烷、環辛烯基三正丙氧基矽烷、環辛烯基三異丙氧基矽烷、環戊二烯基丙基三甲氧基矽烷、環戊二烯基丙基三乙氧基矽烷、環戊二烯基丙基三正丙氧基矽烷、環戊二烯基丙基三異丙氧基矽烷、雙環庚烯基三甲氧基矽烷、雙環庚烯基三乙氧基矽烷、雙環庚烯基三正丙氧基矽烷、雙環庚烯基三異丙氧基矽烷、雙環庚基三甲氧基矽烷、雙環庚基三乙氧基矽烷、雙環庚基三正丙氧基矽烷、雙環庚基三異丙氧基矽烷、金剛烷基三甲氧基矽烷、金剛烷基三乙氧基矽烷、金剛烷基三正丙氧基矽烷、金剛烷基三異丙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基三正丙氧基矽烷、苯基三異丙氧基矽烷、苯甲基三甲氧基矽烷、苯甲基三乙氧基矽烷、苯甲基三正丙氧基矽烷、苯甲基三異丙氧基矽烷、苯乙基三甲氧基矽烷、苯乙基三乙氧基矽烷、苯乙基三正丙氧基矽烷、苯乙基三異丙氧基矽烷、苯丙基三甲氧基矽烷、苯丙基三乙氧基矽烷、苯丙基三正丙氧基矽烷、苯丙基三異丙氧基矽烷、肉桂基三乙氧基矽烷、肉桂基三正丙氧基矽烷、肉桂基三異
丙氧基矽烷、苯乙烯基三甲氧基矽烷、苯乙烯基三乙氧基矽烷、苯乙烯基三正丙氧基矽烷、苯乙烯基三異丙氧基矽烷、三苯甲基三甲氧基矽烷、苯乙烯基三乙氧基矽烷、苯乙烯基三正丙氧基矽烷、苯乙烯基三異丙氧基矽烷、甲苯甲醯基三甲氧基矽烷、甲苯甲醯基三乙氧基矽烷、甲苯甲醯基三正丙氧基矽烷、甲苯甲醯基三異丙氧基矽烷、萘基三甲氧基矽烷、萘基三乙氧基矽烷、萘基三正丙氧基矽烷、萘基三異丙氧基矽烷、異丙苯基三甲氧基矽烷、異丙苯基三乙氧基矽烷、異丙苯基三正丙氧基矽烷、異丙苯基三異丙氧基矽烷、甲磺醯基三甲氧基矽烷、甲磺醯基三乙氧基矽烷、甲磺醯基三正丙氧基矽烷、甲磺醯基三異丙氧基矽烷、二甲苯基三甲氧基矽烷、二甲苯基三乙氧基矽烷、二甲苯基三正丙氧基矽烷、二甲苯基三異丙氧基矽烷、4-甲氧基苯甲基三甲氧基矽烷、4-甲氧基苯甲基三乙氧基矽烷、4-甲氧基苯甲基三正丙氧基矽烷、4-甲氧基苯甲基三異丙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基三正丙氧基矽烷、3-環氧丙氧基丙基三異丙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三正丙氧基矽烷、2-(3,4-環氧環己基)乙基三異丙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三正丙氧基矽烷、3-甲基丙烯醯氧基丙基三異丙氧基矽烷等。
此等當中,於本發明中,較佳為使用甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三正丙氧基矽烷、甲基三異丙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三正丙氧基矽烷、乙基三異丙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三正丙氧基矽烷、乙烯基三異丙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、正丙基三正丙氧基矽烷、正丙基三異丙氧基矽烷、環丙基三甲氧基矽烷、環丙基三乙氧基矽烷、環丙基三正丙氧基矽烷、環丙基三異丙氧基矽烷、環丁基三甲氧基矽烷、環丁基三乙氧基矽烷、環丁基三正丙氧基矽烷、環丁基三異丙氧基矽烷、環戊基三甲氧基矽烷、環戊基三乙氧基矽烷、環戊基三正丙氧基矽烷、環戊基三異丙氧基矽烷、環己基三甲氧基矽烷、環己基三乙氧基矽烷、環己基三正丙氧基矽烷、環己基三異丙氧基矽烷、金剛烷基三甲氧基矽烷、金剛烷基三乙氧基矽烷、金剛烷基三正丙氧基矽烷、金剛烷基三異丙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基三正丙氧基矽烷、苯基三異丙氧基矽烷、苯甲基三甲氧基矽烷、苯甲基三乙氧基矽烷、苯甲基三正丙氧基矽烷、苯甲基三異丙氧基矽烷、萘基三甲氧基矽烷、萘基三乙氧基矽烷、萘基三正丙氧基矽烷、萘基三異丙氧基矽烷、4-甲氧基苯甲基三甲氧基矽烷、4-甲氧基苯甲基三乙氧基矽烷、4-甲氧基苯甲基三正丙氧基矽烷、甲氧基苯甲基三異丙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、
2-(3,4-環氧環己基)三正丙氧基矽烷、2-(3,4-環氧環己基)三異丙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基三正丙氧基矽烷、3-環氧丙氧基丙基三異丙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三正丙氧基矽烷、3-甲基丙烯醯氧基丙基三異丙氧基矽烷。
式(2)所示之化合物更佳為甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、萘基三甲氧基矽烷、萘基三乙氧基矽烷、4-甲氧基苯甲基三甲氧基矽烷、4-甲氧基苯甲基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷。式(2)所示之化合物再更佳為甲基三甲氧基矽烷、苯基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、或、4-甲氧基苯甲基三甲氧基矽烷。
就式(3)之化合物加以說明。
Si(OR6)4 (3)
R6表示烴基。烴基較佳為碳數1~20之直鏈狀烴基、分支狀烴基。
碳數1~20之直鏈狀烴基較佳為甲基、乙基、正丙基。
分支狀烴基較佳為異丙基等的烴基。
R6更佳為碳數1~5之烷基。由原料取得的容易性而言,R6特佳為甲基、乙基。
從而,式(3)所示之化合物較佳為四甲氧基矽烷、四乙氧基矽烷、四正丙氧基矽烷、四異丙氧基矽烷。此等當中,於本發明中,由原料取得的容易性而言,較佳使用四甲氧基矽烷、四乙氧基矽烷等。
式(1)、式(2)、或、式(3)所示之化合物可僅使用1種,亦可同時使用2種以上的化合物。又,也可將2種以上的化合物在水解‧縮合反應前混合而使用。
於本發明之聚矽氧聚合物之製造方法中,係在鹼的存在下進行水解‧縮合反應。
作為鹼,可舉出例如氨、氫氧化鈉、氫氧化鉀、氫氧化鋇、或者氫氧化鈣等的無機鹼、或三乙胺、單乙醇胺、二乙醇胺、二甲基單乙醇胺、單甲基二乙醇胺、三乙醇胺、二氮雜雙環辛烷、二氮雜雙環壬烷、二氮雜雙環十一烷、吡啶、吡咯、哌、吡咯啶、哌、甲吡啶、三甲胺、氟化四丁銨、氯化苯甲基三丁基銨、氯化苯甲基三乙基銨、氯化苯甲基三甲基銨、氯化四正丁銨、氯化四乙銨、氯化四甲銨、溴化苯甲基三正丁基銨、溴化苯甲基三乙基銨、溴化苯甲基三甲基銨、溴化
正辛基三甲基銨、溴化己基三甲基銨、溴化四丁銨、溴化四乙銨、溴化十四基三甲基銨、溴化四甲銨、溴化四正丙銨、碘化四丁銨、碘化四乙銨、碘化四甲銨、碘化四正丙銨、碘化三甲基苯基銨、氫氧化苯甲基三甲基銨、氫氧化苯基三甲基銨、氫氧化四丁銨、氫氧化四乙銨、氫氧化四甲銨、氫氧化四丙銨、硫酸氫四丁銨、四氟硼酸四丁銨、硫氰酸四甲銨、或者對甲苯磺酸四甲銨等的有機鹼。
鹼較佳為四級銨鹽。四級銨鹽可列示例如氯化苯甲基三丁基銨、氯化苯甲基三甲基銨、氯化四正丁銨、氯化四甲銨、溴化苯甲基三正丁基銨、溴化苯甲基三甲基銨、溴化己基三甲基銨、溴化四丁銨、溴化十四基三甲基銨、溴化四甲銨、氫氧化苯甲基三甲基銨、氫氧化苯基三甲基銨、氫氧化四丁銨、氫氧化四乙銨、氫氧化四甲銨、氫氧化四丙銨、硫酸氫四丁銨、四氟硼酸四丁銨、硫氟酸四甲銨、或對甲苯磺酸四甲銨等。再者,鹼更佳為價格低廉的氫氧化四甲銨。
鹼的用量,相對於選自包含式(1)所示之化合物R1R2Si(OR3)2 (1)
(式中,R1、R2表示烴基、環氧丙基、或、甲基丙烯醯基,R1、R2可為相同的基,亦可為不同的基,式中,R3表示烴基)、式(2)所示之化合物R4Si(OR5)3 (2)
(式中,R4表示烴基、環氧丙基、或、甲基丙烯醯基,R5表示烴基)、及式(3)所示之化合物Si(OR6)4 (3)
(式中,R6表示烴基)
之群組中的至少1種化合物的總當量數,較佳為0.001~1.0當量,更佳為0.005~0.5當量。若為0.001當量以上,反應會迅速進行;若為1.0當量以內,聚矽氧聚合物的生產性良好,經濟上較理想。
由選自包含式(1)所示之化合物R1R2Si(OR3)2 (1)
(式中,R1、R2表示烴基、環氧丙基、或、甲基丙烯醯基,R1、R2可為相同的基,亦可為不同的基,式中,R3表示烴基)、式(2)所示之化合物R4Si(OR5)3 (2)
(式中,R4表示烴基、環氧丙基、或、甲基丙烯醯基,R5表示烴基)、及式(3)所示之化合物Si(OR6)4 (3)
(式中,R6表示烴基)
之群組中的至少1種化合物藉由水解.縮合反應得到聚矽氧聚合物時的水量,相對於選自包含式(1)所示之化合物R1R2Si(OR3)2 (1)
(式中,R1、R2表示烴基、環氧丙基、或、甲基丙烯醯基,R1、R2可為相同的基,亦可為不同的基,式中,R3表示烴基)、式(2)所示之化合物R4Si(OR5)3 (2)
(式中,R4表示烴基、環氧丙基、或、甲基丙烯醯基,R5表示烴基)、及式(3)所示之化合物Si(OR6)4 (3)
(式中,R6表示烴基)
之群組中的至少1種化合物的總莫耳數,較佳為0.01~100莫耳,添加0.1~30莫耳更佳。若為0.01莫耳以上,反應會迅速進行;若添加100莫耳以內,則聚矽氧聚合物的生產性良好,經濟上較理想。
於水解‧縮合反應中,亦可使用有機溶媒。作為有機溶媒,可使用甲苯、二甲苯等的非質子性溶媒、甲基乙基酮、甲基異丁基酮等的酮系溶媒、甲醇、乙醇、2-丙醇等的醇溶媒、二乙醚、四氫呋喃等的醚溶媒等溶媒。又,亦可使用丙二醇單甲醚、丙二醇單甲醚乙酸酯、二乙二醇單甲醚、乳酸乙酯等的高沸點溶媒。再者,使用非質子性溶媒時,亦可添加可溶於水的醇溶媒使其進行水解‧縮合反應。有機溶媒可使用2種以上。
就水解‧縮合反應之條件而言,反應溫度較佳為0~100℃,更佳為20~80℃。反應溫度若為0℃以上,水解‧縮合反應可於短時間內完成;又,若為100℃以下,則易達工業化。
於水解‧縮合反應中,可向矽化合物滴下鹼,亦可向鹼、包含鹼的有機溶媒或離子交換水等滴下矽化合物。
水解‧縮合反應的反應時間可為可獲得期望分子量之聚矽氧聚合物的時間,較佳為0.5~48小時,更佳為1~30小時。若為0.5小時以上,可進行水解‧縮合反應;若為48小時以內則聚矽氧聚合物的生產時間較短,經濟上較理想。
於本發明中,係於水解‧縮合反應使用最佳的鹼;較佳的是,得到含矽化合物後,實質上去除鹼、去除溶媒等,並於濃縮前添加有機酸,由此可於高溫下濃縮時抑制聚矽氧聚合物的變質。
於鹼去除操作中,所稱實質上去除鹼,係指使反應所使用的鹼,相對於含矽化合物中於反應開始時所添加的量,殘留0.1質量%以下,較佳為0.01質量%以下左右之意。
作為去除鹼之方法,可舉出以鹼與當量以上的酸進行中和的方法或以離子交換水加以洗淨的方法、採離子交換樹脂之方法。此等方法可配合反應所使用的鹼,單獨或者組合此等或實施1次以上。進行此等方法之際,亦可使用有機溶媒。
作為有機溶媒的實例,可使用甲苯、二甲苯等的非質子性溶媒、甲基乙基酮、甲基異丁基酮等的酮系溶媒、甲醇、乙醇、2-丙醇等的醇溶媒、二乙醚、四氫呋喃等的醚溶媒、乙酸乙酯等溶媒。又,可舉出丙二
醇單甲醚、丙二醇單甲醚乙酸酯、二乙二醇單甲醚、乳酸乙酯等的高沸點溶媒。
就本發明之聚矽氧聚合物之製造方法而言,將特定的化合物,在鹼的存在下進行水解‧縮合反應後之相對於100重量份聚矽氧聚合物的有機酸的含量為0.0001重量份以上0.03重量份以下。
透過含有有機酸,例如,可抑制濃縮時的加熱操作所致之重量平均分子量發生變化等聚矽氧聚合物的變質,而能夠獲得期望之聚矽氧聚合物。
就本發明之聚矽氧聚合物之製造方法而言,較佳的是在進行水解‧縮合反應後,去除鹼。此時,更佳為去除水解‧縮合反應或鹼去除操作中所使用的溶媒等。
就本發明之聚矽氧聚合物之製造方法而言,較佳的是在鹼的存在下進行水解‧縮合反應後,將有機酸添加於聚矽氧聚合物,使相對於100重量份聚矽氧聚合物的有機酸的含量為0.0001重量份以上0.03重量份以下。
就本發明之聚矽氧聚合物之製造方法而言,於鹼去除操作中使用有機酸時,較佳的是直接使用鹼去除操作中所使用的有機酸。又,有機酸可追加至鹼去除操作中所使用的有機酸,而添加同類有機酸。再者,亦可追加至鹼去除操作中所使用的有機酸,而添加其他的有機酸。
有機酸可舉出乙酸、丙酸、丁酸、戊酸、己酸、庚酸、辛酸、壬酸、癸酸、草酸、馬來酸、甲基丙二酸、己二酸、癸二酸、沒食子酸、酪酸、蜜臘酸、二十碳四烯酸、莽草酸(shikimic acid)、2-乙基己酸、油酸、硬脂酸、亞麻仁酸、亞麻油酸、水楊酸、苯甲酸、對胺基苯甲酸、對甲苯磺酸、苯磺酸、一氯乙酸、二氯乙酸、三氯乙酸、三氟乙酸、甲酸、丙二酸、磺酸、鄰苯二甲酸、延胡索酸、檸檬酸、酒石酸、琥珀酸、戊二酸等。此等當中,較佳為草酸、馬來酸、甲基丙二酸、己二酸、油酸、硬脂酸、亞麻仁酸、亞麻油酸、水楊酸、苯甲酸、對胺基苯甲酸、對甲苯磺酸、苯磺酸、丙二酸、鄰苯二甲酸、延胡索酸、檸檬酸、酒石酸、琥珀酸、戊二酸等,更佳為草酸、馬來酸、水楊酸、苯甲酸、丙二酸、鄰苯二甲酸、延胡索酸、檸檬酸、酒石酸、琥珀酸、戊二酸等。
有機酸若為草酸、馬來酸、甲基丙二酸、己二酸、癸二酸、蜜臘酸、丙二酸、鄰苯二甲酸、延胡索酸、檸檬酸、酒石酸、琥珀酸、戊二酸等二元以上的有機酸,則有機酸不會在濃縮中與溶媒一起去除,因而較佳。有機酸更佳為草酸、馬來酸、丙二酸、鄰苯二甲酸、延胡索酸、或、檸檬酸。此等酸可單獨或組合2種以上使用。
相對於100重量份聚矽氧聚合物的有機酸的含量為0.0001重量份以上0.03重量份以下。較佳的是,相對於100重量份聚矽氧聚合物的有機酸的含量為
0.0001重量份以上0.01重量份以下。相對於100重量份聚矽氧聚合物,有機酸的含量若小於0.0001重量份,則無法顯現添加有機酸的效果;相對於100重量份聚矽氧聚合物,有機酸的含量若多於0.03重量份,則添加之有機酸會成為觸媒,使聚矽氧聚合物發生變質、或損及聚矽氧聚合物的特性。
以濃縮去除水解‧縮合反應或鹼去除操作中所使用的溶媒時,作為濃縮方法,可舉出加熱或者減壓或組合此等之方法。
進行濃縮時的加熱溫度可配合所用溶媒的沸點來變更,較佳為30至150℃,更佳為30至100℃。又,較佳藉由進行減壓來降低溫度。加熱溫度若為30℃以上,濃縮會迅速進行;若為150℃以內,則於工業化時易於實施。
以濃縮去除水解‧縮合反應或鹼去除操作中所使用的溶媒時,係控制溶媒的去除量,使聚矽氧聚合物的濃度較佳為20至99%,更佳為30至99%。
以下,示出實施例對本發明加以具體說明。
於以下實施例中,測定係使用下述裝置,原料則使用由試劑廠商(東京化成工業(股)、和光純藥工業(股)、Nacalai Tesque(股)、信越化學工業(股))購入的常用試劑。
使用HLC-8220GPC系統(TOSOH(股)製)。管柱係使用TSKgelSuperHZ3000、TSKgelSuperHZ2000、TSKgel1000(皆為TOSOH(股)製)。檢測係以RI進行,作為參考管柱係使用TSKgelSuperH-RC。溶媒係使用四氫呋喃,管柱與參考管柱的流速係以0.35mL/min進行。測定溫度係加壓泵、管柱皆於40℃進行。就試樣的調製來說,係將約0.025g含羥基之聚矽氧聚合物以10ml的四氫映喃稀釋,注入1μL。分子量分布計算係使用TSK標準聚苯乙烯(TOSOH(股)製、A-500、A-1000、A-2500、A-5000、F-1、F-2、F-4、F-10、F-20、F-40、F-8-)作為標準物質來算出。
將1.0g聚矽氧聚合物溶液以1小時、175℃進行燒成,測定相對於1.0g聚矽氧聚合物之固體成分的重量,而決定聚矽氧聚合物的固體成分濃度。
使用ICS-2000(日本Dionex(股)製)。管柱係使用IonPac AG-11-HC、IonPac AS11-HC(皆為日本Dionex(股)製)。檢測係依電導度進行,溶媒係使用氫氧化鉀與超純水,流速係以1.25mL/min進行。測定溫度係以30℃進行。試樣的調製,係混合約0.7g聚矽氧聚合物、0.1g甲苯、0.7g超純水,注入25μL之所得之水層。
3-甲基丙烯醯氧基丙基三甲氧基矽烷之聚矽氧聚合物的合成(A-1)
對具備攪拌機、回流冷卻器、滴液漏斗及溫度計的3L四頸燒瓶加入18.0g的25%氫氧化四甲銨水溶液、126.0g離子交換水、178.8g的2-丙醇、1132.5g甲基異丁基酮。昇溫至40℃後,使用滴液漏斗以2.0小時滴下596.0g的3-甲基丙烯醯氧基丙基三甲氧基矽烷。其後,於40℃使其反應24小時。反應後,添加1%檸檬酸水予以中和,並進行分液。對分離之油層添加464.9g離子交換水並攪拌後,進行分液。再實施同樣的操作2次,得到3-甲基丙烯醯氧基丙基三甲氧基矽烷之聚矽氧聚合物溶液1145.0g(固體成分20%)。以此聚矽氧聚合物溶液作為(A-1)。
3-環氧丙氧基丙基三甲氧基矽烷與甲基三甲氧基矽烷之聚矽氧聚合物的合成(A-2)
對具備攪拌機、回流冷卻器、滴液漏斗及溫度計的5L四頸燒瓶加入36.8g的25%氫氧化四甲銨水溶液、103.8g離子交換水、297.1g的2-丙醇、1881.5g甲基異丁基酮。昇溫至40℃後,使用滴液漏斗以1.5小時滴下794.1g的3-環氧丙氧基丙基三甲氧基矽烷與196.2g甲基三甲氧基矽烷。其後,於40℃使其反應21小時。反應後,添加1%檸檬酸水予以中和,並進行分液。對分離之油層添加742.7g離子交換水並攪拌後,進行分液,得到3-環氧丙氧基丙基三甲氧基矽烷與甲基三甲氧基矽烷之聚矽氧聚合物溶液3250.1g(固體成分20%)。以此聚矽氧聚合物溶液作為(A-2)。
4-甲氧基苯甲基三甲氧基矽烷與甲基三甲氧基矽烷之聚矽氧聚合物的合成(A-3)
對具備攪拌機、回流冷卻器、滴液漏斗及溫度計的5L四頸燒瓶加入21.9g的25%氫氧化四甲銨水溶液、81.1g離子交換水、604.1g的2-丙醇、604.1g甲苯。昇溫至40℃後,使用滴液漏斗以1.5小時滴下440.6g的4-甲氧基苯甲基三甲氧基矽烷與163.5g甲基三甲氧基矽烷。其後,於40℃使其反應4小時。反應後,添加1%檸檬酸水予以中和。進而,添加1208.2g甲苯與302.0g離子交換水並攪拌後,進行分液。對分離之油層添加471.2g離子交換水並攪拌後,進行分液,得到4-甲氧基苯甲基三甲氧基矽烷與甲基三甲氧基矽烷之聚矽氧聚合物溶液2511.0g(固體成分16%)。以此聚矽氧聚合物溶液作為(A-3)。
苯基三甲氧基矽烷、甲基三甲氧基矽烷、及、四甲氧基矽烷之聚矽氧聚合物的合成(A-4)
對具備攪拌機、回流冷卻器、滴液漏斗及溫度計的5L四頸燒瓶加入512.3g的2-丙醇、512.3g甲基異丁基酮、286.1g甲基三甲氧基矽烷、333.1g苯基三甲氧基矽烷、63.9g四甲氧基矽烷。昇溫至25℃後,使用滴液漏斗以1.5小時滴下270.6g的25%氫氧化四甲銨水溶液。其後,於25℃使其反應20小時。對另一具備攪拌機、回流冷卻器、滴液漏斗及溫度計的5L四頸燒瓶加入
27.8g的35%鹽酸、683.1g離子交換水、1366.2g甲基異丁基酮。反應後,將反應液向加入有鹽酸等的5L四頸燒瓶滴下予以中和並進行分液。對分離之油層添加683.1g離子交換水並攪拌後,進行分液。再實施同樣的操作1次,得到苯基三甲氧基矽烷、甲基三甲氧基矽烷及四甲氧基矽烷之聚矽氧聚合物2671.0g(固體成分14%)。以此聚矽氧聚合物溶液作為(A-4)。
苯基三甲氧基矽烷、甲基三甲氧基矽烷、及、四甲氧基矽烷之聚矽氧聚合物的合成(A-5)
對具備攪拌機、回流冷卻器、滴液漏斗及溫度計的5L四頸燒瓶加入347.7g的2-丙醇、1738.5g甲基異丁基酮、158.0g甲醇、272.4g甲基三甲氧基矽烷、238.0g苯基三甲氧基矽烷、121.8g四甲氧基矽烷。昇溫至25℃後,使用滴液漏斗以1.5小時滴下266.0g的25%氫氧化四甲銨水溶液。其後於25℃使其反應20小時。對另一具備攪拌機、回流冷卻器、滴液漏斗及溫度計的5L四頸燒瓶加入27.4g的35%鹽酸、632.2g離子交換水。反應後,將反應液向加入有鹽酸等的5L四頸燒瓶滴下予以中和並進行分液。對分離之油層添加632.1g離子交換水並攪拌後,進行分液。再實施同樣的操作1次,得到苯基三甲氧基矽烷、甲基三甲氧基矽烷及四甲氧基矽烷之聚矽氧聚合物溶液2390.8g(固體成分14%)。以此聚矽氧聚合物溶液作為(A-5)。
將各合成例中所使用的化合物及其混合比、所得聚矽氧聚合物示於表1。此外,表1中之各表記係表示以下化合物:
(B-1):3-甲基丙烯醯氧基丙基三甲氧基矽烷
(B-2):3-環氧丙氧基丙基三甲氧基矽烷
(B-3):甲基三甲氧基矽烷
(B-4):4-甲氧基苯甲基三甲氧基矽烷
(B-5):苯基三甲氧基矽烷
(B-6):四甲氧基矽烷
對合成例1中所得之聚矽氧聚合物(A-1)溶液添加相對於100重量份的聚矽氧聚合物為0.005重量份有機酸之檸檬酸,於90℃進行30小時減壓濃縮至固體成分濃度成為99%。濃縮前的重量平均分子量(Mw)為2180,濃縮後的重量平均分子量(Mw)為2180而無變化。
除將有機酸的種類改變為延胡索酸以外,係實施與實施例1同樣的操作。將其結果示於表2。
除未使用有機酸以外,係實施與實施例1同樣的操作。將其結果示於表2。
若為合成例1中所得之聚矽氧聚合物(A-1)溶液時,實施例1係無濃縮前後之重量平均分子量(Mw)的變化。與比較例1相比,實施例2係濃縮前後之重量平均分子量(Mw)的變化較少。
對合成例2中所得之聚矽氧聚合物(A-2)溶液添加相對於100重量份聚矽氧聚合物為0.005重量份的有機酸之檸檬酸,於90℃進行24小時減壓濃縮至固體成分濃度成為99%。濃縮前的重量平均分子量(Mw)為2990,濃縮後的重量平均分子量(Mw)為3050而幾乎無變化。
除改變有機酸的種類或量以外,係實施與實施例3同樣的操作。將其結果示於表3。
除未使用有機酸之有機酸以外,係實施與實施例3同樣的操作。將其結果示於表3。
除添加相對於100重量份水解聚合物為0.050重量份的有機酸之檸檬酸以外,係實施與實施例3同樣的操作。將其結果示於表3。
若為合成例2中所得之聚矽氧聚合物(A-2)溶液時,與比較例2~3相比,實施例3~9係濃縮前後之重量平均分子量(Mw)的變化較少。
對合成例3中所得之聚矽氧聚合物(A-3)溶液添加相對於100重量份聚矽氧聚合物為0.005重量份的有機酸之檸檬酸,於90℃進行24小時減壓濃縮至固體成分濃度成為99%。濃縮前的重量平均分子量(Mw)為2880,濃縮後的重量平均分子量(Mw)為2880而無變化。
除改變有機酸的種類以外,係實施與實施例11同樣的操作。將其結果示於表4。
除未使用有機酸之有機酸以外,係實施與實施例10同樣的操作。將其結果示於表4。
若為合成例3中所得之聚矽氧聚合物(A-3)溶液時,就實施例10、12~13而言,無濃縮前後之重量平均分子量(Mw)的變化。與比較例4相比,實施例11係濃縮前後之重量平均分子量(Mw)的變化較少。
對合成例4中所得之聚矽氧聚合物(A-4)溶液添加相對於100重量份聚矽氧聚合物為0.001重量份的有機酸之馬來酸,於50℃進行24小時減壓濃縮至固體成分濃度成為50%以上。濃縮前的重量平均分子量(Mw)為2880,濃縮後的重量平均分子量(Mw)為3200而變化較少。
除改變有機酸的種類或量以外,係實施與實施例14同樣的操作。將其結果示於表5。
除未使用有機酸之有機酸以外,係實施與實施例14同樣的操作。將其結果示於表5。
除添加相對於100重量份水解聚合物為0.050重量份或0.100重量份的有機酸之馬來酸以外,係實施與實施例14同樣的操作。將其結果示於表5。
若為合成例4中所得之聚矽氧聚合物(A-4)溶液時,與比較例5~7相比,實施例14~21係濃縮前後之重量平均分子量(Mw)的變化較少。
對合成例5中所得之聚矽氧聚合物(A-5)溶液添加相對於100重量份聚矽氧聚合物為0.005重量份的有機酸之馬來酸,於60℃進行24小時減壓濃縮至固體成分濃度成為70%以上。濃縮前的重量平均分子量(Mw)為2450,濃縮後的重量平均分子量(Mw)為2610而幾乎無變化。
除改變有機酸的種類或量以外,係實施與實施例22同樣的操作。將其結果示於表6。
除未使用有機酸之有機酸以外,係實施與實施例22同樣的操作。將其結果示於表6。聚矽氧聚合物經固化。
若為合成例5中所得之聚矽氧聚合物(A-5)溶液時,就比較例8而言,其分子量上昇而固化;而就實施例22~26來說,雖有濃縮前後之重量平均分子量(Mw)的變化,但未發生固化。
本發明之聚矽氧聚合物之製造方法,在聚矽氧聚合物的製造過程中,於高溫下濃縮時,可抑制聚矽氧聚合物之分子量的增加。本發明之聚矽氧聚合物之製造方法,在聚矽氧聚合物的製造過程中,於高溫下濃縮時,可抑制聚矽氧聚合物對鹼溶液的溶解性的變化。依本發明之聚矽氧聚合物之製造方法所製造的聚矽氧聚合物,即使經長時間保存,分子量的增加或黏度的變化亦小,保存穩定性優良。
依本發明之聚矽氧聚合物之製造方法所製造的聚矽氧聚合物係作為液晶顯示元件或半導體元件等電子零件的耐熱性材料等而有用,進而,可應用於塗料或接著劑等廣泛領域中。
Claims (7)
- 一種聚矽氧聚合物之製造方法,其將選自包含式(1)所示之化合物:R1R2Si(OR3)2 (1)(式中,R1、R2表示烴基、環氧丙基、或、甲基丙烯醯基,R1、R2可為相同的基,亦可為不同的基,式中,R3表示烴基)、式(2)所示之化合物:R4Si(OR5)3 (2)(式中,R4表示烴基、環氧丙基、或、甲基丙烯醯基,R5表示烴基)、及式(3)所示之化合物:Si(OR6)4 (3)(式中,R6表示烴基)之群組中的至少1種化合物,在鹼的存在下進行水解.縮合反應後,在濃縮前,首先,添加酸以中和鹼,接著,加入水以分離水層,在聚矽氧聚合物溶液中追加添加有機酸,將相對於100重量份聚矽氧聚合物的有機酸的含量設為0.0001重量份以上0.03重量份以下後,濃縮聚矽氧聚合物溶液。
- 如請求項1之聚矽氧聚合物之製造方法,其中式(1)所示之化合物為二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二苯基二甲氧基矽烷、或、二苯基二乙氧基矽烷。
- 如請求項1之聚矽氧聚合物之製造方法,其中式(2)所示之化合物為甲基三甲氧基矽烷、苯基三甲氧基矽 烷、3-環氧丙氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、或、4-甲氧基苯甲基三甲氧基矽烷。
- 如請求項1之聚矽氧聚合物之製造方法,其中式(3)所示之化合物為四甲氧基矽烷、或、四乙氧基矽烷。
- 如請求項1至4中任一項之聚矽氧聚合物之製造方法,其中鹼為四級銨鹽。
- 如請求項1至4中任一項之聚矽氧聚合物之製造方法,其中有機酸為二元以上的有機酸。
- 如請求項1至4中任一項之聚矽氧聚合物之製造方法,其中有機酸為草酸、馬來酸、丙二酸、鄰苯二甲酸、延胡索酸、或、檸檬酸。
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